公开(公告)号：US07212288B2

公开(公告)日：2007-05-01

申请号：US10886110

申请日：2004-07-07

申请人： Jon Opsal ,  Lena Nicolaides ,  Alex Salnik

发明人： Jon Opsal ,  Lena Nicolaides ,  Alex Salnik

IPC分类号： G01N21/55

CPC分类号： G01N21/9501 ,  G01N21/1717 ,  G01N21/9505

摘要： A system for evaluating semiconductor wafers includes illumination sources for generating probe and pump beams. The pump beam is focused on the surface of a sample and a beam steering mechanism is used to modulate the point of focus in a predetermined pattern. The moving pump beam introduces thermal and plasma waves in the sample causing changes in the reflectivity of the surface of the sample. The probe beam is focused within or adjacent to the area illuminated by the pump beam. The reflected probe beam is gathered and used to measure the changes in reflectivity induced by the pump beam. By analyzing changes in reflectivity, a processor is able to deduce structure and chemical details of the sample.

摘要翻译： 用于评估半导体晶片的系统包括用于产生探针和泵浦光束的照明源。 泵浦光束聚焦在样品的表面上，并且使用光束转向机构以预定图案调制聚焦点。 移动的泵浦光束在样品中引入热和等离子体波，导致样品表面的反射率的变化。 探测光束聚焦在由泵浦光束照射的区域内或附近。 反射的探测光束被聚集并用于测量由泵浦光引起的反射率的变化。 通过分析反射率的变化，处理器能够推断样品的结构和化学细节。

公开(公告)号：US07206071B2

公开(公告)日：2007-04-17

申请号：US11273686

申请日：2005-11-14

申请人： Jon Opsal

发明人： Jon Opsal

IPC分类号： G01B11/06

CPC分类号： G01B11/0641 ,  G01J4/04 ,  G01N21/211 ,  G01N2021/213

摘要： An apparatus is disclosed for obtaining ellipsometric measurements from a sample. A probe beam is focused onto the sample to create a spread of angles of incidence. The beam is passed through a quarter waveplate retarder and a polarizer. The reflected beam is measured by a detector. In one preferred embodiment, the detector includes eight radially arranged segments, each segment generating an output which represents an integration of multiple angle of incidence. A processor manipulates the output from the various segments to derive ellipsometric information.

摘要翻译： 公开了一种用于从样品获得椭偏测量的装置。 探针光束聚焦在样品上以产生入射角的扩展。 光束通过四分之一波片延迟器和偏振器。 反射光束由检测器测量。 在一个优选实施例中，检测器包括八个径向布置的段，每个段产生表示多个入射角的积分的输出。 处理器处理来自各个段的输出以导出椭偏信息。

公开(公告)号：US20070008541A1

公开(公告)日：2007-01-11

申请号：US11520512

申请日：2006-09-13

申请人： Jon Opsal ,  Lena Nicolaides ,  Alex Salnik ,  Allan Rosencwaig

发明人： Jon Opsal ,  Lena Nicolaides ,  Alex Salnik ,  Allan Rosencwaig

IPC分类号： G01N21/55

CPC分类号： G01N21/636 ,  G01N21/1717

摘要： A modulated reflectance measurement system includes lasers for generating an intensity modulated pump beam and a UV probe beam. The pump and probe beams are focused on a measurement site within a sample. The pump beam periodically excites the measurement site and the modulation is imparted to the probe beam. For one embodiment, the wavelength of the probe beam is selected to correspond to a local maxima of the temperature reflectance coefficient of the sample. For a second embodiment, the probe laser is tuned to either minimize the thermal wave contribution to the probe beam modulation or to equalize the thermal and plasma wave contributions to the probe beam modulation.

摘要翻译： 调制反射测量系统包括用于产生强度调制泵浦光束和UV探测光束的激光器。 泵和探针光束聚焦在样品内的测量位置。 泵浦光束周期性地激发测量位置，并且调制被赋予探测光束。 对于一个实施例，选择探针光束的波长以对应于样品的温度反射系数的局部最大值。 对于第二实施例，探针激光器被调谐以使对热探测波束调制的热波贡献最小化，或者使得等离子体波对探测光束调制的贡献均衡。

公开(公告)号：US20060262314A1

公开(公告)日：2006-11-23

申请号：US11492583

申请日：2006-07-25

申请人： Lena Nicolaides ,  Jeffrey Fanton ,  Alex Salnik ,  Jon Opsal

发明人： Lena Nicolaides ,  Jeffrey Fanton ,  Alex Salnik ,  Jon Opsal

IPC分类号： G01N21/55

CPC分类号： G01N21/39 ,  G01N21/1717 ,  G01N21/55 ,  G01N21/636 ,  G01N21/9501 ,  G01N2201/0612 ,  G01N2201/0691

摘要： A modulated reflectance measurement system includes three monochromatic diode-based lasers. Each laser can operate as a probe beam or as a pump beam source. The laser outputs are redirected using a series of mirrors and beam splitters to reach an objective lens. The objective lens focuses the laser outputs on a sample. Reflected energy returns through objective and is redirected by a beam splitter to a detector. A lock-in amplifier converts the output of the detector to produce quadrature (Q) and in-phase (I) signals for analysis. A Processor uses the Q and/or I signals to analyze the sample. By changing the number of lasers used as pump or probe beam sources, the measurement system can be optimized to measure a range of different samples types.

公开(公告)号：US07126690B2

公开(公告)日：2006-10-24

申请号：US10659626

申请日：2003-09-10

申请人： Jon Opsal ,  Lena Nicolaides ,  Alex Salnik ,  Allan Rosencwaig

发明人： Jon Opsal ,  Lena Nicolaides ,  Alex Salnik ,  Allan Rosencwaig

IPC分类号： G01N21/55

CPC分类号： G01N21/636 ,  G01N21/1717

摘要： A modulated reflectance measurement system includes lasers for generating an intensity modulated pump beam and a UV probe beam. The pump and probe beams are focused on a measurement site within a sample. The pump beam periodically excites the measurement site and the modulation is imparted to the probe beam. For one embodiment, the wavelength of the probe beam is selected to correspond to a local maxima of the temperature reflectance coefficient of the sample. For a second embodiment, the probe laser is tuned to either minimize the thermal wave contribution to the probe beam modulation or to equalize the thermal and plasma wave contributions to the probe beam modulation.

摘要翻译： 调制反射测量系统包括用于产生强度调制泵浦光束和UV探测光束的激光器。 泵和探针光束聚焦在样品内的测量位置。 泵浦光束周期性地激发测量位置，并且调制被赋予探测光束。 对于一个实施例，选择探针光束的波长以对应于样品的温度反射系数的局部最大值。 对于第二实施例，探针激光器被调谐以使对热探测波束调制的热波贡献最小化，或者使得等离子体波对探测光束调制的贡献均衡。

公开(公告)号：US20060167651A1

公开(公告)日：2006-07-27

申请号：US11043196

申请日：2005-01-26

申请人： Shahin Zangooie ,  Youxian Wen ,  Heath Pois ,  Jon Opsal

发明人： Shahin Zangooie ,  Youxian Wen ,  Heath Pois ,  Jon Opsal

IPC分类号： G06F17/18

CPC分类号： G01B11/0625 ,  G05B13/024 ,  G05B15/02

摘要： Measurement data sets for optical metrology systems can be processed in parallel using Multiple Tool and Structure Analysis (MTSA). In an MTSA procedure, at least one parameter that is common to the data sets can be coupled as a global parameter. Setting this parameter as global allows a regression on each data set to contain fewer fitting parameters, making the process is less complex, requiring less processing capacity, and providing more accurate results. MTSA can analyze multiple structures measured on a single tool, or a single structure measured on separate tools. For a multiple tool recipe, a minimized regression solution can be applied back to each tool to determine whether the recipe is optimized. If the recipe does not provide accurate results for each tool, search parameters and/or spaces can be modified in an iterative manner until an optimized solution is obtained that provides acceptable solutions on each tool.

公开(公告)号：US20060103844A1

公开(公告)日：2006-05-18

申请号：US11269204

申请日：2005-11-08

申请人： Jon Opsal

发明人： Jon Opsal

IPC分类号： G01J4/00

CPC分类号： G01J4/04 ,  G01N21/211

摘要： An optical inspection device includes a light source for generating a probe beam. The probe beam is focused onto a sample to create a spread of angles of incidence. After reflecting from the sample, the light is imaged onto a two dimensional array of photodetectors. Prior to reaching the detector array, the beam is passed through a rotating compensator. A processor functions to evaluate the sample by analyzing the output of the photodetectors lying along one or more azimuthal angles and at different compensator positions.

摘要翻译： 光学检查装置包括用于产生探测光束的光源。 探测光束被聚焦到样品上以产生入射角的扩展。 从样品反射后，将光成像到二维阵列的光电探测器上。 在到达检测器阵列之前，光束通过旋转补偿器。 处理器用于通过分析沿着一个或多个方位角并且处于不同补偿器位置的光电探测器的输出来评估样本。

公开(公告)号：US07031848B2

公开(公告)日：2006-04-18

申请号：US11177699

申请日：2005-07-08

申请人： Jon Opsal ,  Hanyou Chu

发明人： Jon Opsal ,  Hanyou Chu

IPC分类号： G06F17/00

CPC分类号： G03F7/70616 ,  G01B11/24 ,  G01N21/211 ,  G03F7/705 ,  G03F7/70625

摘要： A system for characterizing geometric structures formed on a sample on a real time basis is disclosed. A multi-parameter measurement module generates output signals as a function of either wavelength or angle of incidence. The output signals are supplied to a parallel processor. The processor creates an initial theoretical model and then calculates the theoretical optical response of that sample. The calculated optical response is compared to measured values. Based on the comparison, the model configuration is modified to be closer to the actual measured structure. The processor recalculates the optical response of the modified model and compares the result to the measured data. This process is repeated in an iterative manner until a best fit is achieved. The steps of calculating the optical response of the model is distributed to the processors as a function of wavelength or angle of incidence so these calculations can be performed in parallel.

摘要翻译： 公开了一种在实时基础上表征样品上形成的几何结构的系统。 多参数测量模块产生作为波长或入射角的函数的输出信号。 输出信号被提供给并行处理器。 处理器创建一个初始理论模型，然后计算该样本的理论光学响应。 将计算出的光学响应与测量值进行比较。 基于比较，模型配置被修改为更接近实际的测量结构。 处理器重新计算修改模型的光学响应，并将结果与​​测量数据进行比较。 以迭代的方式重复该过程，直到达到最佳拟合。 计算模型的光学响应的​​步骤作为波长或入射角分布到处理器，因此可以并行执行这些计算。

公开(公告)号：US06989899B2

公开(公告)日：2006-01-24

申请号：US10387259

申请日：2003-03-12

申请人： Alex Salnik ,  Lena Nicolaides ,  Jon Opsal

发明人： Alex Salnik ,  Lena Nicolaides ,  Jon Opsal

IPC分类号： G01N21/00 ,  G01N21/55

CPC分类号： G01N21/276 ,  G01N21/1717 ,  G01N21/55 ,  G01N2021/3568

摘要： A method for simultaneously monitoring ion implantation dose, damage and/or dopant depth profiles in ion-implanted semiconductors includes a calibration step where the photo-modulated reflectance of a known damage profile is identified in I-Q space. In a following measurement step, the photo-modulated reflectance of a subject is empirically measured to obtain in-phase and quadrature values. The in-phase and quadrature values are then compared, in I-Q space, to the known damage profile to characterize the damage profile of the subject.

摘要翻译： 在离子注入的半导体中同时监测离子注入剂量，损伤和/或掺杂剂深度分布的方法包括校准步骤，其中在I-Q空间中识别已知损伤谱的光调制反射率。 在随后的测量步骤中，经验地测量受试者的光调制反射率以获得同相和正交值。 然后在I-Q空间中将同相和正交值与已知的损伤特征进行比较，以表征受试者的损伤特征。

公开(公告)号：US06934025B2

公开(公告)日：2005-08-23

申请号：US10839049

申请日：2004-05-05

申请人： Jon Opsal ,  Jeffrey T. Fanton ,  Craig Uhrich

发明人： Jon Opsal ,  Jeffrey T. Fanton ,  Craig Uhrich

IPC分类号： G01B11/06 ,  G01J4/00 ,  G01N21/21

CPC分类号： G01B11/0641 ,  G01J4/00 ,  G01N21/211

摘要： An optical measurement system for evaluating a reference sample, having at least a partially known composition, includes a reference ellipsometer and at least one non-contact optical measurement device. The ellipsometer includes a light generator, an analyzer, and a detector. The light generator generates a beam of quasi-monochromatic light of known wavelength and polarization, which is directed at a non-normal angle of incidence relative to the reference sample. The analyzer creates interference between S and P polarized components in the beam after interaction with the sample. The detector then measures the intensity of the beam, which a processor uses to determine the polarization state of the beam and, subsequently, an optical property of the reference sample. The processor then can calibrate an optical measurement device by comparing a measured optical parameter from the optical measurement device to the determined optical property from the reference ellipsometer.

摘要翻译： 用于评估具有至少部分已知组成的参考样品的光学测量系统包括参考椭偏仪和至少一个非接触式光学测量装置。 椭偏仪包括光发生器，分析器和检测器。 光发生器产生已知波长和极化的准单色光束，其被引导到相对于参考样本的非正常入射角。 分析仪在与样品相互作用后，在光束中产生S和P偏振分量之间的干扰。 然后，检测器测量光束的强度，处理器用于确定光束的偏振状态，随后测量参考样品的光学特性。 然后，处理器可以通过将来自光学测量装置的测量光学参数与来自参考椭偏仪的所确定的光学特性进行比较来校准光学测量装置。