公开(公告)号：US07190436B2

公开(公告)日：2007-03-13

申请号：US11062024

申请日：2005-02-18

申请人： Yutaka Watanabe

发明人： Yutaka Watanabe

IPC分类号： G03B27/54 ,  G03B27/42

CPC分类号： G03B27/54 ,  G03F7/70075

摘要： An illumination apparatus for illuminating a target surface using light includes a light source that emits the light, a reflection integrator that forms plural secondary light sources using the light from the light source, and an optical unit that differentiates Helmholtz-Lagrange invariants in two orthogonal directions with respect to the light incident upon the reflection integrator.

摘要翻译： 用于使用光照射目标表面的照明装置包括发射光的光源，使用来自光源的光形成多个次级光源的反射积分器，以及在两个正交方向上区分亥姆霍兹 - 拉格朗日不变量的光学单元 相对于反射积分器发生的光线。

公开(公告)号：US20070055704A1

公开(公告)日：2007-03-08

申请号：US11258033

申请日：2005-10-26

申请人： Yutaka Watanabe ,  Masanobu Yamamoto ,  Takashi Kaga

发明人： Yutaka Watanabe ,  Masanobu Yamamoto ,  Takashi Kaga

IPC分类号： G06F17/30

CPC分类号： G06F3/0644 ,  G06F3/0608 ,  G06F3/0662 ,  G06F3/067

摘要： The present invention uses the storage resources of a storage system effectively, thereby reducing the cost of the storage system and improving its usability. The storage system comprises a first storage apparatus and a second storage apparatus. When a host writes data to a virtual volume, the data are written into a pool area. A management table associates an address in the virtual volume with a pointer indicating the data stored in the pool area. The usage amount of the pool area is monitored. When the usage amount of the pool area reaches a predetermined value, a search for available capacity is performed. An unused external volume is detected and associated with an externally connected volume. The data stored in the pool area are then copied to the externally connected volume.

摘要翻译： 本发明有效地利用存储系统的存储资源，从而降低存储系统的成本并提高其可用性。 存储系统包括第一存储装置和第二存储装置。 当主机将数据写入虚拟卷时，数据将写入池区。 管理表将虚拟卷中的地址与指示存储在池区中的数据的指针相关联。 监控池区域的使用量。 当池区域的使用量达到预定值时，执行对可用容量的搜索。 检测到未使用的外部音量并与外部连接的音量相关联。 然后将存储在池区域中的数据复制到外部连接的卷。

公开(公告)号：US07102734B2

公开(公告)日：2006-09-05

申请号：US11101277

申请日：2005-04-07

申请人： Takeshi Yamamoto ,  Yutaka Watanabe

发明人： Takeshi Yamamoto ,  Yutaka Watanabe

IPC分类号： G03B27/54 ,  G03B27/42 ,  G03F1/00

CPC分类号： G03F1/24 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/54 ,  G03F7/70958 ,  G21K1/062

摘要： An exposure apparatus for exposing a mask pattern onto an object by using a light with wavelength of approximately 11 nm, said exposure apparatus including a projection optical system that includes a reflection-type optical element that has a multilayer film including a Be layer, and a reflection-type mask including a multilayer film that includes a first layer that has a first refractive index, and a second layer that has a second refractive index that has a real part that is larger than a real part of the first refractive index, said reflection-type mask includes the mask pattern, wherein said the first layer includes a beryllium, chrome, cobalt, niobium, molybdenum, technetium, ruthenium, rhodium, palladium, or tungsten, wherein said the second layer includes a lithium, boron, carbon, nitrogen, oxygen, fluorine, silicon, aluminum, titanium, scandium, iron, germanium, lanthanum, magnesium, tungsten, strontium, yttrium, or zirconium.

摘要翻译： 一种用于通过使用波长为约11nm的光将掩模图案曝光到物体上的曝光装置，所述曝光装置包括投影光学系统，该投影光学系统包括具有包括Be层的多层膜的反射型光学元件和 反射型掩模，包括包括具有第一折射率的第一层的多层膜和具有大于第一折射率的实部的实部的具有第二折射率的第二层，所述反射 型掩模包括掩模图案，其中所述第一层包括铍，铬，钴，铌，钼，锝，钌，铑，钯或钨，其中所述第二层包括锂，硼，碳，氮 氧，氟，硅，铝，钛，钪，铁，锗，镧，镁，钨，锶，钇或锆。

公开(公告)号：US07060338B2

公开(公告)日：2006-06-13

申请号：US10874309

申请日：2004-06-24

申请人： Yoshihiro Ikari ,  Akira Kashiwakura ,  Makoto Miyamoto ,  Makoto Iimura ,  Naoki Kitagaki ,  Yutaka Watanabe ,  Mayumi Kurokawa ,  Sonoko Onodera

发明人： Yoshihiro Ikari ,  Akira Kashiwakura ,  Makoto Miyamoto ,  Makoto Iimura ,  Naoki Kitagaki ,  Yutaka Watanabe ,  Mayumi Kurokawa ,  Sonoko Onodera

IPC分类号： B32B3/02

CPC分类号： G11B7/243 ,  G11B7/2403 ,  G11B7/2534 ,  G11B7/2542 ,  G11B7/257 ,  G11B7/266 ,  G11B2007/24312 ,  G11B2007/24314 ,  G11B2007/24316 ,  G11B2007/2571 ,  G11B2007/25713 ,  Y10T428/21

摘要： A phase-change optical recording medium capable of performing recording and reproduction at a high speed is provided, in which a reproduced signal output is not only sufficiently large but the phase-change optical recording medium also has excellent repeated rewriting performance. An interface layer 3, which is composed of a Ge—Si—N-based material, is formed on at least a surface of one side of a recording layer 4 of the phase-change optical recording medium 10. Accordingly, even when a phase-change material having a high melting point, for example, a Bi—Ge—Te-based phase-change material is used for the recording layer 4, it is possible to provide the phase-change optical recording medium in which the reproduced signal output is sufficiently large and the repeated rewriting performance is excellent.

摘要翻译： 提供能够以高速进行记录和再现的相变光学记录介质，其中再现信号输出不仅足够大，而且相变光学记录介质也具有优异的重复重写性能。 在相变光记录介质10的记录层4的一侧的至少一个表面上形成由Ge-Si-N基材料构成的界面层3。 因此，即使使用具有高熔点的相变材料（例如Bi-Ge-Te类相变材料）作为记录层4，也可以提供相变光记录介质 其中再现信号输出足够大并且重复的重写性能优异。

公开(公告)号：US06867843B2

公开(公告)日：2005-03-15

申请号：US10187852

申请日：2002-07-03

申请人： Nobuaki Ogushi ,  Yutaka Watanabe ,  Akira Miyake

发明人： Nobuaki Ogushi ,  Yutaka Watanabe ,  Akira Miyake

IPC分类号： A61B5/117 ,  G03F1/22 ,  G03F1/24 ,  G03F7/20 ,  H01L21/027 ,  H05G2/00 ,  G03B27/52 ,  G03B27/72 ,  G21K1/04 ,  G21K5/00

CPC分类号： H05G2/001 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70916 ,  G21K1/04 ,  G21K1/043

摘要： A debris removing system prevents debris from being scattered from an X-ray source. The debris removing system includes an attracting unit, disposed between a light emission point of the X-ray source and the optical system, for attracting debris. The attracting unit has an attracting surface parallel or approximately parallel to an axis passing through the light emission point. The debris removing system further includes a rotation unit for rotating the attracting unit about the axis. This debris removing system assures a superior debris removing effect and a good EUV light utilization efficiency, being compatible with each other.

摘要翻译： 碎片清除系统可防止碎片从X射线源散射。 垃圾清除系统包括设置在X射线源的发光点和光学系统之间的吸引单元，用于吸引碎屑。 吸引单元具有平行于或大致平行于穿过发光点的轴线的吸引表面。 碎片去除系统还包括用于围绕轴线旋转吸引单元的旋转单元。 这种碎屑去除系统确保了优异的除尘效果和良好的EUV光利用效率，彼此兼容。

公开(公告)号：US06847696B2

公开(公告)日：2005-01-25

申请号：US10689031

申请日：2003-10-21

申请人： Hideyuki Chinju ,  Yutaka Watanabe ,  Akira Miyake ,  Nobuaki Oqushi

发明人： Hideyuki Chinju ,  Yutaka Watanabe ,  Akira Miyake ,  Nobuaki Oqushi

IPC分类号： H05H1/00 ,  G21K5/00

CPC分类号： H05H1/0025

摘要： A measurement apparatus has a first detector for measuring an intensity such that a sheet-shaped beam of synchrotron radiation is integrated over the entire range of the beam in the thickness direction thereof; a second detector for measuring the intensity of the beam at two points where positions along the direction are different; and a calculating device for calculating the magnitude of the beam in the direction on the basis of the detections by the first and second detectors.

摘要翻译： 测量装置具有用于测量强度的第一检测器，使得在波束的厚度方向的整个范围上整合同步加速器辐射的片状波束; 第二检测器，用于在沿着所述方向的位置不同的两个点处测量所述光束的强度; 以及计算装置，用于基于第一和第二检测器的检测来计算沿该方向的光束的幅度。

公开(公告)号：US06823289B2

公开(公告)日：2004-11-23

申请号：US10257013

申请日：2002-10-07

申请人： Hirotsugu Kasuya ,  Yutaka Watanabe ,  Masami Ochiai

发明人： Hirotsugu Kasuya ,  Yutaka Watanabe ,  Masami Ochiai

IPC分类号： G06F1500

CPC分类号： F04B51/00 ,  F04B23/06 ,  F04B49/00 ,  F04B49/002 ,  F04B49/065

摘要： Fault diagnosis of hydraulic pumps is made automatically during an actual operation of a working machine, particularly when there is a problem with horsepower limiting control of the hydraulic pumps. A controller 50 performs horsepower limiting control for a plurality of variable displacement hydraulic pumps 1 to 6. The controller 50 measures a pump delivery pressure and pump delivery rate of each hydraulic pump when the pump delivery rate reaches a maximum during operation of the hydraulic drive system based on their detected values, collects the measured values as fault diagnostic data, and then compares a calculated target pump delivery rate with the collected pump delivery rate to decide if there is a fault of the hydraulic pump.

摘要翻译： 液压泵的故障诊断在工作机械的实际操作过程中自动进行，特别是当液压泵的马力限制控制存在问题时。 控制器50对多个可变排量液压泵1〜6进行马力限制控制。控制器50在液压驱动系统的运行期间，当泵输送速度达到最大时，测量每个液压泵的泵输送压力和泵输送速度 根据其检测值，将测量值作为故障诊断数据收集，然后将计算出的目标泵输送速率与收集的泵输送速率进行比较，以确定液压泵是否存在故障。

公开(公告)号：US06728332B2

公开(公告)日：2004-04-27

申请号：US09970826

申请日：2001-10-05

申请人： Keiko Chiba ,  Masami Tsukamoto ,  Yutaka Watanabe ,  Shinichi Hara ,  Hiroshi Maehara

发明人： Keiko Chiba ,  Masami Tsukamoto ,  Yutaka Watanabe ,  Shinichi Hara ,  Hiroshi Maehara

IPC分类号： G21K300

CPC分类号： G03F1/62 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/24

摘要： An exposure method for transferring a pattern of a mask onto a member to be exposed. The method includes the steps of making preparations for exposure while a protection cover is attached to the mask, executing alignment between the member to be exposed and the mask while the protection cover is detached from the mask, and executing exposure with X-rays while the protection cover is detached from the mask.

摘要翻译： 一种用于将掩模图案转印到要曝光的构件上的曝光方法。 该方法包括以下步骤：当保护盖附着到掩模上时，进行曝光准备，在保护盖与掩模分离的同时执行被曝光元件与掩模之间的对准，并且执行X射线曝光 防护罩与面罩分离。

公开(公告)号：US06603833B2

公开(公告)日：2003-08-05

申请号：US10003100

申请日：2001-12-06

申请人： Shigeru Terashima ,  Yutaka Watanabe

发明人： Shigeru Terashima ,  Yutaka Watanabe

IPC分类号： G03G1504

CPC分类号： G03F7/708 ,  G03F7/7035 ,  G03F7/70358 ,  G03F7/70808 ,  G21K5/04

摘要： An X-ray exposure apparatus includes a partition structure for defining therein an ambience of one of an atmospheric pressure and a reduced pressure, for accommodating an X-ray mask and an article to be exposed, an X-ray window provided on the partition structure for spatially isolating the inside of the partition structure and an X-ray source, and having a function for transmitting therethrough an X-ray beam with which the article as placed inside the partition structure can be exposed through the X-ray mask, and a scanning mechanism for scanningly moving the X-ray window in a direction intersecting with an optical axis of the X-ray beam, in a single exposure and without interruption at least from just before the start of the exposure to just after the end of the exposure.

公开(公告)号：US6167111A

公开(公告)日：2000-12-26

申请号：US108373

申请日：1998-07-01

申请人： Yutaka Watanabe ,  Shunichi Uzawa ,  Yasuaki Fukuda ,  Nobutoshi Mizusawa ,  Shinichi Hara

发明人： Yutaka Watanabe ,  Shunichi Uzawa ,  Yasuaki Fukuda ,  Nobutoshi Mizusawa ,  Shinichi Hara

IPC分类号： G03F7/20 ,  G21K1/06 ,  G21K5/00

CPC分类号： G03F7/70058 ,  G21K1/06

摘要： An apparatus for transferring a pattern of a mask onto a substrate with radiation light from a synchrotron radiation light source, includes a first mirror for collectively reflecting radiation light from the synchrotron radiation light source, and a second mirror for reflecting radiation light from the first mirror and for projecting the same to the mask. When a light ray advancing from a light emission point of the light source toward a center of a predetermined region of the mask, to be transferred to the substrate, is taken as a chief ray, when a normal to each of the first and second mirrors at an incidence position of a corresponding chief ray is taken as a Z axis, when a direction perpendicular to a plane defined by the Z axis of each mirror and a corresponding chief ray is taken as an X axis, and when a Y axis is taken along a direction perpendicular to the Z axis and X axis of each mirror, the first mirror has a reflection surface of a shape which is concave with respect to the X axis direction and concave with respect to the Y axis direction, while the second mirror has a reflection surface of a shape which is convex with respect to the Y axis direction.

摘要翻译： 一种用于利用来自同步加速器辐射光源的辐射光将掩模图案转印到基板上的装置，包括用于共同地反射来自同步加速器辐射光源的辐射光的第一反射镜和用于反射来自第一反射镜的辐射光的第二反射镜 并将其投射到面罩。 当将从光源的发光点向掩模的预定区域的中心传播的光线作为主光线时，当第一和第二反射镜中的每一个的法线 当将相应的主光线的入射位置作为Z轴时，当将与每个反射镜的Z轴和相应的主光线所定义的平面垂直的方向作为X轴，并且当采用Y轴时 沿着与每个反射镜的Z轴和X轴垂直的方向，第一反射镜具有相对于X轴方向为凹形且相对于Y轴方向凹陷的形状的反射面，而第二反射镜具有 相对于Y轴方向凸出的形状的反射面。