公开(公告)号：US20160315043A1

公开(公告)日：2016-10-27

申请号：US15138119

申请日：2016-04-25

Applicant: XINTEC INC.

Inventor： Yen-Shih HO ,  Shu-Ming CHANG ,  Hsing-Lung SHEN ,  Yu-Hao SU ,  Kuan-Jung WU ,  Yi CHENG

IPC: H01L23/498 ,  H01L21/687 ,  H01L49/02 ,  H01L21/48

CPC classification number: H01L23/49838 ,  C25D17/001 ,  C25D17/005 ,  C25D17/06 ,  H01L21/2885 ,  H01L21/4846 ,  H01L21/4853 ,  H01L21/486 ,  H01L21/68721 ,  H01L21/76898 ,  H01L23/481 ,  H01L23/498 ,  H01L23/49811 ,  H01L23/49827 ,  H01L23/5227 ,  H01L23/525 ,  H01L23/53214 ,  H01L23/53228 ,  H01L28/10 ,  H01L2224/11

Abstract: A chip package includes a chip, an isolation layer, and a redistribution layer. The chip has a substrate, an electrical pad, and a protection layer. The substrate has a first surface and a second surface. The substrate has a through hole, and protection layer has a concave hole, such that the electrical pad is exposed through the concave hole and the through hole. The isolation layer is located on the second surface, the sidewall of the through hole, and the sidewall of the concave hole. The redistribution layer includes a connection portion and a passive element portion. The connection portion is located on isolation layer and in electrical contact with the electrical pad. The passive element portion is located on isolation layer that is on second surface, and an end of passive element portion is connected to connection portion that is on the second surface.

Abstract translation: 芯片封装包括芯片，隔离层和再分配层。 芯片具有基板，电焊盘和保护层。 基板具有第一表面和第二表面。 基板具有通孔，保护层具有凹孔，使得电焊盘通过凹孔和通孔露出。 隔离层位于第二表面，通孔的侧壁和凹孔的侧壁上。 再分配层包括连接部分和无源元件部分。 连接部分位于隔离层上并与电焊垫电接触。 无源元件部分位于第二表面上的隔离层上，无源元件部分的一端连接到第二表面上的连接部分。

公开(公告)号：US20160315048A1

公开(公告)日：2016-10-27

申请号：US15138167

申请日：2016-04-25

Applicant: XINTEC INC.

Inventor： Yen-Shih HO ,  Shu-Ming CHANG ,  Hsing-Lung SHEN ,  Yu-Hao SU ,  Kuan-Jung WU ,  Yi CHENG

IPC: H01L23/522 ,  H01L23/48 ,  H01L21/768 ,  H01L21/288 ,  C25D17/08 ,  H01L49/02 ,  H01L21/673 ,  H01L21/677 ,  C25D17/00 ,  C25D7/12 ,  H01L27/144 ,  H01L21/3205

CPC classification number: H01L23/49838 ,  C25D17/001 ,  C25D17/005 ,  C25D17/06 ,  H01L21/2885 ,  H01L21/4846 ,  H01L21/4853 ,  H01L21/486 ,  H01L21/68721 ,  H01L21/76898 ,  H01L23/481 ,  H01L23/498 ,  H01L23/49811 ,  H01L23/49827 ,  H01L23/5227 ,  H01L23/525 ,  H01L23/53214 ,  H01L23/53228 ,  H01L28/10 ,  H01L2224/11

Abstract: A semiconductor electroplating system includes a conducting ring and at least one conductive device. The conducting ring is used for carrying a wafer. The conducting ring has at least two connecting points. The wafer has a first surface and an opposite second surface. An isolation layer is located on the second surface. Two ends of the conductive device are respectively connected to the two connecting points of the conducting ring. When the conducting ring is immersed in the plating solution and is energized, a redistribution layer that is to be patterned is formed on the isolation layer. The conductive device is used for transmitting a partial current that passes through one of the connecting points to the other connecting point.

Abstract translation: 半导体电镀系统包括导电环和至少一个导电装置。 导电环用于承载晶片。 导电环具有至少两个连接点。 晶片具有第一表面和相对的第二表面。 隔离层位于第二表面上。 导电装置的两端分别连接到导电环的两个连接点。 当导电环浸入电镀溶液中并通电时，在隔离层上形成待图案化的再分配层。 导电装置用于将通过其中一个连接点的部分电流传送到另一个连接点。