摘要:
A photoelectron mask for photo cathode image projection includes a transparent substrate, and a pattern formed on a main surface of the transparent substrate. The pattern includes a non-transparent material. The mask also includes a photoelectron emission film formed so as to cover the main surface of the transparent substrate on which the pattern is formed. The photoelectron emission film includes a material selected from the group consisting of pure platinum, a platinum-rich material containing platinum as the major component, and a platinum compound.
摘要:
A method for compensating for an eddy current effect due to leakage flux of a magnetic lens in a charged particle beam exposure system, and a system for exposing the beam on a substrate while a stage carrying the substrate is moving. By employing this method and system, a step and repeat system can be operated while the stage is moving, while improving the throughput of the system. A deviation in the path of the charged particle beam caused by the eddy current is proportional to the velocity of the stage. To compensate for this, a proportional constant relating the deviation to the velocity of the stage is measured in advance, and a correction term which is a product of the speed of the stage and the proportional constant, is fed back to a deflector of the charged particle beam. The proportional constant is obtained from a shift of an image of a test pattern viewed on a CRT in a SEM mode, from a first position at which the stage is stationary to a second position while the stage is moving at a constant speed.
摘要:
The movable range of an objective of an optical pickup device used in optical disc reproducing apparatus is increased and the size of the device is reduced by moving the objective solely or in combination with a collimating lens system in that range. The objective and collimating lens systems are integrated into a lens holder and located in the path of a diverging beam of a semiconductor laser.
摘要:
A grid has a grid structure (11) made of acid proof synthetic resin. A grid rib structure constitutes the grid structure and part of the grid rib structure inclusive of at least a connector lug (12) and a portion contiguous thereto is immersed in molten lead or lead alloy to form a lead or lead alloy film (16) coated on the grid structure. The portion to be coated with the lead or lead alloy film includes part of a frame rib (13) and an active material support rib (14, 15) which constitute the grid rib structure, and the active material support rib constituting the grid mesh is partly cut off (18) to enhance the coating of the lead or lead alloy film, the reduction in weight of the grid and ease of working for the coating of the lead or lead alloy film on the grid structure.
摘要:
A universally articulable supporting sheath comprises an interconnected series of links, each having a convex spherical surface at one end, and a concave spherical surface at its opposite end. The concave and convex surfaces mate with one another to form the sheath. Special links having branch openings may be provided. Various forms of waterproofing seals are provided, including O-rings, axially compressed rings, flexible belts, and ridges on the spherical surfaces. The links can be fitted together by thermal expansion. However, an axilly split link is also described, which comprises two parts which snap together. The split parts may be molded as a unit with an integral thin wall hinge. The bending characteristics and bending radius of a sheath can be modified by insertion of spacers between the links at selected locations, or by the insertion of pins into radial holes provided in the links. Spacers with tongues may be used to prevent rotation of the links about the sheath axis, while allowing unidirectional articulation. Projections on one of a pair of mating spherical surfaces can be engaged with holes, slots or recesses of rectangular or other shapes to produce various limits on articulation and rotation. A single link may be provided iwth several alternatively usable holes, recesses and the like. The outer surface of a link can be provided iwth an axial extension engageable with a surface of an adjoining link to prevent back bending, or to prevent bending altogether.
摘要:
A signal transmission circuit includes an input pad for receiving an input signal, a resistor connected at one end to the input pad, and a signal transmission line connected at the input end to the other end of the resistor, and at the output end to an internal circuit. The signal transmission circuit further includes an auxiliary line connected at the input end to the input pad, floating electrically at the output end, and extending substantially in parallel with the transmission line.
摘要:
Disclosed is an objective lens driving apparatus having a holder 9 holding an objective lens 1 and connected to a base 17 through at least four linear members 13, such that the holder 9 can be moved both in the focussing direction and in the tracking direction orthogonal to the focussing direction through the flexing of the linear members 13. Undesirable local resonance can be suppressed due to the use of the linear members 13 in support of the holder 9.
摘要:
In a D/A converter in a deflection system of an electron beam exposure device, the most significant bits (m bits) of input digital data consisting of n bits are input into a decoder circuit, and 2.sup.m D/A converters which correspond to the m bits are provided. The data consisting of the least significant bits (n-m bits) is input into the 2.sup.m D/A converters via 2.sup.m gates, respectively. The decoder circuit is constructed so as to control the 2.sup.m gates so that when the content of the data of the m bits is S, the first to S-th data of the 2.sup.m D/A converters is all rendered to be "1", the data of the (S+1)-th D/A converter remains the same as the data of the n-m bits, and the data of the (S+2)-th and subsequent D/A converters is all rendered to be "0", the sum of the outputs of the 2.sup.m D/A converters being applied to a coil which deflects the electron beam.
摘要翻译:在电子束曝光装置的偏转系统中的D / A转换器中,由n位组成的输入数字数据的最高有效位(m位)被输入到解码器电路中,对应于2m的D / A转换器 提供m位。 由最低有效位(n-m位)组成的数据分别通过2m个门输入到2m D / A转换器。 解码器电路被构造成控制2m个门,使得当m位的数据的内容为S时,2m D / A转换器的第一至第S数据全部变为“1” 第(S + 1)个D / A转换器的数据与nm位的数据保持相同,并且第(S + 2)和随后的D / A转换器的数据全部变为“ 0“,2m D / A转换器的输出之和被施加到偏转电子束的线圈上。
摘要:
An electron beam lithographic system which exposes a desired area of an electron beam resist so as to form a desired pattern to be used for manufacturing large scale integrated circuits. This electron beam lithographic system provides a first and a second slit plate, respectively providing a rectangular slit so as to form an electron beam having a rectangular cross section, and a deflection means which deflects the electron beam passing the first slit so as to vary the cross section of the electron beam which passes the second slit. Therefore, electron beams having various cross sections can be obtained, so that the electron beam resist is exposed by the beam having various cross sections and the desired pattern can be formed within a short time on a wafer.
摘要:
Stretching polyester tows at a speed greater than 150 m/min., wherein more than 85 mol percent of the recurring units are units of ethylene terephthalate, is carried out at a stretch ratio satisfying the formula-1.58log(.DELTA.n .times. 10.sup.3) + 4.18 .ltoreq. DR .ltoreq. -2.32log(.DELTA.n .times. 10.sup.3) + 5.93Wherein .DELTA. n represents the birefringence of the unstretched filaments and is a value of from 0.020 to 0.100, and DR is the stretch ratio in times.