Method for manufacturing array substrate, array substrate, and display device
    91.
    发明授权
    Method for manufacturing array substrate, array substrate, and display device 有权
    阵列基板,阵列基板和显示装置的制造方法

    公开(公告)号:US09520420B2

    公开(公告)日:2016-12-13

    申请号:US14402532

    申请日:2013-12-16

    CPC classification number: H01L27/1274 H01L27/1255 H01L27/1262

    Abstract: The present invention provides a method for manufacturing an array substrate, an array substrate, and a display device. The method for manufacturing an array substrate, including a step of forming a thin film transistor and a storage capacitor on a substrate, the thin film transistor including a gate, a source, and a drain, and the storage capacitor including a first pole plate and a second pole plate, wherein, arranging the source, the drain, and the first pole plate in a single layer through implanting dopant ions into an amorphous silicon layer formed on the substrate by one ion-implantation process, and through crystallizing an amorphous silicon material forming the amorphous silicon layer and activating the dopant ions by a laser irradiation process. Accordingly, process steps are simplified and a process cost is reduced greatly, and the performances of the array substrate and the display device are increased.

    Abstract translation: 本发明提供一种阵列基板,阵列基板和显示装置的制造方法。 制造阵列基板的方法,包括在基板上形成薄膜晶体管和存储电容的步骤,所述薄膜晶体管包括栅极,源极和漏极,所述存储电容器包括第一极板和 第二极板,其中,通过一个离子注入工艺将源极,漏极和第一极板设置在单层中,通过将掺杂剂离子注入到形成在衬底上的非晶硅层中,并且通过使非晶硅材料结晶 形成非晶硅层并通过激光照射工艺激活掺杂剂离子。 因此,简化了处理步骤,并且大大降低了处理成本,并且增加了阵列基板和显示装置的性能。

    ARRAY SUBSTRATE, METHOD OF FABRICATING THE SAME, DISPLAY PANEL AND DISPLAY DEVICE
    92.
    发明申请
    ARRAY SUBSTRATE, METHOD OF FABRICATING THE SAME, DISPLAY PANEL AND DISPLAY DEVICE 有权
    阵列基板,其制造方法,显示面板和显示装置

    公开(公告)号:US20160343736A1

    公开(公告)日:2016-11-24

    申请号:US15131175

    申请日:2016-04-18

    Abstract: An array substrate, a method for fabricating the same, a display panel and a display device are disclosed. The array substrate comprises a display area and a non-display area that is outside the display area. The method comprises: forming a metal layer on a base substrate, the metal layer comprising a conductive pattern in the display area and a first electrode in the non-display area; forming a protective layer on the metal layer, a thickness of the protection layer in the non-display area being less than a thickness of the protection layer in the display area; forming a display electrode layer on the protection layer and removing the display electrode layer in the non-display area; and removing the protection layer in the non-display area.

    Abstract translation: 公开了阵列基板,其制造方法,显示面板和显示装置。 阵列基板包括在显示区域外的显示区域和非显示区域。 所述方法包括:在基底基板上形成金属层,所述金属层包括在所述显示区域中的导电图案和所述非显示区域中的第一电极; 在所述金属层上形成保护层,所述非显示区域中所述保护层的厚度小于所述保护层在所述显示区域中的厚度; 在保护层上形成显示电极层,去除非显示区域中的显示电极层; 并且去除非显示区域中的保护层。

    LOW TEMPERATURE POLYCRYSTALLINE SILICON TFT ARRAY SUBSTRATE AND METHOD OF PRODUCING THE SAME, DISPLAY APPARATUS
    93.
    发明申请
    LOW TEMPERATURE POLYCRYSTALLINE SILICON TFT ARRAY SUBSTRATE AND METHOD OF PRODUCING THE SAME, DISPLAY APPARATUS 有权
    低温多晶硅晶体管阵列基板及其制造方法,显示装置

    公开(公告)号:US20160268319A1

    公开(公告)日:2016-09-15

    申请号:US14769891

    申请日:2014-09-30

    CPC classification number: H01L27/1288 H01L27/1255 H01L27/3262 H01L2227/323

    Abstract: The present disclosure provides a low temperature polycrystalline silicon field effect TFT array substrate and a method for producing the same and a display apparatus. The method: using a stepped photo resist process to form a polycrystalline silicon active layer and a lower polar plate of a polycrystalline silicon storage capacitor simultaneously on a substrate in one lithographic process; forming a gate insulation layer on the polycrystalline silicon active layer and the lower polar plate of the polycrystalline silicon storage capacitor; forming a metal layer on the gate insulation layer and etching the metal layer to form a gate electrode and gate lines connected with the gate electrode, a source electrode, a drain electrode and data lines connected with the source electrode and the drain electrode; forming a passivation layer, a photo resist layer and a pixel electrode layer in sequence and patterning the passivation layer, the photo resist layer and the pixel electrode layer to form patterns of an interlayer insulation layer via hole and a pixel electrode in one lithographic process; forming a pixel definition layer on the pixel electrode. The present disclosure may reduce times of lithographic processes for the low temperature polycrystalline silicon field effect TFT array substrate, improve the yield and reduce the costs.

    Abstract translation: 本公开内容提供了一种低温多晶硅场效应TFT阵列基板及其制造方法和显示装置。 该方法:在一个光刻工艺中,使用阶梯式光刻胶工艺在衬底上同时形成多晶硅存储电容器的多晶硅有源层和下极板; 在多晶硅有源层和多晶硅储存电容器的下极板上形成栅极绝缘层; 在所述栅极绝缘层上形成金属层,并蚀刻所述金属层以形成与所述栅电极,源电极,漏电极以及与所述源电极和所述漏极连接的数据线连接的栅电极和栅极线; 依次形成钝化层,光致抗蚀剂层和像素电极层,并在一个光刻工艺中图案化钝化层,光致抗蚀剂层和像素电极层以形成层间绝缘层通孔和像素电极的图案; 在像素电极上形成像素定义层。 本公开可以减少低温多晶硅场效应晶体管阵列基板的光刻工艺的时间,提高产量并降低成本。

    Substrate dry device and method for drying substrate based on substrate dry device
    94.
    发明授权
    Substrate dry device and method for drying substrate based on substrate dry device 有权
    基板干燥装置及基板干燥装置干燥基板的方法

    公开(公告)号:US09383136B2

    公开(公告)日:2016-07-05

    申请号:US14495247

    申请日:2014-09-24

    CPC classification number: F26B5/00 F26B5/14 F26B15/20 F26B21/004 F26B21/14

    Abstract: The present invention provides a substrate dry device and a method for drying the substrate, the substrate dry device comprises a cavity, dry bars and a sensor disposed on the top of the cavity, liquid immerging the substrate is accommodated within the cavity, with the dry bars comprising a first dry bar and a second dry bar arranged parallel to each other, with a gap is formed therebetween and with the sensor disposed on one end or on two ends of the gap for monitoring a position in which the substrate is moved away from the liquid. By use of the above arrangement, the gas is ejected through the dry bars to the surface of the substrate which has moved away from the liquid, the tension of the surface of the liquid film on the substrate is changed by marangori effect under the action of the gas and the surface tension gradient of the liquid film makes the liquid film shrink so that the surface of the substrate becomes dry.

    Abstract translation: 本发明提供一种基板干燥装置和干燥基板的方法,所述基板干燥装置包括空腔,设置在空腔顶部的干燥条和传感器,浸入基板的液体容纳在空腔内,干燥 在它们之间形成包括彼此平行布置的间隔开的第一干条和第二干条的条,并且传感器设置在间隙的一端或两端,用于监测基板离开的位置 液体。 通过使用上述结构,气体通过干燥棒喷射到离开液体的基板表面,基板上的液膜表面的张力由于马拉古罗效应而变化 液体膜的气体和表面张力梯度使液膜收缩,使得基板的表面变干。

    SUBSTRATE DRY DEVICE AND METHOD FOR DRYING SUBSTRATE
    95.
    发明申请
    SUBSTRATE DRY DEVICE AND METHOD FOR DRYING SUBSTRATE 有权
    基板干燥装置和干燥基板的方法

    公开(公告)号:US20150338163A1

    公开(公告)日:2015-11-26

    申请号:US14495247

    申请日:2014-09-24

    CPC classification number: F26B5/00 F26B5/14 F26B15/20 F26B21/004 F26B21/14

    Abstract: The present invention provides a substrate dry device and a method for drying the substrate, the substrate dry device comprises a cavity, dry bars and a sensor disposed on the top of the cavity, liquid immerging the substrate is accommodated within the cavity, with the dry bars comprising a first dry bar and a second dry bar arranged parallel to each other, with a gap is formed therebetween and with the sensor disposed on one end or on two ends of the gap for monitoring a position in which the substrate is moved away from the liquid. By use of the above arrangement, the gas is ejected through the dry bars to the surface of the substrate which has moved away from the liquid, the tension of the surface of the liquid film on the substrate is changed by marangori effect under the action of the gas and the surface tension gradient of the liquid film makes the liquid film shrink so that the surface of the substrate becomes dry.

    Abstract translation: 本发明提供一种基板干燥装置和干燥基板的方法,所述基板干燥装置包括空腔,设置在空腔顶部的干燥条和传感器,浸入基板的液体容纳在空腔内,干燥 在它们之间形成包括彼此平行布置的间隔开的第一干条和第二干条的条,并且传感器设置在间隙的一端或两端,用于监测基板离开的位置 液体。 通过使用上述结构,将气体通过干燥棒喷射到离开液体的基板的表面,基板上的液膜的表面张力由于马拉古罗效应而变化 液体膜的气体和表面张力梯度使液膜收缩,使得基板的表面变干。

    Display panel and display device
    98.
    发明授权

    公开(公告)号:US12004392B2

    公开(公告)日:2024-06-04

    申请号:US17473602

    申请日:2021-09-13

    CPC classification number: H10K59/131

    Abstract: A display panel and a display device are provided. The display panel comprises a substrate, a plurality of sub-pixels, a plurality of data lines, a plurality of wiring structures and a plurality of pads. The substrate comprises a display area and a non-display area comprising a bending area. The sub-pixels and data lines are in the display area and electrically connected with each other. The wiring structures are in the bending area and electrically connected with the data lines. At least one wiring structure comprises a plurality of hollow patterns connected successively, each hollow pattern comprises a first conductive part and a second conductive part connected with each other. The plurality of pads are in the non-display area and located on a side of the plurality of wiring structures away from the display area and electrically connected with the plurality of wiring structures.

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