公开(公告)号：US06831731B2

公开(公告)日：2004-12-14

申请号：US10183612

申请日：2002-06-28

申请人： Yasuhiro Omura ,  Naomasa Shiraishi ,  Issey Tanaka ,  Soichi Owa ,  Toshihiko Ozawa ,  Shunsuke Niisaka

发明人： Yasuhiro Omura ,  Naomasa Shiraishi ,  Issey Tanaka ,  Soichi Owa ,  Toshihiko Ozawa ,  Shunsuke Niisaka

IPC分类号： G03B2754

CPC分类号： G02B17/0892 ,  G02B13/24 ,  G02B17/08 ,  G03F7/70225 ,  G03F7/70233 ,  G03F7/70358 ,  G03F7/70566 ,  G03F7/70966

摘要： A projection optical system, which forms a reduced image of a first surface onto a second surface, has excellent optical performance without substantially being affected by birefringence despite the use of optical material having intrinsic birefringence. This is done by suitably arranging certain crystal axes of radiation transmissive members that make up the projection optical system relative to the optical axis of the projection optical system, and by suitably arranging the certain crystal axes of the radiation transmissive members relative to the crystal axes of other radiation transmissive members in the projection optical system.

摘要翻译： 将第一表面的缩小图像形成到第二表面上的投影光学系统虽然使用具有固有双折射的光学材料，但是基本上不受双折射的影响，具有优异的光学性能。 这通过适当地布置构成投影光学系统的相对于投影光学系统的光轴的辐射透射构件的某些晶轴，并且通过将辐射透射构件的某些晶轴相对于晶体轴适当地布置 投影光学系统中的其他辐射透射构件。

公开(公告)号：US06788389B2

公开(公告)日：2004-09-07

申请号：US10191428

申请日：2002-07-10

申请人： Youhei Fujishima ,  Hironori Ikezawa ,  Toshihiko Ozawa ,  Yasuhiro Omura ,  Takeshi Suzuki

发明人： Youhei Fujishima ,  Hironori Ikezawa ,  Toshihiko Ozawa ,  Yasuhiro Omura ,  Takeshi Suzuki

IPC分类号： G03B2754

CPC分类号： G03F7/70241 ,  C30B11/00 ,  C30B29/12 ,  G03F7/705 ,  G03F7/706 ,  G03F7/70966 ,  G03F7/70975

摘要： A projection optical system in which an image of a first surface is projected onto a second surface based on a light beam having a predetermined wavelength. The projection optical system having at least one isometric system refractive member made of an isometric system crystal material. The isometric system crystal material transmits a light beam having the predetermined wavelength. The projection optical system also has an amorphous refractive member made of an amorphous material for compensating deterioration of optical performance due to intrinsic birefringence of the isometric system refractive member.

摘要翻译： 一种投影光学系统，其中基于具有预定波长的光束将第一表面的图像投影到第二表面上。 投影光学系统具有至少一个等距系统折射构件，其由等轴系统晶体材料制成。 等轴系统晶体材料透射具有预定波长的光束。 投影光学系统还具有由非晶材料制成的非晶折射构件，用于补偿等距系统折射构件的固有双折射引起的光学性能劣化。

公开(公告)号：US06768537B2

公开(公告)日：2004-07-27

申请号：US10417120

申请日：2003-04-17

申请人： Takeshi Suzuki ,  Hideki Komatsuda ,  Yasuhiro Omura

发明人： Takeshi Suzuki ,  Hideki Komatsuda ,  Yasuhiro Omura

IPC分类号： G03B2748

CPC分类号： G03F7/70941 ,  G03B27/48

摘要： A projection optical system for forming an image of a pattern in a first plane onto a second plane using exposure light in a wavelength region of shorter than 200 nm. When a projection pattern placed in the first plane and having a dark pattern and a light pattern around the dark pattern is projected onto the second plane, an average illuminance in a area where a projected image of the dark pattern is formed in the second plane is 8 or less, where an illuminance of an image of the light pattern around the dark pattern in the second plane is set to be 100.

摘要翻译： 一种投影光学系统，用于在短于200nm的波长区域中使用曝光光将第一平面中的图案的图像形成到第二平面上。 当放置在第一平面中并且具有暗图案和围绕暗图案的光图案的投影图案被投影到第二平面上时，在第二平面中形成暗图案的投影图像的区域中的平均照度为 8或更小，其中在第二平面中暗图案周围的光图案的图像的照度设置为100。

公开(公告)号：US06750948B2

公开(公告)日：2004-06-15

申请号：US10104033

申请日：2002-03-25

申请人： Yasuhiro Omura

发明人： Yasuhiro Omura

IPC分类号： G03B2742

CPC分类号： G03F7/70233 ,  G02B17/0652 ,  G03F7/70358

摘要： A projection optical system having a large numerical aperture in a soft X-ray wavelength range of 200 nm or less, specifically 100 nm or less and a resolution drastically lower than 50 nm, and a projection exposure apparatus provided with the projection optical system.

摘要翻译： 具有200nm以下的软X射线波长范围，特别是100nm以下，分辨率大大低于50nm的投影光学系统，以及投影光学系统。

公开(公告)号：US06714280B2

公开(公告)日：2004-03-30

申请号：US10079519

申请日：2002-02-22

申请人： Yasuhiro Omura

发明人： Yasuhiro Omura

IPC分类号： G03B2742

CPC分类号： G03F7/70025 ,  G02B13/143 ,  G03F7/70241 ,  G03F7/70575 ,  G03F7/70958

摘要： A projection optical system transferring a mask image on a mask onto a substrate and correcting chromatic aberration. A projection exposure system includes at least two refractive optical members collectively containing at least a first fluoride substance and a second fluoride substance, and satisfying the design condition 0.4

摘要翻译： 投影光学系统将掩模上的掩模图像转印到基板上并校正色差。 投影曝光系统包括至少两个折射光学构件，其共同地至少包含第一氟化物物质和第二氟化物物质，并且满足设计条件，其中MX1是折射率表面中具有最大有效孔径的表面的有效孔径 含有第一氟化物物质的光学构件MX2是包含第二氟化物物质的折射光学构件的表面中具有最大有效孔径的表面的有效孔径，MX1大于MX2。 投影曝光装置包括投影光学系统和提供具有入射在线宽变窄单元上的自然线宽的辐射的光源，以提供具有比天然线宽窄的线宽的曝光用辐射。

公开(公告)号：US06451507B1

公开(公告)日：2002-09-17

申请号：US09377010

申请日：1999-08-18

申请人： Yutaka Suenaga ,  Yasuhiro Omura

发明人： Yutaka Suenaga ,  Yasuhiro Omura

IPC分类号： G02C500

CPC分类号： G03F7/70058 ,  G03F7/70241

摘要： An exposure apparatus (PE1) and exposure method for use in photolithographically manufacturing devices such as semiconductor devices, image pickup devices, liquid crystal display devices and thin film magnetic heads. The apparatus is capable of transferring onto a substrate (W) the image of a pattern on a reticle (R) and includes a light source (2) capable of supplying an exposure energy beam (IL) with a wavelength under 200 nm, and an illumination optical system arranged to receive the exposure energy beam from said light source. The illumination optical system is designed to guide the exposure energy beam to the reticle. The apparatus also includes a projection optical system (PL) arranged between the reticle and the substrate. The projection optical system is capable of forming an image of the reticle pattern onto the substrate based on the exposure energy beam passing through the reticle. The projection optical system has a plurality of refractive optical members, wherein at least two such refractive optical members are arranged along an optical path of said exposure energy beam, and wherein each refractive optical member is made of at least two types of fluoride crystalline materials.

公开(公告)号：US06195213B1

公开(公告)日：2001-02-27

申请号：US09328198

申请日：1999-06-08

申请人： Yasuhiro Omura ,  Tetsuo Takahashi ,  Masatoshi Ikeda ,  Shiwen Li ,  Yutaka Ichihara

发明人： Yasuhiro Omura ,  Tetsuo Takahashi ,  Masatoshi Ikeda ,  Shiwen Li ,  Yutaka Ichihara

IPC分类号： G02B1700

CPC分类号： G02B17/0892 ,  G02B13/143 ,  G02B17/08 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/70808 ,  G03F7/70825 ,  G03F7/70833

摘要： The present invention relates to a projection exposure apparatus (10) for and method of imaging a reticle (R) having patterned surface onto a substrate (W) in photolithographic processes for manufacturing a variety of devices. The invention further relates to an optical system (C) having a folding member (M1) suited to the projection exposure apparatus, and a method for manufacturing the optical system. The projection exposure apparatus comprises an illumination optical system (IS) and a reticle stage (RS) capable of holding the reticle so the normal line to its patterned surface is in the direction of gravity. The apparatus also includes a substrate stage (WS) capable of holding the substrate with its surface normal parallel to the direction of gravity. The optical system includes a first imaging optical system (A) comprising a concave reflecting mirror and a dioptric optical member arranged along a first optical axis. The first imaging optical system (A) forms an intermediate image of the patterned surface. The optical system also includes a second imaging optical system (B) having a second optical axis, and forms a reduced image of the intermediate image on the substrate. The first folding member is arranged in the optical path from the first imaging optical system to the second imaging optical system. The first and second imaging optical systems and the first and second folding members are positioned so that a reduced image of the pattered surface is formed parallel to the pattern surface of the reticle, and the first and second optical axes are positioned so that they are substantially parallel to the direction of gravity.

摘要翻译： 本发明涉及一种投影曝光装置（10），该投影曝光装置（10）用于在具有用于制造各种装置的光刻工艺中将具有图案化表面的掩模版（R）成像到基板（W）上。 本发明还涉及一种具有适合于投影曝光装置的折叠构件（M1）的光学系统（C），以及用于制造光学系统的方法。 投影曝光装置包括能够保持标线的照明光学系统（IS）和光罩台（RS），使得其图案化表面的法线在重力方向上。 该装置还包括能够将其表面保持平行于重力方向的基板的基底台（WS）。 光学系统包括第一成像光学系统（A），其包括沿第一光轴布置的凹面反射镜和屈光光学构件。 第一成像光学系统（A）形成图案化表面的中间图像。 光学系统还包括具有第二光轴的第二成像光学系统（B），并且在基板上形成中间图像的缩小图像。 第一折叠构件布置在从第一成像光学系统到第二成像光学系统的光路中。 第一和第二成像光学系统以及第一和第二折叠构件被定位成使得图案化表面的缩小图像平行于标线板的图案表面形成，并且第一和第二光轴被定位成使得它们基本上 平行于重力方向。

公开(公告)号：US06104542A

公开(公告)日：2000-08-15

申请号：US20877

申请日：1998-02-09

申请人： Yasuhiro Omura

发明人： Yasuhiro Omura

IPC分类号： G02B25/00

CPC分类号： G02B25/001

摘要： Wide-angle eyepiece lenses for a microscope are disclosed. A representative lens comprises, from the object side to the eye side, a first lens group with positive refractive power, a second lens group with a concave surface facing the object side and a surface (closest to the object side) contacting air, and a third lens group with positive refractive power and at least one surface contacting air. One or both of the surface of the second lens group closest to the object side and the air-contacting surface of the third lens group is aspherical.

摘要翻译： 公开了用于显微镜的广角目镜。 代表性透镜包括从物体侧到眼睛侧的具有正折光力的第一透镜组，具有面向物体侧的凹面的第二透镜组和与空气接触的表面（最靠近物体侧），以及 具有正屈光力和至少一个表面接触空气的第三透镜组。 最靠近物体侧的第二透镜组的表面和第三透镜组的空气接触表面中的一个或两个是非球面的。

公开(公告)号：US5835275A

公开(公告)日：1998-11-10

申请号：US883748

申请日：1997-06-27

申请人： Tetsuo Takahashi ,  Yasuhiro Omura

发明人： Tetsuo Takahashi ,  Yasuhiro Omura

IPC分类号： G02B17/08 ,  G03F7/20 ,  H01L21/027 ,  G02B27/14 ,  G02B17/00

CPC分类号： G02B17/0892 ,  G02B17/08 ,  G03F7/70225 ,  G03F7/7025 ,  G03F7/70275

摘要： Catadioptric systems are provided, comprising a first imaging system, a plane mirror, and a second imaging system. The first imaging system comprises a single-pass optical system and a double-pass optical system that further comprises a concave mirror and a double-pass lens group. The second imaging system comprises a plane mirror and an aperture. The first imaging system forms an intermediate image of an object; the second imaging system re-images the intermediate image on a substrate. The catadioptric systems satisfy various conditions.

摘要翻译： 提供反射折射系统，包括第一成像系统，平面镜和第二成像系统。 第一成像系统包括单通光学系统和还包括凹面镜和双透镜组的双通光学系统。 第二成像系统包括平面镜和孔。 第一成像系统形成物体的中间图像; 第二成像系统将衬底上的中间图像重新图像。 反射折射系统满足各种条件。

公开(公告)号：US4986125A

公开(公告)日：1991-01-22

申请号：US460274

申请日：1990-01-02

申请人： Yasuhiro Omura ,  Mitsugu Sakai ,  Koichi Karaki ,  Yasuo Sasaki

发明人： Yasuhiro Omura ,  Mitsugu Sakai ,  Koichi Karaki ,  Yasuo Sasaki

IPC分类号： G01N29/06 ,  G01H3/12 ,  G01N29/28

CPC分类号： G01H3/125

摘要： A supersonic microscope comprises a container for containing a liquid nitrogen, and an acoustic lens housed in the container to emit a supersonic beam onto the view face of a sample. A volume-variable member is provided in the liquid so that its upper part is extended from the top surface of the liquid. When the observing of the sample, the vertical position of the member is changed for moving the top surface of the liquid nitrogen up and down so that the top surface of the liquid contacts the view face of the sample.

摘要翻译： 超音速显微镜包括用于容纳液氮的容器和容纳在容器中以将超音速光束发射到样品的视图上的声透镜。 在液体中设置体积可变构件，使得其上部从液体的顶表面延伸。 当观察样品时，改变构件的垂直位置以使液氮的上表面上下移动，使得液体的顶表面接触样品的视图。