公开(公告)号：US06493062B2

公开(公告)日：2002-12-10

申请号：US09286447

申请日：1999-04-06

申请人： Yukio Tokuda ,  Nobuyoshi Deguchi ,  Shigeyuki Uzawa ,  Yukio Takabayashi ,  Hiromichi Hara

发明人： Yukio Tokuda ,  Nobuyoshi Deguchi ,  Shigeyuki Uzawa ,  Yukio Takabayashi ,  Hiromichi Hara

IPC分类号： G03B2742

CPC分类号： F16F15/02 ,  G03B27/42 ,  G03F7/70725 ,  G03F7/709

摘要： A driving apparatus for moving an object has a stage which moves the object mounted thereon, a base member supporting the stage, a reaction force reception structure for receiving a reaction force generated upon driving the stage, a damp member for damping transmission of vibration with a predetermined frequency range from the reaction force reception structure to a floor and an actuator for generating a force between the base member and the reaction force reception structure.

摘要翻译： 用于移动物体的驱动装置具有使安装在其上的物体移动的台阶，支撑台的基座部件，用于接收在驱动台架时产生的反作用力的反作用力接收结构，用于阻止振动传播的阻尼部件 从反作用力接收结构到地面的预定频率范围和用于在基部构件和反作用力接收结构之间产生力的致动器。

公开(公告)号：US06307620B1

公开(公告)日：2001-10-23

申请号：US09557972

申请日：2000-04-25

申请人： Yukio Takabayashi ,  Shigeyuki Uzawa

发明人： Yukio Takabayashi ,  Shigeyuki Uzawa

IPC分类号： G03B2758

CPC分类号： G03F7/70708 ,  G03F7/707 ,  G03F7/70916 ,  G03F7/70925 ,  H01L21/6875

摘要： An exposure holding apparatus includes a substrate holding section for holding a substrate. The substrate holding section includes a thin film, which causes a photocatalytic reaction upon irradiation with light. This substrate holding apparatus prevents adhesion of foreign materials, which causes a decrease in yield of device production, and provides a system for rapidly removing the foreign materials.

摘要翻译： 曝光保持装置包括用于保持基板的基板保持部。 基板保持部包括在照射光时引起光催化反应的薄膜。 该基板保持装置防止异物粘附，导致器件制造成品率下降，并提供快速除去异物的系统。

公开(公告)号：US06534777B2

公开(公告)日：2003-03-18

申请号：US09793078

申请日：2001-02-27

申请人： Yuichi Yamada ,  Shigeyuki Uzawa

发明人： Yuichi Yamada ,  Shigeyuki Uzawa

IPC分类号： G01N2186

CPC分类号： G03F9/7026 ,  G03F7/70358

摘要： A surface position detecting system for detecting a surface position of a substrate. The system includes a plurality of sensors for measuring surface position at plural locations on the substrate, while relatively scanning the substrate, a discriminating device for discriminating and memorizing, beforehand, effectiveness/ineffectiveness of each sensor at each measurement point during scanning measurement, on the basis of information related to the substrate processing, and a calculating device for selecting, during scan measurement, one or those of the sensors of effective measured value on the basis of the discrimination information and for calculating the surface information of the substrate on the basis of a measurement output of the one or those sensors.

摘要翻译： 一种用于检测基板的表面位置的表面位置检测系统。 该系统包括用于在扫描基板的同时在基板上的多个位置处测量表面位置的多个传感器，用于在扫描测量期间在每个测量点处预先识别和记忆每个传感器在每个测量点处的有效性/无效性的识别装置， 基板处理的信息的基础，以及计算装置，用于在扫描测量期间根据识别信息选择有效测量值中的一个或那些传感器，并且基于基于 一个或那些传感器的测量输出。

公开(公告)号：US6142660A

公开(公告)日：2000-11-07

申请号：US870546

申请日：1997-06-06

申请人： Norihiko Utsunomiya ,  Shigeyuki Uzawa

发明人： Norihiko Utsunomiya ,  Shigeyuki Uzawa

IPC分类号： G03F7/20 ,  G05B19/042 ,  G05B19/418 ,  H01L21/027 ,  G06F19/00

CPC分类号： G05B19/41875 ,  G05B19/0426 ,  G05B2219/24001 ,  Y02P90/14 ,  Y02P90/22

摘要： A semiconductor manufacturing method and apparatus using a plurality of maintenance commands for automatically measuring errors caused by the apparatus or caused by a wafer treatment process, by using measuring functions of the apparatus. The apparatus includes a display device for displaying a list of the plurality of maintenance commands, a console-side control device for enabling an operator to select some of the plurality of maintenance commands displayed by the display device, to generate a maintenance menu in which some of the plurality of maintenance commands are combined as desired by the operator and to edit the maintenance menu, a storage device for storing the maintenance menu generated and edited using the console-side control device and an apparatus-side control device for successively executing the maintenance commands in the maintenance menu stored in the storage device when the apparatus-side control device receives an instruction to execute the maintenance menu.

摘要翻译： 一种使用多个维护命令的半导体制造方法和装置，其通过使用该装置的测量功能来自动测量由该装置引起或由晶片处理过程引起的误差。 该装置包括用于显示多个维护命令的列表的显示装置，用于使操作者能够选择由显示装置显示的多个维护命令中的一些的控制台侧控制装置，以生成维护菜单，其中一些 多个维护命令的组合根据操作者的需要进行组合并编辑维护菜单，存储装置，用于存储使用控制台侧控制装置生成和编辑的维护菜单以及用于连续执行维护的装置侧控制装置 当设备侧控制设备接收到执行维护菜单的指令时，存储在存储设备中的维护菜单中的命令。

公开(公告)号：US5920398A

公开(公告)日：1999-07-06

申请号：US805749

申请日：1997-02-25

申请人： Takehiko Iwanaga ,  Yuichi Yamada ,  Shigeyuki Uzawa

发明人： Takehiko Iwanaga ,  Yuichi Yamada ,  Shigeyuki Uzawa

IPC分类号： G01B11/03 ,  G03F7/20 ,  G03F7/207 ,  G03F9/00 ,  G01B11/00

CPC分类号： G03F9/7026 ,  G03F7/70358 ,  G03F7/70458 ,  G03F9/7034

摘要： A surface position detecting method for detecting a surface position of a surface to be examined, having surface height irregularity, while relatively scanning the surface, is disclosed. The method includes detecting characteristic data related to a surface state at plural measurement positions on the surface, while relatively scanning the surface, and processing the detected characteristic data related to the measurement positions to determine a measurement position for measurement of the surface position in a subsequent surface position detecting process.

摘要翻译： 公开了一种表面位置检测方法，用于在相对扫描表面的同时检测具有表面高度不规则性的待检查表面的表面位置。 该方法包括在相对扫描表面的同时检测与表面上的多个测量位置处的表面状态有关的特征数据，以及处理与测量位置有关的检测到的特征数据，以确定用于后续测量中的表面位置的测量位置 表面位置检测过程。

公开(公告)号：US5499099A

公开(公告)日：1996-03-12

申请号：US202064

申请日：1994-02-25

申请人： Makoto Sato ,  Shigeyuki Uzawa

发明人： Makoto Sato ,  Shigeyuki Uzawa

IPC分类号： G03F7/20 ,  G03F9/00 ,  G06Q50/00 ,  G06Q50/04 ,  H01L21/027 ,  H01L21/30 ,  G01B11/00

CPC分类号： G03F7/70425 ,  G03F9/70

摘要： An alignment method and system in which substrates having zones, to be aligned and being disposed in a predetermined array, are supplied sequentially and in which in each substrate the zones are brought into alignment with a predetermined reference position sequentially. Deviations in the positions of the zones of a first substrate with respect to positions determined in accordance with the predetermined array, are measured in sequence, and the actual array of the zones through the measurement is detected. The relationship between the predetermined array and the actual array detected in the first step is determined in terms of a predetermined transformation parameter, and a transformation parameter for the first substrate effective to minimize an error, is determined. An error between the actual array and an array determined in accordance with the transformation parameter of the first substrate, is determined and stored, and with respect to the predetermined reference position, a second substrate having zones of substantially the same array as the first substrate is aligned by using the stored error as an alignment correction value.

摘要翻译： 对准方法和系统，其中顺序地提供要被排列并且以预定阵列布置的区域的基板，并且其中在每个基板中，这些区域顺序地与预定的参考位置对齐。 相对于根据预定阵列确定的位置的第一基板的区域的位置的偏差被依次测量，并且检测通过测量的区域的实际阵列。 根据预定的变换参数来确定在第一步骤中检测到的预定阵列和实际阵列之间的关系，并且确定用于使误差最小化的第一衬底的变换参数。 确定并存储根据第一衬底的变换参数确定的实际阵列和阵列之间的误差，并且相对于预定参考位置，具有与第一衬底基本相同的阵列区域的第二衬底是 通过使用存储的错误作为对准校正值对齐。

公开(公告)号：US20090021847A1

公开(公告)日：2009-01-22

申请号：US12171644

申请日：2008-07-11

申请人： Ryo Nawata ,  Makoto Mizuno ,  Shigeyuki Uzawa

发明人： Ryo Nawata ,  Makoto Mizuno ,  Shigeyuki Uzawa

IPC分类号： G02B7/00

CPC分类号： G02B7/005 ,  G02B7/1827 ,  G03F7/70258 ,  G03F7/70825

摘要： The apparatus includes a holder holding an optical element, a back plate supporting the optical element via the holder, a mechanism moving the optical element in a six-degree-of-freedom, a base plate supporting the back plate via the mechanism, and six displacement sensors disposed on the base plate and measuring displacement amounts of different points on the optical element. The displacement sensors includes three ones measuring them in a first direction, one measuring it in a second direction, and two ones measuring them in a third direction. The apparatus further includes a transformation processor transforming the six measured displacement amounts into displacement amounts of the optical element in the six-degree-of-freedom, a calibration processor calibrating the transformed displacement amounts, and a controller outputting command values to the displacing mechanism based on differences between the calibrated displacement amounts and target displacement amounts of the optical element.

摘要翻译： 该装置包括保持光学元件的保持器，经由保持器支撑光学元件的背板，以六自由度移动光学元件的机构，经由机构支撑背板的基板，以及六个 位移传感器设置在基板上并测量光学元件上的不同点的位移量。 位移传感器包括在第一方向上测量它们的三个位移传感器，一个在第二方向上测量它们，并且在第三方向上测量它们的两个。 该装置还包括变换处理器，将六个测量的位移量变换为六自由度中的光学元件的位移量，校准经变换的位移量的校准处理器，以及基于位移机构输出命令值的控制器 在校准位移量和光学元件的目标位移量之间的差异。

公开(公告)号：US06614503B1

公开(公告)日：2003-09-02

申请号：US09658464

申请日：2000-09-08

申请人： Shigeyuki Uzawa

发明人： Shigeyuki Uzawa

IPC分类号： G03B2752

CPC分类号： G03F7/70241 ,  G03F7/70258 ,  G03F7/70883

摘要： A projection exposure apparatus includes a projection optical system with a barrel, a pressure measuring device disposed inside and/or outside the barrel, and a device for estimating a change in pressure in accordance with an output of the pressure measuring device and for compensating for a change in optical performance of the projection optical system due to the change in pressure, in accordance with the estimation.

摘要翻译： 投影曝光装置包括具有镜筒的投影光学系统，设置在镜筒内部和/或外部的压力测量装置，以及用于根据压力测量装置的输出来估计压力变化的装置， 根据估计，由于压力的变化导致的投影光学系统的光学性能的变化。

公开(公告)号：US6081614A

公开(公告)日：2000-06-27

申请号：US687986

申请日：1996-07-29

申请人： Yuichi Yamada ,  Shigeyuki Uzawa

发明人： Yuichi Yamada ,  Shigeyuki Uzawa

IPC分类号： G03F7/20 ,  G03F7/207 ,  G03F9/00 ,  H01L21/027 ,  G06K9/00

CPC分类号： G03F9/7026 ,  G03F7/70358 ,  G03F7/70716 ,  G03F7/70725 ,  G03F9/7011

摘要： A surface position detecting method, wherein, while an object having a region with a pattern structure is scanned relative to a surface position detecting system in a scan direction, different from a surface position detecting direction of the surface position detecting system, the surface position detecting system performs surface position detection sequentially at a plurality of detection points, which are disposed within the region and along the scan direction. The method includes steps of measuring beforehand errors to be produced with respect to the detection points due to a difference in pattern structure among the detection points disposed along the scan direction and correcting, when the surface position detection is sequentially performed by the surface position detecting system at the detection points along the scan direction while the object is scanned in the scan direction relative to the surface position detecting system, a result of the detection by the surface position detecting system at each detection point, on the basis of a measured error corresponding to that detection point, measured in the measuring step.

摘要翻译： 一种表面位置检测方法，其特征在于，在与表面位置检测系统的表面位置检测方向不同的扫描方向上相对于表面位置检测系统扫描具有图案结构的区域的物体时，表面位置检测 系统在设置在该区域内并且沿扫描方向的多个检测点依次执行表面位置检测。 该方法包括以下步骤：由于由沿着扫描方向设置的检测点之间的图案结构的差异而预先产生的关于检测点的误差，并且当通过表面位置检测系统顺序执行表面位置检测时， 在沿着扫描方向的检测点处，在相对于表面位置检测系统的扫描方向上扫描物体时，根据表面位置检测系统在每个检测点处的检测结果，基于对应于 该检测点，在测量步骤中测量。

公开(公告)号：US5751404A

公开(公告)日：1998-05-12

申请号：US684100

申请日：1996-07-22

申请人： Eiichi Murakami ,  Fumio Sakai ,  Shigeyuki Uzawa ,  Shigeki Ogawa ,  Tetsuya Mori

发明人： Eiichi Murakami ,  Fumio Sakai ,  Shigeyuki Uzawa ,  Shigeki Ogawa ,  Tetsuya Mori

IPC分类号： G03F7/20 ,  G03F9/00 ,  G03B27/42 ,  G02B11/00 ,  G03B27/32 ,  G03B27/52

CPC分类号： G03F7/70691 ,  G03F7/70358 ,  G03F9/7015

摘要： A scanning exposure apparatus includes a first movable stage being movable while carrying a first object thereon, a second movable stage being movable while carrying a second object thereon, a projection optical system for projecting a pattern, a control system serviceable to scan the first and second movable stages in a timed relation and relative to the projection optical system and to project a pattern of the first object onto the second object through the projection optical system, a first reference plate fixedly mounted on the first movable stage, a second reference plate fixedly mounted on the second movable stage, and a detecting system serviceable to scan at least one of the first and second movable stages to detect a relative positional relationship between alignment marks of the first and second reference plates to thereby determine a scan direction of one of the first and second movable stages.

摘要翻译： 一种扫描曝光装置，包括：可移动的第一可移动台，其上携带有第一物体;可移动的第二可移动台，其上携带有第二物体;投影光学系统，用于投影图案;可控制的扫描第一和第二物体的控制系统 以相对于投影光学系统的定时关系的可移动台阶，并且通过投影光学系统将第一物体的图案投射到第二物体上，固定地安装在第一可移动台上的第一参考板，固定地安装在第二参考板上的第二参考板 在第二可移动台上，以及检测系统，其能够扫描第一和第二可移动台中的至少一个，以检测第一和第二参考板的对准标记之间的相对位置关系，从而确定第一和第二可移动台之一的扫描方向 和第二可动台。