公开(公告)号：US20120140060A1

公开(公告)日：2012-06-07

申请号：US13307389

申请日：2011-11-30

申请人： Hideo TSUCHIYA ,  Takafumi Inoue ,  Nobutaka Kikuiri

发明人： Hideo TSUCHIYA ,  Takafumi Inoue ,  Nobutaka Kikuiri

IPC分类号： H04N7/18

CPC分类号： G01N21/95607 ,  G01N21/8851 ,  G01N2021/95615 ,  G01N2021/95676

摘要： An inspection apparatus and method, which can perform defect determination and estimate a defect on a mask and the resultant influence on a wafer. Each of the transfer images is reviewed in order of following (1) to (3): (1) when the degree of defect identified in the first comparing unit is at or exceeding a third threshold and an error ratio corresponding to the defect is at or exceeding a fourth threshold; (2) when the degree of a defect identified in the first comparing unit is less than the third threshold, and an error ratio corresponding to the defect is at or exceeding a fourth threshold; and (3) when the degree of a defect identified in the first comparing unit is at or exceeding a third threshold, and an error ratio corresponding to the defect is less than the fourth threshold.

摘要翻译： 一种检查装置和方法，其可以执行缺陷确定并估计掩模上的缺陷以及对晶片的所得影响。 以下（1）〜（3）的顺序对每个传送图像进行检查：（1）当在第一比较单元中识别的缺陷程度在或超过第三阈值时，并且与缺陷相对应的误差率在 或超过第四阈值; （2）当在第一比较单元中识别的缺陷程度小于第三阈值时，并且与该缺陷相对应的误差率在或超过第四阈值; 以及（3）当第一比较单元中识别的缺陷程度在或超过第三阈值时，并且与缺陷相对应的误差率小于第四阈值。

公开(公告)号：US20090129664A1

公开(公告)日：2009-05-21

申请号：US12274034

申请日：2008-11-19

申请人： Hideo Tsuchiya ,  Takayuki Abe

发明人： Hideo Tsuchiya ,  Takayuki Abe

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G06T2207/30148

摘要： A pattern inspection apparatus includes a stage configured to mount thereon a target workpiece to be inspected where patterns are formed, at least one sensor configured to move relatively to the stage and capture optical images of the target workpiece to be inspected, a first comparing unit configured to compare first pixel data of an optical image captured by one of the at least one sensor with first reference data at a position corresponding to a position of the first pixel data, and a second comparing unit configured to compare second pixel data of an optical image captured by one of the at least one sensor at a position shifted by a sub-pixel unit from the position where the optical image of the first pixel data is captured, with second reference data at a position corresponding to the position of the second pixel data.

摘要翻译： 图案检查装置包括：被配置为在其上安装待检查的目标工件的台阶，其中形成图案;至少一个传感器，被配置为相对于所述台移动并捕获待检查的目标工件的光学图像;第一比较单元， 将由所述至少一个传感器中的一个传感器捕获的光学图像的第一像素数据与对应于所述第一像素数据的位置的位置处的第一参考数据进行比较;以及第二比较单元，被配置为比较光学图像的第二像素数据 在与从第一像素数据的光学图像被捕获的位置移位的位置处的至少一个传感器中的一个被捕获的第二参考数据在与第二像素数据的位置相对应的位置处 。

公开(公告)号：US20070127806A1

公开(公告)日：2007-06-07

申请号：US11674025

申请日：2007-02-12

申请人： Hideo Tsuchiya ,  Kyoji Yamashita ,  Toshiuki Watanabe ,  Ikunao Isomura ,  Toru Tojo ,  Yasushi Sanada

发明人： Hideo Tsuchiya ,  Kyoji Yamashita ,  Toshiuki Watanabe ,  Ikunao Isomura ,  Toru Tojo ,  Yasushi Sanada

IPC分类号： G06K9/00

CPC分类号： G06T7/0004 ,  G06T2207/30148

摘要： A pattern inspection apparatus uses a die-to-database comparison method which compares detected pattern data obtained from an optical image of a pattern of a plate to be inspected with first reference pattern data obtained from designed pattern data in combination with a die-to-die comparison method which compares the detected pattern data with second reference pattern data obtained by detecting an area to be a basis for repetition. A computer detects presence of a plurality of repeated pattern areas from layout information contained in the designed pattern data, reads the arrangement, the number, the dimension and the repeated pitch of the repeated pattern areas, and automatically fetches an inspection area of the die-to-die comparison method.

摘要翻译： 图案检查装置使用芯片对数据库比较方法，将从被检查板的图案的光学图像获得的检测图案数据与从设计图案数据获得的第一参考图案数据结合， 芯片比较方法，其将检测到的图案数据与通过检测作为重复基础的区域获得的第二参考图案数据进行比较。 计算机从包含在设计图案数据中的布局信息中检测多个重复图案区域的存在，读取重复图案区域的布置，数量，尺寸和重复间距，并且自动取出模具数据的检查区域， 对比方法。

公开(公告)号：US07068364B2

公开(公告)日：2006-06-27

申请号：US10627702

申请日：2003-07-28

申请人： Shinji Sugihara ,  Mitsuo Tabata ,  Hideo Tsuchiya ,  Yasushi Sanada

发明人： Shinji Sugihara ,  Mitsuo Tabata ,  Hideo Tsuchiya ,  Yasushi Sanada

IPC分类号： G01N21/88

CPC分类号： G01N21/95607

摘要： A pattern inspection apparatus includes a light source irradiating a plate having a pattern, a photoelectric device photoelectrically converting the image of the pattern, a generator generating detected pattern data based on a photoelectrically converted signal, a generator generating reference pattern data from designed data, a comparator comparing the detected pattern data with the reference pattern data, a sensor detecting a light intensity of the light source, a barometric pressure sensor detecting a barometric pressure in the apparatus, a detector detecting at least one of the light intensity and barometric pressure deviating from predetermined ranges, a memory storing the detected and reference pattern data at a point of time when the abnormal status is generated in synchronization with position data and detected values of the light intensity and barometric pressure and an output device which outputs these.

摘要翻译： 图案检查装置包括照射具有图案的板的光源，对图案的图像进行光电转换的光电装置，基于光电转换信号产生检测图案数据的发生器，从设计数据生成参考图案数据的发生器， 将检测到的图案数据与参考图案数据进行比较，检测光源的光强度的传感器，检测设备中的气压的大气压传感器，检测到偏离的光强度和大气压力中的至少一个 预定范围，在与位置数据同步生成异常状态的时间点和检测到的光强度和大气压值的同时存储检测到的参考图形数据的存储器和输出这些数据的输出装置。

公开(公告)号：US5379348A

公开(公告)日：1995-01-03

申请号：US40852

申请日：1993-03-31

申请人： Toshiyuki Watanabe ,  Hideo Tsuchiya ,  Toru Tojo ,  Tomohide Watanabe

发明人： Toshiyuki Watanabe ,  Hideo Tsuchiya ,  Toru Tojo ,  Tomohide Watanabe

IPC分类号： G01B11/24 ,  G01N21/88 ,  G01N21/93 ,  G01N21/956 ,  G03F1/26 ,  G03F1/29 ,  G03F1/30 ,  G03F1/32 ,  G03F1/34 ,  G03F1/84 ,  G06T7/00 ,  H01L21/027 ,  H01L21/66 ,  G06K9/00 ,  G01N21/00 ,  H04N7/00

CPC分类号： G06T7/001 ,  G01N21/956 ,  G06T2207/10056 ,  G06T2207/30148 ,  H01L22/12 ,  H01L2924/0002

摘要： A pattern defects inspection system inspects the presence/absence of pattern defects in a photomask as an object to be inspected in which a chromium pattern and a phase shift pattern are formed together. Measurement data output from a sensor circuit for generating measurement pattern data by inspecting measurement patterns corresponding to two types of patterns formed on the object by radiating light on the object, and two identifiable design data stored in a magnetic disk unit in advance, i.e., chromium pattern design data used to form a chromium pattern and phase shift pattern design data used to form a phase shift pattern, are read out by a bit pattern generator for performing development processing. The two types of bit data obtained by the bit pattern generator are synthesized according to the same coordinate definition. The synthesized design data is compared with the measurement data by a comparator. As a result, the presence/absence of pattern defects in the object can be determined.

摘要翻译： 图案缺陷检查系统检查作为要检查的对象的光掩模中是否存在图案缺陷，其中形成铬图案和相移图案。 从传感器电路输出的测量数据，用于通过在物体上照射光来检查与形成在物体上的两种图案相对应的测量图案，以及预先存储在磁盘单元中的两个可识别的设计数据来产生测量图案数据，即铬 用于形成铬图案的图案设计数据和用于形成相移图案的相移图案设计数据由用于进行显影处理的位图发生器读出。 根据相同的坐标定义来合成由位图生成器获得的两种位数据。 将合成的设计数据与比较器的测量数据进行比较。 结果，可以确定对象中的图案缺陷的存在/不存在。

公开(公告)号：US09031313B2

公开(公告)日：2015-05-12

申请号：US12781232

申请日：2010-05-17

申请人： Hideo Tsuchiya ,  Fumio Ozaki

发明人： Hideo Tsuchiya ,  Fumio Ozaki

IPC分类号： G03F1/84 ,  G06T7/00 ,  G01N21/956

CPC分类号： G03F1/84 ,  G01N21/95607 ,  G01N2021/95676 ,  G06T7/001 ,  G06T2207/30148

摘要： The entire surface of a photomask 101 is inspected after data and parameters of the lithography simulator are set in the operation setting screen of a control computer 110 and after the inspection system 100 is calibrated. The coordinates of a portion or portions determined in the inspection to be a defect are written into an XML file. When the inspection system 100 is in the die-to-database inspection mode, the control computer 110 reads pattern data from the database, which data is used by the inspection system 100 to generate reference data, and then converts the read pattern data into OASIS format, which is highly versatile. The optical image captured by the inspection system 100 is converted into a bitmap. These data are sent to the lithography simulator, together with simulation operating conditions and the image data that was used to calibrate the inspection system 100.

摘要翻译： 在光刻模拟器的数据和参数设置在控制计算机110的操作设置画面中并且在校准了检查系统100之后，检查光掩模101的整个表面。 将检查中确定为缺陷的部分或部分的坐标写入XML文件。 当检查系统100处于管芯到数据库检查模式时，控制计算机110从数据库读取图案数据，检查系统100使用哪个数据来生成参考数据，然后将读取的图案数据转换成OASIS 格式，高度通用。 由检查系统100拍摄的光学图像被转换成位图。 这些数据连同模拟操作条件和用于校准检查系统100的图像数据一起发送到光刻模拟器。

公开(公告)号：US08903158B2

公开(公告)日：2014-12-02

申请号：US12856901

申请日：2010-08-16

申请人： Hideo Tsuchiya ,  Takafumi Inoue

发明人： Hideo Tsuchiya ,  Takafumi Inoue

IPC分类号： G06K9/00 ,  G03F1/84 ,  G01N21/88 ,  G01N21/956

CPC分类号： G01N21/95607 ,  G01N21/8851 ,  G01N2021/95676 ,  G03F1/84 ,  G06T2207/30148

摘要： An inspection system determines, for each detected pattern defect, a defect inspection pattern area of predetermined dimensions containing the coordinates of the defect, then determines the clusters or cells whose reference points are located within the defect inspection pattern area. The system extracts the data of these clusters or cells from design pattern data read from a first magnetic disk unit. The system then generates an output file containing the extracted data. The output file is then converted into the same format as the input design pattern data or into OASIS format, before it is output to a second magnetic disk unit. The extracted pattern data specifying the clusters or cells within each defect inspection pattern area can be output from the mask inspection system to external systems.

摘要翻译： 对于每个检测到的图案缺陷，检查系统确定包含缺陷坐标的预定尺寸的缺陷检查图案区域，然后确定参考点位于缺陷检查图案区域内的簇或单元。 系统从从第一磁盘单元读取的设计模式数据中提取这些簇或单元的数据。 然后，系统生成包含提取的数据的输出文件。 然后，在将输出文件输出到第二个磁盘单元之前，将输出文件转换为与输入设计模式数据相同的格式或OASIS格式。 可以将指定每个缺陷检查图案区域内的簇或单元的提取图案数据从掩模检查系统输出到外部系统。

公开(公告)号：US08548223B2

公开(公告)日：2013-10-01

申请号：US13005048

申请日：2011-01-12

申请人： Takafumi Inoue ,  Hideo Tsuchiya

发明人： Takafumi Inoue ,  Hideo Tsuchiya

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G06T2207/30148

摘要： Optical image data of a mask is acquired. Reference image data associated with the optical images is created from design pattern data. Regional image data that includes pixel values denoted by multi-valued resolution based on importance level information of the patterns is created from region data including at least one portion of the patterns defined in the design pattern data. Defect determination is conducted on a pixel-by-pixel basis by comparing the optical image data with the reference image data, by means of either a plurality of threshold values determined by each pixel value within the regional image data or a plurality of defect determination methods. Image data of a section whose Mask Error Enhancement Factor (MEEF) is equal to or greater than a predetermined value is created from the region data including at least one portion of the patterns defined in the design pattern data.

摘要翻译： 获取掩模的光学图像数据。 从设计图案数据创建与光学图像相关联的参考图像数据。 从包括在设计图案数据中定义的图案的至少一部分的区域数据创建包括基于图案的重要度级别信息的由多值分辨率表示的像素值的区域图像数据。 通过将区域图像数据中的每个像素值确定的多个阈值或多个缺陷确定方法，通过将光学图像数据与参考图像数据进行比较来逐个像素地进行缺陷确定 。 从包括在设计图案数据中定义的图案的至少一部分的区域数据创建其掩模误差增强因子（MEEF）等于或大于预定值的部分的图像数据。

公开(公告)号：US20130044205A1

公开(公告)日：2013-02-21

申请号：US13572972

申请日：2012-08-13

申请人： Eiji Matsumoto ,  Nobutaka Kikuiri ,  Hideo Tsuchiya

发明人： Eiji Matsumoto ,  Nobutaka Kikuiri ,  Hideo Tsuchiya

IPC分类号： H04N7/18 ,  G06K9/00

CPC分类号： G06K9/00 ,  G01B11/02 ,  G01B2210/56 ,  G01N21/95 ,  G01N21/95607 ,  G01N2021/95615 ,  G03F1/84 ,  G03F7/70616 ,  G03F7/707 ,  H01L22/00 ,  H01L2924/0002 ,  H04N7/18 ,  H01L2924/00

摘要： A pattern inspection method according to one aspect of the present invention includes generating a first positional deviation amount map by using data acquired by a pre-scan, generating a second positional deviation amount map by using data acquired by a full scan, generating a first positional deviation difference map by calculating a difference between the first positional deviation amount map and the second positional deviation amount map, generating a third positional deviation amount map from the first positional deviation difference map and the second positional deviation amount map, and judging existence of a value exceeding an allowable value, in values defined by the third positional deviation amount map.

摘要翻译： 根据本发明的一个方面的图案检查方法包括通过使用通过预扫描获取的数据来生成第一位置偏差量图，通过使用通过全扫描获取的数据产生第二位置偏差量图，产生第一位置 通过计算第一位置偏差量图和第二位置偏差量图之间的差来产生偏差差图，从第一位置偏差差图和第二位置偏差量图生成第三位置偏差量图，并且判断值的存在 超过第三位置偏差量图所定义的值的允许值。

公开(公告)号：US07973918B2

公开(公告)日：2011-07-05

申请号：US12552108

申请日：2009-09-01

申请人： Hideo Tsuchiya ,  Takayuki Abe

发明人： Hideo Tsuchiya ,  Takayuki Abe

IPC分类号： G01N21/00

CPC分类号： G01N21/956 ,  G01N2021/95676

摘要： A pattern inspection apparatus includes a pulsed light source configured to emit pulsed light; a stage configured to mount thereon an inspection target object with a pattern formed thereon; a time delay integration (TDI) sensor configured to detect, a plurality of times with a time delay, each pixel value of an optical image of the inspection target object, wherein the optical image is acquired by emitting the pulsed light onto the inspection target object, and to integrate a detected each pixel value for each pixel of the optical image; a light quantity sensor configured to detect a light quantity of the pulsed light after emitting the pulsed light onto the inspection target object; a light quantity measurement circuit configured to input the light quantity detected by the light quantity sensor, and to measure a light quantity of each pulse while being synchronized with a period of the pulsed light; a correction unit configured to input the light quantity of each pulse and an integrated pixel value output from the TDI sensor, and to correct the integrated pixel value output from the TDI sensor, for each pixel of the optical image, using a total light quantity of the light quantity of corresponding each pulse; and an inspection unit configured to inspect whether there is a defect of the pattern, using the integrated pixel value corrected.

摘要翻译： 图案检查装置包括被配置为发射脉冲光的脉冲光源; 被配置为在其上安装有形成在其上的图案的检查对象物体的台; 时间延迟积分（TDI）传感器，其被配置为以时间延迟多次检测所述检查对象物体的光学图像的每个像素值，其中通过将所述脉冲光发射到所述检查对象物体上而获取所述光学图像 并且对于所述光学图像的每个像素集成检测到的每个像素值; 光量传感器，被配置为在将所述脉冲光发射到所述检查对象物体上之后检测所述脉冲光的光量; 光量测量电路，被配置为输入由光量传感器检测的光量，并且与脉冲光的周期同步地测量每个脉冲的光量; 校正单元，被配置为输入每个脉冲的光量和从TDI传感器输出的积分像素值，并且对于光学图像的每个像素，校正从TDI传感器输出的积分像素值，使用总光量 相应的每个脉冲的光量; 以及检查单元，被配置为使用校正的积分像素值来检查是否存在图案的缺陷。