摘要:
In multi-echo multi-contrast imaging, the image quality is improved by suppressing an increase in imaging time. In order to do so, the arrangement order of echo signals that form an echo train and k space filled with each echo signal are determined such that the continuity of the echo arrangement is maintained while sharing an echo signal between contrasts in multi-echo multi-contrast imaging. Echo trains that perform echo sharing are arranged in non-oscillatory centric view ordering (NOCO). In addition, the starting point of echo sharing of one echo train is connected to the same position of another echo train. When some discontinuous regions are present, the discontinuous regions may be corrected using continuous data of regions symmetrical thereto on the k space.
摘要:
A writing method includes emitting a first charged particle beam formed to be a first shape by passing through a first shaping aperture and a second shaping aperture, onto a target workpiece; and emitting a second charged particle beam formed to be a second shape by passing through the first shaping aperture and the second shaping aperture, wherein the second charged particle beam is superimposed onto a same position exposed by the first charged particle beam and is formed by using an opposite sides of respective first and second shaping apertures to those used for the first shape.
摘要:
A switch includes a movable contact piece having one end as a supporting point of turn and the other end arranged with a movable contact, a turning member having the other end as a supporting point of turn, a coil spring having one end locked to one end of the turning member and the other end locked to an intermediate portion of the movable contact piece, and a push button supported and slidable in an up and down direction. The movable contact piece is inverted by pushing down the one end of the turning member with the push button so as to make the movable contact approach and separate from a fixed contact. The turning member includes a position regulating portion that is brought into contact with the coil spring and brings the movable contact into contact with the fixed contact while maintaining a contact state with the coil spring.
摘要:
A charged particle beam writing apparatus includes a unit emitting a charged particle beam, a stage on which a target workpiece to be written is placed, a unit correcting a reference position of a small region in a writing region, based on a pattern distortion obtained from positions of figures spread over substantially all writing region of a dummy target workpiece and written without correcting, a first deflector deflecting the beam, based on a corrected reference position obtained by correcting the reference position, a correction unit correcting a relative distance from the corrected reference position to an arbitrary position in the small region, based on a pattern distortion of the dummy, by using the reference position and a coefficient of a correction equation for correcting the reference position, and a second deflector further deflecting the beam from a position deflected by the first deflector, based on the relative distance corrected.
摘要:
A magnetic resonance imaging apparatus is configured to generate a correcting magnetic field for correcting a static magnetic field, based on a first set of information representing an inhomogeneous distribution of the static magnetic field generated depending on the characteristic of the static magnetic field generating means, a second set of information representing an inhomogeneous distribution of the static magnetic field generated depending on the tissue of the object, a third set of information corresponding to a set field of view for imaging in a desired region of the object.
摘要:
A pattern inspection apparatus includes a light source configured to emit a pulsed light, a stage on which an inspection target workpiece is placed, a sensor, including a plurality of light receiving elements two-dimensionally arrayed, configured to capture a pattern image in a two-dimensional region of the inspection target workpiece which is irradiated with the pulsed light, by using the plurality of light receiving elements, and a comparing unit configured to compare data of the pattern image with predetermined reference pattern image data, wherein the stage moves to be shifted by a number of pixels, being the number of natural number times one pixel, between pulses of the pulsed light.
摘要:
A charged particle beam writing apparatus includes a stage on which a target object is placed and which moves in a predetermined direction, a first column configured to irradiate a first charged particle beam on a writing region of the target object, a second column which is located at the back of the first column in the predetermined direction and configured to irradiate a second charged particle beam on the writing region of the target object, and a sensor configured to measure a height level of the target object at any one of a position in front of a position where the first column irradiates the first charged particle beam in the predetermined direction and a position almost immediately under the position where the first charged particle beam is irradiated.
摘要:
A pattern inspection apparatus includes a pulsed light source configured to emit pulsed light; a stage configured to mount thereon an inspection target object with a pattern formed thereon; a time delay integration (TDI) sensor configured to detect, a plurality of times with a time delay, each pixel value of an optical image of the inspection target object, wherein the optical image is acquired by emitting the pulsed light onto the inspection target object, and to integrate a detected each pixel value for each pixel of the optical image; a light quantity sensor configured to detect a light quantity of the pulsed light after emitting the pulsed light onto the inspection target object; a light quantity measurement circuit configured to input the light quantity detected by the light quantity sensor, and to measure a light quantity of each pulse while being synchronized with a period of the pulsed light; a correction unit configured to input the light quantity of each pulse and an integrated pixel value output from the TDI sensor, and to correct the integrated pixel value output from the TDI sensor, for each pixel of the optical image, using a total light quantity of the light quantity of corresponding each pulse; and an inspection unit configured to inspect whether there is a defect of the pattern, using the integrated pixel value corrected.
摘要:
A charged particle beam writing method includes inputting pattern data for writing a writing region, predicting a writing time for writing the pattern of the pattern data, acquiring, by using a correlation among a time required from a writing start time, the predicted writing time and a base dose of a charged particle beam, a base dose of the charged particle beam after an optional time from a writing start in the case in which the pattern are written, acquiring, by using a correlation among the time required from the writing start time, the predicted writing time and a proximity effect correction coefficient, a proximity effect correction coefficient after an optional time from the writing start in the case in which the pattern are written, calculating, by using the base dose and the proximity effect correction coefficient after the optional time, an exposure dose of the charged particle beam after an optional time from a writing start in the writing time, and writing an optional position in the writing region by using the charged particle beam corresponding to the dose.
摘要:
A liquid jetting pump of the present invention is constructed such that an intra container liquid is sucked into a cylinder 3 through a suction valve 9 by moving a vertically movable member 4 up and down, and the intra cylinder liquid is jetted out of a nozzle 29 through a discharge valve 31 from a stem 28. A plurality of ribs 10 are protruded in a peripheral direction from a lower edge part within the cylinder. Engagement recessed portions 11 are formed in inner parts of the upper surfaces of the ribs. A lower edge of a coil spring 39 for biasing the vertically movable member 4 is secured to each of the engagement recessed portions 11, thereby permitting a flow of liquid on both sides of the lower edge of the spring internally externally.