公开(公告)号：US07289214B1

公开(公告)日：2007-10-30

申请号：US10997210

申请日：2004-11-23

申请人： Guoguang Li ,  Shuqiang Chen ,  Abdul Rahim Forouhi

发明人： Guoguang Li ,  Shuqiang Chen ,  Abdul Rahim Forouhi

IPC分类号： G01G11/00

CPC分类号： G03F9/7076 ,  G03F7/70633

摘要： A system and method for optical offset measurement is provided. An offset between two grating layers in a compound grating is measured by illuminating the gratings with light having a plane of incidence that is neither parallel with nor perpendicular to the grating lines. This non-symmetrical optical illumination allows determination of the sign and magnitude of the offset. Two measurements are performed at azimuthal angles separated by 180°, and a difference of these measurements is calculated. Measurement of this difference allows determination of the offset (e.g., with a calibration curve). Alternatively, two compound gratings having a predetermined non-zero offset difference can be employed. This arrangement permits determination of the offsets without the need for a calibration curve (or for additional compound gratings), based on a linear approximation.

摘要翻译： 提供了一种用于光学偏移测量的系统和方法。 复合光栅中的两个光栅层之间的偏移通过用不具有平行于或不垂直于光栅线的入射平面的光照射光栅来测量。 这种非对称光学照明允许确定偏移的符号和幅度。 在以180°分开的方位角进行两次测量，并计算这些测量值的差。 该差异的测量允许确定偏移（例如，利用校准曲线）。 或者，可以采用具有预定非零偏移差的两个复合光栅。 这种布置允许基于线性近似来确定偏移而不需要校准曲线（或用于附加复合光栅）。

公开(公告)号：US07253909B1

公开(公告)日：2007-08-07

申请号：US11028894

申请日：2005-01-03

申请人： Guoguang Li ,  Phillip Walsh ,  Shuqiang Chen ,  Abdul Rahim Forouhi

发明人： Guoguang Li ,  Phillip Walsh ,  Shuqiang Chen ,  Abdul Rahim Forouhi

IPC分类号： G01B11/00

CPC分类号： G01B11/0625 ,  G01N21/4788 ,  G01N21/59 ,  G01N21/956 ,  G01N2021/4735

摘要： An apparatus and method for determining a physical parameter of features on a substrate by illuminating the substrate with an incident light covering an incident wavelength range Δλ, e.g., from 190 nm to 1000 nm, where the substrate is at least semi-transparent. A response light received from the substrate and the feature is measured to obtain a response spectrum of the response light. Further, a complex-valued response due to the feature and the substrate is computed and both the response spectrum and the complex-valued response are used in determining the physical parameter. A direct approximate phase measurement is provided when the response light is transmitted light.

摘要翻译： 一种用于通过用覆盖入射波长范围（例如190nm至1000nm）的入射光照射衬底来确定衬底上特征的物理参数的装置和方法，其中衬底至少是半透明的。 测量从衬底接收的响应光和特征以获得响应光的响应光谱。 此外，计算由特征和衬底引起的复值响应，并且在确定物理参数中使用响应谱和复值响应。 当响应光透射光时，提供直接近似相位测量。

公开(公告)号：US06379014B1

公开(公告)日：2002-04-30

申请号：US09560504

申请日：2000-04-27

申请人： Guoguang Li ,  Dale A. Harrison ,  Abdul Rahim Forouhi

发明人： Guoguang Li ,  Dale A. Harrison ,  Abdul Rahim Forouhi

IPC分类号： G02B111

CPC分类号： G03F7/70958 ,  G02B1/115 ,  Y10T428/12653

摘要： A graded anti-reflective coating (ARC) with one or more layers has a bottom layer that is highly absorbing at the lithographic wavelength, and one or more layers between the substrate and the resist layer having inhomogeneous optical constants. The refractive indices are matched across layer interfaces, and the optical constants vary smoothly through the layer thicknesses. In each layer the extinction coefficient and the refractive index have independently selectable values and gradients. This ARC structure provides almost total absorption in the bottom layer and near-zero reflection at the resist interface and all other intermediate interfaces. Layers are preferably of inorganic materials, typically SiOxNy. Because of its highly absorbing bottom layer, an ARC according to an embodiment of the present invention works effectively over diverse substrate materials for a variety of lithographic wavelengths. It provides great latitude of manufacturing tolerances for thicknesses and optical constants.

摘要翻译： 具有一层或多层的梯度抗反射涂层（ARC）具有在光刻波长处高度吸收的底层，并且基板和抗蚀剂层之间的一层或多层具有不均匀的光学常数。 折射率跨层界面匹配，光学常数通过层厚度平滑变化。 在每个层中，消光系数和折射率具有独立的可选值和梯度。 该ARC结构在抗蚀剂界面和所有其它中间界面处在底层几乎全部吸收和近零反射。 层优选为无机材料，通常为SiO x N y。 由于其高度吸收的底层，根据本发明的实施例的ARC可以有效地用于各种光刻波长的不同的衬底材料。 它为厚度和光学常数的制造公差提供了很大的自由度。

公开(公告)号：US06327035B1

公开(公告)日：2001-12-04

申请号：US09451465

申请日：1999-11-30

申请人： Guoguang Li ,  Dale A. Harrison ,  Abdul Rahim Forouhi

发明人： Guoguang Li ,  Dale A. Harrison ,  Abdul Rahim Forouhi

IPC分类号： G01N2100

CPC分类号： G03F7/70616

摘要： A method and apparatus for optically determining a physical parameter a pattern made up of features and disposed on an underlayer. The physical parameter can be, e.g., feature width, relative feature size, feature thickness, index of refraction n or extinction coefficient k and is determined from a response light generated upon illumination of the pattern and underlayer. The response light, e.g. light transmitted by or reflected from the pattern and from the underlayer is analyzed and broken down into response light fractions including an underlayer light fraction and a feature light fraction as well as any other background light fractions making up the response light. The physical parameter of the pattern is determined from the response light fractions and reference physical parameters) of the underlayer, which are either known a priori or determined.

摘要翻译： 一种用于光学地确定由特征构成并布置在底层上的图案的物理参数的方法和装置。 物理参数可以是例如特征宽度，相对特征尺寸，特征厚度，折射率n或消光系数k，并且根据照射图案和底层时产生的响应光来确定。 响应光，例如 从图案和底层透射或反射的光被分析并分解成包括底层光分数和特征光分数的响应轻分数以及构成响应光的任何其它背景轻馏分。 根据已知先验或确定的底层的反应轻分数和参考物理参数确定图案的物理参数）。

公开(公告)号：US07999936B1

公开(公告)日：2011-08-16

申请号：US12417606

申请日：2009-04-02

申请人： Guoguang Li ,  Abdul Rahim Forouhi ,  Erik Nackerud

发明人： Guoguang Li ,  Abdul Rahim Forouhi ,  Erik Nackerud

IPC分类号： G01N15/02

CPC分类号： G01N15/0205 ,  G01N21/4133 ,  G01N21/532

摘要： The refractive index, extinction coefficient, size and density of fluid suspended particles are simultaneously determined by combined transmittance and scattering measurements. The scattering measurements are preferably angle selective to obtain additional information about the scattered light. A charge-coupled device is employed for its high sensitivity to low light intensity in measurement of scattered light in combination with a photodiode array employed for its high signal to noise ratio, which is beneficial in transmittance measurement. The scattered light may be measured in an angle selective fashion by use of a motorized aperture that is concentrically positioned with respect to the impinging beam axis and moveable along the impinging beam axis. An ellipsoidal mirror collects the scattered light that passes through the motorized aperture and focuses the scattered light towards the charge-coupled device.

摘要翻译： 流体悬浮颗粒的折射率，消光系数，尺寸和密度通过组合的透射率和散射测量值同时确定。 散射测量优选地是角度选择性的，以获得关于散射光的附加信息。 采用电荷耦合器件对散射光测量时的低光强度的高灵敏度，结合用于其高信噪比的光电二极管阵列，这对透射率测量是有益的。 可以通过使用相对于入射光束轴线同心定位并且沿撞击光束轴线移动的电动孔径以角度选择性方式测量散射光。 椭球镜收集通过电动孔径的散射光，并将散射光聚焦到电荷耦合器件。

公开(公告)号：US6091485A

公开(公告)日：2000-07-18

申请号：US464640

申请日：1999-12-15

申请人： Guoguang Li ,  Hongwei Zhu ,  Dale A. Harrison ,  Abdul Rahim Forouhi ,  Weilu Xu

发明人： Guoguang Li ,  Hongwei Zhu ,  Dale A. Harrison ,  Abdul Rahim Forouhi ,  Weilu Xu

IPC分类号： G01N21/00

CPC分类号： G01N21/41 ,  G01N21/55 ,  G01N21/59

摘要： A method and apparatus for optically determining a physical parameter of an underlayer such as the underlayer refractive index N.sub.u, extinction coefficient k.sub.u and/or thickness t.sub.u through a top layer having a first top layer thickness t.sub.1 and an assigned refractive index index n.sub.t and coefficient of extinction k.sub.t. The values of index n.sub.t and extinction coefficient k.sub.t can be estimated, optically determined or assigned based on prior knowledge. In a subsequent step a first reflectance R.sub.1 is measured over a wavelength range .DELTA..lambda. by using a test beam spanning that wavelength range. Then, a second reflectance R.sub.2 of the top layer and underlayer is measured using the test beam spanning wavelength range .DELTA..lambda. at a second top layer thickness t.sub.2. In a calculation step the physical parameter of the underlayer is determined from the first reflectance measurement R.sub.1, the second reflectance measurement R.sub.2, and the assigned or predetermined thickness values t.sub.1, t.sub.2, and the refractive index n.sub.t. and coefficient of extinction k.sub.t of the top layer. A dispersion model can be used in this calculation step. Alternatively, with transmissive samples, a first and second transmittance T.sub.1, T.sub.2 can be used.

摘要翻译： 一种用于通过具有第一顶层厚度t1和所分配的折射率指数nt的顶层以及所分配的折射率指数nt和的系数来光学地确定诸如底层折射率Nu，消光系数ku和/或厚度tu的底层的物理参数的方法和装置 灭绝kt 指数nt和消光系数kt的值可以基于现有知识来估计，光学确定或分配。 在随后的步骤中，通过使用横跨该波长范围的测试光束，在波长范围DELTAλ上测量第一反射率R1。 然后，使用第二顶层厚度t2的跨越波长范围DELTAλ的测试光束来测量顶层和底层的第二反射率R2。 在计算步骤中，从第一反射率测量R1，第二反射率测量R2和分配的或预定的厚度值t1，t2和折射率nt确定底层的物理参数。 和顶层消光系数kt。 在该计算步骤中可以使用色散模型。 或者，对于透射样品，可以使用第一和第二透射率T1，T2。

公开(公告)号：US07349103B1

公开(公告)日：2008-03-25

申请号：US11264733

申请日：2005-10-31

申请人： Mehdi Balooch ,  Marc Aho ,  Homan Amin ,  Abdul Rahim Forouhi ,  Phillip Walsh ,  Guoguang Li

发明人： Mehdi Balooch ,  Marc Aho ,  Homan Amin ,  Abdul Rahim Forouhi ,  Phillip Walsh ,  Guoguang Li

IPC分类号： G01B11/24

CPC分类号： G01J3/10 ,  G01J3/108 ,  G01N21/4738 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/4735

摘要： An apparatus and method for examining features of a sample with a broadband beam of light obtained from a long-wavelength source that may include two distinct emitters that emit a long-wavelength radiation and a short-wavelength source that emits a short-wavelength radiation. A passage is positioned between the sources and a reflective beam combining optics is provided for shaping the long-wavelength radiation to enter the short-wavelength source via the passage and also for shaping the short-wavelength radiation that exits through the passage and propagates toward the long-wavelength source. The reflective beam combining optics shape the short-wavelength radiation such that it re-enters the short-wavelength source via the passage and is combined with the long-wavelength radiation into the broadband beam that exits the short-wavelength source. A beam steering optics projects the broadband beam to a spot on the sample, and a scattered broadband radiation from the spot is intercepted and shaped to a broadband signal beam, which is passed through a sampling pinhole that passes a test portion of it on to a detector for optical examination; the test portion that is passed can correspond to a center portion of the spot.

摘要翻译： 一种用于利用从可能包括发射长波长辐射的两个不同的发射体和发射短波长辐射的短波长源的长波长源获得的宽带光束来检查样本的特征的装置和方法。 通道位于源之间，并且提供反射光束组合光学器件用于使长波长辐射成形以经由通道进入短波长源，并且还用于使通过通道离开的短波长辐射成形，并朝向 长波长源。 反射光束组合光学器件形成短波长辐射，使得其经由通道重新进入短波长源并且与长波长辐射组合成离开短波长源的宽带光束。 光束转向光学器件将宽带光束投射到样品上的光点，并且来自光斑的散射宽带辐射被截取并成形为宽带信号光束，该宽带信号光束通过将其测试部分通过的采样针孔 光学检测仪 通过的测试部分可以对应于点的中心部分。

公开(公告)号：US06392756B1

公开(公告)日：2002-05-21

申请号：US09336404

申请日：1999-06-18

申请人： Guoguang Li ,  Hongwei Zhu ,  Dale A. Harrison ,  Abdul Rahim Forouhi ,  Weilu Xu

发明人： Guoguang Li ,  Hongwei Zhu ,  Dale A. Harrison ,  Abdul Rahim Forouhi ,  Weilu Xu

IPC分类号： G01B1106

CPC分类号： G01B11/0641

摘要： A method and an apparatus for optically determining a physical parameter such as thickness t, index of refraction n, extinction coefficient k or a related physical parameter such as energy bandgap Eg of a thin film. A test beam having a wavelength range &Dgr;&lgr; is used to illuminate the thin film after it is deposited on a complex substrate which has at least two layers and exhibits a non-monotonic and an appreciably variable substrate optical response over wavelength range &Dgr;&lgr;. Alternatively, the thin film can be deposited between the at least two layers of the complex substrate. A measurement of a total optical response, consisting of the substrate optical response and an optical response difference due to the thin film is performed over wavelength range &Dgr;&lgr;. The at least two layers making up the complex substrate are chosen such that the effect of multiple internal reflections in the complex substrate and the film is maximized. The physical parameters are determined from the total optical response which can be in the form of a reflected and/or a transmitted beam.

摘要翻译： 用于光学地确定诸如厚度t，折射率n，消光系数k或相关物理参数（诸如薄膜的能带隙Eg）的物理参数的方法和装置。 具有波长范围DELTAlambd的测试光束在其沉积在具有至少两层的复合衬底上并且在波长范围DELTAlambd上表现出非单调和可观的可变衬底光学响应之后，用于照射薄膜。 或者，薄膜可以沉积在复合基板的至少两层之间。 在波长范围DELTAlambd上执行由基板光学响应和由薄膜引起的光学响应差异的总光学响应的​​测量。 选择构成复合衬底的至少两层，使得复合衬底和膜中的多次内部反射的影响最大化。 物理参数由可以是反射和/或透射束形式的总光学响应确定。

公开(公告)号：US6128085A

公开(公告)日：2000-10-03

申请号：US421449

申请日：1999-10-19

申请人： Dale Buermann ,  Abdul Rahim Forouhi ,  Michael J. Mandella

发明人： Dale Buermann ,  Abdul Rahim Forouhi ,  Michael J. Mandella

IPC分类号： G01B11/06 ,  G01J3/02 ,  G01J3/12 ,  G01J3/42 ,  G01J3/45 ,  G01J4/00 ,  G01N21/27 ,  G01N21/45 ,  G01N21/21

CPC分类号： G01J3/12 ,  G01B11/0625 ,  G01B11/0641 ,  G01J3/02 ,  G01J3/0208 ,  G01J3/42 ,  G01J4/00

摘要： An apparatus uses reflectance spectrophotometry to characterize a sample having any number of thin films. The apparatus uses two toroidal mirrors in an optical relay to direct light reflected by the sample to a spectroscopic device. A computer then analyzes the reflected spectrum to characterize the optical properties of the sample. The optical relay allows a range of angles of reflection from the sample, and has no chromatic aberration. The optical relay is also arranged so that the non-chromatic aberration is minimized. For polarization-based measurements polarizing elements can be used in the apparatus and the spectroscopic device can be a spectroscopic ellipsometer. The sample is mounted on a movable stage so that different areas of the sample may be characterized. Furthermore, a deflector and a viewer are used to allow the operator of the apparatus to view the region of the sample under study.

摘要翻译： 一种装置使用反射分光光度法来表征具有任何数量薄膜的样品。 该装置在光学继电器中使用两个环形反射镜来将由样品反射的光引导到光谱装置。 然后计算机分析反射光谱以表征样品的光学性质。 光学继电器允许来自样品的一定范围的反射角度，并且没有色差。 光学继电器也被布置成使得非色差最小化。 对于基于偏振的测量，偏振元件可以用在装置中，并且光谱装置可以是光谱椭偏仪。 将样品安装在可移动的载物台上，以便可以对样品的不同区域进行表征。 此外，偏转器和观察器用于允许装置的操作者观察正在研究的样品的区域。

公开(公告)号：US5825072A

公开(公告)日：1998-10-20

申请号：US599959

申请日：1996-02-14

申请人： Yeochung Yen ,  Wenn-Jei Chen ,  Steve S. Chiang ,  Abdul Rahim Forouhi

发明人： Yeochung Yen ,  Wenn-Jei Chen ,  Steve S. Chiang ,  Abdul Rahim Forouhi

IPC分类号： H01L23/525 ,  H01L23/60 ,  H01L29/00

CPC分类号： H01L23/5252 ,  H01L23/60 ,  H01L2924/0002

摘要： A static-charge protection device for an antifuse includes an additional second-sized aperture smaller in area than the antifuse apertures disposed in the same inter-electrode dielectric layer. Antifuse material is disposed in the second-sized aperture, and the upper electrode extends over the second aperture as well as the first aperture. A preferred process for fabricating the protection device utilizes the step of forming the smaller apertures and forming their antifuse material layers simultaneously with forming the antifuse apertures. A static-charge protection device for an antifuse device includes an additional second-sized aperture larger in area than the first-sized antifuse apertures. Metal plug material is deposited and etched back. A layer of amorphous silicon antifuse material is formed and defined over the first and second sized apertures, the portion formed over the larger partially filled antifuse protection device cell being thinner.

摘要翻译： 用于反熔丝的静电保护装置包括比设置在相同的电极间介电层中的反熔丝孔小的面积小的附加的第二尺寸孔。 防污材料设置在第二尺寸的孔中，并且上电极在第二孔和第一孔上延伸。 用于制造保护装置的优选方法利用形成较小孔径并与形成反熔丝孔同时形成其反熔丝材料层的步骤。 用于反熔丝装置的静电保护装置包括具有比第一尺寸的反熔丝孔大的面积的额外的第二尺寸孔。 将金属塞材料沉积并回蚀刻。 在第一和第二尺寸的孔上形成并限定一层非晶硅反熔丝材料，形成在较大部分填充的反熔丝保护器件单元上的部分较薄。