REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY
    91.
    发明申请
    REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY 有权
    反射掩蔽空白用于EUV LITHOGRAPHY

    公开(公告)号:US20100304283A1

    公开(公告)日:2010-12-02

    申请号:US12855053

    申请日:2010-08-12

    IPC分类号: G03F1/00

    CPC分类号: G03F1/24 B82Y10/00 B82Y40/00

    摘要: A reflective mask blank for EUV lithography is provided which has an absorber layer wherein stress and crystal structure can be easily controlled.A reflective mask blank for EUV lithography, which comprises a substrate, and at least a reflective layer for reflecting EUV light and an absorber layer for absorbing EUV light formed in this order on the substrate, wherein the absorber layer contains tantalum (Ta), nitrogen (N) and hydrogen (H); and in the absorber layer, the total content of Ta and N is from 50 to 99.9 at %, and the content of H is from 0.1 to 50 at %.

    摘要翻译: 提供了用于EUV光刻的反射掩模板,其具有可以容易地控制应力和晶体结构的吸收层。 一种用于EUV光刻的反射掩模板,其包括衬底,以及用于反射EUV光的至少反射层和用于吸收在衬底上依次形成的EUV光的吸收层,其中吸收层包含钽(Ta),氮 (N)和氢(H); 在吸收层中,Ta和N的总含量为50〜99.9原子%,H的含量为0.1〜50原子%。

    Reflective mask blank for EUV lithography and substrate with a conductive film for the mask blank
    92.
    发明授权
    Reflective mask blank for EUV lithography and substrate with a conductive film for the mask blank 有权
    用于EUV光刻的反射掩模板和用于掩模板的导电膜的基板

    公开(公告)号:US07736821B2

    公开(公告)日:2010-06-15

    申请号:US11566883

    申请日:2006-12-05

    IPC分类号: G03F1/00

    摘要: To provide a substrate with a conductive film for an EUV mask blank having an increased surface hardness, and a substrate with a reflective multilayer film and an EUV mask blank using such a substrate with a conductive film.A substrate with a conductive film to be used for production of a reflective mask blank for EUV lithography, characterized in that the chief material of the conductive film is at least one member selected from the group consisting of Cr, Ti, Zr, Nb, Ni and V, and the conductive film contains B (boron) at an average concentration of from 1 to 70 at %.

    摘要翻译: 为了提供具有增加表面硬度的EUV掩模坯料用导电膜的基板,以及使用这种具有导电膜的基板的具有反射多层膜的基板和EUV掩模坯料。 一种具有用于生产用于EUV光刻的反射掩模板的导电膜的基板,其特征在于,导电膜的主要材料是选自Cr,Ti,Zr,Nb,Ni中的至少一种 和V,导电膜含有平均浓度为1-70原子%的B(硼)。

    Reflective mask blank for EUV lithography
    93.
    发明授权
    Reflective mask blank for EUV lithography 失效
    EUV光刻用反光罩

    公开(公告)号:US07713666B2

    公开(公告)日:2010-05-11

    申请号:US12027680

    申请日:2008-02-07

    IPC分类号: G03F1/00

    摘要: To provide a reflective mask blank for EUV lithography having an absorber layer which has a low reflectance in a wavelength region of EUV light or light for inspection of a pattern and which is easy to control to have a desired layer composition and thickness.A reflective mask blank for EUV lithography, which comprises a substrate, and a reflective layer to reflect EUV light and an absorber layer to absorb EUV light, formed in this order on the substrate, wherein the absorber layer contains tantalum (Ta) and hafnium (Hf), and in the absorber layer, the content of Hf is from 20 to 60 at. % and the content of Ta is from 40 to 80 at. %.

    摘要翻译: 为了提供EUV光刻用的反射掩模板,其具有在EUV光或光的波长区域具有低反射率的吸收层,用于检查图案,并且易于控制以具有期望的层组成和厚度。 用于EUV光刻的反射掩模板,其包括基板,以及反射层,用于反射EUV光和吸收层,以吸收在基板上依次形成的EUV光,其中吸收层包含钽(Ta)和铪( Hf),并且在吸收层中,Hf的含量为20〜60at。 %,Ta的含量为40〜80。 %。

    REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND SUBSTRATE WITH FUNCTIONAL FILM FOR THE SAME
    94.
    发明申请
    REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND SUBSTRATE WITH FUNCTIONAL FILM FOR THE SAME 有权
    用于EUV光刻的反射掩膜和具有相同功能膜的基板

    公开(公告)号:US20080318140A1

    公开(公告)日:2008-12-25

    申请号:US12198912

    申请日:2008-08-27

    IPC分类号: G03F1/00

    摘要: To provide an EUV mask blank of which the decrease in the reflectance during EUV exposure is suppressed, and a substrate with a functional film to be used for production of such an EUV mask blank.A substrate with a reflective layer for EUV lithography, comprising a substrate, and a reflective layer for reflecting EUV light and a protective layer for protecting the reflective layer formed in this order on the substrate, wherein the protective layer contains ruthenium (Ru) and at least one element selected from the group consisting of boron (B) and zirconium (Zr); and in the protective layer, the Ru content is from 70 at % to 95 at % and the total content of B and Zr is from 5 at % to 30 at %.

    摘要翻译: 提供抑制EUV曝光期间反射率降低的EUV掩模空白,以及用于制造这种EUV掩模空白的具有功能膜的基板。 具有用于EUV光刻的反射层的衬底,包括衬底和用于反射EUV光的反射层和用于保护在衬底上依次形成的反射层的保护层,其中保护层包含钌(Ru)并且在 选自硼(B)和锆(Zr)的至少一种元素; 并且在保护层中,Ru含量为70原子%至95原子%,B和Zr的总含量为5原子%至30原子%。

    Glass run and its attaching structure
    95.
    发明申请
    Glass run and its attaching structure 有权
    玻璃运行及其附件结构

    公开(公告)号:US20080172948A1

    公开(公告)日:2008-07-24

    申请号:US12003508

    申请日:2007-12-26

    IPC分类号: B60J10/04 E06B7/22

    CPC分类号: B60J10/76

    摘要: A glass run includes a main body portion including a base bottom portion, a vehicle exterior side wall portion and a vehicle interior side wall portion attached along an inner periphery of a door frame and seal lips extended to an inner side of the main body portion and an entire region in a longitudinal direction thereof is formed by extrusion. The base bottom portion and the vehicle exterior side wall portion and the base bottom portion and the vehicle interior side wall portion are respectively connected by deformed connecting portions. The deformed connecting portion is thin-walled more than the base bottom portion and the two side wall portions and constitutes substantially a J-like shape in a section thereof to provide a predetermined length in a width direction. At two corner portions of the glass run, the deformed connecting portions are deformed by being folded to bend at fold points, the base bottom portion is smoothly disposed on an inner peripheral side, and is continuously bent without providing a slit or a notch.

    摘要翻译: 玻璃行程包括主体部分,其包括基部底部,车辆外侧壁部分和沿着门框的内周安装的车辆内侧壁部分,以及延伸到主体部分的内侧的密封唇部;以及 通过挤压形成其长度方向的整个区域。 基底部分和车辆外侧壁部分以及基部底部部分和车辆内侧壁部分分别通过变形的连接部分连接。 变形的连接部分比基部底部部分和两个侧壁部分更薄,并且在其一部分中基本上形成为J形,以在宽度方向上提供预定长度。 在玻璃行程的两个角部,变形的连接部通过折叠弯折而变形,基部底部平滑地设置在内周侧,并且在不设置狭缝或凹口的情况下连续弯曲。

    Disc driving apparatus and information readout method
    96.
    发明申请
    Disc driving apparatus and information readout method 审中-公开
    盘驱动装置和信息读出方法

    公开(公告)号:US20070008838A1

    公开(公告)日:2007-01-11

    申请号:US11517261

    申请日:2006-09-08

    IPC分类号: G11B7/00

    摘要: A disc driving apparatus and an information readout method according to the present invention realize optimum servo control of a readout unit in reading out the information from a recording medium having lands and grooves. The disc driving apparatus includes a unit for correcting tracking error signals, a unit for inverting signals corrected by the correcting unit to generate inverted tracking error signals, a unit for detecting which of the lands and the grooves the readout unit is scanning, and a unit for selecting the tracking error signals or the inverted tracking error signals according to the results of detection by the detection unit to tracking-control the readout unit by the selected signals.

    摘要翻译: 根据本发明的盘驱动装置和信息读出方法在从具有槽脊和槽的记录介质读出信息的同时实现读出单元的最佳伺服控制。 盘驱动装置包括用于校正跟踪误差信号的单元,用于反转由校正单元校正的信号以产生反向跟踪误差信号的单元,用于检测读出单元正在扫描的区域和沟槽中的哪一个的单元,以及单元 用于根据检测单元的检测结果来选择跟踪误差信号或反向跟踪误差信号,以通过所选择的信号对读出单元进行跟踪控制。

    Method of and an apparatus for processing a lead frame
    98.
    发明授权
    Method of and an apparatus for processing a lead frame 失效
    用于处理引线框架的方法和装置

    公开(公告)号:US5372972A

    公开(公告)日:1994-12-13

    申请号:US44625

    申请日:1993-04-09

    摘要: Improved transportation accuracy of a lead frame and reduced transportation time is attained. On the both sides of a heat block (1), rails (3a) equipped with a vertical drive mechanism are provided. By rotation of a screw shaft (7), a lead frame (4) is moved from front side to rear side of the heat block (1) along guide rails (3b) and the movable rails (3a) while holding the lead frame (4) by a clamp (5c) which has freedom of horizontal and vertical movements. During this transportation, a sensor (8) detects the position of the lead frame (4). A frame presser member (2) is mounted above the heat block (1) and equipped with a vertical drive mechanism for pressing the lead frame (4) against the heat block (1). The lead frame (4) is fed to a predetermined point by one motion of the clamp (5c) while firmly held by the clamp (5c) without frictionally contacting the heat block (1).

    摘要翻译: 提高引线架的运输精度,减少运输时间。 在散热块(1)的两侧设有配有垂直驱动机构的导轨(3a)。 通过螺杆轴(7)的旋转,引线框架(4)沿着导轨(3b)和可动导轨(3a)沿着加热块(1)的前侧到后侧移动,同时保持引线框架 4)通过具有水平和垂直运动自由度的夹具(5c)。 在该运输过程中,传感器(8)检测引线框架(4)的位置。 框架按压构件(2)安装在加热块(1)的上方,并具有用于将引线框架(4)压靠在加热块(1)上的垂直驱动机构。 引导框架(4)通过夹具(5c)的一次运动被馈送到预定点,同时由夹具(5c)牢固地保持,而不摩擦地接触热块(1)。

    Packet switching equipment and a packet switching method for controlling
packet switched networks
    100.
    发明授权
    Packet switching equipment and a packet switching method for controlling packet switched networks 失效
    分组交换设备和用于控制分组交换网络的分组交换方法

    公开(公告)号:US4876681A

    公开(公告)日:1989-10-24

    申请号:US194044

    申请日:1988-05-13

    IPC分类号: H04L12/54

    CPC分类号: H04L12/56

    摘要: In order to enable an expansion of a packet switched network and a constitution change thereof to be readily achieved in a multistage switched network constitution, in a packet switched network including a packet data terminal, a packet switching equipment, a PBX, a multiplexer, an LAN, a voice communication apparatus such as a telephone set, and a facsimile or in a linkage between switching modules in a packet switching apparatus, the basic switching modules called configuration units connected to the network are interconnected to each other to form a hierarchic tree structure of which the number of hierarchic levels can be selected depending on a size of the packet switched network. Furthermore, in order to increase the reliability of the packet data transfer in the multi-stage switched network configuration, there are disposed a plurality of connecting lines between bit switches and upper-level configuration units so as to establish a redundant configuration.