摘要:
An argon (Ar.sup.+) laser has a resonator. A reaction chamber is integrally formed in the resonator. A voltage is applied to electrodes, which discharge electricity to excite argon atoms in the resonator to produce a laser beam. The laser beam is continuously oscillated between total reflection mirrors disposed at opposite ends of the resonator. A substrate is disposed in the reaction chamber into which a material gas is introduced. The material gas absorbs the laser beam, to decompose and deposit as a thin film over the substrate.
摘要:
A vapor-phase deposition apparatus comprises a substrate-supporting unit for supporting a substrate, a heater for heating the substrate-supporting unit, and a gas-supplying unit for supplying gas for forming a thin film on the substrate supported by the substrate-supporting unit. The substrate-supporting unit includes a first member to be heated to a predetermined temperature by the heater, a second member for supporting a peripheral part of the substrate, and a support member for supporting the second member on the first member and located outside a periphery of the substrate.
摘要:
The present invention provides a chemical vapor deposition using, as feed gases, a silicon compound and hydrazine or a derivative thereof, or a compound containing both silicon and nitrogen, and a process and a system useful for chemical vapor deposition growth, in which a chlorinated silane compound and ammonia, feed gases, are preliminarily reacted with each other, and the resulting reaction gas mixture from which the ammonium halide produced by the preliminary reaction has been eliminated is fed to form a thin film on a substrate.
摘要:
A substrate such as a semiconductor wafer is transferred to a plurality of process chambers so as to perform prescribed processes. An inspection chamber is air-tightly connected to each of the process chambers. The inspection chamber is provided with a handler which loads and unloads the substrate. A gate valve is disposed between each process chamber and the inspection chamber. By this gate valve, each chamber is air-tightly closed.
摘要:
A substrate such as a semiconductor wafer is transferred to a plurality of process chambers so as to perform prescribed processes. An inspection chamber is air-tightly connected to each of the process chambers. The inspection chamber is provided with a handler which loads and unloads the substrate. A gate valve is disposed between each process chamber and the inspection chamber. By this gate valve, each chamber is air-tightly closed.
摘要:
A vapor-phase deposition apparatus comprises a substrate-supporting unit for supporting a substrate, a heater for heating the substrate-supporting unit, and a gas-supplying unit for supplying gas for forming a thin film on the substrate supported by the substrate-supporting unit. The substrate-supporting unit includes a first member to be heated to a predetermined temperature by the heater, a second member for supporting a peripheral part of the substrate, and a support member for supporting the second member on the first member and located outside a periphery of the substrate.
摘要:
A liquid cartridge for supplying liquid to an external device connected therewith is provided with a casing, a partition member movably fitted in the casing, which partitions the casing into a first chamber and a second chamber, an outlet port communicating between the first chamber and the external device and a pressure unit housed in the second chamber, which presses the partition member so as to discharge the liquid out of the outlet port.
摘要:
A flow path structure is provided with: a first flow path member having a plurality of through grooves, the through grooves being disposed adjacent to each other; a second flow path member having a fitting portion, in the fitting portion the first flow path member being fitted; a third flow path member covering the fitting portion so as to be sealed, the third flow path member being provided on the second flow path member; an inflow port to receive a fluid; an outflow port to exhaust an exhaust fluid; and a flow path formed in the fitting portion along the first flow path member, the flow path linking the inflow port and the outflow port and running through the through grooves.
摘要:
According to an aspect of the present invention, there is provided a fuel cell including: a membrane electrode assembly including: an electrolyte membrane; anode and cathode catalyst layers respectively disposed on the electrolyte membrane; and anode and cathode gas diffusion layers respectively disposed on the anode and cathode catalyst layers; a cathode porous body including a front face portion and a rear face portion and being disposed on the cathode gas diffusion layer at the front face portion, the front face portion having an electric conductivity higher than that of air and having a hydrophilicity higher than that of the rear face portion; an anode passage plate disposed on the anode gas diffusion layer; and an air supply apparatus that supplies air toward an end of the cathode porous body.
摘要:
A fuel cell system is provided with a fuel cell stack composed of one or more fuel cells, a discharging flow path for conducting an exhaust from the fuel cells connected to the fuel cells and a radiator for cooling the exhaust to a controlled temperature.