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150 条记录 (耗时 0.049 秒)

    Inspection apparatus and method, lithographic apparatus, lithographic processing cell and device manufacturing method
    91.
    发明授权
    Inspection apparatus and method, lithographic apparatus, lithographic processing cell and device manufacturing method 有权
    检测装置和方法，光刻设备，光刻处理单元和器件制造方法

    公开(公告)号：US09223227B2

    公开(公告)日：2015-12-29

    申请号：US13361349

    申请日：2012-01-30

    申请人： Kaustuve Bhattacharyya ,  Arie Jeffrey Den Boef ,  Stefan Carolus Jacobus Antonius Keij ,  Peter Clement Paul Vanoppen

    发明人： Kaustuve Bhattacharyya ,  Arie Jeffrey Den Boef ,  Stefan Carolus Jacobus Antonius Keij ,  Peter Clement Paul Vanoppen

    IPC分类号： G03B27/54 ,  G03F7/20 ,  G01N21/956

    CPC分类号： G03F7/70625 ,  G01B2210/56 ,  G01N21/956 ,  G03F7/705 ,  G03F7/70633

    摘要： Asymmetry properties of a periodic target on a substrate, such as a grating on a wafer, are determined. An inspection apparatus has a broadband illumination source with illumination beams point mirrored in the pupil plane of a high numerical aperture objective lens. The substrate and target are illuminated via the objective lens from a first direction and a second direction mirror reflected with respect to the plane of the substrate. A quad wedge optical device separately redirects diffraction orders of radiation scattered from the substrate and separates diffraction orders from illumination along each of the first and second directions. For example the zeroth and first orders are separated for each incident direction. After capture in multimode fibers, spectrometers are used to measure the intensity of the separately redirected diffraction orders as a function of wavelength.

    摘要翻译： 确定基板（例如晶片上的光栅）上的周期性靶的不对称性质。 检查装置具有宽带照明源，其具有在高数值孔径物镜的光瞳平面中镜像的照明光束点。 从第一方向通过物镜照射衬底和靶，并且相对于衬底的平面反射的第二方向镜。 四楔形光学器件分别重新引导从衬底散射的辐射的衍射级，并沿着第一和第二方向沿着照射分离衍射级。 例如，为每个事件方向分离第零个和第一个命令。 在多模光纤捕获之后，使用光谱仪测量单独重定向的衍射级的强度作为波长的函数。

    Metrology method and apparatus, lithographic apparatus, and device manufacturing method
    92.
    发明授权
    Metrology method and apparatus, lithographic apparatus, and device manufacturing method 有权
    测量方法和设备，光刻设备和器件制造方法

    公开(公告)号：US09110385B2

    公开(公告)日：2015-08-18

    申请号：US12867415

    申请日：2009-02-23

    申请人： Arie Jeffrey Den Boef

    发明人： Arie Jeffrey Den Boef

    IPC分类号： G03B27/68 ,  G03F7/20

    CPC分类号： G01J3/18 ,  G01J3/28 ,  G03F7/70483 ,  G03F7/70625 ,  G03F7/70633

    摘要： A metrology apparatus includes first (21) and second (22) radiation sources which generate first (iB1) and second (iB2) illumination beams of different spatial extent and/or angular range. One of the illumination beams is selected, e.g. according to the size of target to be measured. The beam selection can be made by a tillable mirror (254) at a back-projected substrate plane in a Kohler illumination setup.

    摘要翻译： 测量装置包括产生不同空间范围和/或角度范围的第一（iB1）和第二（iB2）照明光束的第一（21）和第二（22）辐射源。 选择一个照明光束，例如。 根据要测量的目标的大小。 光束选择可以由Kohler照明设置中的背投影基板平面上的可压扁反射镜（254）制成。

    Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
    93.
    发明授权
    Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method 有权
    检测方法和装置，光刻设备，光刻处理单元和器件制造方法

    公开(公告)号：US08885150B2

    公开(公告)日：2014-11-11

    申请号：US12867416

    申请日：2009-02-18

    申请人： Henricus Petrus Maria Pellemans ,  Arie Jeffrey Den Boef

    发明人： Henricus Petrus Maria Pellemans ,  Arie Jeffrey Den Boef

    IPC分类号： G01C3/08 ,  G03F7/20

    CPC分类号： G01B11/24 ,  G03F7/70191 ,  G03F7/70633 ,  G03F7/7085

    摘要： A scatterometer, configured to measure a property of a substrate, includes a radiation source which produces a radiation spot on a target formed on the surface of the substrate, the size of the radiation spot being smaller than the target in one direction along the target, the position of the radiation spot being moved along the surface in a series of discrete steps. A detector detects a spectrum of the radiation beam reflected from the target and produces measurement signals representative of the spectrum corresponding to each position of the radiation spot. A processor processes the measurement signals produced by the detector corresponding to each position of the radiation spot and derives a single value for the property.

    摘要翻译： 被配置为测量衬底性质的散射仪包括辐射源，其在形成在衬底表面上的靶上产生辐射点，辐射点的尺寸小于目标沿目标的一个方向的尺寸， 辐射光斑在一系列离散步骤中沿着表面移动的位置。 检测器检测从目标反射的辐射束的光谱，并产生表示与辐射光斑的每个位置对应的光谱的测量信号。 处理器处理由检测器产生的与辐射点的每个位置相对应的测量信号，并为该属性导出单个值。

    Lithographic apparatus and device manufacturing method involving a level sensor having a detection grating including three or more segments
    96.
    发明授权
    Lithographic apparatus and device manufacturing method involving a level sensor having a detection grating including three or more segments 有权
    涉及具有包括三个或更多个段的检测光栅的液位传感器的平版印刷设备和设备制造方法

    公开(公告)号：US08351024B2

    公开(公告)日：2013-01-08

    申请号：US12722924

    申请日：2010-03-12

    申请人： Arie Jeffrey Den Boef

    发明人： Arie Jeffrey Den Boef

    IPC分类号： G03B27/58

    CPC分类号： G01B11/0608 ,  G03F9/7034

    摘要： A level sensor configured to determine a height level of a substrate is disclosed. The level sensor includes a projection unit to project a measurement beam having a substantially periodic radiation intensity on the substrate; a detection unit to receive the measurement beam after reflection on the substrate, the detection unit having a detection grating arranged to receive the reflected measurement beam, the detection grating comprising at least one array of three or more segments together having a length substantially equal to a length of a period of the measurement beam projected on the detection grating, and configured to split the reflected measurement beam in three or more reflected measurement beam parts, and three or more detectors each arranged to receive one of the three or more measurement beam parts; and a processing unit to calculate a height level on the basis of the measurement beam parts.

    摘要翻译： 公开了一种配置成确定基板的高度水平的液位传感器。 液位传感器包括：投影单元，用于将具有基本上周期性辐射强度的测量光束投射到基板上; 检测单元，用于在所述基板上反射之后接收所述测量光束，所述检测单元具有布置成接收所述反射的测量光束的检测光栅，所述检测光栅包括三个或更多个段的至少一个阵列，所述三个或更多个段的长度基本上等于 投影在检测光栅上的测量光束的周期的长度，并且被配置为将反射的测量光束分成三个或更多个反射的测量光束部分，以及三个或更多个检测器，每个检测器被布置成接收三个或更多个测量光束部分中的一个; 以及处理单元，其基于测量光束部分来计算高度水平。

    Overlay Measurement Apparatus, Lithographic Apparatus and Device Manufacturing Method Using Such Overlay Measurement Apparatus
    100.
    发明申请
    Overlay Measurement Apparatus, Lithographic Apparatus and Device Manufacturing Method Using Such Overlay Measurement Apparatus 有权
    覆盖测量装置，平版印刷装置和使用这种覆盖测量装置的装置制造方法

    公开(公告)号：US20110188020A1

    公开(公告)日：2011-08-04

    申请号：US13000229

    申请日：2009-05-14

    申请人： Arie Jeffrey Den Boef

    发明人： Arie Jeffrey Den Boef

    IPC分类号： G03B27/72 ,  G01J4/00

    CPC分类号： G03F7/70633

    摘要： An overlay measurement apparatus has a polarized light source for illuminating a sample with a polarized light beam and an optical system to capture light that is scattered by the sample. The optical system includes a polarizer for transmitting an orthogonal polarization component that is orthogonal to a polarization direction of the polarized light beam. A detector measures intensity of the orthogonal polarization component. A processing unitise connected to the detector, and is arranged to process the orthogonal polarization component for overlay metrology measurement using asymmetry data derived from the orthogonal polarization component.

    摘要翻译： 覆盖测量装置具有用于利用偏振光束照射样本的偏振光源和用于捕获被样品散射的光的光学系统。 光学系统包括偏振器，用于透射与偏振光束的偏振方向正交的正交偏振分量。 检测器测量正交偏振分量的强度。 一种与检测器连接的处理单元，并且被布置为使用从正交偏振分量导出的不对称数据来处理用于覆盖测量测量的正交偏振分量。