公开(公告)号：US07962242B1

公开(公告)日：2011-06-14

申请号：US12050387

申请日：2008-03-18

申请人： Marc T. Aho ,  Thaddeus J. Wilson ,  Jeff Roberts

发明人： Marc T. Aho ,  Thaddeus J. Wilson ,  Jeff Roberts

IPC分类号： B65G47/24 ,  B25J1/00

CPC分类号： G03F1/84 ,  G03F1/66

摘要： A spatial photomask flipper provides up to four access gates for an unloading of a clamped photomask after its reorientation along a single photomask transfer axis. The clamping frames holding the photomask are secured by a locking control cam that prevents their inadvertent opening in any other but the two main flip orientations. The flipper is part of an automated system including a digital camera and an image recognition algorithm that interpret an arbitrary initial photomask loading orientation from a circumferential photomask identification number. An eventual pellicle on the photomask may be also automatically detected via a pellicle detection sensor. Alternately, the digital camera may be employed for pellicle detection together with a pellicle detection algorithm that processes the digital image for well known components of the pellicle such as the pellicle frame.

摘要翻译： 空间光掩模引脚提供多达四个访问门，用于在沿着单个光掩模传输轴重新定向之后卸载夹紧的光掩模。 夹持光掩模的夹紧框架通过锁定控制凸轮来固定，该锁定控制凸轮防止在两个主要翻转方向中的任何其它方面的意外打开。 引导器是自动化系统的一部分，其包括数字照相机和图像识别算法，其从圆周光掩模识别号解释任意的初始光掩模负载取向。 也可以通过防护薄膜检测传感器自动检测光掩模上的最终防护薄膜。 或者，数字照相机可以与防护薄膜组件检测算法一起使用，该防护薄膜组件检测算法处理防护薄膜组件的众所周知的组件的数字图像，例如防护薄膜组件框架。

公开(公告)号：US07330256B1

公开(公告)日：2008-02-12

申请号：US11130638

申请日：2005-05-16

申请人： Marc Aho ,  Abdul Rahim Forouhi

发明人： Marc Aho ,  Abdul Rahim Forouhi

IPC分类号： G01J3/42

CPC分类号： G01J3/02 ,  G01J3/0208 ,  G01N21/55

摘要： A system uses reflectance spectrophotometry to characterize a sample having any number of structures. The system uses toroidal mirrors that are shaped in such a way that the angle of reflectance off of the target is small. The small angle of reflectance may allow for simplification of calculations and can result in a faster processing time. In addition, a more accurate measurement can be achieved when the reflected beam is close to normal.

摘要翻译： 系统使用反射分光光度法来表征具有任何数量结构的样品。 该系统使用环形反射镜，其形状使得靶的反射率角小。 较小的反射角度可以简化计算，并可能导致更快的处理时间。 此外，当反射光束接近正常时，可以实现更准确的测量。

公开(公告)号：US07289214B1

公开(公告)日：2007-10-30

申请号：US10997210

申请日：2004-11-23

申请人： Guoguang Li ,  Shuqiang Chen ,  Abdul Rahim Forouhi

发明人： Guoguang Li ,  Shuqiang Chen ,  Abdul Rahim Forouhi

IPC分类号： G01G11/00

CPC分类号： G03F9/7076 ,  G03F7/70633

摘要： A system and method for optical offset measurement is provided. An offset between two grating layers in a compound grating is measured by illuminating the gratings with light having a plane of incidence that is neither parallel with nor perpendicular to the grating lines. This non-symmetrical optical illumination allows determination of the sign and magnitude of the offset. Two measurements are performed at azimuthal angles separated by 180°, and a difference of these measurements is calculated. Measurement of this difference allows determination of the offset (e.g., with a calibration curve). Alternatively, two compound gratings having a predetermined non-zero offset difference can be employed. This arrangement permits determination of the offsets without the need for a calibration curve (or for additional compound gratings), based on a linear approximation.

摘要翻译： 提供了一种用于光学偏移测量的系统和方法。 复合光栅中的两个光栅层之间的偏移通过用不具有平行于或不垂直于光栅线的入射平面的光照射光栅来测量。 这种非对称光学照明允许确定偏移的符号和幅度。 在以180°分开的方位角进行两次测量，并计算这些测量值的差。 该差异的测量允许确定偏移（例如，利用校准曲线）。 或者，可以采用具有预定非零偏移差的两个复合光栅。 这种布置允许基于线性近似来确定偏移而不需要校准曲线（或用于附加复合光栅）。

公开(公告)号：US07253909B1

公开(公告)日：2007-08-07

申请号：US11028894

申请日：2005-01-03

申请人： Guoguang Li ,  Phillip Walsh ,  Shuqiang Chen ,  Abdul Rahim Forouhi

发明人： Guoguang Li ,  Phillip Walsh ,  Shuqiang Chen ,  Abdul Rahim Forouhi

IPC分类号： G01B11/00

CPC分类号： G01B11/0625 ,  G01N21/4788 ,  G01N21/59 ,  G01N21/956 ,  G01N2021/4735

摘要： An apparatus and method for determining a physical parameter of features on a substrate by illuminating the substrate with an incident light covering an incident wavelength range Δλ, e.g., from 190 nm to 1000 nm, where the substrate is at least semi-transparent. A response light received from the substrate and the feature is measured to obtain a response spectrum of the response light. Further, a complex-valued response due to the feature and the substrate is computed and both the response spectrum and the complex-valued response are used in determining the physical parameter. A direct approximate phase measurement is provided when the response light is transmitted light.

摘要翻译： 一种用于通过用覆盖入射波长范围（例如190nm至1000nm）的入射光照射衬底来确定衬底上特征的物理参数的装置和方法，其中衬底至少是半透明的。 测量从衬底接收的响应光和特征以获得响应光的响应光谱。 此外，计算由特征和衬底引起的复值响应，并且在确定物理参数中使用响应谱和复值响应。 当响应光透射光时，提供直接近似相位测量。

公开(公告)号：US07999936B1

公开(公告)日：2011-08-16

申请号：US12417606

申请日：2009-04-02

申请人： Guoguang Li ,  Abdul Rahim Forouhi ,  Erik Nackerud

发明人： Guoguang Li ,  Abdul Rahim Forouhi ,  Erik Nackerud

IPC分类号： G01N15/02

CPC分类号： G01N15/0205 ,  G01N21/4133 ,  G01N21/532

摘要： The refractive index, extinction coefficient, size and density of fluid suspended particles are simultaneously determined by combined transmittance and scattering measurements. The scattering measurements are preferably angle selective to obtain additional information about the scattered light. A charge-coupled device is employed for its high sensitivity to low light intensity in measurement of scattered light in combination with a photodiode array employed for its high signal to noise ratio, which is beneficial in transmittance measurement. The scattered light may be measured in an angle selective fashion by use of a motorized aperture that is concentrically positioned with respect to the impinging beam axis and moveable along the impinging beam axis. An ellipsoidal mirror collects the scattered light that passes through the motorized aperture and focuses the scattered light towards the charge-coupled device.

摘要翻译： 流体悬浮颗粒的折射率，消光系数，尺寸和密度通过组合的透射率和散射测量值同时确定。 散射测量优选地是角度选择性的，以获得关于散射光的附加信息。 采用电荷耦合器件对散射光测量时的低光强度的高灵敏度，结合用于其高信噪比的光电二极管阵列，这对透射率测量是有益的。 可以通过使用相对于入射光束轴线同心定位并且沿撞击光束轴线移动的电动孔径以角度选择性方式测量散射光。 椭球镜收集通过电动孔径的散射光，并将散射光聚焦到电荷耦合器件。

公开(公告)号：US07679736B1

公开(公告)日：2010-03-16

申请号：US12180522

申请日：2008-07-26

申请人： Marc T. Aho ,  Thaddeus J. Wilson ,  Jeff Roberts

发明人： Marc T. Aho ,  Thaddeus J. Wilson ,  Jeff Roberts

IPC分类号： G01N21/00

CPC分类号： G01N21/956 ,  G01N2021/95676

摘要： A pellicle correction factor is determined by comparing a first measurement of a reference photomask alone with a second measurement of that reference photomask through a reference pellicle protecting the mask layers of the photomask. A number of pellicle correction factors may be determined for different type pellicles and made accessible in pellicle correction factor lookup table of the system or supplied on a separate data storage medium. Raw Reflectance and/or Transmittance measurement data of a generic photomask through a generic pellicle is consecutively corrected for the measurement distorting effects of that pellicle by applying a matching one of the previously determined pellicle correction factors. The pellicle correction factor is preferably an attenuation signature across a predetermined measurement irradiation spectrum.

摘要翻译： 通过将参考光掩模的第一测量与通过保护光掩模的掩模层的参考防护薄膜进行第二次测量的参考光掩模进行比较来确定防护薄膜校正因子。 可以为不同类型的薄膜确定许多防护薄膜修正因子，并且可以在系统的防护薄膜修正因子查找表中访问或提供在单独的数据存储介质上。 通过应用一个先前确定的防护薄膜修正因子中匹配的一个，通过通用防护薄膜的普通光掩模的原始反射率和/或透射率测量数据被连续校正为该防护薄片的测量失真效应。 防护薄膜修正因子优选为预定测量照射光谱上的衰减特征。

公开(公告)号：US07525672B1

公开(公告)日：2009-04-28

申请号：US11305449

申请日：2005-12-16

申请人： Shuqiang Chen ,  Guoguang Li

发明人： Shuqiang Chen ,  Guoguang Li

IPC分类号： G01B11/24

CPC分类号： G01B11/02 ,  G01B11/22 ,  G01N21/4788

摘要： Methods and apparatus for optical characterization based on symmetry-reduced 2-D RCWA calculations are provided. The invention is applicable to gratings having a grating reflection symmetry plane. A sample can be illuminated at normal incidence or at a non-zero angle of incidence such that the plane of incidence is parallel to or identical with the symmetry plane. The diffracted field components are either symmetric or anti-symmetric with respect to the grating symmetry plane. This symmetry is exploited to provide a symmetry-reduced 2-D RCWA having reduced matrix dimension (by about a factor of two) that is mathematically equivalent to a conventional 2-D RCWA. For normal incidence on a grating having two reflection symmetry planes, a symmetry-reduced 2-D RCWA having reduced matrix dimension (by about a factor of four) is provided. This normal incidence RCWA can be used to approximately characterize a sample illuminated at non-normal incidence. Approximation accuracy can be improved by modifying either the grating depth or the grating refractive index.

摘要翻译： 提供了基于对称减少的2-D RCWA计算的光学表征的方法和装置。 本发明适用于具有光栅反射对称面的光栅。 样品可以以正常入射或非零入射角照射，使得入射平面与对称平面平行或相同。 衍射场分量相对于光栅对称平面是对称的或反对称的。 这种对称性被用于提供在数学上等同于传统的2-D RCWA的具有减小的矩阵尺寸（大约二分之一）的对称减小的二维RCWA。 对于具有两个反射对称平面的光栅的正常入射，提供了具有减小的矩阵尺寸（约四分之一）的对称减小的二维RCWA。 这种正常发生率的RCWA可用于近似表征以非正常发生率照射的样本。 可以通过修改光栅深度或光栅折射率来提高近似精度。

公开(公告)号：US07397030B1

公开(公告)日：2008-07-08

申请号：US11445749

申请日：2006-06-01

申请人： Mehdi Balooch ,  Abdul Rahim Forouhi

发明人： Mehdi Balooch ,  Abdul Rahim Forouhi

IPC分类号： H01J37/00

CPC分类号： G01Q30/02

摘要： This invention relates to an apparatus and method for integrated measurement of a sample that has miniature features. The apparatus has an optical measuring unit for illuminating the sample with a global test radiation over an optical test region and obtaining an optical response, such as scattered or transmitted radiation from the optical test region. In addition, the apparatus has a local measuring unit for making a nanometer scale measurement of a local material parameter ρ of the sample. The local parameter ρ is determined with a mechanical, optical, magnetic, electric or other physical measurement performed in the nanometer range with a scanning probe tip at a test location lying within the optical test region. The material parameter ρ is selected such that it is substantially constant or uniform over the illuminated area. A computational unit determines a property of the miniature features within the optical test region from the optical response supplemented with an adjustment derived from the local material parameter obtained by the local measuring unit.

摘要翻译： 本发明涉及一种具有微型特征的样本的集成测量装置和方法。 该装置具有光学测量单元，用于在光学测试区域上以全局测试辐射照射样品，并获得光学响应，例如来自光学测试区域的散射或透射的辐射。 此外，该装置具有用于对样品的局部材料参数rho进行纳米级测量的局部测量单元。 局部参数rho通过在纳米范围内进行的机械，光学，磁性，电学或其他物理测量来确定，扫描探针尖端位于光学测试区域内的测试位置。 选择材料参数rho使得其在照明区域上基本上恒定或均匀。 计算单元根据补充有由本地测量单元获得的局部材料参数导出的调整的光学响应确定光学测试区域内的微型特征的属性。

公开(公告)号：US07327457B2

公开(公告)日：2008-02-05

申请号：US10750636

申请日：2003-12-19

申请人： Ray Hebert ,  Marc Aho ,  Abdul Rahim Forouhi

发明人： Ray Hebert ,  Marc Aho ,  Abdul Rahim Forouhi

IPC分类号： G01J4/00

CPC分类号： G02B17/0663

摘要： An apparatus and method for optically characterizing the reflection and transmission properties of a sample with a beam of light having a small diameter on a surface of the sample over a broadband of wavelengths, from 190 nm to 1100 nm. Reflective optical components, including off-axis parabolic mirrors with a collimated incident or reflected broadband beam of light, minimize non-chromatic aberration. Angles of incidence and reflection from optical components and the sample are kept substantially near normal to the optical components and the sample to minimize changes in the polarization of the beam of light. The apparatus and method further disclose an optical light path that can be focused by adjusting the position of an off-axis parabolic mirror and a planar mirror.

摘要翻译： 用于在190nm至1100nm的波长宽度上在样品表面上具有小直径的光束的样品的反射和透射特性进行光学表征的装置和方法。 包括具有准直入射或反射的宽带光束的离轴抛物面镜的反射光学部件最小化非色差。 来自光学部件和样品的入射角和反射角保持基本上接近垂直于光学部件和样品的位置，以最小化光束的偏振变化。 该装置和方法还公开了可以通过调节离轴抛物面镜和平面镜的位置来聚焦的光学光路。

公开(公告)号：US6091485A

公开(公告)日：2000-07-18

申请号：US464640

申请日：1999-12-15

申请人： Guoguang Li ,  Hongwei Zhu ,  Dale A. Harrison ,  Abdul Rahim Forouhi ,  Weilu Xu

发明人： Guoguang Li ,  Hongwei Zhu ,  Dale A. Harrison ,  Abdul Rahim Forouhi ,  Weilu Xu

IPC分类号： G01N21/00

CPC分类号： G01N21/41 ,  G01N21/55 ,  G01N21/59

摘要： A method and apparatus for optically determining a physical parameter of an underlayer such as the underlayer refractive index N.sub.u, extinction coefficient k.sub.u and/or thickness t.sub.u through a top layer having a first top layer thickness t.sub.1 and an assigned refractive index index n.sub.t and coefficient of extinction k.sub.t. The values of index n.sub.t and extinction coefficient k.sub.t can be estimated, optically determined or assigned based on prior knowledge. In a subsequent step a first reflectance R.sub.1 is measured over a wavelength range .DELTA..lambda. by using a test beam spanning that wavelength range. Then, a second reflectance R.sub.2 of the top layer and underlayer is measured using the test beam spanning wavelength range .DELTA..lambda. at a second top layer thickness t.sub.2. In a calculation step the physical parameter of the underlayer is determined from the first reflectance measurement R.sub.1, the second reflectance measurement R.sub.2, and the assigned or predetermined thickness values t.sub.1, t.sub.2, and the refractive index n.sub.t. and coefficient of extinction k.sub.t of the top layer. A dispersion model can be used in this calculation step. Alternatively, with transmissive samples, a first and second transmittance T.sub.1, T.sub.2 can be used.

摘要翻译： 一种用于通过具有第一顶层厚度t1和所分配的折射率指数nt的顶层以及所分配的折射率指数nt和的系数来光学地确定诸如底层折射率Nu，消光系数ku和/或厚度tu的底层的物理参数的方法和装置 灭绝kt 指数nt和消光系数kt的值可以基于现有知识来估计，光学确定或分配。 在随后的步骤中，通过使用横跨该波长范围的测试光束，在波长范围DELTAλ上测量第一反射率R1。 然后，使用第二顶层厚度t2的跨越波长范围DELTAλ的测试光束来测量顶层和底层的第二反射率R2。 在计算步骤中，从第一反射率测量R1，第二反射率测量R2和分配的或预定的厚度值t1，t2和折射率nt确定底层的物理参数。 和顶层消光系数kt。 在该计算步骤中可以使用色散模型。 或者，对于透射样品，可以使用第一和第二透射率T1，T2。