MAGNETIC RESONANCE IMAGING APPARATUS AND MULTI-ECHO MULTI-CONTRAST IMAGING METHOD
    91.
    发明申请
    MAGNETIC RESONANCE IMAGING APPARATUS AND MULTI-ECHO MULTI-CONTRAST IMAGING METHOD 有权
    磁共振成像装置和多重多重对比成像方法

    公开(公告)号:US20130147483A1

    公开(公告)日:2013-06-13

    申请号:US13818748

    申请日:2011-08-18

    IPC分类号: G01R33/44 G01R33/34

    摘要: In multi-echo multi-contrast imaging, the image quality is improved by suppressing an increase in imaging time. In order to do so, the arrangement order of echo signals that form an echo train and k space filled with each echo signal are determined such that the continuity of the echo arrangement is maintained while sharing an echo signal between contrasts in multi-echo multi-contrast imaging. Echo trains that perform echo sharing are arranged in non-oscillatory centric view ordering (NOCO). In addition, the starting point of echo sharing of one echo train is connected to the same position of another echo train. When some discontinuous regions are present, the discontinuous regions may be corrected using continuous data of regions symmetrical thereto on the k space.

    摘要翻译: 在多回波多对比度成像中,通过抑制成像时间的增加来提高图像质量。 为了做到这一点,确定形成回波列的回波信号的排列顺序和填充有每个回波信号的k空间,使得保持回波装置的连续性,同时在多回波多路复用中共享回波信号, 对比成像。 执行回波共享的回波列车以非振荡中心视图排序(NOCO)排列。 另外,一个回波列的回波共享的起始点连接到另一个回波列的相同位置。 当存在一些不连续区域时,可以使用在k空间对称的区域的连续数据来校正不连续区域。

    Charged particle beam writing method
    92.
    再颁专利
    Charged particle beam writing method 有权
    带电粒子束写入方式

    公开(公告)号:USRE44179E1

    公开(公告)日:2013-04-30

    申请号:US13553354

    申请日:2012-07-19

    IPC分类号: G21K1/00 G21K5/10 H01J37/21

    摘要: A writing method includes emitting a first charged particle beam formed to be a first shape by passing through a first shaping aperture and a second shaping aperture, onto a target workpiece; and emitting a second charged particle beam formed to be a second shape by passing through the first shaping aperture and the second shaping aperture, wherein the second charged particle beam is superimposed onto a same position exposed by the first charged particle beam and is formed by using an opposite sides of respective first and second shaping apertures to those used for the first shape.

    摘要翻译: 写入方法包括通过将第一成形孔和第二成形孔通过到目标工件上来发射形成为第一形状的第一带电粒子束; 并且通过穿过所述第一成形孔和所述第二成形孔而发射形成为第二形状的第二带电粒子束,其中所述第二带电粒子束叠加在由所述第一带电粒子束暴露的相同位置上,并且通过使用 相应的第一和第二成形孔的相对侧与用于第一形状的那些相对。

    SWITCH
    93.
    发明申请
    SWITCH 有权
    开关

    公开(公告)号:US20120152714A1

    公开(公告)日:2012-06-21

    申请号:US13256948

    申请日:2011-03-23

    IPC分类号: H01H5/08

    摘要: A switch includes a movable contact piece having one end as a supporting point of turn and the other end arranged with a movable contact, a turning member having the other end as a supporting point of turn, a coil spring having one end locked to one end of the turning member and the other end locked to an intermediate portion of the movable contact piece, and a push button supported and slidable in an up and down direction. The movable contact piece is inverted by pushing down the one end of the turning member with the push button so as to make the movable contact approach and separate from a fixed contact. The turning member includes a position regulating portion that is brought into contact with the coil spring and brings the movable contact into contact with the fixed contact while maintaining a contact state with the coil spring.

    摘要翻译: 开关包括一端作为支撑点的可动接触片,另一端配置有可动触点,另一端作为支撑点转动的转动构件,一端锁定在一端的螺旋弹簧 并且另一端锁定到可动接触片的中间部分,以及按钮,其在上下方向上被支撑和滑动。 通过用按钮向下推动转动构件的一端来使可动接触件反转,以使可动接点接近并与固定接触件分离。 转动构件包括与螺旋弹簧接触的位置限制部,并且使活动触点与固定触点接触,同时保持与螺旋弹簧的接触状态。

    Charged particle beam writing apparatus and method thereof
    94.
    发明授权
    Charged particle beam writing apparatus and method thereof 有权
    带电粒子束写入装置及其方法

    公开(公告)号:US08080809B2

    公开(公告)日:2011-12-20

    申请号:US12168361

    申请日:2008-07-07

    申请人: Takayuki Abe

    发明人: Takayuki Abe

    IPC分类号: H01J3/14

    摘要: A charged particle beam writing apparatus includes a unit emitting a charged particle beam, a stage on which a target workpiece to be written is placed, a unit correcting a reference position of a small region in a writing region, based on a pattern distortion obtained from positions of figures spread over substantially all writing region of a dummy target workpiece and written without correcting, a first deflector deflecting the beam, based on a corrected reference position obtained by correcting the reference position, a correction unit correcting a relative distance from the corrected reference position to an arbitrary position in the small region, based on a pattern distortion of the dummy, by using the reference position and a coefficient of a correction equation for correcting the reference position, and a second deflector further deflecting the beam from a position deflected by the first deflector, based on the relative distance corrected.

    摘要翻译: 带电粒子束写入装置包括发射带电粒子束的单元,放置待写入的目标工件的台,基于从写入区域中获得的图案失真校正小区域的基准位置的单元 图形的位置分布在虚拟目标工件的基本上所有的写入区域上,并且在不进行校正的情况下被写入,基于通过校正参考位置而获得的校正参考位置偏转光束的第一偏转器,修正单元,校正校正参考 通过使用参考位置和用于校正参考位置的校正方程的系数,基于虚拟的图案失真,将位置移动到小区域中的任意位置,以及第二偏转器,进一步使光束从偏转的位置偏转 第一偏转器,基于相对距离校正。

    Magnetic resonance imaging apparatus and method
    95.
    发明授权
    Magnetic resonance imaging apparatus and method 有权
    磁共振成像装置及方法

    公开(公告)号:US07944209B2

    公开(公告)日:2011-05-17

    申请号:US12295160

    申请日:2007-03-12

    IPC分类号: G01V3/00

    摘要: A magnetic resonance imaging apparatus is configured to generate a correcting magnetic field for correcting a static magnetic field, based on a first set of information representing an inhomogeneous distribution of the static magnetic field generated depending on the characteristic of the static magnetic field generating means, a second set of information representing an inhomogeneous distribution of the static magnetic field generated depending on the tissue of the object, a third set of information corresponding to a set field of view for imaging in a desired region of the object.

    摘要翻译: 磁共振成像装置被配置为基于表示根据静磁场产生装置的特性产生的静磁场的不均匀分布的第一组信息来产生用于校正静磁场的校正磁场, 第二组信息,其表示根据对象的组织产生的静态磁场的不均匀分布;第三组信息对应于用于在对象的期望区域成像的设定视野。

    Pattern inspection apparatus and pattern inspection method
    96.
    发明授权
    Pattern inspection apparatus and pattern inspection method 有权
    图案检验装置和图案检验方法

    公开(公告)号:US07872745B2

    公开(公告)日:2011-01-18

    申请号:US12186874

    申请日:2008-08-06

    IPC分类号: G01N21/00

    CPC分类号: G01N21/95607

    摘要: A pattern inspection apparatus includes a light source configured to emit a pulsed light, a stage on which an inspection target workpiece is placed, a sensor, including a plurality of light receiving elements two-dimensionally arrayed, configured to capture a pattern image in a two-dimensional region of the inspection target workpiece which is irradiated with the pulsed light, by using the plurality of light receiving elements, and a comparing unit configured to compare data of the pattern image with predetermined reference pattern image data, wherein the stage moves to be shifted by a number of pixels, being the number of natural number times one pixel, between pulses of the pulsed light.

    摘要翻译: 图案检查装置包括被配置为发射脉冲光的光源,放置有检查对象工件的台,包括多个二维排列的光接收元件的传感器,被配置为以二维方式捕获图案图像 通过使用多个光接收元件,用脉冲光照射的检查对象工件的三维区域,以及比较单元,被配置为将图案图像的数据与预定的参考图案图像数据进行比较,其中,该台移动为 在脉冲光的脉冲之间移动多个像素,即自然数乘以1个像素的数量。

    Charged particle beam writing apparatus and method
    97.
    发明授权
    Charged particle beam writing apparatus and method 有权
    带电粒子束写入装置及方法

    公开(公告)号:US07705321B2

    公开(公告)日:2010-04-27

    申请号:US12129048

    申请日:2008-05-29

    申请人: Takayuki Abe

    发明人: Takayuki Abe

    IPC分类号: H01J37/21 G21K1/00 G21K5/04

    摘要: A charged particle beam writing apparatus includes a stage on which a target object is placed and which moves in a predetermined direction, a first column configured to irradiate a first charged particle beam on a writing region of the target object, a second column which is located at the back of the first column in the predetermined direction and configured to irradiate a second charged particle beam on the writing region of the target object, and a sensor configured to measure a height level of the target object at any one of a position in front of a position where the first column irradiates the first charged particle beam in the predetermined direction and a position almost immediately under the position where the first charged particle beam is irradiated.

    摘要翻译: 带电粒子束写入装置包括:放置目标物体并沿预定方向移动的载物台;第一列,被配置为在目标物体的写入区域上照射第一带电粒子束;第二列,位于 在预定方向的第一列的背面,并配置成将第二带电粒子束照射在目标物体的写入区域上;以及传感器,被配置为在前面的位置的任一位置测量目标物体的高度水平 第一列在预定方向上照射第一带电粒子束的位置和几乎在第一带电粒子束照射的位置下方的位置。

    APPARATUS AND METHOD FOR PATTERN INSPECTION
    98.
    发明申请
    APPARATUS AND METHOD FOR PATTERN INSPECTION 有权
    装置和方法进行模式检查

    公开(公告)号:US20100060890A1

    公开(公告)日:2010-03-11

    申请号:US12552108

    申请日:2009-09-01

    IPC分类号: G01N21/88

    CPC分类号: G01N21/956 G01N2021/95676

    摘要: A pattern inspection apparatus includes a pulsed light source configured to emit pulsed light; a stage configured to mount thereon an inspection target object with a pattern formed thereon; a time delay integration (TDI) sensor configured to detect, a plurality of times with a time delay, each pixel value of an optical image of the inspection target object, wherein the optical image is acquired by emitting the pulsed light onto the inspection target object, and to integrate a detected each pixel value for each pixel of the optical image; a light quantity sensor configured to detect a light quantity of the pulsed light after emitting the pulsed light onto the inspection target object; a light quantity measurement circuit configured to input the light quantity detected by the light quantity sensor, and to measure a light quantity of each pulse while being synchronized with a period of the pulsed light; a correction unit configured to input the light quantity of each pulse and an integrated pixel value output from the TDI sensor, and to correct the integrated pixel value output from the TDI sensor, for each pixel of the optical image, using a total light quantity of the light quantity of corresponding each pulse; and an inspection unit configured to inspect whether there is a defect of the pattern, using the integrated pixel value corrected.

    摘要翻译: 图案检查装置包括被配置为发射脉冲光的脉冲光源; 被配置为在其上安装有形成在其上的图案的检查对象物体的台; 时间延迟积分(TDI)传感器,其被配置为以时间延迟多次检测所述检查对象物体的光学图像的每个像素值,其中通过将所述脉冲光发射到所述检查对象物体上而获取所述光学图像 并且对于所述光学图像的每个像素集成检测到的每个像素值; 光量传感器,被配置为在将所述脉冲光发射到所述检查对象物体上之后检测所述脉冲光的光量; 光量测量电路,被配置为输入由光量传感器检测的光量,并且与脉冲光的周期同步地测量每个脉冲的光量; 校正单元,被配置为输入每个脉冲的光量和从TDI传感器输出的积分像素值,并且对于光学图像的每个像素,校正从TDI传感器输出的积分像素值,使用总光量 相应的每个脉冲的光量; 以及检查单元,被配置为使用校正的积分像素值来检查是否存在图案的缺陷。

    Charged particle beam writing method and apparatus and readable storage medium
    99.
    发明授权
    Charged particle beam writing method and apparatus and readable storage medium 有权
    带电粒子束写入方法和装置以及可读存储介质

    公开(公告)号:US07619230B2

    公开(公告)日:2009-11-17

    申请号:US11535725

    申请日:2006-09-27

    IPC分类号: G21K5/10 H01J37/00

    摘要: A charged particle beam writing method includes inputting pattern data for writing a writing region, predicting a writing time for writing the pattern of the pattern data, acquiring, by using a correlation among a time required from a writing start time, the predicted writing time and a base dose of a charged particle beam, a base dose of the charged particle beam after an optional time from a writing start in the case in which the pattern are written, acquiring, by using a correlation among the time required from the writing start time, the predicted writing time and a proximity effect correction coefficient, a proximity effect correction coefficient after an optional time from the writing start in the case in which the pattern are written, calculating, by using the base dose and the proximity effect correction coefficient after the optional time, an exposure dose of the charged particle beam after an optional time from a writing start in the writing time, and writing an optional position in the writing region by using the charged particle beam corresponding to the dose.

    摘要翻译: 带电粒子束写入方法包括输入用于写入写入区域的图形数据,预测用于写入图案数据的图案的写入时间,通过使用从写入开始时间所需的时间,预测写入时间和 带电粒子束的基本剂量,在写入图案的情况下从写入开始的任意时间之后的带电粒子束的基本剂量,通过使用写入开始时间所需的时间之间的相关性来获取 ,预测写入时间和接近效应校正系数,在写入图案的情况下从写入开始的可选时间之后的邻近效应校正系数,通过使用基本剂量和后面的邻近效应校正系数 可选时间,在写入时间从写入开始的可选时间之后的带电粒子束的曝光剂量,以及写入可选的posi 通过使用与剂量对应的带电粒子束,在写入区域中进行。

    Non-leaking non-dripping liquid jet pump
    100.
    发明授权
    Non-leaking non-dripping liquid jet pump 失效
    不漏液滴喷液泵

    公开(公告)号:US07472809B2

    公开(公告)日:2009-01-06

    申请号:US11093224

    申请日:2005-03-30

    IPC分类号: B65D88/54

    摘要: A liquid jetting pump of the present invention is constructed such that an intra container liquid is sucked into a cylinder 3 through a suction valve 9 by moving a vertically movable member 4 up and down, and the intra cylinder liquid is jetted out of a nozzle 29 through a discharge valve 31 from a stem 28. A plurality of ribs 10 are protruded in a peripheral direction from a lower edge part within the cylinder. Engagement recessed portions 11 are formed in inner parts of the upper surfaces of the ribs. A lower edge of a coil spring 39 for biasing the vertically movable member 4 is secured to each of the engagement recessed portions 11, thereby permitting a flow of liquid on both sides of the lower edge of the spring internally externally.

    摘要翻译: 本发明的液体喷射泵是通过使可垂直移动的构件4上下移动而将内部容器液体通过吸入阀9吸入气缸3的方式构成的,并且将气缸内液体从喷嘴29喷出 通过来自杆28的排出阀31.多个肋10沿圆周方向从圆筒内的下边缘部突出。 接合凹部11形成在肋的上表面的内部。 用于使可垂直运动的构件4偏置的螺旋弹簧39的下边缘固定到每个接合凹部11,从而允许在内部的外部在弹簧的下边缘两侧的液体流动。