Signal transmission circuit in a semiconductor integrated circuit
    101.
    发明授权
    Signal transmission circuit in a semiconductor integrated circuit 失效
    半导体集成电路中的信号传输电路

    公开(公告)号:US4687949A

    公开(公告)日:1987-08-18

    申请号:US795256

    申请日:1985-11-05

    申请人: Hiroshi Yasuda

    发明人: Hiroshi Yasuda

    摘要: A signal transmission circuit includes an input pad for receiving an input signal, a resistor connected at one end to the input pad, and a signal transmission line connected at the input end to the other end of the resistor, and at the output end to an internal circuit. The signal transmission circuit further includes an auxiliary line connected at the input end to the input pad, floating electrically at the output end, and extending substantially in parallel with the transmission line.

    摘要翻译: 信号传输电路包括用于接收输入信号的输入焊盘,一端连接到输入焊盘的电阻器和在输入端连接到电阻器的另一端的信号传输线,在输出端连接到 内部电路 信号传输电路还包括在输入端连接到输入焊盘的辅助线,其在输出端处电气浮动,并且基本上与传输线平行地延伸。

    Objective lens driving apparatus for optical disc player
    102.
    发明授权
    Objective lens driving apparatus for optical disc player 失效
    用于光盘播放器的物镜驱动装置

    公开(公告)号:US4646283A

    公开(公告)日:1987-02-24

    申请号:US700818

    申请日:1985-01-29

    IPC分类号: G11B7/09 G11B7/22 G11B7/08

    摘要: Disclosed is an objective lens driving apparatus having a holder 9 holding an objective lens 1 and connected to a base 17 through at least four linear members 13, such that the holder 9 can be moved both in the focussing direction and in the tracking direction orthogonal to the focussing direction through the flexing of the linear members 13. Undesirable local resonance can be suppressed due to the use of the linear members 13 in support of the holder 9.

    摘要翻译: PCT No.PCT / JP84 / 00275 Sec。 371日期1985年1月29日第 102(e)日期1985年1月29日PCT提交1984年5月29日PCT公布。 公开号WO84 / 04841 日期为1984年12月6日。公开的是一种物镜驱动装置,其具有保持物体1并通过至少四个直线构件13连接到基座17的保持器9,使得保持器9可以在聚焦方向 并且通过线性构件13的弯曲在与聚焦方向正交的跟踪方向上。由于使用支撑保持器9的直线构件13,可以抑制不期望的局部共振。

    Deflection system in an electron beam exposure device
    103.
    发明授权
    Deflection system in an electron beam exposure device 失效
    电子束曝光装置中的偏转系统

    公开(公告)号:US4583077A

    公开(公告)日:1986-04-15

    申请号:US536467

    申请日:1983-09-27

    CPC分类号: H01L21/30 H03M1/74

    摘要: In a D/A converter in a deflection system of an electron beam exposure device, the most significant bits (m bits) of input digital data consisting of n bits are input into a decoder circuit, and 2.sup.m D/A converters which correspond to the m bits are provided. The data consisting of the least significant bits (n-m bits) is input into the 2.sup.m D/A converters via 2.sup.m gates, respectively. The decoder circuit is constructed so as to control the 2.sup.m gates so that when the content of the data of the m bits is S, the first to S-th data of the 2.sup.m D/A converters is all rendered to be "1", the data of the (S+1)-th D/A converter remains the same as the data of the n-m bits, and the data of the (S+2)-th and subsequent D/A converters is all rendered to be "0", the sum of the outputs of the 2.sup.m D/A converters being applied to a coil which deflects the electron beam.

    摘要翻译: 在电子束曝光装置的偏转系统中的D / A转换器中,由n位组成的输入数字数据的最高有效位(m位)被输入到解码器电路中,对应于2m的D / A转换器 提供m位。 由最低有效位(n-m位)组成的数据分别通过2m个门输入到2m D / A转换器。 解码器电路被构造成控制2m个门,使得当m位的数据的内容为S时,2m D / A转换器的第一至第S数据全部变为“1” 第(S + 1)个D / A转换器的数据与nm位的数据保持相同,并且第(S + 2)和随后的D / A转换器的数据全部变为“ 0“,2m D / A转换器的输出之和被施加到偏转电子束的线圈上。

    Electron beam lithographic system
    104.
    发明授权
    Electron beam lithographic system 失效
    电子束光刻系统

    公开(公告)号:US4145597A

    公开(公告)日:1979-03-20

    申请号:US752989

    申请日:1976-12-21

    申请人: Hiroshi Yasuda

    发明人: Hiroshi Yasuda

    CPC分类号: H01J37/3007 H01J37/3045

    摘要: An electron beam lithographic system which exposes a desired area of an electron beam resist so as to form a desired pattern to be used for manufacturing large scale integrated circuits. This electron beam lithographic system provides a first and a second slit plate, respectively providing a rectangular slit so as to form an electron beam having a rectangular cross section, and a deflection means which deflects the electron beam passing the first slit so as to vary the cross section of the electron beam which passes the second slit. Therefore, electron beams having various cross sections can be obtained, so that the electron beam resist is exposed by the beam having various cross sections and the desired pattern can be formed within a short time on a wafer.

    摘要翻译: 一种电子束光刻系统,其暴露电子束抗蚀剂的期望区域,以形成用于制造大规模集成电路的期望图案。 该电子束光刻系统提供分别提供矩形狭缝以形成具有矩形横截面的电子束的第一和第二狭缝板以及偏转通过第一狭缝的电子束的偏转装置,以便改变 通过第二狭缝的电子束的横截面。 因此,可以获得具有各种横截面的电子束,使得电子束抗蚀剂被具有各种截面的光束曝光,并且可以在短时间内在晶片上形成期望的图案。

    Process for the production of polyester fiber
    105.
    发明授权
    Process for the production of polyester fiber 失效
    聚酯纤维生产工艺

    公开(公告)号:US4105740A

    公开(公告)日:1978-08-08

    申请号:US536644

    申请日:1974-12-26

    IPC分类号: D01F6/62 D02J1/22

    CPC分类号: D01F6/62 D02J1/22

    摘要: Stretching polyester tows at a speed greater than 150 m/min., wherein more than 85 mol percent of the recurring units are units of ethylene terephthalate, is carried out at a stretch ratio satisfying the formula-1.58log(.DELTA.n .times. 10.sup.3) + 4.18 .ltoreq. DR .ltoreq. -2.32log(.DELTA.n .times. 10.sup.3) + 5.93Wherein .DELTA. n represents the birefringence of the unstretched filaments and is a value of from 0.020 to 0.100, and DR is the stretch ratio in times.

    摘要翻译: 以大于150m / min的速度拉伸聚酯丝束,其中大于85mol%的重复单元是对苯二甲酸乙二醇酯的单元,以满足式-1.58LOG(DELTA N×103)+ 4.18

    Microphone apparatus
    108.
    发明授权
    Microphone apparatus 失效
    麦克风设备

    公开(公告)号:US4010335A

    公开(公告)日:1977-03-01

    申请号:US625504

    申请日:1975-10-24

    申请人: Hiroshi Yasuda

    发明人: Hiroshi Yasuda

    CPC分类号: H04R5/027 H04R1/08

    摘要: A microphone assembly or apparatus comprises a perforated capsule having a microphone unit supported therein and a tubular projection communicating with the interior of the capsule. The projection is arranged to be inserted into the auditory canal of a human or dummy head. The microphone unit is located near the opening of the auditory canal.

    ELECTRON GUN AND ELECTRON BEAM DEVICE
    109.
    发明申请
    ELECTRON GUN AND ELECTRON BEAM DEVICE 有权
    电子枪和电子束装置

    公开(公告)号:US20140055025A1

    公开(公告)日:2014-02-27

    申请号:US14000988

    申请日:2011-02-25

    申请人: Hiroshi Yasuda

    发明人: Hiroshi Yasuda

    IPC分类号: H01J29/48

    摘要: An electron gun cathode (104) is column shaped, and emits electrons by being heated. A holder (103), which covers the bottom and sides of the electron gun cathode, has electrical conductivity and holds the electron gun cathode, and is composed of a material that does not easily react with the electron gun cathode when in a heated state, is provided. The tip of the electron gun cathode (104) protrudes from the holder (103) so as to be exposed, and electrons are emitted from the tip toward the front by applying an electric field to the tip.

    摘要翻译: 电子枪阴极(104)为柱状,通过加热发射电子。 覆盖电子枪阴极的底部和侧面的保持器(103)具有导电性并保持电子枪阴极,并且由处于加热状态时不易与电子枪阴极反应的材料构成, 被提供。 电子枪阴极(104)的尖端从保持器(103)突出以露出,并且通过向尖端施加电场,从尖端向前方发射电子。

    Multi-column electron beam exposure apparatus and magnetic field generation device
    110.
    发明授权
    Multi-column electron beam exposure apparatus and magnetic field generation device 有权
    多列电子束曝光装置及磁场发生装置

    公开(公告)号:US08390201B2

    公开(公告)日:2013-03-05

    申请号:US12928899

    申请日:2010-12-22

    IPC分类号: H01J25/50

    摘要: A multi-column electron beam exposure apparatus includes: multiple column cells; an electron beam converging unit in which two annular permanent magnets and electromagnetic coils are surrounded by a ferromagnetic frame, the two annular permanent magnets being magnetized in an optical axis direction and symmetrical about the optical axis, where the electromagnetic coils adjust magnetic fields of the annular permanent magnets; and a substrate provided with circular apertures through which electron beams used in the column cells pass, respectively, where the electron beam converging unit is disposed in each of the circular apertures. The two annular permanent magnets may be disposed one above the other in the optical axis direction, and the electromagnetic coils may be provided inside or outside the annular permanent magnets in their radial direction.

    摘要翻译: 多列电子束曝光装置包括:多列细胞; 电子束会聚单元,其中两个环形永磁体和电磁线圈被铁磁框架包围,两个环形永磁体沿光轴方向被磁化并且围绕光轴对称,其中电磁线圈调节环形磁场 永久磁铁 以及设置有圆孔的基板,分别在列单元中使用的电子束通过其中电子束会聚单元设置在每个圆形孔中。 两个环形永久磁铁可以在光轴方向上彼此上下配置,并且电磁线圈可以设置在环形永磁体的径向内侧或外侧。