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公开(公告)号:US20130092945A1
公开(公告)日:2013-04-18
申请号:US13649580
申请日:2012-10-11
Applicant: Semiconductor Energy Laboratory Co., Ltd.
Inventor: Tatsuya HONDA , Masashi TSUBUKU , Yusuke NONAKA , Takashi SHIMAZU , Shunpei YAMAZAKI
IPC: H01L29/786
CPC classification number: H01L29/7869 , H01L27/1225 , H01L29/42384 , H01L29/78693
Abstract: The concentration of impurity elements included in an oxide semiconductor film in the vicinity of a gate insulating film is reduced. Further, crystallinity of the oxide semiconductor film in the vicinity of the gate insulating film is improved. A semiconductor device includes an oxide semiconductor film over a substrate, a source electrode and a drain electrode over the oxide semiconductor film, a gate insulating film which includes an oxide containing silicon and is formed over the oxide semiconductor film, and a gate electrode over the gate insulating film. The oxide semiconductor film includes a region in which the concentration of silicon is lower than or equal to 1.0 at. %, and at least the region includes a crystal portion.
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公开(公告)号:US20250142891A1
公开(公告)日:2025-05-01
申请号:US19004596
申请日:2024-12-30
Applicant: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
Inventor: Hajime KIMURA , Kengo AKIMOTO , Masashi TSUBUKU , Toshinari SASAKI
Abstract: A display device including a pixel having a memory. The pixel includes at least a display element, a capacitor, an inverter, and a switch. The switch is controlled with a signal held in the capacitor and a signal output from the inverter so that voltage is supplied to the display element. The inverter and the switch can be constituted by transistors with the same polarity. A semiconductor layer included in the pixel may be formed using a light-transmitting material. Moreover, a gate electrode, a drain electrode, and a capacitor electrode may be formed using a light-transmitting conductive layer. The pixel is formed using a light-transmitting material in such a manner, whereby the display device can be a transmissive display device while including a pixel having a memory.
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公开(公告)号:US20250011916A1
公开(公告)日:2025-01-09
申请号:US18887099
申请日:2024-09-17
Applicant: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
Inventor: Shunpei YAMAZAKI , Junichi KOEZUKA , Kenichi OKAZAKI , Masashi TSUBUKU
Abstract: A metal oxide film containing a crystal part is provided. Alternatively, a metal oxide film with highly stable physical properties is provided. Alternatively, a metal oxide film with improved electrical characteristics is provided. Alternatively, a metal oxide film with which field-effect mobility can be increased is provided. A metal oxide film including In, M (M is Al, Ga, Y, or Sn), and Zn includes a first crystal part and a second crystal part; the first crystal part has c-axis alignment; the second crystal part has no c-axis alignment; and the existing proportion of the second crystal part is higher than the existing proportion of the first crystal part.
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公开(公告)号:US20230064813A1
公开(公告)日:2023-03-02
申请号:US17980693
申请日:2022-11-04
Applicant: Semiconductor Energy Laboratory Co., Ltd.
Inventor: Shunpei YAMAZAKI , Jun KOYAMA , Masashi TSUBUKU , Kosei NODA
IPC: H01L27/12 , G09G3/20 , G09G3/3291 , H01L29/786 , H03K19/003 , H03K19/096 , G11C19/28 , H03K17/16 , G09G3/36 , G11C19/18
Abstract: To reduce a leakage current of a transistor so that malfunction of a logic circuit can be suppressed. The logic circuit includes a transistor which includes an oxide semiconductor layer having a function of a channel formation layer and in which an off current is 1×10−13 A or less per micrometer in channel width. A first signal, a second signal, and a third signal that is a clock signal are input as input signals. A fourth signal and a fifth signal whose voltage states are set in accordance with the first to third signals which have been input are output as output signals.
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公开(公告)号:US20220416061A1
公开(公告)日:2022-12-29
申请号:US17902224
申请日:2022-09-02
Applicant: Semiconductor Energy Laboratory Co., Ltd.
Inventor: Shunpei YAMAZAKI , Hideomi SUZAWA , Shinya SASAGAWA , Motomu KURATA , Masashi TSUBUKU
IPC: H01L29/66 , H01L27/12 , H01L27/146 , H01L21/02 , H01L29/786
Abstract: The on-state characteristics of a transistor are improved and thus, a semiconductor device capable of high-speed response and high-speed operation is provided. A highly reliable semiconductor device showing stable electric characteristics is made. The semiconductor device includes a transistor including a first oxide layer; an oxide semiconductor layer over the first oxide layer; a source electrode layer and a drain electrode layer in contact with the oxide semiconductor layer; a second oxide layer over the oxide semiconductor layer; a gate insulating layer over the second oxide layer; and a gate electrode layer over the gate insulating layer. An end portion of the second oxide layer and an end portion of the gate insulating layer overlap with the source electrode layer and the drain electrode layer.
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公开(公告)号:US20220328693A1
公开(公告)日:2022-10-13
申请号:US17836004
申请日:2022-06-09
Applicant: Semiconductor Energy Laboratory Co., Ltd.
Inventor: Shunpei YAMAZAKI , Masashi TSUBUKU , Hiromichi GODO
IPC: H01L29/786 , H01L29/66
Abstract: It is an object to provide a highly reliable thin film transistor with stable electric characteristics, which includes an oxide semiconductor film. The channel length of the thin film transistor including the oxide semiconductor film is in the range of 1.5 μm to 100 μm inclusive, preferably 3 μm to 10 μm inclusive; when the amount of change in threshold voltage is less than or equal to 3 V, preferably less than or equal to 1.5 V in an operation temperature range of room temperature to 180° C. inclusive or −25° C. to 150° C. inclusive, a semiconductor device with stable electric characteristics can be manufactured. In particular, in a display device which is an embodiment of the semiconductor device, display unevenness due to variation in threshold voltage can be reduced.
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107.
公开(公告)号:US20220020586A1
公开(公告)日:2022-01-20
申请号:US17491637
申请日:2021-10-01
Applicant: Semiconductor Energy Laboratory Co., Ltd.
Inventor: Shunpei YAMAZAKI , Masashi TSUBUKU , Masashi OOTA , Yoichi KUROSAWA , Noritaka ISHIHARA
IPC: H01L21/02 , C23C14/08 , C01G15/00 , B82Y30/00 , C23C14/34 , C30B23/08 , C30B29/22 , H01J37/34 , C30B1/04 , C30B28/02 , C30B29/68 , H01L29/04 , H01L29/24 , H01L29/66 , H01L29/786
Abstract: A method for manufacturing a sputtering target with which an oxide semiconductor film with a small amount of defects can be formed is provided. Alternatively, an oxide semiconductor film with a small amount of defects is formed. A method for manufacturing a sputtering target is provided, which includes the steps of: forming a polycrystalline In-M-Zn oxide (M represents a metal chosen among aluminum, titanium, gallium, yttrium, zirconium, lanthanum, cesium, neodymium, and hafnium) powder by mixing, sintering, and grinding indium oxide, an oxide of the metal, and zinc oxide; forming a mixture by mixing the polycrystalline In-M-Zn oxide powder and a zinc oxide powder; forming a compact by compacting the mixture; and sintering the compact.
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公开(公告)号:US20210296371A1
公开(公告)日:2021-09-23
申请号:US17340165
申请日:2021-06-07
Applicant: Semiconductor Energy Laboratory Co., Ltd.
Inventor: Shunpei YAMAZAKI , Jun KOYAMA , Masashi TSUBUKU , Kosei NODA
IPC: H01L27/12 , G09G3/20 , G09G3/3291 , H01L29/786 , H03K19/003 , H03K19/096 , G11C19/28 , H03K17/16 , G09G3/36 , G11C19/18
Abstract: To reduce a leakage current of a transistor so that malfunction of a logic circuit can be suppressed. The logic circuit includes a transistor which includes an oxide semiconductor layer having a function of a channel formation layer and in which an off current is 1×10−13 A or less per micrometer in channel width. A first signal, a second signal, and a third signal that is a clock signal are input as input signals. A fourth signal and a fifth signal whose voltage states are set in accordance with the first to third signals which have been input are output as output signals.
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公开(公告)号:US20210005755A1
公开(公告)日:2021-01-07
申请号:US17026470
申请日:2020-09-21
Applicant: Semiconductor Energy Laboratory Co., Ltd.
Inventor: Shunpei YAMAZAKI , Masashi TSUBUKU , Hiromichi GODO
IPC: H01L29/786 , H01L29/66
Abstract: It is an object to provide a highly reliable thin film transistor with stable electric characteristics, which includes an oxide semiconductor film. The channel length of the thin film transistor including the oxide semiconductor film is in the range of 1.5 μm to 100 μm inclusive, preferably 3 μm to 10 μm inclusive; when the amount of change in threshold voltage is less than or equal to 3 V, preferably less than or equal to 1.5 V in an operation temperature range of room temperature to 180° C. inclusive or −25° C. to 150° C. inclusive, a semiconductor device with stable electric characteristics can be manufactured. In particular, in a display device which is an embodiment of the semiconductor device, display unevenness due to variation in threshold voltage can be reduced.
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公开(公告)号:US20200212078A1
公开(公告)日:2020-07-02
申请号:US16816806
申请日:2020-03-12
Applicant: Semiconductor Energy Laboratory Co., Ltd.
Inventor: Shunpei YAMAZAKI , Jun KOYAMA , Masashi TSUBUKU , Kosei NODA
IPC: H01L27/12 , G11C19/18 , G09G3/36 , H03K17/16 , G11C19/28 , G09G3/20 , H03K19/096 , H03K19/003 , H01L29/786 , G09G3/3291
Abstract: To reduce a leakage current of a transistor so that malfunction of a logic circuit can be suppressed. The logic circuit includes a transistor which includes an oxide semiconductor layer having a function of a channel formation layer and in which an off current is 1×10−13 A or less per micrometer in channel width. A first signal, a second signal, and a third signal that is a clock signal are input as input signals. A fourth signal and a fifth signal whose voltage states are set in accordance with the first to third signals which have been input are output as output signals.
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