Memory element and memory apparatus
    111.
    发明授权

    公开(公告)号:US10217501B2

    公开(公告)日:2019-02-26

    申请号:US15942258

    申请日:2018-03-30

    Abstract: According to some aspects, a layered structure comprises a memory layer exhibiting magnetization perpendicular to a face of the memory layer, the memory layer configured to change a direction of the magnetization in response to application of a current thereto, a magnetic layer exhibiting magnetization parallel or antiparallel to the direction of the magnetization of the memory layer and comprising a plurality of ferromagnetic layers, one or more non-magnetic layers, and an antiferromagnetic material, wherein a first non-magnetic layer of the one or more non-magnetic layers is situated between a first ferromagnetic layer of the plurality of ferromagnetic layers and a second ferromagnetic layer of the plurality of ferromagnetic layers, and wherein the antiferromagnetic material contacts at least one of the first non-magnetic layer and the first ferromagnetic layer, and an intermediate layer formed from a non-magnetic material located between the memory layer and the magnetic layer.

    Magnetoresistive element
    114.
    发明授权

    公开(公告)号:US10069062B2

    公开(公告)日:2018-09-04

    申请号:US15355327

    申请日:2016-11-18

    Abstract: A magnetoresistive element includes a laminated structure including a plurality of fixed layers, an intermediate layer formed of a non-magnetic material, and a recording layer, the plurality of fixed layers being laminated via a non-magnetic layer, the plurality of fixed layers having at least a first fixed layer and a second fixed layer, the following formula being satisfied: S1>S2 (wherein S1 is an area of a portion of the first fixed layer adjacent to the intermediate layer, which faces the intermediate layer, and S2 is an area of the fixed layer having the smallest area out of the fixed layers other than the first fixed layer).

    MEMORY ELEMENT AND MEMORY APPARATUS
    115.
    发明申请

    公开(公告)号:US20180226113A1

    公开(公告)日:2018-08-09

    申请号:US15942258

    申请日:2018-03-30

    CPC classification number: G11C11/161 G11C11/15 H01L43/02 H01L43/08 H01L43/10

    Abstract: According to some aspects, a layered structure comprises a memory layer exhibiting magnetization perpendicular to a face of the memory layer, the memory layer configured to change a direction of the magnetization in response to application of a current thereto, a magnetic layer exhibiting magnetization parallel or antiparallel to the direction of the magnetization of the memory layer and comprising a plurality of ferromagnetic layers, one or more non-magnetic layers, and an antiferromagnetic material, wherein a first non-magnetic layer of the one or more non-magnetic layers is situated between a first ferromagnetic layer of the plurality of ferromagnetic layers and a second ferromagnetic layer of the plurality of ferromagnetic layers, and wherein the antiferromagnetic material contacts at least one of the first non-magnetic layer and the first ferromagnetic layer, and an intermediate layer formed from a non-magnetic material located between the memory layer and the magnetic layer.

    Memory element and memory apparatus
    116.
    发明授权

    公开(公告)号:US09984735B2

    公开(公告)日:2018-05-29

    申请号:US14701401

    申请日:2015-04-30

    CPC classification number: G11C11/161 G11C11/15 H01L43/02 H01L43/08 H01L43/10

    Abstract: According to some aspects, a layered structure includes a memory layer, a magnetization-fixed layer, and a tunnel insulating layer. The memory layer has magnetization perpendicular to a film face in which a direction of the magnetization is configured to be changed according to information by applying a current in a lamination direction of the layered structure. The magnetization-fixed layer has magnetization parallel or antiparallel to the magnetization direction of the memory layer and comprises a laminated ferripinned structure including a plurality of ferromagnetic layers and one or more non-magnetic layers, and includes a layer comprising an antiferromagnetic material formed on a first ferromagnetic layer of the plurality of ferromagnetic layers and situated between the first ferromagnetic layer and the non-magnetic layer. The tunnel insulating layer is located between the memory layer and the magnetization-fixed layer.

    Magnetoresistive element
    118.
    发明授权
    Magnetoresistive element 有权
    磁阻元件

    公开(公告)号:US09530958B2

    公开(公告)日:2016-12-27

    申请号:US14607487

    申请日:2015-01-28

    CPC classification number: H01L43/02 H01L27/228 H01L43/08 H01L43/10

    Abstract: A magnetoresistive element includes a laminated structure including a plurality of fixed layers, an intermediate layer formed of a non-magnetic material, and a recording layer, the plurality of fixed layers being laminated via a non-magnetic layer, the plurality of fixed layers having at least a first fixed layer and a second fixed layer, the following formula being satisfied: S1>S2 (wherein S1 is an area of a portion of the first fixed layer adjacent to the intermediate layer, which faces the intermediate layer, and S2 is an area of the fixed layer having the smallest area out of the fixed layers other than the first fixed layer).

    Abstract translation: 磁阻元件包括层叠结构,其包括多个固定层,由非磁性材料形成的中间层和记录层,所述多个固定层经由非磁性层层叠,所述多个固定层具有 至少第一固定层和第二固定层,满足以下公式:S1> S2(其中S1是与中间层相邻的第一固定层的面向中间层的部分的面积,S2是 固定层的除了第一固定层之外的固定层中具有最小面积的区域)。

    MEMORY DEVICE AND ACCESS METHOD
    120.
    发明申请
    MEMORY DEVICE AND ACCESS METHOD 审中-公开
    存储器和访问方法

    公开(公告)号:US20160203862A1

    公开(公告)日:2016-07-14

    申请号:US15074460

    申请日:2016-03-18

    Abstract: A memory device includes a plurality of bit lines extending in a first direction, a plurality of word lines extending in a second direction crossing the first direction, and a plurality of memory cells. Each memory cell includes a memory element and two select transistors disposed along the first direction and the memory element being configured to store information based on changes in resistance. A first and a second column are formed by repeatedly arranging a first group and a second group of the memory cells, respectively, along the first direction, and the second column is disposed adjacent to the first column and the first group is displaced in the first direction such that, in the second direction, a first select transistor in respective memory cells in the first column is aligned with a second select transistor in respective memory cells in the second column.

    Abstract translation: 存储器件包括沿第一方向延伸的多个位线,沿与第一方向交叉的第二方向延伸的多个字线以及多个存储单元。 每个存储单元包括存储元件和沿着第一方向设置的两个选择晶体管,并且存储元件被配置为基于电阻变化存储信息。 第一和第二列分别通过沿着第一方向重复布置第一组和第二组存储单元而形成,第二列与第一列相邻设置,第一组在第一组中移位 方向使得在第二方向上,第一列中的各个存储单元中的第一选择晶体管与第二列的各个存储单元中的第二选择晶体管对准。

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