公开(公告)号：US20230242570A1

公开(公告)日：2023-08-03

申请号：US18003630

申请日：2021-07-08

Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED

Inventor： Yuki TANAKA ,  Hideki OKUMURA ,  Toshifumi KANO

IPC: C07H21/02

CPC classification number: C07H21/02

Abstract: An object of the present invention is to provide an efficient method for producing a nucleic acid oligomer. An object of the present invention is to provide a method for producing a nucleic acid oligomer represented by formula (2) (in the formula, the symbols have the meanings described in the specification), including a step of reacting a nucleic acid oligomer represented by formula (1) (in the formula, the symbols have the meanings described in the specification) with a trichloroacetic acid solution in which a molar ratio of formaldehyde to trichloroacetic acid (formaldehyde mol/trichloroacetic acid mol) is 11×10−5 or less.

公开(公告)号：US20230212385A1

公开(公告)日：2023-07-06

申请号：US17927561

申请日：2021-05-14

Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED

Inventor： Kenichi TAKEUCHI ,  Hirofumi KATO

IPC: C08L63/00 ,  C08K5/3445 ,  C08K5/13 ,  C08K5/1545 ,  C08J5/24

CPC classification number: C08L63/00 ,  C08K5/3445 ,  C08K5/13 ,  C08K5/1545 ,  C08J5/24 ,  C08J2363/00

Abstract: Provided is an epoxy resin composition containing an epoxy resin (A), a curing agent (B) and an imidazole adduct-type curing accelerator (C), in which the curing agent (B) contains a compound (B-1) represented by formula (B-1) [R1 represents a hydrogen atom, a halogen atom, a methoxy group or a hydrocarbon group having 1 to 12 carbon atoms] and a compound (B-2) represented by formula (B-2) [R2 represents a hydrogen atom, a halogen atom, a methyl group or a methoxy group] and the content of the compound (B-2) is 2 parts by mass or more and 5 parts by mass or less with respect to 100 parts by mass of the epoxy resin (A).

公开(公告)号：US11694854B2

公开(公告)日：2023-07-04

申请号：US16762340

申请日：2018-11-09

Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED

Inventor： Junichi Nakadate ,  Takamichi Shinohara

IPC: H01G11/52 ,  H01M10/0525 ,  H01M50/417 ,  H01M50/489 ,  H01M50/491

CPC classification number: H01G11/52 ,  H01M10/0525 ,  H01M50/417 ,  H01M50/489 ,  H01M50/491

Abstract: A separator for power storage devices includes a synthetic resin film having minute pore portions, the separator having an air resistance of 30 sec/100 mL/16 μm or more and 100 sec/100 mL/16 μm or less, and a first scattering peak in a stretching direction measured by small-angle X-ray scattering measurement (SAXS) present in a range where a scattering vector is 0.0030 nm−1 or more and 0.0080 nm−1 or less.

公开(公告)号：US11690378B2

公开(公告)日：2023-07-04

申请号：US16958018

申请日：2018-12-25

Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED

Inventor： Ayaka Tanaka ,  Naoya Sugimoto

IPC: A61K31/4427 ,  C07D401/04 ,  A01N43/90 ,  A01N47/18 ,  C07D471/04 ,  C07D487/04

CPC classification number: A01N43/90 ,  A01N47/18 ,  C07D471/04 ,  C07D487/04

Abstract: The present invention provides a compound that have excellent harmful arthropod controlling effects, the compounds being represented by formula (I) [wherein Q represents a group represented by formula Q1 or the like, Z represents an oxygen atom or a sulfur atom, A1 represents a nitrogen atom or CR6a, A2 represents a nitrogen atom or CR6b, A3 represents a nitrogen atom or CR6c, A4 represents CR1a or the like, A5 represents a nitrogen atom or CR6e or the like, A6 represents a nitrogen atom or CR6f, R6a represents a hydrogen atom or the like, R6b represents a C1-C6 chain hydrocarbon group or the like, R6c, R6e, R6f are identical to or different from each other, and each represents a C1-C6 chain hydrocarbon group or the like, R1a represents a C1-C6 chain hydrocarbon group or the like, R2 represents a C1-C6 chain hydrocarbon group or the like, R3 represents a C1-C6 chain hydrocarbon group or the like, and n is 0, 1 or 2] or its N oxide compound.

公开(公告)号：US20230207964A1

公开(公告)日：2023-06-29

申请号：US18146055

申请日：2022-12-23

Applicant: Sumitomo Chemical Company, Limited

Inventor： Takuji YAMAMOTO

IPC: H01M50/449 ,  H01M50/417 ,  H01M50/423

CPC classification number: H01M50/449 ,  H01M50/417 ,  H01M50/423

Abstract: Provided is a nonaqueous electrolyte secondary battery separator having an excellent withstand voltage property after repeated charge-discharge cycles. The nonaqueous electrolyte secondary battery separator includes a polyolefin porous film, and a heat-resistant porous layer that contains a heat-resistant resin and that is formed on one surface or both surfaces of the polyolefin porous film, the nonaqueous electrolyte secondary battery separator having an absolute value of a ratio of change in thickness between before and after a heat-shock cycle test in a range of not more than 1.4%.

公开(公告)号：US20230207873A1

公开(公告)日：2023-06-29

申请号：US18075899

申请日：2022-12-06

Applicant: Sumitomo Chemical Company, Limited

Inventor： Kensaku HORIE ,  Makoto FURUKAWA ,  Takahiro KUWATA

IPC: H01M10/0565 ,  H01M50/417 ,  H01M50/491

CPC classification number: H01M10/0565 ,  H01M50/417 ,  H01M50/491 ,  H01M2300/0082

Abstract: Provided is a nonaqueous electrolyte secondary battery porous layer which is capable of improving a capacity maintenance ratio shown when a nonaqueous electrolyte secondary battery is repeatedly subjected to a charge-discharge cycle. The nonaqueous electrolyte secondary battery porous layer contains at least one type of a resin having an amide bond, and an aspect ratio of a pore therein is not less than 1.0 and not more than 2.2.

公开(公告)号：US11681224B2

公开(公告)日：2023-06-20

申请号：US16549206

申请日：2019-08-23

Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED

Inventor： Mutsuko Higo ,  Shingo Fujita ,  Koji Ichikawa

IPC: C08F212/14 ,  C08F220/16 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/32 ,  G03F7/16 ,  G03F7/20 ,  G03F7/38

CPC classification number: G03F7/0392 ,  C08F212/14 ,  C08F220/16 ,  G03F7/0045 ,  G03F7/0382 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2037 ,  G03F7/322 ,  G03F7/38

Abstract: Disclosed are a resin containing a structural unit represented by formula (I), a structural unit represented by formula (a1-1), a structural unit represented by formula (a1-2) and a structural unit represented by formula (a2-A), and a resist composition including the same:

公开(公告)号：US20230161256A1

公开(公告)日：2023-05-25

申请号：US18051041

申请日：2022-10-31

Applicant: Sumitomo Chemical Company, Limited

Inventor： Masahiko SHIMADA ,  Koji ICHIKAWA

IPC: G03F7/039

CPC classification number: G03F7/0392

Abstract: A salt represented by formula (I), a resin comprising a structural unit derived from the salt represented by formula (I), a resist composition comprising the salt represented by formula (I) or a resin comprising a structural unit derived from the salt represented by formula (I).

公开(公告)号：US20230159735A1

公开(公告)日：2023-05-25

申请号：US17922834

申请日：2021-05-10

Applicant: Sumitomo Chemical Company, Limited

Inventor： Takashi KAMAHARA

IPC: C08L23/20 ,  C08J3/12

CPC classification number: C08L23/20 ,  C08J3/12 ,  C08J2323/20 ,  C08J2423/06

Abstract: A polyolefin-based resin pellet which generates less fine powder is provided. The polyolefin-based resin pellet contains: a polyolefin-based resin; an erucic acid amide; and a fatty acid amide having 20 or less carbon atoms, in which a content of the fatty acid amide having 20 or less carbon atoms is 1% to 6% by mass with respect to 100% by mass of a total amount of the erucic acid amide and the fatty acid amide having 20 or less carbon atoms.

公开(公告)号：US20230152691A1

公开(公告)日：2023-05-18

申请号：US17821820

申请日：2022-08-24

Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED

Inventor： Katsuhiro KOMURO ,  Saki KATO ,  Koji ICHIKAWA

IPC: G03F7/004 ,  C07D307/68 ,  C07D307/00 ,  C07D307/56 ,  C07D321/10 ,  C07D333/40 ,  C07D333/28

CPC classification number: G03F7/0045 ,  C07D307/68 ,  C07D307/00 ,  C07D307/56 ,  C07D321/10 ,  C07D333/40 ,  C07D333/28

Abstract: Disclosed are a salt represented by formula (I), an acid generator, and a resist composition including the same:




wherein R4 to R9 each represent a halogen atom, a haloalkyl group, etc., A1, A2 and A3 each represent a hydrocarbon group, the group may have a substituent, —CH2— in the group may be replaced by —O—, —CO—, —S—, etc., X4, X5 and X6 each represent —O— or —S—, m1 represents an integer of 1 to 5, m2, m3, m8 and m9 represent an integer of 0 to 5, m4, m5 and m6 represent an integer of 0 to 3, m7 represents an integer of 0 to 4, 1≤m1+m7≤5, 0≤m2+m8≤5, 0≤m3+m9≤5, and AI− represents an organic anion.