-
公开(公告)号:US10715153B1
公开(公告)日:2020-07-14
申请号:US16517103
申请日:2019-07-19
Applicant: XILINX, INC.
Inventor: Adebabay M. Bekele , Parag Upadhyaya , Didem Z. Turker Melek , Jing Jing
Abstract: Apparatus and associated methods relate to automatically generating a data structure representation of an on-chip inductive-capacitive (LC) tank circuit by determining parasitic inductances in each of the segments of conductive paths that connect a main inductor to one or more selectable VCO components such as capacitors and varactors, for example. In an illustrative example, one or more of the selectable VCO components may be arranged, when selected, to form a parallel resonant LC tank with the main inductor. A method may include defining nodes ai terminating each of the segments along the conductive paths between the main inductor terminals and a drive circuit. By modelling the paths as multi-port inductors and transformers, resonant frequency of the VCO may be more accurately predicted by simulation.
-
公开(公告)号:US20160049393A1
公开(公告)日:2016-02-18
申请号:US14460292
申请日:2014-08-14
Applicant: XILINX, INC.
Inventor: Jing Jing , Shuxian Wu
CPC classification number: H01L27/0805 , H01L23/5223 , H01L28/60 , H01L2924/0002 , H01L2924/00
Abstract: In an example, a capacitor in an integrated circuit (IC), includes: a first finger capacitor formed in at least one layer of the IC having a first bus and a second bus; a second finger capacitor formed in the at least one layer of the IC having a first bus and a second bus, where a longitudinal edge of the second bus of the second finger capacitor is adjacent a longitudinal edge of the first bus of the first finger capacitor and separated by a dielectric gap; and a first metal segment formed on a first layer above the at least one layer, the first metal segment being electrically coupled to the first bus of the first finger capacitor and increasing a width and a height of the first bus of the first finger capacitor.
Abstract translation: 在一个示例中,集成电路(IC)中的电容器包括:形成在具有第一总线和第二总线的IC的至少一个层中的第一指状电容器; 形成在具有第一总线和第二总线的IC的至少一层中的第二手指电容器,其中第二指状电容器的第二总线的纵向边缘与第一指状电容器的第一总线的纵向边缘相邻 并由电介质间隙隔开; 以及形成在所述至少一层上方的第一层上的第一金属段,所述第一金属段电耦合到所述第一指状电容器的第一总线,并增加所述第一指状电容器的第一总线的宽度和高度。
-
公开(公告)号:US11043470B2
公开(公告)日:2021-06-22
申请号:US16694476
申请日:2019-11-25
Applicant: XILINX, INC.
Inventor: Jing Jing , Shuxian Wu , Xin X. Wu , Yohan Frans
IPC: H01L25/065 , H01L23/64 , H01L23/522 , H01L25/00 , H01L49/02 , H01L21/48 , H01L23/538
Abstract: Examples described herein provide for an isolation design for an inductor of a stacked integrated circuit device. An example is a multi-chip device comprising a chip stack comprising: a plurality of chips, neighboring pairs of the plurality of chips being bonded together, each chip comprising a semiconductor substrate, and a front side dielectric layer on a front side of the semiconductor substrate; an inductor disposed in a backside dielectric layer of a first chip of the plurality of chips, the backside dielectric layer being on a backside of the semiconductor substrate of the first chip opposite from the front side of the semiconductor substrate of the first chip; and an isolation wall extending from the backside dielectric layer of the first chip to the front side dielectric layer, the isolation wall comprising a through substrate via of the first chip, the isolation wall being disposed around the inductor.
-
公开(公告)号:US10217703B2
公开(公告)日:2019-02-26
申请号:US15397612
申请日:2017-01-03
Applicant: Xilinx, Inc.
Inventor: Parag Upadhyaya , Jing Jing
IPC: H01L23/522 , H01L49/02 , H01L21/768 , H03B5/12 , H01L23/64 , H01L29/40
Abstract: An integrated circuit device is described. The integrated circuit device comprises a substrate; a plurality of metal routing interconnect layers; an inductor formed in at least one metal layer of the plurality of metal routing interconnect layers; and a bottom metal layer between the plurality of metal routing interconnect layers and the substrate; wherein a pattern ground shield is formed in the bottom metal layer. A method of implementing an integrated circuit device is also disclosed.
-
公开(公告)号:US20140117494A1
公开(公告)日:2014-05-01
申请号:US13661195
申请日:2012-10-26
Applicant: XILINX, INC.
Inventor: Jing Jing , Shuxian Wu , Parag Upadhyaya
IPC: H01L27/06
CPC classification number: H01L28/10 , H01F17/0013 , H01L23/5227 , H01L23/645 , H01L2924/0002 , H01L2924/00
Abstract: An inductor structure implemented within a semiconductor integrated circuit includes a coil of conductive material including at least one turn and a current return encompassing the coil. The current return is formed of a plurality of interconnected metal layers of the semiconductor integrated circuit.
Abstract translation: 在半导体集成电路内实现的电感器结构包括包括至少一个匝的导电材料的线圈和包围线圈的电流返回。 电流返回由半导体集成电路的多个互连的金属层形成。
-
公开(公告)号:US10332885B1
公开(公告)日:2019-06-25
申请号:US15987722
申请日:2018-05-23
Applicant: Xilinx, Inc.
Inventor: Jing Jing
IPC: H01L23/522 , H01L27/108 , H01L29/76 , G11C11/24 , H01L27/10 , H01L27/105 , H01L49/02 , H01L27/02 , G06F17/50
Abstract: A capacitor includes a cell array including a plurality of cells and a fine tuning cell electrically coupled to the cell array by a first bus and a second bus. Each cell of the cell array includes a first number of fingers electrically coupled to the first and second bus, and a second number of fingers electrically coupled to the first and second bus. The fine tuning cell includes a third number of fingers electrically coupled to the first and second bus, and a fourth number of fingers electrically coupled to the first and second bus. The directional alignment of the first and second number of fingers is generally perpendicular, the directional alignment of the third and fourth number of fingers is generally perpendicular, and the second number of fingers is different than the fourth number of fingers.
-
公开(公告)号:US20180083096A1
公开(公告)日:2018-03-22
申请号:US15272292
申请日:2016-09-21
Applicant: Xilinx, Inc.
Inventor: Jing Jing , Shuxian Wu , Jane Sowards
IPC: H01L29/06 , H01L21/761
CPC classification number: H01L29/0623 , H01L21/761 , H01L21/823481
Abstract: An example a semiconductor device includes a first circuit and a second circuit formed in a semiconductor substrate. The semiconductor device further includes a first guard structure formed in the semiconductor substrate and disposed between the first circuit and the second circuit, the first guard structure including first discontinuous pairs of n+ and p+ diffusions disposed along a first axis. The semiconductor device further includes a second guard structure formed in the semiconductor substrate and disposed between the first circuit and the second circuit, the second guard structure including second discontinuous pairs of n+ and p+ diffusions disposed along the first axis, the second discontinuous pairs of n+ and p+ diffusions being staggered with respect to the first discontinuous pairs of n+ and p+ diffusions.
-
8.
公开(公告)号:US20180190584A1
公开(公告)日:2018-07-05
申请号:US15397612
申请日:2017-01-03
Applicant: Xilinx, Inc.
Inventor: Parag Upadhyaya , Jing Jing
IPC: H01L23/522 , H01L49/02 , H01L21/768 , H03B5/12
CPC classification number: H01L23/5225 , H01L21/76877 , H01L23/5226 , H01L23/5227 , H01L23/645 , H01L28/10 , H01L29/402 , H03B5/1215 , H03B2201/0208
Abstract: An integrated circuit device is described. The integrated circuit device comprises a substrate; a plurality of metal routing interconnect layers; an inductor formed in at least one metal layer of the plurality of metal routing interconnect layers; and a bottom metal layer between the plurality of metal routing interconnect layers and the substrate; wherein a pattern ground shield is formed in the bottom metal layer. A method of implementing an integrated circuit device is also disclosed.
-
公开(公告)号:US09524964B2
公开(公告)日:2016-12-20
申请号:US14460292
申请日:2014-08-14
Applicant: Xilinx, Inc.
Inventor: Jing Jing , Shuxian Wu
IPC: H01L21/02 , H01L27/08 , H01L49/02 , H01L23/522
CPC classification number: H01L27/0805 , H01L23/5223 , H01L28/60 , H01L2924/0002 , H01L2924/00
Abstract: In an example, a capacitor in an integrated circuit (IC), includes: a first finger capacitor formed in at least one layer of the IC having a first bus and a second bus; a second finger capacitor formed in the at least one layer of the IC having a first bus and a second bus, where a longitudinal edge of the second bus of the second finger capacitor is adjacent a longitudinal edge of the first bus of the first finger capacitor and separated by a dielectric gap; and a first metal segment formed on a first layer above the at least one layer, the first metal segment being electrically coupled to the first bus of the first finger capacitor and increasing a width and a height of the first bus of the first finger capacitor.
Abstract translation: 在一个示例中,集成电路(IC)中的电容器包括:形成在具有第一总线和第二总线的IC的至少一个层中的第一指状电容器; 形成在具有第一总线和第二总线的IC的至少一层中的第二手指电容器,其中第二指状电容器的第二总线的纵向边缘与第一指状电容器的第一总线的纵向边缘相邻 并由电介质间隙隔开; 以及形成在所述至少一层上方的第一层上的第一金属段,所述第一金属段电耦合到所述第一指状电容器的第一总线,并增加所述第一指状电容器的第一总线的宽度和高度。
-
10.
公开(公告)号:US09270247B2
公开(公告)日:2016-02-23
申请号:US14092241
申请日:2013-11-27
Applicant: Xilinx, Inc.
Inventor: Jing Jing , Shuxian Wu , Zhaoyin D. Wu
CPC classification number: H03H7/0115 , H01L23/5223 , H01L23/5227 , H01L27/016 , H01L28/10 , H01L28/60 , H01L28/88 , H01L2924/0002 , H03H5/02 , H03H7/0138 , H05K1/16 , Y10T29/49117 , H01L2924/00
Abstract: A circuit includes a first finger capacitor having a first bus line coupled to a first plurality of finger elements and a second bus line coupled to a second plurality of finger elements. The first bus line is parallel to the second bus line. The circuit further includes an inductor having a first leg oriented perpendicular to the first bus line and the second bus line. The first leg of the inductor is coupled to a center of the first bus line.
Abstract translation: 电路包括具有耦合到第一多个指状元件的第一总线和耦合到第二多个指状元件的第二总线的第一指状电容器。 第一条总线与第二条总线平行。 电路还包括具有垂直于第一总线线路和第二总线线路定向的第一支路的电感器。 电感器的第一段耦合到第一总线的中心。
-
-
-
-
-
-
-
-
-