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1.发明授权Synchrotron radiation measurement apparatus, X-ray exposure apparatus, and device manufacturing method 失效同步辐射测量装置，X射线曝光装置和装置制造方法公开(公告)号：US06847696B2
公开(公告)日：2005-01-25
申请号：US10689031
申请日：2003-10-21
申请人： Hideyuki Chinju , Yutaka Watanabe , Akira Miyake , Nobuaki Oqushi
发明人： Hideyuki Chinju , Yutaka Watanabe , Akira Miyake , Nobuaki Oqushi
CPC分类号： H05H1/0025
摘要： A measurement apparatus has a first detector for measuring an intensity such that a sheet-shaped beam of synchrotron radiation is integrated over the entire range of the beam in the thickness direction thereof; a second detector for measuring the intensity of the beam at two points where positions along the direction are different; and a calculating device for calculating the magnitude of the beam in the direction on the basis of the detections by the first and second detectors.
摘要翻译： 测量装置具有用于测量强度的第一检测器，使得在波束的厚度方向的整个范围上整合同步加速器辐射的片状波束; 第二检测器，用于在沿着所述方向的位置不同的两个点处测量所述光束的强度; 以及计算装置，用于基于第一和第二检测器的检测来计算沿该方向的光束的幅度。
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2.发明授权Synchrotron radiation measurement apparatus, X-ray exposure apparatus, and device manufacturing method 失效同步辐射测量装置，X射线曝光装置和装置制造方法公开(公告)号：US06665371B1
公开(公告)日：2003-12-16
申请号：US09583979
申请日：2000-05-31
申请人： Hideyuki Chinju , Yutaka Watanabe , Akira Miyake , Nobuaki Ogushi
发明人： Hideyuki Chinju , Yutaka Watanabe , Akira Miyake , Nobuaki Ogushi
IPC分类号： G21K500
CPC分类号： H05H1/0025
摘要： A measurement apparatus has a first detector for measuring an intensity such that a sheet-shaped beam of synchrotron radiation is integrated over the entire range of the beam in the thickness direction thereof; a second detector for measuring the intensity of the beam at two points where positions along the direction are different; and a calculating device for calculating the magnitude of the beam in the direction on the basis of the detections by the first and second detectors.
摘要翻译： 测量装置具有用于测量强度的第一检测器，使得在波束的厚度方向的整个范围上整合同步加速器辐射的片状波束; 第二检测器，用于在沿着所述方向的位置不同的两个点处测量所述光束的强度; 以及计算装置，用于基于第一和第二检测器的检测来计算沿该方向的光束的幅度。
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公开(公告)号：US06867843B2
公开(公告)日：2005-03-15
申请号：US10187852
申请日：2002-07-03
申请人： Nobuaki Ogushi , Yutaka Watanabe , Akira Miyake
发明人： Nobuaki Ogushi , Yutaka Watanabe , Akira Miyake
IPC分类号： A61B5/117 , G03F1/22 , G03F1/24 , G03F7/20 , H01L21/027 , H05G2/00 , G03B27/52 , G03B27/72 , G21K1/04 , G21K5/00
CPC分类号： H05G2/001 , B82Y10/00 , G03F7/70033 , G03F7/70916 , G21K1/04 , G21K1/043
摘要： A debris removing system prevents debris from being scattered from an X-ray source. The debris removing system includes an attracting unit, disposed between a light emission point of the X-ray source and the optical system, for attracting debris. The attracting unit has an attracting surface parallel or approximately parallel to an axis passing through the light emission point. The debris removing system further includes a rotation unit for rotating the attracting unit about the axis. This debris removing system assures a superior debris removing effect and a good EUV light utilization efficiency, being compatible with each other.
摘要翻译： 碎片清除系统可防止碎片从X射线源散射。 垃圾清除系统包括设置在X射线源的发光点和光学系统之间的吸引单元，用于吸引碎屑。 吸引单元具有平行于或大致平行于穿过发光点的轴线的吸引表面。 碎片去除系统还包括用于围绕轴线旋转吸引单元的旋转单元。 这种碎屑去除系统确保了优异的除尘效果和良好的EUV光利用效率，彼此兼容。
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公开(公告)号：US5394451A
公开(公告)日：1995-02-28
申请号：US955433
申请日：1992-10-02
申请人： Akira Miyake , Yutaka Watanabe
发明人： Akira Miyake , Yutaka Watanabe
CPC分类号： G03F7/702 , G03F7/70991
摘要： An optical arrangement includes an optical system for transforming synchrotron radiation light emitted from an emission point of a synchrotron ring into a substantially parallel beam, with respect to a first direction which is parallel to an orbit plane of the synchrotron ring and with respect to a second direction which is perpendicular to the orbit plane, wherein an absolute value of a focal length of the optical system in the first direction is smaller than that in the second direction.
摘要翻译： 光学装置包括光学系统，用于相对于平行于同步加速器环的轨道平面的第一方向，并相对于第二方向将从同步加速器环的发射点发射的同步加速度辐射光转换为基本平行的光束 方向垂直于所述轨道平面，其中所述光学系统在所述第一方向上的焦距的绝对值小于所述第二方向上的焦距的绝对值。
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公开(公告)号：US5825844A
公开(公告)日：1998-10-20
申请号：US620604
申请日：1996-03-22
申请人： Akira Miyake , Yutaka Watanabe
发明人： Akira Miyake , Yutaka Watanabe
CPC分类号： G03F7/70141 , G03F7/702 , G03F7/708 , G21K1/06 , G21K5/10
摘要： An X-ray optical apparatus includes a mirror element for reflecting an X-ray beam and a mechanism for applying vibrations of a predetermined excitation frequency to the mirror element to produce elastic vibrations to cause deformation of the surface of the mirror element. An illumination method and a device manufacturing method utilize such an X-ray optical apparatus for irradiating an object to be illuminated, such as a mask and a wafer, with the reflected X-ray beam, so that a pattern of the mask is transferred to the wafer.
摘要翻译： X射线光学装置包括用于反射X射线束的反射镜元件和用于将预定激发频率的振动施加到镜元件的机构，以产生弹性振动，从而导致镜元件的表面变形。 照明方法和装置制造方法利用这样的X射线光学装置，用反射的X射线束照射诸如掩模和晶片的被照射物体，使得掩模的图案被转印到 晶圆。
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公开(公告)号：US5503950A
公开(公告)日：1996-04-02
申请号：US158774
申请日：1993-12-01
申请人： Akira Miyake , Yutaka Watanabe
发明人： Akira Miyake , Yutaka Watanabe
CPC分类号： G03F7/70283 , B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/29 , G03F1/30 , G03F7/2039 , G03F7/70233
摘要： A reflection type mask for X-ray lithography based on a phase shift method. A multilayered film of the mask is locally irradiated with an energy beam to provide a phase shifter, on the basis of a change in film thickness period resulting from a temperature rise. By heating the multilayered film to 100 deg. (.degree.C.) or a few hundred deg. (.degree.C.), a film thickness period change of a few percentages occurs without substantially changing the reflectivity. Thus, by selecting the heating condition suitably, a desired phase shifter for changing the phase of reflected light by .pi. can be provided.
摘要翻译： 基于相移法的X射线光刻反射型掩模。 基于由温度升高导致的膜厚度周期的变化，用能量束局部地照射掩模的多层膜以提供移相器。 通过将多层膜加热至100℃。 （℃）或几百度。 （℃），几乎没有显着改变反射率的膜厚周期变化。 因此，通过适当地选择加热条件，可以提供用于通过pi改变反射光的相位的期望的移相器。
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公开(公告)号：US5606586A
公开(公告)日：1997-02-25
申请号：US678784
申请日：1996-07-11
CPC分类号： G03F7/70075 , G03F7/2039 , G03F7/702 , B29C2035/0844
摘要： An exposure method using X-rays from a synchrotron radiation source includes determining a relationship between an X-ray intensity distribution and an exposure amount distribution in an exposure area; and effecting exposure operation while controlling a dose amount for respective positions in the exposure area using the relationship, wherein the dose amount is controlled by changing a driving profile of a movable shutter for controlling the exposure operation, and wherein the relationship is in the form of a proportional coefficient between an X-ray intensity and the exposure amount as a function of position information in the exposure area.
摘要翻译： 使用来自同步加速器辐射源的X射线的曝光方法包括确定曝光区域中的X射线强度分布与曝光量分布之间的关系; 以及通过使用关系控制曝光区域中的各个位置的剂量量来进行曝光操作，其中通过改变用于控制曝光操作的活动快门的驱动轮廓来控制剂量，并且其中的关系为 作为曝光区域中的位置信息的函数的X射线强度与曝光量之间的比例系数。
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8.发明授权公开(公告)号：US09063277B2
公开(公告)日：2015-06-23
申请号：US13332582
申请日：2011-12-21
申请人： Fumitaro Masaki , Akira Miyake
发明人： Fumitaro Masaki , Akira Miyake
CPC分类号： G02B5/0816 , B82Y10/00 , G03F7/702 , G03F7/70233 , G03F7/70316 , G03F7/70958 , G21K1/062 , G21K2201/064 , G21K2201/067
摘要： A method of manufacturing a mirror includes a first step of arranging, on a substrate, a shape adjusting layer having a layer thickness which changes by heat, a second step of arranging, on the shape adjusting layer, a reflection layer including a first layer, a second layer, and a barrier layer which is arranged between the first layer and the second layer, and prevents a diffusion of a material of the first layer and a material of the second layer, and a third step of bringing a shape of the reflection layer close to a target shape by changing a layer thickness profile of the shape adjusting layer after the second step, the third step including a process of partially annealing the shape adjusting layer.
摘要翻译： 一种制造反射镜的方法包括：在基板上布置具有由热变化的层厚度的形状调整层的第一步骤，在形状调整层上布置包括第一层的反射层的第二步骤， 第二层和布置在第一层和第二层之间的阻挡层，并且防止第一层的材料和第二层的材料的扩散，以及使反射形状的第三步骤 通过在第二步骤之后改变形状调整层的层厚度轮廓，接近目标形状的层，第三步骤包括部分退火形状调节层的过程。
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公开(公告)号：US08921807B2
公开(公告)日：2014-12-30
申请号：US13462013
申请日：2012-05-02
申请人： Hiromitsu Takase , Ichiro Tanaka , Akira Miyake
发明人： Hiromitsu Takase , Ichiro Tanaka , Akira Miyake
IPC分类号： H01J37/30 , B08B5/00 , H01J37/317
CPC分类号： H01J37/3177 , B08B5/00 , B82Y10/00 , B82Y40/00 , G03F7/70925 , H01J2237/022 , H01J2237/03 , H01J2237/0435 , H01J2237/0453 , H01J2237/1205
摘要： A lithographic apparatus which performs drawing on a substrate with a charged-particle beam, includes an optical system having an aperture plate in which a first number of apertures are formed to pass a first number of charged-particle beams to perform the drawing, a substrate holder, a cleaning unit configured to clean the aperture plate, and a chamber containing the optical system and the substrate holder. The cleaning unit includes a case having an emitting hole plate in which a second number of emitting holes are formed, the second number being smaller than the first number, an active species source configured to generate active species in the case, and a driving mechanism configured to move the case.
摘要翻译： 在带有带电粒子束的基板上进行拉伸的光刻设备包括具有孔板的光学系统，其中形成有第一数量的孔以通过第一数量的带电粒子束以进行绘图;基板 配置为清洁孔板的清洁单元和容纳光学系统和基板保持器的室。 清洁单元包括具有发射孔板的壳体，其中形成有第二数量的发射孔，第二数量小于第一数量，被配置为在壳体中产生活性物种的活性物质源和被配置为 移动案件。
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公开(公告)号：US08106584B2
公开(公告)日：2012-01-31
申请号：US11721807
申请日：2005-07-27
申请人： Tomoya Tabuchi , Akira Miyake , Daisuke Sakumoto
发明人： Tomoya Tabuchi , Akira Miyake , Daisuke Sakumoto
CPC分类号： H01L33/56 , H01L33/507 , H01L2224/13
摘要： A light emitting device includes a base on which a wiring conductor is formed from the top surface to the bottom surface or the side face; a light emitting chip mounted on the top surface of the base and electrically connected with the wiring conductor; a first light transmitting member which covers the light emitting chip; a second light transmitting member provided above the first light transmitting member to cover the first light transmitting member, the second light transmitting member being formed of a light transmitting material containing fluorescent materials for converting in wavelength the light emitted from the light emitting chip; and a third light transmitting member provided between the first and second light transmitting members, wherein the refractive index n1 of the first light transmitting member, the refractive index n2 of the second light transmitting member and the refractive index n3 of the third light transmitting member satisfy the relation: n3
摘要翻译： 发光器件包括从顶表面到底表面或侧面形成布线导体的基底; 发光芯片安装在基座的顶表面上并与布线导体电连接; 覆盖发光芯片的第一透光构件; 第二透光构件，设置在第一透光构件上方以覆盖第一透光构件，第二透光构件由包含荧光材料的透光材料形成，用于使波长从发光芯片发射的光转换; 以及第三透光构件，设置在第一透光构件和第二透光构件之间，其中第一透光构件的折射率n1，第二透光构件的折射率n2和第三透光构件的折射率n3满足 关系：n3
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