公开(公告)号：US5858593A

公开(公告)日：1999-01-12

申请号：US902323

申请日：1997-07-29

申请人： Osamu Tamura ,  Koichi Tomiyama ,  Nobuyuki Okubo ,  Shunji Suzuki ,  Yoshihiro Ogawa ,  Keita Nozawa

发明人： Osamu Tamura ,  Koichi Tomiyama ,  Nobuyuki Okubo ,  Shunji Suzuki ,  Yoshihiro Ogawa ,  Keita Nozawa

IPC分类号： G03G9/08 ,  G03G9/083 ,  G03G13/09 ,  G03G15/08 ,  G03G15/09

CPC分类号： G03G9/0835 ,  G03G13/09 ,  G03G9/0819 ,  G03G9/0821 ,  G03G9/0833

摘要： Disclosed are a magnetic toner for developing an electrostatic latent image comprising magnetic toner particles containing a binder resin of 100 parts by weight and a magnetic substance of 20 to 150 parts by weight, and an apparatus unit and an image forming method for employing the magnetic toner. A frictional electrification property is such that the absolute value of the frictional electrification amount relative to an iron powder of 250 mesh-pass to 350 mesh-on is 25 to 40 mc/kg. Assuming that for particle distribution of the magnetic toner a weight-average particle diameter (D.sub.4) for the magnetic toner is X (.mu.m) and that a count % in a count distribution of magnetic toner particles that have a diameter of 3.17 .mu.m or smaller is Y (%), expressions (1) and (2) are satisfied:-5X+35.ltoreq.Y.ltoreq.-25X+180 (1)3.5.ltoreq.X.ltoreq.6.5 (2).Sphericity (.psi.) of particles is equal to or greater than 0.80 and a product (.sigma..sub.r .times.H.sub.c) of remanence �.sigma..sub.r (Am.sup.2 /kg)! and coercive force (H.sub.c (kA/m)! of the magnetic substance in a magnetic field of 795.8 kA/m (10 k oersted) is 10 to 56 (kA.sup.2 m/kg).

摘要翻译： 公开了一种用于显影静电潜像的磁性调色剂，其包含含有100重量份的粘合剂树脂的磁性调色剂颗粒和20至150重量份的磁性物质，以及用于使用磁性调色剂的装置单元和图像形成方法 。 摩擦带电特性使得相对于250目通过至350目的铁粉的摩擦带电量的绝对值为25〜40mc / kg。 假设对于磁性调色剂的颗粒分布，磁性调色剂的重均粒径（D4）为X（μm），并且磁性调色剂颗粒的计数分布的计数％为直径为3.17μm，或 较小的是Y（％），表达式（1）和（2）满足：-5X + 35

公开(公告)号：US5750302A

公开(公告)日：1998-05-12

申请号：US822650

申请日：1997-03-24

申请人： Yoshihiro Ogawa ,  Koichi Tomiyama ,  Osamu Tamura ,  Nobuyuki Okubo ,  Shunji Suzuki

发明人： Yoshihiro Ogawa ,  Koichi Tomiyama ,  Osamu Tamura ,  Nobuyuki Okubo ,  Shunji Suzuki

IPC分类号： G03G9/08 ,  G03G9/083 ,  G03G13/09 ,  G03G15/09

CPC分类号： G03G9/0833 ,  G03G9/0819 ,  G03G9/0821 ,  G03G9/0834 ,  G03G9/0839

摘要： A magnetic toner for developing an electrostatic image has magnetic toner particles containing at least a binder resin and magnetic iron oxide particles. The magnetic iron oxide particles have been surface-treated with an aliphatic alcohol having carbon atoms of from 12 to 300 on the average. The magnetic toner has a weight average particle diameter of 13.5 .mu.m or smaller, and contains magnetic toner particles with particle diameters of 3.17 .mu.m or smaller in an amount not less than 1% by number as number-based percentage determined from number distribution.

摘要翻译： 用于显影静电图像的磁性调色剂具有至少含有粘合剂树脂和磁性氧化铁颗粒的磁性调色剂颗粒。 磁性氧化铁颗粒平均用碳原子数为12〜300的脂肪族醇进行表面处理。 磁性调色剂的重均粒径为13.5μm以下，粒径为3.17μm以下的磁性调色剂颗粒的数量按照数量分布确定的数量不少于1％。

公开(公告)号：US4871649A

公开(公告)日：1989-10-03

申请号：US28129

申请日：1987-03-19

申请人： Hiroyuki Imataki ,  Mizuho Hiraoka ,  Sachiko Ichikawa ,  Yoshihiro Ogawa ,  Hitoshi Yoshino

发明人： Hiroyuki Imataki ,  Mizuho Hiraoka ,  Sachiko Ichikawa ,  Yoshihiro Ogawa ,  Hitoshi Yoshino

IPC分类号： G11B7/00 ,  G11B7/0045 ,  G11B7/24 ,  G11B7/243 ,  G11B7/244 ,  G11B7/258

CPC分类号： G11B7/258 ,  G11B7/244 ,  G11B7/2467 ,  G11B7/2472 ,  G11B7/2475 ,  G11B7/249 ,  Y10S430/146 ,  Y10S430/165

摘要： An optical recording medium wherein recording information has been recorded as pits, comprises an absorptive layer and a reflective layer placed thereon, the absorptive layer having, on the surface, concave portions thermally deformed by heat generated upon irradiation of light beams, and the reflective layer having concave pits formed by deformation as a consequence of the thermal deformation of the absorptive layer and covering said concave portions of the absorptive layer in such a state that the concave portions are not exposed.An optical recording method comprises irradiating an optical recording medium having an absorptive layer and a reflective layer placed thereon, with light beams to generate a heat, allowing the heat to cause the thermal deformation of the absortive layer to form concave portions on the surface of the absorptive layer, deforming the reflective layer as a consequence of the thermal deformation of the absorptive layer, thereby allowing the deformed reflective layer to cover the concave portions of the absorptive layer in such a state that the concave portions are not exposed and to form concave pits.

摘要翻译： 其中记录信息已被记录为凹坑的光学记录介质包括吸收层和放置在其上的反射层，吸收层在表面上具有通过在光束照射时产生的热而热变形的凹部，反射层 具有作为吸收层的热变形的变形而形成的凹坑，并且在凹部未露出的状态下覆盖吸收层的所述凹部。 光学记录方法包括用光束照射具有吸收层和反射层的光学记录介质，产生热量，使热量引起自由基层的热变形，形成凹部 吸收层，由于吸收层的热变形而使反射层变形，从而允许变形的反射层在凹部未露出并形成凹坑的状态下覆盖吸收层的凹部 。

公开(公告)号：US08435903B2

公开(公告)日：2013-05-07

申请号：US13069164

申请日：2011-03-22

申请人： Yoshihiro Ogawa ,  Shinsuke Kimura ,  Tatsuhiko Koide ,  Hisashi Okuchi ,  Hiroshi Tomita

发明人： Yoshihiro Ogawa ,  Shinsuke Kimura ,  Tatsuhiko Koide ,  Hisashi Okuchi ,  Hiroshi Tomita

IPC分类号： H01L21/302 ,  H01L21/461

CPC分类号： H01L21/0206 ,  H01L21/0337 ,  H01L21/31133 ,  H01L21/67028 ,  H01L27/11531

摘要： In one embodiment, a method for treating a surface of a semiconductor substrate is disclosed. The semiconductor substrate has a first pattern covered by a resist and a second pattern not covered by the resist. The method includes supplying a resist-insoluble first chemical solution onto a semiconductor substrate to subject the second pattern to a chemical solution process. The method includes supplying a mixed liquid of a water repellency agent and a resist-soluble second chemical solution onto the semiconductor substrate after the supply of the first chemical solution, to form a water-repellent protective film on a surface of at least the second pattern and to release the resist. In addition, the method can rinse the semiconductor substrate using water after the formation of the water-repellent protective film, and dry the rinsed semiconductor substrate.

摘要翻译： 在一个实施例中，公开了一种用于处理半导体衬底的表面的方法。 半导体衬底具有由抗蚀剂覆盖的第一图案和未被抗蚀剂覆盖的第二图案。 该方法包括将抗蚀剂不溶的第一化学溶液提供到半导体衬底上以使第二图案进行化学溶液处理。 该方法包括：在供给第一化学溶液之后，在半导体衬底上提供防水剂和可溶解抗蚀剂的第二化学溶液的混合液体，在至少第二图案的表面上形成防水保护膜 并释放抗蚀剂。 此外，该方法可以在形成防水保护膜之后用水冲洗半导体衬底，并干燥冲洗后的半导体衬底。

公开(公告)号：US20120094493A1

公开(公告)日：2012-04-19

申请号：US13236306

申请日：2011-09-19

申请人： Takeshi Hizawa ,  Nobuhide Yamada ,  Yoshihiro Ogawa ,  Masahiro Kiyotoshi

发明人： Takeshi Hizawa ,  Nobuhide Yamada ,  Yoshihiro Ogawa ,  Masahiro Kiyotoshi

IPC分类号： H01L21/306 ,  B08B3/08

CPC分类号： H01L21/02076 ,  H01L21/02164 ,  H01L21/02222 ,  H01L21/02282 ,  H01L21/02301 ,  H01L21/02326 ,  H01L21/28273 ,  H01L27/11524

摘要： A method of manufacturing a semiconductor device in which an insulating film is filled between patterns etched into a workpiece structure is disclosed. The method includes cleaning etch residues residing between the etched patterns by a first chemical liquid; rinsing the workpiece structure cleaned by the first chemical liquid by a rinse liquid; and coating the workpiece structure rinsed by the rinse liquid with a coating liquid for formation of the insulating film. The cleaning to the coating are carried out within the same processing chamber such that a liquid constantly exists between the patterns of the workpiece structure.

摘要翻译： 公开了一种制造半导体器件的方法，其中绝缘膜填充在蚀刻到工件结构中的图案之间。 该方法包括通过第一化学液体清洁驻留在蚀刻图案之间的蚀刻残留物; 用漂洗液冲洗由第一化学液体清洗的工件结构; 并用用于形成绝缘膜的涂布液涂覆由冲洗液冲洗的工件结构。 在相同的处理室中进行对涂层的清洁，使得在工件结构的图案之间始终存在液体。

公开(公告)号：US08124306B2

公开(公告)日：2012-02-28

申请号：US12298755

申请日：2007-04-25

申请人： Junko Hirata ,  Yoshihiro Ogawa ,  Yusuke Hasegawa ,  Kouji Nishikawa ,  Miho Okazaki ,  Takashige Kasuya

发明人： Junko Hirata ,  Yoshihiro Ogawa ,  Yusuke Hasegawa ,  Kouji Nishikawa ,  Miho Okazaki ,  Takashige Kasuya

IPC分类号： G03G9/083

CPC分类号： G03G9/0833 ,  G03G9/0834 ,  G03G9/0835 ,  G03G9/0836 ,  G03G9/08755

摘要： The object of the present invention is to provide a magnetic toner enabling an image with high image density and excellent image reproducibility to be obtained, which is excellent in fluidity, charging stability, and charging uniformity, even for long-term use, and also enabling an image whose fogging, ghost, and scattering are suppressed to be obtained. The magnetic toner has at least a binder resin and a magnetic material, where, the magnetic material is an magnetic iron oxide whose dielectric breakdown voltage of the magnetic material is 160 to 1600 V/cm, and the dielectric loss tangent (tan δ) of the magnetic toner at 100 kHz and 40° C. is 2.0×10−3 to 1.0×10−2.

摘要翻译： 本发明的目的是提供一种能够获得具有高图像密度和优异的图像再现性的图像的磁性调色剂，即使长期使用也具有优异的流动性，充电稳定性和充电均匀性，并且还使得 抑制雾化，重影和散射的图像。 磁性调色剂至少具有粘合剂树脂和磁性材料，其中磁性材料是磁性材料的介电击穿电压为160至1600V / cm的磁性氧化铁，介电损耗角正切（tanδ）为 在100kHz和40℃下的磁性调色剂为2.0×10-3〜1.0×10-2。

公开(公告)号：US20110269313A1

公开(公告)日：2011-11-03

申请号：US13069164

申请日：2011-03-22

申请人： Yoshihiro OGAWA ,  Shinsuke Kimura ,  Tatsuhiko Koide ,  Hisashi Okuchi ,  Hiroshi Tomita

发明人： Yoshihiro OGAWA ,  Shinsuke Kimura ,  Tatsuhiko Koide ,  Hisashi Okuchi ,  Hiroshi Tomita

IPC分类号： H01L21/3065

CPC分类号： H01L21/0206 ,  H01L21/0337 ,  H01L21/31133 ,  H01L21/67028 ,  H01L27/11531

摘要： In one embodiment, a method for treating a surface of a semiconductor substrate is disclosed. The semiconductor substrate has a first pattern covered by a resist and a second pattern not covered by the resist. The method includes supplying a resist-insoluble first chemical solution onto a semiconductor substrate to subject the second pattern to a chemical solution process. The method includes supplying a mixed liquid of a water repellency agent and a resist-soluble second chemical solution onto the semiconductor substrate after the supply of the first chemical solution, to form a water-repellent protective film on a surface of at least the second pattern and to release the resist. In addition, the method can rinse the semiconductor substrate using water after the formation of the water-repellent protective film, and dry the rinsed semiconductor substrate.

摘要翻译： 在一个实施例中，公开了一种用于处理半导体衬底的表面的方法。 半导体衬底具有由抗蚀剂覆盖的第一图案和未被抗蚀剂覆盖的第二图案。 该方法包括将抗蚀剂不溶的第一化学溶液提供到半导体衬底上以使第二图案进行化学溶液处理。 该方法包括：在供给第一化学溶液之后，在半导体衬底上提供防水剂和可溶解抗蚀剂的第二化学溶液的混合液体，在至少第二图案的表面上形成防水保护膜 并释放抗蚀剂。 此外，该方法可以在形成防水保护膜之后用水冲洗半导体衬底，并干燥冲洗后的半导体衬底。

公开(公告)号：US07927949B2

公开(公告)日：2011-04-19

申请号：US12755532

申请日：2010-04-07

申请人： Yoshio Ozawa ,  Isao Kamioka ,  Junichi Shiozawa ,  Akihito Yamamoto ,  Ryota Fujitsuka ,  Yoshihiro Ogawa ,  Katsuaki Natori ,  Katsuyuki Sekine ,  Masayuki Tanaka ,  Daisuke Nishida

发明人： Yoshio Ozawa ,  Isao Kamioka ,  Junichi Shiozawa ,  Akihito Yamamoto ,  Ryota Fujitsuka ,  Yoshihiro Ogawa ,  Katsuaki Natori ,  Katsuyuki Sekine ,  Masayuki Tanaka ,  Daisuke Nishida

IPC分类号： H01L21/336 ,  H01L21/8238 ,  H01L21/3205 ,  H01L21/4763

CPC分类号： H01L27/115 ,  H01L27/11521

摘要： A semiconductor memory device manufacturing method includes forming a floating gate electrode above a semiconductor substrate, forming an interelectrode insulating film above the floating gate electrode, forming a first radical nitride film on a surface of the interelectrode insulating film by first radical nitriding, and forming a control gate electrode on the first radical nitride film.

摘要翻译： 一种半导体存储器件制造方法，包括在半导体衬底上形成浮置栅电极，在浮置栅电极上形成电极间绝缘膜，通过第一自由基氮化在电极间绝缘膜的表面上形成第一自由基氮化物膜， 第一自由基氮化物膜上的控制栅电极。

公开(公告)号：US07776756B1

公开(公告)日：2010-08-17

申请号：US11878965

申请日：2007-07-30

申请人： Hisashi Okuchi ,  Hiroyasu Iimori ,  Mami Saito ,  Yoshihiro Ogawa ,  Hiroshi Tomita ,  Soichi Nadahara

发明人： Hisashi Okuchi ,  Hiroyasu Iimori ,  Mami Saito ,  Yoshihiro Ogawa ,  Hiroshi Tomita ,  Soichi Nadahara

IPC分类号： H01L21/302 ,  H01L21/461

CPC分类号： H01L21/67253 ,  H01L21/31111 ,  H01L21/67086

摘要： An etching apparatus includes a chamber containing an etching solution including first and second components and water, a concentration of the water in the etching solution is at a specified level or lower; a circulation path circulating the etching solution; a concentration controller sampling the etching liquid from the circulation path and controls concentrations of the etching solution respectively; and a refilling chemical liquid feeder feeding a refilling chemical liquid including the first component having a concentration higher than the first component in the etching solution.

摘要翻译： 蚀刻装置包括：包含第一和第二成分和水的蚀刻液的室，蚀刻液中的水的浓度在规定的水平以下; 使蚀刻溶液循环的循环路径; 浓度控制器对来自循环路径的蚀刻液进行采样，并分别控制蚀刻液的浓度; 以及再填充化学液体给料器，其在所述蚀刻溶液中供给包含浓度高于所述第一成分的所述第一成分的再填充药液。

公开(公告)号：US07704659B2

公开(公告)日：2010-04-27

申请号：US12420336

申请日：2009-04-08

申请人： Yoshihiro Ogawa ,  Yusuke Hasegawa ,  Kouji Nishikawa ,  Miho Okazaki ,  Takashige Kasuya

发明人： Yoshihiro Ogawa ,  Yusuke Hasegawa ,  Kouji Nishikawa ,  Miho Okazaki ,  Takashige Kasuya

IPC分类号： G03G9/08

CPC分类号： G03G9/08782 ,  G03G9/0812

摘要： To provide a toner which has superior low-temperature fixing performance, high-temperature anti-offsetting properties and developing performance and may cause neither melt sticking of toner to photosensitive member nor turn-up of cleaning blade. The toner contains at least a binder resin, a colorant and a wax, and the wax is characterized by i) being an oxidized hydrocarbon wax, ii) having a hydroxyl value of from 5 mgKOH/g or more to 150 mgKOH/g or less, and iii) having, in molecular weight distribution measured by gel permeation chromatography of tetrahydrofuran-soluble matter, a main peak within the range of molecular weight of from 200 or more to 600 or less, and a component with a molecular weight of 700 or more in a content of 3% by mass or less.

摘要翻译： 为了提供具有优异的低温定影性能，高温抗粘着性和显影性能的调色剂，并且不会使调色剂熔融粘附到感光构件上，也不会导致清洁刮片的翻转。 调色剂至少含有粘合剂树脂，着色剂和蜡，并且蜡的特征在于i）是氧化烃蜡，ii）羟值为5mgKOH / g以上至150mgKOH / g以下 ，和iii）在分子量为200以上且600以下的主峰和分子量为700以下的成分中，具有通过四氢呋喃可溶物质的凝胶渗透色谱法测定的分子量分布， 更多的是3质量％以下的含量。