公开(公告)号：US20100157812A1

公开(公告)日：2010-06-24

申请号：US12343056

申请日：2008-12-23

申请人： Aaron Blocker ,  Chin-Wang Chao ,  Wenwen Ji ,  Herman Lee ,  John Lee ,  Sheauling Tang

发明人： Aaron Blocker ,  Chin-Wang Chao ,  Wenwen Ji ,  Herman Lee ,  John Lee ,  Sheauling Tang

IPC分类号： H04L12/26

CPC分类号： H04L41/5074 ,  H04L41/0631

摘要： A method and apparatus for providing asynchronous alarm correlation in packet networks are disclosed. For example, the method receives a trigger, and performs an asynchronous correlation of at least one root cause alarm with at least one symptom alarm.

摘要翻译： 公开了一种在分组网络中提供异步报警相关性的方法和装置。 例如，该方法接收触发，并且执行至少一个根本原因警报与至少一个症状警报的异步相关。

公开(公告)号：US07651951B2

公开(公告)日：2010-01-26

申请号：US11681027

申请日：2007-03-01

申请人： Luan Tran ,  William T. Rericha ,  John Lee ,  Ramakanth Alapati ,  Sheron Honarkhah ,  Shuang Meng ,  Puneet Sharma ,  Jingyi Bai ,  Zhiping Yin ,  Paul Morgan ,  Mirzafer K. Abatchev ,  Gurtej S. Sandhu ,  D. Mark Durcan

发明人： Luan Tran ,  William T. Rericha ,  John Lee ,  Ramakanth Alapati ,  Sheron Honarkhah ,  Shuang Meng ,  Puneet Sharma ,  Jingyi Bai ,  Zhiping Yin ,  Paul Morgan ,  Mirzafer K. Abatchev ,  Gurtej S. Sandhu ,  D. Mark Durcan

IPC分类号： H01L21/302 ,  H01L21/461

CPC分类号： H01L21/0338 ,  H01L21/0337 ,  H01L21/3086 ,  H01L21/3088

摘要： Differently-sized features of an integrated circuit are formed by etching a substrate using a mask which is formed by combining two separately formed patterns. Pitch multiplication is used to form the relatively small features of the first pattern and conventional photolithography used to form the relatively large features of the second pattern. Pitch multiplication is accomplished by patterning a photoresist and then etching that pattern into an amorphous carbon layer. Sidewall spacers are then formed on the sidewalls of the amorphous carbon. The amorphous carbon is removed, leaving behind the sidewall spacers, which define the first mask pattern. A bottom anti-reflective coating (BARC) is then deposited around the spacers to form a planar surface and a photoresist layer is formed over the BARC. The photoresist is next patterned by conventional photolithography to form the second pattern, which is then is transferred to the BARC. The combined pattern made out by the first pattern and the second pattern is transferred to an underlying amorphous silicon layer and the pattern is subjected to a carbon strip to remove BARC and photoresist material. The combined pattern is then transferred to the silicon oxide layer and then to an amorphous carbon mask layer. The combined mask pattern, having features of difference sizes, is then etched into the underlying substrate through the amorphous carbon hard mask layer.

公开(公告)号：US20090122738A1

公开(公告)日：2009-05-14

申请号：US11983829

申请日：2007-11-13

申请人： Wai Chen ,  Stephanie Demers ,  John Lee ,  Marcus Pang ,  Ryokichi Onishi ,  Toshiro Hikita

发明人： Wai Chen ,  Stephanie Demers ,  John Lee ,  Marcus Pang ,  Ryokichi Onishi ,  Toshiro Hikita

IPC分类号： H04H20/71

CPC分类号： H04H20/08 ,  H04H20/57 ,  H04H60/50 ,  H04H60/53 ,  H04L12/1868 ,  H04L12/189 ,  H04L45/16 ,  H04W40/20

摘要： A method for distributing a packet to a plurality of moving nodes comprising receiving a packet containing at least a message, a sender identifier, a location of a sender, an identifier for a relay node and distance from the sender and the relay node, determining if a node receiving the packet is the relay node and immediately distributing the packet to a plurality of moving nodes if the receiving node is the relay node. If the receiving node is not the relay node, the method further comprises steps of waiting a set period of time, determining if a packet is received from a different sender containing the same message, within the period of time and distributing the packet to a plurality of moving nodes if a packet containing the same message is not received within the period of time. The distributed packet includes an identifier for a successive relay node.

摘要翻译： 一种用于将分组分发到多个移动节点的方法，包括：接收包含至少一个消息的包，发送方标识符，发送者的位置，中继节点的标识符和距发件人和中继节点的距离，确定是否 如果接收节点是中继节点，则接收分组的节点是中继节点，并且立即将分组分发到多个移动节点。 如果接收节点不是中继节点，则该方法还包括在一段时间内等待设定的时间段，确定是否从包含相同消息的不同发送方接收到分组的步骤，并将分组分发到多个 如果在一段时间内没有收到包含相同消息的数据包，则移动节点。 分布式分组包括用于连续中继节点的标识符。

公开(公告)号：US20080227293A1

公开(公告)日：2008-09-18

申请号：US12119831

申请日：2008-05-13

申请人： Luan C. Tran ,  John Lee ,  Zengtao "Tony" Liu ,  Eric Freeman ,  Russell Nielsen

发明人： Luan C. Tran ,  John Lee ,  Zengtao "Tony" Liu ,  Eric Freeman ,  Russell Nielsen

IPC分类号： H01L21/768 ,  H01L21/306

CPC分类号： H01L21/0334 ,  H01L21/0337 ,  H01L21/0338 ,  H01L21/30604 ,  H01L21/3083 ,  H01L21/31144 ,  H01L21/76816 ,  H01L21/76877 ,  H01L21/76897 ,  H01L23/544 ,  H01L27/1052 ,  H01L2924/0002 ,  Y10S438/947 ,  H01L2924/00

摘要： A method for defining patterns in an integrated circuit comprises defining a plurality of features in a first photoresist layer using photolithography over a first region of a substrate. The method further comprises using pitch multiplication to produce at least two features in a lower masking layer for each feature in the photoresist layer. The features in the lower masking layer include looped ends. The method further comprises covering with a second photoresist layer a second region of the substrate including the looped ends in the lower masking layer. The method further comprises etching a pattern of trenches in the substrate through the features in the lower masking layer without etching in the second region. The trenches have a trench width.

摘要翻译： 用于限定集成电路中的图案的方法包括在衬底的第一区域上使用光刻法在第一光致抗蚀剂层中限定多个特征。 该方法还包括使用音调倍增以在光致抗蚀剂层中的每个特征的下掩蔽层中产生至少两个特征。 下掩蔽层中的特征包括环形端。 该方法还包括用第二光致抗蚀剂层覆盖包括下掩蔽层中的环状末端的衬底的第二区域。 该方法还包括通过下掩蔽层中的特征蚀刻衬底中的沟槽图案，而不在第二区域内进行蚀刻。 沟槽具有沟槽宽度。

公开(公告)号：US20080095134A1

公开(公告)日：2008-04-24

申请号：US11584979

申请日：2006-10-23

申请人： Wai Chen ,  Marcus Pang ,  Jasmine Chennikara-Varghese ,  John Lee ,  Toshiro Hikita ,  Ryokichi Onishi ,  Taek-Jin Kwon

发明人： Wai Chen ,  Marcus Pang ,  Jasmine Chennikara-Varghese ,  John Lee ,  Toshiro Hikita ,  Ryokichi Onishi ,  Taek-Jin Kwon

IPC分类号： H04B7/216

CPC分类号： H04B7/2606 ,  H04W40/32 ,  H04W84/22

摘要： An ad-hoc wireless network with a roadside network unit (RSU) and a local peer group (LPG). The LPG is formed from a plurality of moving vehicles. The LPG includes a group header node (GH) for managing the LPG. The GH is elected from one of the moving vehicles. The LPG further includes group nodes (GN) designated from the remaining moving vehicles in a given area. Each of the moving vehicles, whether the GH or the GN, communicates with other using routing paths created based upon a first control packet broadcast from the GH and a second control packet broadcast from each of the GN. Each moving vehicle communicates with the RSU using a routing paths created based upon a beacon broadcast by the RSU and a reply signal from each of the moving vehicles. The RSU can also be a member of the LPG and act as GN or GH.

摘要翻译： 具有路边网络单元（RSU）和本地对等组（LPG）的自组织无线网络。 LPG由多个移动车辆形成。 LPG包括一个用于管理LPG的组头节点（GH）。 GH从其中一个移动车辆中选出。 LPG还包括从给定区域中的其余移动车辆指定的组节点（GN）。 每个移动的车辆，无论是GH还是GN，都与基于从GH广播的第一控制分组创建的其他使用路由路径和从每个GN广播的第二控制分组进行通信。 每个移动车辆使用基于由RSU广播的信标创建的路由路径和来自每个移动车辆的回复信号与RSU通信。 RSU也可以是液化石油气的成员，作为GN或GH。

公开(公告)号：US20070197831A1

公开(公告)日：2007-08-23

申请号：US10589413

申请日：2004-04-01

申请人： John Lee ,  Rajeev Mathur

发明人： John Lee ,  Rajeev Mathur

IPC分类号： C07F5/02

CPC分类号： C07F5/027

摘要： This invention provides a process for producing a protic ammonium tetrakis(Faryl)borate. The process comprises mixing together (a) at least one alkali metal tetrakis(Faryl)borate, at least one magnesium tetrakis(Faryl)borate, at least one halo-magnesium tetrakis(Faryl)borate, or a mixture of two or more of the foregoing, (b) at least one amine, and (c) one or more liquid dihydrocarbyl ethers, one or more liquid hydrocarbons, one or more liquid halogenated hydrocarbons, or a mixture of two or more of the foregoing, to form a solution or slurry in a liquid organic medium. At least one protic acid is mixed together with at least a portion of the solution or slurry formed in i), such that a protic ammonium tetrakis(Faryl)borate is formed. The amine has the formula R3N, in which each R is independently a hydrocarbyl group containing up to about thirty carbon atoms. Each of the Faryl groups is a fluorine-containing aryl group that has bonded directly to an aromatic ring at least two fluorine atoms, or at least two perfluorohydrocarbyl groups, or at least one fluorine atom and at least one perfluorohydrocarbyl group.

摘要翻译： 本发明提供了一种生产四氨基四氢（P）芳基）质子铵的方法。 所述方法包括将（a）至少一种碱金属四（非 - 氟）芳基）硼酸盐，至少一种四（四丁基）芳基硼酸镁，至少一种卤代 - 或四种（F）芳基）硼酸镁，或上述两种或多种的混合物，（b）至少一种胺，和（c）一种或多种液体二烃基醚，一种或多种液体烃 ，一种或多种液体卤代烃，或两种或更多种前述物质的混合物，以在液体有机介质中形成溶液或浆液。 将至少一种质子酸与i）中形成的溶液或浆料的至少一部分混合在一起，从而形成四氨基四（四氢呋喃）四磷酸铵。 胺具有式R 3 N，其中每个R独立地是含有至多约30个碳原子的烃基。 每一个芳基都是含氟芳基直接与芳环键合至少两个氟原子，或至少两个全氟烃基，或至少一个氟原子，至少有一个氟原子 一个全氟烃基。

公开(公告)号：US20070138526A1

公开(公告)日：2007-06-21

申请号：US11669840

申请日：2007-01-31

申请人： Luan Tran ,  William Rericha ,  John Lee ,  Ramakanth Alapati ,  Sheron Honarkhah ,  Shuang Meng ,  Puneet Sharma ,  Jingyi Bai ,  Zhiping Yin ,  Paul Morgan ,  Mirzafer Abatchev ,  Gurtej Sandhu ,  D. Durcan

发明人： Luan Tran ,  William Rericha ,  John Lee ,  Ramakanth Alapati ,  Sheron Honarkhah ,  Shuang Meng ,  Puneet Sharma ,  Jingyi Bai ,  Zhiping Yin ,  Paul Morgan ,  Mirzafer Abatchev ,  Gurtej Sandhu ,  D. Durcan

IPC分类号： H01L29/94

CPC分类号： H01L21/0338 ,  H01L21/0337 ,  H01L21/3086 ,  H01L21/3088

摘要： Differently-sized features of an integrated circuit are formed by etching a substrate using a mask which is formed by combining two separately formed patterns. Pitch multiplication is used to form the relatively small features of the first pattern and conventional photolithography used to form the relatively large features of the second pattern. Pitch multiplication is accomplished by patterning a photoresist and then etching that pattern into an amorphous carbon layer. Sidewall spacers are then formed on the sidewalls of the amorphous carbon. The amorphous carbon is removed, leaving behind the sidewall spacers, which define the first mask pattern. A bottom anti-reflective coating (BARC) is then deposited around the spacers to form a planar surface and a photoresist layer is formed over the BARC. The photoresist is next patterned by conventional photolithography to form the second pattern, which is then is transferred to the BARC. The combined pattern made out by the first pattern and the second pattern is transferred to an underlying amorphous silicon layer and the pattern is subjected to a carbon strip to remove BARC and photoresist material. The combined pattern is then transferred to the silicon oxide layer and then to an amorphous carbon mask layer. The combined mask pattern, having features of difference sizes, is then etched into the underlying substrate through the amorphous carbon hard mask layer.

公开(公告)号：US20070128856A1

公开(公告)日：2007-06-07

申请号：US11670296

申请日：2007-02-01

申请人： Luan Tran ,  William Rericha ,  John Lee ,  Ramakanth Alapati ,  Sheron Honarkhah ,  Shuang Meng ,  Puneet Sharma ,  Jingyi (Jenny) Bai ,  Zhiping Yin ,  Paul Morgan ,  Mirzafer Abatchev ,  Gurtej Sandhu ,  D. Durcan

发明人： Luan Tran ,  William Rericha ,  John Lee ,  Ramakanth Alapati ,  Sheron Honarkhah ,  Shuang Meng ,  Puneet Sharma ,  Jingyi (Jenny) Bai ,  Zhiping Yin ,  Paul Morgan ,  Mirzafer Abatchev ,  Gurtej Sandhu ,  D. Durcan

IPC分类号： H01L21/4763

CPC分类号： H01L21/0338 ,  H01L21/0337 ,  H01L21/3086 ,  H01L21/3088

摘要： Differently-sized features of an integrated circuit are formed by etching a substrate using a mask which is formed by combining two separately formed patterns. Pitch multiplication is used to form the relatively small features of the first pattern and conventional photolithography used to form the relatively large features of the second pattern. Pitch multiplication is accomplished by patterning a photoresist and then etching that pattern into an amorphous carbon layer. Sidewall spacers are then formed on the sidewalls of the amorphous carbon. The amorphous carbon is removed, leaving behind the sidewall spacers, which define the first mask pattern. A bottom anti-reflective coating (BARC) is then deposited around the spacers to form a planar surface and a photoresist layer is formed over the BARC. The photoresist is next patterned by conventional photolithography to form the second pattern, which is then is transferred to the BARC. The combined pattern made out by the first pattern and the second pattern is transferred to an underlying amorphous silicon layer and the pattern is subjected to a carbon strip to remove BARC and photoresist material. The combined pattern is then transferred to the silicon oxide layer and then to an amorphous carbon mask layer. The combined mask pattern, having features of difference sizes, is then etched into the underlying substrate through the amorphous carbon hard mask layer.

公开(公告)号：US20070066525A1

公开(公告)日：2007-03-22

申请号：US11499775

申请日：2006-08-03

申请人： John Lee ,  Lee-Chuan Yeh

发明人： John Lee ,  Lee-Chuan Yeh

IPC分类号： A61K38/18

CPC分类号： A61K38/1875

摘要： The present invention provides pharmaceutical compositions comprising at least two morphogenic proteins, particularly those belonging to the BMP protein family. This invention also provides implantable morphogenic devices comprising a first morphogenic protein and a second morphogenic protein combination disposed within a carrier, that are capable of inducing tissue formation. Methods for inducing local tissue formation from a progenitor cell in a mammal using those compositions and devices are also provided. Methods for improving the tissue inductive activity in a mammal at a target locus using the morphogenic proteins, nucleic acids encoding them, vectors comprising the nucleic acids encoding them and cells comprising the vectors are also provided.

摘要翻译： 本发明提供包含至少两种形态发生蛋白质的药物组合物，特别是属于BMP蛋白质家族的那些。 本发明还提供了可植入形态发生装置，其包含第一形态发生蛋白和布置在载体内的能够诱导组织形成的第二形态发生蛋白组合。 还提供了使用这些组合物和装置从哺乳动物的祖细胞诱导局部组织形成的方法。 还提供了使用形态发生蛋白，编码它们的核酸，包含编码它们的核酸的载体和包含载体的细胞来改善哺乳动物在靶基因座处的组织诱导活性的方法。

公开(公告)号：US20070011297A1

公开(公告)日：2007-01-11

申请号：US11519571

申请日：2006-09-12

申请人： Dennis Boylan ,  Kenneth Burroughs ,  Sean Drun ,  John Lee ,  Angela Schneider

发明人： Dennis Boylan ,  Kenneth Burroughs ,  Sean Drun ,  John Lee ,  Angela Schneider

IPC分类号： G06F15/173

CPC分类号： H04L61/00 ,  H04L29/12009 ,  H04L43/045 ,  H04L43/0876

摘要： Methods, computer systems, and computer readable media generate displays of networking addresses. The display may provide a map containing individually selectable grid spaces representing networking addresses of a set. The networking addresses of the set have at least one attribute and the value of the attribute is indicated in the display. The value of the attribute may be indicated by a color for the networking addresses of the set having the attribute. Furthermore, the networking addresses of a block may be represented by rectangles defining the blocks within the display. Additionally, the display may provide utilization of the networking addresses through pie charts where the size of each pie piece represents the relative number of networking addresses with that particular indicated attribute value. The display may provide additional features as well, such as the ability to zoom in and out and select areas within the displayed map. Furthermore, the hierarchy of the networking address space may be represented in a tree structure that can be expanded and collapsed to show relationships between the various networks and to allow for selection of a network to map within the map display.

摘要翻译： 方法，计算机系统和计算机可读介质生成网络地址的显示。 显示器可以提供包含表示组的网络地址的可单独选择的网格空间的地图。 集合的网络地址具有至少一个属性，属性的值在显示中指示。 属性的值可以由具有该属性的集合的网络地址的颜色来指示。 此外，块的网络地址可以由定义显示器内的块的矩形来表示。 此外，显示器可以通过饼图提供对网络地址的利用，其中每个饼图的大小表示具有该特定指示属性值的联网地址的相对数量。 显示器也可以提供附加特征，例如放大和缩小并选择显示的地图中的区域的能力。 此外，网络地址空间的层次结构可以以可扩展和折叠的树结构来表示，以显示各种网络之间的关系，并允许选择在地图显示内映射的网络。