公开(公告)号：US07090754B2

公开(公告)日：2006-08-15

申请号：US10331903

申请日：2002-12-31

申请人： Nobuyuki Takahashi

发明人： Nobuyuki Takahashi

IPC分类号： C23C14/35

CPC分类号： H01J37/32761 ,  C23C14/3464 ,  C23C14/505 ,  H01J37/34

摘要： An object of the invention is to provide a method of sputtering and a device for sputtering which can improve distribution of a film's thickness and coverage distribution improve. The device for sputtering includes at least a substrate, a substrate holder which holds the substrate, a target for forming a thin film on the substrate, a sputtering cathode in which the target is installed, a means for sputtering which makes materials of the target sputter to the substrate. Sputtering is carried out by making the substrate holder rotate and making a sputter cathode unit comprising at least one sputtering cathode move along an arc over the rotating substrate held on the substrate holder.

摘要翻译： 本发明的目的是提供一种溅射方法和溅射装置，其可以改善膜的厚度分布和覆盖分布。 用于溅射的装置至少包括基板，保持基板的基板保持器，用于在基板上形成薄膜的靶，其中安装靶的溅射阴极，用于溅射的装置，其使靶溅射材料 到基底。 通过使衬底保持器旋转并且使包括至少一个溅射阴极的溅射阴极单元沿着保持在衬底保持器上的旋转衬底上的弧线移动来进行溅射。

公开(公告)号：US20060081463A1

公开(公告)日：2006-04-20

申请号：US11248257

申请日：2005-10-13

申请人： Nobuyuki Takahashi

发明人： Nobuyuki Takahashi

IPC分类号： C23C14/00

CPC分类号： C23C14/35 ,  C23C14/225 ,  H01J37/3408 ,  H01J37/3411 ,  H01J37/347

摘要： This invention is a sputtering device comprising at least: a vacuum container defining a vacuum space; a substrate holder installed rotatably in said vacuum space; a substrate installed on said substrate holder; a target for forming thin film on said substrate; and a rotatable sputtering cathode in which said target is installed, wherein said sputtering cathode is slant to said substrate, and a center of said target is eccentric to a rotation axis of said sputtering cathode.

摘要翻译： 本发明是至少包括一个限定真空空间的真空容器的溅射装置; 可旋转地安装在所述真空空间中的基板保持架; 安装在所述衬底保持器上的衬底; 用于在所述衬底上形成薄膜的靶; 以及其中安装有所述靶的可旋转溅射阴极，其中所述溅射阴极倾斜到所述衬底，并且所述靶的中心偏离所述溅射阴极的旋转轴线。

公开(公告)号：US20050252767A1

公开(公告)日：2005-11-17

申请号：US11125157

申请日：2005-05-10

申请人： Nobuyuki Takahashi

发明人： Nobuyuki Takahashi

IPC分类号： C23C14/34 ,  C23C14/32 ,  C23C14/35

CPC分类号： C23C14/352 ,  C23C14/3407 ,  C23C14/35

摘要： The object of the invention is to provide a sputtering device which can design uniformity of film thickness distribution by corresponding to ablation change of a target and can gain a stable film quality by uniformity of film growth components. Accordingly, a sputtering device according to this invention comprises at least: a vacuum container defining a vacuum space; a substrate holder for holding a substrate in said vacuum container; at least one sputtering cathode device which is provided with a cathode unit located at a position facing said substrate held on the substrate holder and arranged slantly at a specific angle to said substrate, and a means for moving cathode unit in parallel along said substrate; and a target installed on said cathode unit. The plural sputtering cathode devices can be also arranged at specific intervals in a circumferential direction of the substrate holder.

摘要翻译： 本发明的目的是提供一种溅射装置，其可以通过对应于靶的烧蚀变化来设计膜厚分布的均匀性，并且可以通过膜生长组分的均匀性获得稳定的膜质量。 因此，根据本发明的溅射装置至少包括：限定真空空间的真空容器; 用于将基板保持在所述真空容器中的基板保持器; 至少一个溅射阴极装置，其设置有位于与所述基板相对的位置上的阴极单元，所述阴极单元保持在所述基板保持器上并且以与所述基板成特定角度倾斜地布置;以及用于沿着所述基板平行移动阴极单元的装置; 和安装在所述阴极单元上的目标。 多个溅射阴极器件也可以在衬底保持器的圆周方向上以特定间隔设置。

公开(公告)号：US20050199492A1

公开(公告)日：2005-09-15

申请号：US11074678

申请日：2005-03-09

申请人： Nobuyuki Takahashi

发明人： Nobuyuki Takahashi

IPC分类号： C23C14/34 ,  G09F9/00 ,  H01J11/20 ,  H01J11/22 ,  H01J11/34

CPC分类号： C23C14/56 ,  C23C14/3464 ,  H01J37/32541 ,  H01J37/32568 ,  H01J37/32752 ,  H01J37/32889 ,  H01J37/34

摘要： The present invention is to provide a sputtering device in which a film can be formed to a large sized substrate efficiently and uniformity of forming film distribution is designed, which comprises a sputtering cathode group including a plurality of sputtering cathodes which are established at a specific arrangement in a direction perpendicular to a movable direction of a large sized substrate which moves in a specific direction. Note that it is preferred that the sputtering cathode is a round shape. It is preferred that the sputtering cathode group is a first sputtering cathode row comprising a plurality of sputtering cathodes which are arranged at specific intervals in the direction perpendicular to the movable direction of the large sized substrate. It is preferred that the sputtering cathode group has a second sputtering cathode row comprising a plurality of sputtering cathodes which are arranged at a specific distance to the first sputtering cathode row in the movable direction and which are arranged at positions where every sputtering cathodes in the first sputtering cathode row are not overlapped against the movable direction. It is preferred that centers of the sputtering cathodes constituting the first sputtering cathode row and centers of the sputtering cathodes constituting the second sputtering cathode row are positioned at regular intervals alternately when they are projected in the movable direction.

摘要翻译： 本发明提供一种溅射装置，其中可以有效地对大尺寸基板形成膜，并且设计成均匀的成膜分布，其包括溅射阴极组，其包括以特定布置建立的多个溅射阴极 在与特定方向移动的大尺寸基板的移动方向垂直的方向上。 注意，溅射阴极优选为圆形。 优选的是，溅射阴极组是包括在垂直于大尺寸基板的移动方向的方向上以特定间隔布置的多个溅射阴极的第一溅射阴极行。 优选的是，溅射阴极组具有包括多个溅射阴极的第二溅射阴极排，所述多个溅射阴极在可移动方向上与第一溅射阴极列以特定距离排列，并且布置在第一溅射阴极的每个溅射阴极的位置 溅射阴极排不与可移动方向重叠。 优选的是，构成第一溅射阴极排的溅射阴极的中心和构成第二溅射阴极排的溅射阴极的中心在可移动方向上被投影时交替地定位成规则间隔。

公开(公告)号：USD504354S1

公开(公告)日：2005-04-26

申请号：US29201693

申请日：2004-03-19

申请人： Akio Fumiiri ,  Nobuyuki Takahashi

设计人： Akio Fumiiri ,  Nobuyuki Takahashi

公开(公告)号：US06874959B2

公开(公告)日：2005-04-05

申请号：US10396150

申请日：2003-03-25

申请人： Nobuyuki Takahashi

发明人： Nobuyuki Takahashi

IPC分类号： H01H9/04 ,  G06F3/02 ,  H01H13/702 ,  H05K3/36 ,  H01R12/12

CPC分类号： H01H13/702 ,  G06F3/0202 ,  H01H2207/026 ,  H05K3/365

摘要： A keyboard assembly having a keyboard membrane and a set of electrical connections. The keyboard membrane includes conductors arranged on the membrane to convey electrical signals generated by depression and/or release of keyboard keys to electrical terminals affixed to the membrane. The electrical connections are made between the membrane terminals and corresponding mutually-opposing terminals of a printed circuit board affixed within the body of the keyboard. The connections are arranged in first and second linear rows. The first row of connections is arranged at a uniform spacing in a direction approximately parallel to a long dimension of the membrane. The connections of the second row are arranged at a uniform spacing in a direction approximately perpendicular to the long dimension. An inter-terminal pitch among the connections of the first row is substantially greater than a inter-terminal pitch among the connections of the second row.

摘要翻译： 具有键盘膜和一组电连接的键盘组件。 键盘膜包括布置在膜上的导体，以将通过按压和/或释放键盘键产生的电信号传送到固定到膜的电端子。 电连接在薄膜端子和固定在键盘主体内的印刷电路板的相应相对的端子之间形成。 连接被布置在第一和第二线性行中。 第一排连接件在大致平行于膜的长尺寸的方向上以均匀的间隔布置。 第二排的连接在大致垂直于长尺寸的方向上以均匀的间隔布置。 第一行的连接之间的端子间间距基本上大于第二行的连接之间的端子间间距。

公开(公告)号：US06800183B2

公开(公告)日：2004-10-05

申请号：US10280035

申请日：2002-10-25

申请人： Nobuyuki Takahashi

发明人： Nobuyuki Takahashi

IPC分类号： C23C1434

CPC分类号： H01J37/3435 ,  C23C14/3464

摘要： The invention is intended to provide a sputtering device in which a single sputtering chamber is equipped with a plurality of supports and a target-positioning mechanism for rotating the supports to position the targets into film-forming position. Each support is provided with targets that are different from each other. The same types of targets are mounted in the same order on each support. The supports are rotated to select the same types of targets needed to form a film and to position the targets relative to the substrate. A plurality of the same type of targets are used simultaneously to form a film. The supports are then rotated to select the next targets, and the next film is built up on the previous film. As the film is formed, targets that are not used in the film-forming process can be cleaned with a cleaning device.

摘要翻译： 本发明旨在提供一种溅射装置，其中单个溅射室配备有多个支撑件和用于旋转支架以将靶定位成成膜位置的目标定位机构。 每个支持都提供了彼此不同的目标。 相同类型的目标以相同的顺序安装在每个支持上。 旋转支撑件以选择形成膜所需的相同类型的靶并相对于基底定位靶。 同时使用多个相同类型的靶来形成膜。 然后旋转支持以选择下一个目标，下一部电影是在上一部电影上构建的。 当形成膜时，可以用清洁装置清洁不用于成膜过程中的靶。

公开(公告)号：US06504333B2

公开(公告)日：2003-01-07

申请号：US09793486

申请日：2001-02-27

申请人： Nobuyuki Takahashi ,  Kiyotaka Kato ,  Kenji Iriguchi

发明人： Nobuyuki Takahashi ,  Kiyotaka Kato ,  Kenji Iriguchi

IPC分类号： G05B1925

CPC分类号： G05B19/41 ,  G05B2219/34093 ,  G05B2219/34141 ,  G05B2219/43129 ,  G05B2219/49111

摘要： A numerical control system includes a curved-surface state evaluating unit for forming curved-surface evaluation data of evaluation points by arranging, virtually, the tool on a given scheduled path locus, that serves as the criterion of movement of a tool, to come into contact with a processed surface of a processing object, and by setting a plurality of evaluation points to evaluate the shape of the curved surface, a command speed deciding unit for deciding a command speed appropriately by using a passing speed and other data in the evaluation data, and a tool position data forming unit for calculating quickly a succeeding tool position by utilizing the evaluation data. The operations are performed in real time.

摘要翻译： 数值控制系统包括：弯曲表面状态评估单元，用于通过将作为工具移动标准的给定计划路径轨迹上的工具实际上安排来形成评估点的曲面评估数据，以进入 与加工对象的经处理面接触，通过设定多个评价点来评价曲面的形状，指令速度决定部，通过使用评价数据中的通过速度和其他数据适当地判定指令速度 以及刀具位置数据形成单元，用于通过利用评估数据快速计算后续刀具位置。 这些操作是实时执行的。

公开(公告)号：US06432261B1

公开(公告)日：2002-08-13

申请号：US09758141

申请日：2001-01-12

申请人： Kazuhito Watanabe ,  Hironari Shimizu ,  Toshiaki Koguchi ,  Nobuyuki Takahashi

发明人： Kazuhito Watanabe ,  Hironari Shimizu ,  Toshiaki Koguchi ,  Nobuyuki Takahashi

IPC分类号： C23F102

摘要： A substrate holder and an electrode are arranged facing each other in a vacuum chamber. The electrode is provided with a process gas introduction mechanism and a gas blowoff plate. A substrate is loaded on the substrate holder, the process gas is introduced, and electric power is supplied between the substrate holder and the electrode to generate plasma for etching the substrate surface. At the rear side of the gas blowoff plate in the vacuum chamber, a plurality of magnets is provided at concentric positions. The magnetic field strength resulting from the magnets on the surface of the substrate is made 0 Gauss. By using the magnets in this way and improving the magnets, it is possible to establish a better etching process for various materials to be etched.

公开(公告)号：US06386511B1

公开(公告)日：2002-05-14

申请号：US09654117

申请日：2000-09-01

申请人： Kazuhito Watanabe ,  Yoshihiro Katsumata ,  Nobuyuki Takahashi

发明人： Kazuhito Watanabe ,  Yoshihiro Katsumata ,  Nobuyuki Takahashi

IPC分类号： F16K116

CPC分类号： F16K31/52 ,  F16K1/16

摘要： To be able to reduce the size of a drive part and, as a result, to achieve the reduction in size and the lowering of manufacturing cots of a gate valve. An open/close mechanism is configured from a turning pair only. This open/close mechanism is configured from a first swing link, second swing link and coupling link. The first swing link is driven by a rotation cylinder to perform a swinging motion. The second swing link is connected to a drive shaft and performs a swinging motion with the drive shaft as its axis. The first swing link and second swing link are coupled by the coupling link. When the rotation cylinder is driven, whereby the first swing link is caused to swing, the coupling link is vertically driven whereby the second swing link is caused to swing. As a result, a valve, connected to the second swing link, swings and the opening and closing operation of the flow path port is performed.

摘要翻译： 为了能够减小驱动部件的尺寸，因此能够实现闸阀的制造小型​​化的小型化和降低。 开/关机构仅由转弯配置。 该开/关机构由第一摆动连杆，第二摆动连杆和联接杆构成。 第一摆动连杆由旋转圆筒驱动以进行摆动。 第二摆动连杆与驱动轴连接，以驱动轴为轴的方式进行摆动。 第一摆动连杆和第二摆动连杆通过联轴节连接。 当旋转圆筒被驱动时，第一摆动杆被摆动，联接杆被垂直驱动，从而使第二摆动杆摆动。 结果，与第二摆动连杆连接的阀门摆动，进行流路口的开闭动作。