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119 条记录 (耗时 0.032 秒)

    Light-sensitive composition
    92.
    发明授权
    Light-sensitive composition 失效
    感光组合物

    公开(公告)号：US4950582A

    公开(公告)日：1990-08-21

    申请号：US176196

    申请日：1988-03-31

    申请人： Toshiaki Aoai ,  Keitaro Aoshima ,  Yasuo Okamoto

    发明人： Toshiaki Aoai ,  Keitaro Aoshima ,  Yasuo Okamoto

    IPC分类号： G03C1/72 ,  C08G18/38 ,  C08G18/83 ,  G03F7/021 ,  G03F7/022 ,  G03F7/023 ,  G03F7/035 ,  G03F7/095

    CPC分类号： C08G18/83 ,  C08G18/3857 ,  G03F7/0217 ,  G03F7/0233 ,  G03F7/035 ,  G03F7/095 ,  Y10S430/107

    摘要： A light-sensitive composition comprises at least one water-insoluble and aqueous alkaline-soluble polyurethane resin having N-sulfonylamido, N-sulfonylureido or N-aminosulfonylamido groups. The light-sensitive composition is excellent in developing properties in an aqueous alkaline developer and coating properties. In addition, the images obtained from the composition are good in wear resistance and exhibit high adhesion to the substrate. Thus, the composition is very suitable for use in making IC circuits, photomasks and PS plates which provide lithographic printing plates exhibiting high printing durability.

    摘要翻译： 光敏性组合物包含至少一种具有N-磺酰胺基，N-磺酰基脲基或N-氨基磺酰胺基的水不溶性和水溶性的碱溶性聚氨酯树脂。 感光性组合物在碱性显影剂的水性和显色性中的显影性优异。 此外，由组合物获得的图像具有良好的耐磨性，并且对基材表现出高粘合性。 因此，该组合物非常适用于制造提供具有高印刷耐久性的平版印刷版的IC电路，光掩模和PS板。

    Light-sensitive composition comprising a diazonium salt condensate and a modified polyvinyl acetal polymer.
    93.
    发明授权
    Light-sensitive composition comprising a diazonium salt condensate and a modified polyvinyl acetal polymer. 失效
    包含重氮盐缩合物和改性聚乙烯醇缩醛聚合物的感光组合物。

    公开(公告)号：US4741985A

    公开(公告)日：1988-05-03

    申请号：US871343

    申请日：1986-06-06

    申请人： Toshiaki Aoai ,  Kazuo Maemoto ,  Akihiko Kamiya ,  Toshiyuki Sekiya

    发明人： Toshiaki Aoai ,  Kazuo Maemoto ,  Akihiko Kamiya ,  Toshiyuki Sekiya

    IPC分类号： C08F8/00 ,  G03F7/021 ,  G03C1/52

    CPC分类号： C08F8/00 ,  G03F7/0215

    摘要： A light-sensitive composition comprising a diazonium compound and a polymer having the recurring units represented by the following general formula (I): ##STR1## wherein R.sub.1 represents a hydrogen atom or a substituted or unsubstituted alkyl group; R.sub.2 represents an unsubstituted alkyl group; R.sub.3 represents an aliphatic or aromatic hydrocarbon group having a carboxyl group; R.sub.4 represents an aliphatic or aromatic hydrocarbon group which has at least one hydroxyl or nitrile group and which may be further substituted; n.sub.1, n.sub.2, n.sub.3, n.sub.4 and n.sub.5 represent the molar percents of the respective recurring units, provided that n.sub.1 is from about 5 to about 85 mol %, n.sub.2 is from 0 to about 60 mol %, n.sub.3 is from 0 to about 20 mol %, n.sub.4 is from about 3 to about 60 mol % and n.sub.5 is from greater than 0 to about 60 mol %.

    摘要翻译： 一种感光性组合物，其包含重氮化合物和具有由以下通式（I）表示的重复单元的聚合物：其中R 1表示氢原子或取代或未取代的烷基; R2表示未取代的烷基; R3表示具有羧基的脂族或芳族烃基; R4表示具有至少一个羟基或腈基并且可以进一步被取代的脂族或芳族烃基; n1，n2，n3，n4和n5表示各个重复单元的摩尔百分数，条件是n1为约5至约85摩尔％，n2为0至约60摩尔％，n3为0至约20摩尔 ％，n4为约3至约60mol％，n5为大于0至约60mol％。

    Positive photosensitive compositions
    96.
    再颁专利
    Positive photosensitive compositions 有权
    正光敏组合物

    公开(公告)号：USRE43560E1

    公开(公告)日：2012-07-31

    申请号：US12649828

    申请日：2009-12-30

    申请人： Kunihiko Kodama ,  Toshiaki Aoai

    发明人： Kunihiko Kodama ,  Toshiaki Aoai

    IPC分类号： G03F7/039 ,  G03C1/73

    CPC分类号： G03F7/0045 ,  C23F1/02 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/106

    摘要： A positive photosensitive composition comprising (A) a compound capable of generating a fluorine-substituted alkanesulfonic acid having 2 to 4 carbon atoms by irradiation of actinic rays or radiation, (B) a resin having a monocyclic or polycyclic alicyclic hydrocarbon structure and being decomposed by the action of an acid to increase solubility in an alkali developer, (C) a basic compound, and (D) a fluorine and/or silicon surfactant.

    摘要翻译： 一种正型光敏组合物，其包含（A）能够通过光化射线或辐射的照射产生具有2至4个碳原子的氟取代的链烷磺酸的化合物，（B）具有单环或多环脂环族烃结构的树脂，并被 酸增加在碱性显影剂中的溶解度的作用，（C）碱性化合物和（D）氟和/或硅表面活性剂。

    Ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate
    99.
    发明授权
    Ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate 有权
    油墨组合物，喷墨记录方法，印刷材料，平版印刷版的制造方法和平版印刷版

    公开(公告)号：US07538149B2

    公开(公告)日：2009-05-26

    申请号：US11418220

    申请日：2006-05-05

    申请人： Toshiaki Aoai

    发明人： Toshiaki Aoai

    IPC分类号： C09D11/00

    CPC分类号： C09D11/101

    摘要： An ink composition is provided that includes (a) a polymerizable compound, (b) a polymerization initiator, (c) a coloring agent, and (d) a fragrance. There is also provided an inkjet recording method that includes a step of discharging the ink composition onto a recording medium, and a step of irradiating the discharged ink composition with radiation so as to cure the ink composition.

    摘要翻译： 提供一种油墨组合物，其包含（a）可聚合化合物，（b）聚合引发剂，（c）着色剂和（d）香料。 还提供了一种喷墨记录方法，其包括将油墨组合物排出到记录介质上的步骤，以及用放射线照射排出的油墨组合物以固化油墨组合物的步骤。