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公开(公告)号：US20240274417A1
公开(公告)日：2024-08-15
申请号：US18429046
申请日：2024-01-31
Applicant: TOKYO ELECTRON LIMITED
Inventor： Mitsutoshi ASHIDA
CPC classification number: H01J37/32935 , G01R19/0061
Abstract: Provided is a plasma measurement method for measuring a plasma state using a probe device that is provided in a plasma processing apparatus, and a measurement circuit including a signal transmitter that outputs an AC voltage, the method comprising: measuring a first current including a magnitude and phase of current in the measurement circuit when the AC voltage is output from the signal transmitter to the probe device, in a state where no plasma is generated in the plasma processing apparatus; measuring a second current including a magnitude and phase of current in the measurement circuit when the AC voltage is output from the signal transmitter to the probe device, in a state where plasma is generated in the plasma processing apparatus; and measuring current flowing through the plasma by vector operation using the magnitude and phase of the current included in the measured first current and second current.
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公开(公告)号：US20210111003A1
公开(公告)日：2021-04-15
申请号：US17063260
申请日：2020-10-05
Applicant: Tokyo Electron Limited
Inventor： Taro IKEDA , Hirokazu UEDA , Eiki KAMATA , Mitsutoshi ASHIDA , Isao GUNJI
Abstract: A plasma processing method includes: supplying a gas into a processing container; and intermittently supplying microwave powers output from a plurality of microwave introducing modules into the processing container. In the intermittently supplying the microwave powers, the supply of all the microwave powers from the plurality of microwave introducing modules is periodically in an OFF state for a given time.
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公开(公告)号：US20180261432A1
公开(公告)日：2018-09-13
申请号：US15914951
申请日：2018-03-07
Applicant: TOKYO ELECTRON LIMITED
Inventor： Mitsutoshi ASHIDA
IPC: H01J37/32
Abstract: In a high frequency generator, a high frequency generated by an IQ modulation of a vector multiplier and a amplification of an amplifier is outputted through an output unit. An directional coupler outputs a first high frequency including a part of traveling waves and a second high frequency including a part of reflected waves. A control units obtains an estimated value of each of an in-phase component and an orthogonal component of the traveling waves in the output unit, and an in-phase component and an orthogonal component of the reflected waves in the output unit by performing a first matrix operation that is an operation of four polynomials, each including as multi-variables an in-phase component and an orthogonal component of a first high frequency and an in-phase component and an orthogonal component of the second high frequency.
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公开(公告)号：US20240170260A1
公开(公告)日：2024-05-23
申请号：US18282775
申请日：2022-03-14
Applicant: TOKYO ELECTRON LIMITED
Inventor： Taro IKEDA , Mitsutoshi ASHIDA , Eiki KAMATA
IPC: H01J37/32 , H01J37/16 , H01L21/3065
CPC classification number: H01J37/32229 , H01J37/16 , H01L21/3065
Abstract: There is provided a plasma processing apparatus comprising: a processing container configured such that a substrate is subjected to plasma processing; a dielectric top plate which is quadrangular and which is provided to close an upper opening of the processing container; and a conductor plate supporting the dielectric top plate and having four electromagnetic wave emitting ports for emitting electromagnetic waves to the dielectric top plate. Each of the four electromagnetic wave emitting ports has a rectangular shape having long side and short side, the electromagnetic wave emitting ports are arranged such that the long side of each of the four electromagnetic wave emitting ports are parallel to the closest side among four sides of the dielectric top plate forming the quadrangular shape, and the long sides of the two electromagnetic wave emitting ports oriented in a same direction do not overlap each other in the same direction.
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公开(公告)号：US20230066120A1
公开(公告)日：2023-03-02
申请号：US17893621
申请日：2022-08-23
Applicant: Tokyo Electron Limited
Inventor： Eiki KAMATA , Mikio SATO , Taro IKEDA , Mitsutoshi ASHIDA
IPC: H01J37/32
Abstract: Measuring a plasma state using a probe device in the case of performing plasma processing on a substrate by introducing process gas into a processing container accommodating the substrate and by producing pulsed plasma using an electromagnetic wave pulse obtained by processing an electromagnetic wave generated from an electromagnetic wave oscillator using a pulsing device. An AC voltage to the pulsed plasma is applied via the probe device; transmitting a signal from the pulsed plasma based on the AC voltage via the probe device and measuring data including a current value; and obtaining a state of the pulsed plasma by analyzing the measured data. The frequency of the AC voltage deviates from a frequency of the electromagnetic wave pulse so that the number of data required for the measurement of the pulsed plasma within one cycle of the electromagnetic wave pulse is obtained within allowable time.
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Patent Agency Ranking
公开(公告)号：US20150305097A1
公开(公告)日：2015-10-22
申请号：US14684865
申请日：2015-04-13
Applicant: TOKYO ELECTRON LIMITED
Inventor： Mitsutoshi ASHIDA , Seokhyoung HONG
CPC classification number: H05B6/80 , H01L21/67115 , H01L21/6875 , H05B6/6408 , H05B6/645
Abstract: A microwave heating apparatus includes: a processing chamber including a ceiling wall and a bottom wall and accommodating a target object; a microwave introducing unit to generate a microwave for heating the target object; a holding unit to hold the target object; and a control unit to control the microwave introducing unit to heat the target object. During heating the target object, the holding unit holds the target object at a position in which a distance H1 from the top surface of the bottom wall to the bottom surface of the target object satisfies a condition of H1
Abstract translation: 微波加热装置包括：处理室，包括顶壁和底壁并容纳目标物体; 微波引入单元，用于产生用于加热目标物体的微波; 保持目标对象的保持单元; 以及控制单元，用于控制微波引入单元以加热目标物体。 在加热目标物体期间，保持单元将目标物体保持在距离目标物体的顶壁表面到底面的距离H1满足H1 <λ/ 2的条件的位置处， H2从顶壁的底表面到目标物体的顶面满足3λ/ 4＆nlE; H2 <λ，λ为微波波长的条件。
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公开(公告)号：US20150144621A1
公开(公告)日：2015-05-28
申请号：US14549175
申请日：2014-11-20
Applicant: TOKYO ELECTRON LIMITED
Inventor： Seokhyoung HONG , Mitsutoshi ASHIDA , Yoshihiro MIYAGAWA , Masaki KOIZUMI
CPC classification number: H01L21/67115 , H05B6/6411 , H05B6/705 , H05B6/806
Abstract: A matching method and a microwave heating method in a microwave heating apparatus for heating a substrate by introducing a microwave into a processing chamber comprises an initial matching step of performing a matching so that a reflection power to a microwave introducing unit is minimized in a state where the substrate is maintained at a first height position by a supporting member. And a second height position determination step of introducing the microwave into the processing chamber by the microwave introducing unit and determining a second height position of the substrate based on at least a temperature of the substrate while adjusting a height of the substrate by the supporting member.
Abstract translation: 微波加热装置中的匹配方法和微波加热方法，用于通过将微波引入处理室来加热基板包括：初始匹配步骤，执行匹配，使得对微波导入单元的反射功率最小化， 基板通过支撑构件保持在第一高度位置。 以及第二高度位置确定步骤，通过微波引入单元将微波引入处理室，并且在通过支撑构件调节基板的高度的同时基于至少基板的温度确定基板的第二高度位置。
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公开(公告)号：US20250087463A1
公开(公告)日：2025-03-13
申请号：US18820762
申请日：2024-08-30
Applicant: Tokyo Electron Limited
Inventor： Mitsutoshi ASHIDA
IPC: H01J37/32
Abstract: An electromagnetic wave supply mechanism for supplying an electromagnetic wave into a processing container serving as a load, includes a first branch circuit provided downstream of a radio-frequency power source for generating the electromagnetic wave. The first branch circuit includes a first waveguide having an input end, a plurality of second waveguides having respective output ends, and a branch point at which the first waveguide is branched into the second waveguides corresponding to n branches. Each output end is connected to the load or an input end of a second branch circuit subsequent to the first branch circuit. In the first branch circuit, when a total number of the output ends seen from the branch point is n, lengths of the second waveguides from the branch point to the n output ends differ from each other by m×λ/2+(λ/2)/n.
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公开(公告)号：US20210234248A1
公开(公告)日：2021-07-29
申请号：US17155618
申请日：2021-01-22
Applicant: Tokyo Electron Limited
Inventor： Isao TAKAHASHI , Hiroyuki MIYASHITA , Yuki OSADA , Mitsuya INOUE , Mitsutoshi ASHIDA
Abstract: A directional coupler includes: a hollow coaxial line including a central conductor forming a main line and an outer conductor surrounding the central conductor and having an opening formed therein; a dielectric substrate covering the opening and provided with film-shaped ground conductors, wherein a film-shaped ground conductor covers a rear surface of the dielectric substrate facing the central conductor via the opening and a film-shaped ground conductor covers a front surface of the dielectric substrate, respectively, and are grounded; and a coupling line provided on the rear surface of the dielectric substrate in a region surrounded by the ground conductor formed on the rear surface and serving as an auxiliary line, wherein the ground conductor formed on the front surface is provided with a conductor-removed portion in which a portion of a conductor film in a region facing the coupling line via the dielectric substrate is removed.
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公开(公告)号：US20200313628A1
公开(公告)日：2020-10-01
申请号：US16821694
申请日：2020-03-17
Applicant: TOKYO ELECTRON LIMITED
Inventor： Mitsuya INOUE , Mitsutoshi ASHIDA
Abstract: A device includes an amplifier for amplifying and supplying a high frequency power supplied to a load, a parameter detector for detecting a parameter of a current, a voltage, or a power from the amplifier to the load, a current supply unit for supplying a driving current for the amplifier, and an output unit for outputting a command signal for changing an amplification degree of the amplifier based on the detected parameter such that the parameter becomes a target value. The device further includes a first abnormality detector for detecting an abnormality by monitoring the command signal, and/or a current detector for detecting the driving current, a current data storage unit storing an upper and a lower limit value of the driving current, and a second abnormality detector for detecting the abnormality based on at least one of the upper limit value or the lower limit value.
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