摘要:
Reaction products of a microgel that contains carboxylic acid groups with a nitrogen-containing base have a high latency and high stability towards mechanical influences and are suitable as hardeners for one-component epoxy resin systems.
摘要:
An antenna reflector for satellites or space vehicles having a number of hexagonal individual reflectors (1) which can be arranged around a rigid central element (2). The reflectors (1) are connected to the central element (2) by a support structure (3) that can collapse to hold the reflectors in a compact storage state or be extended to deploy the reflectors. The reflectors (1) are folded like an umbrella in a transport state when the reflectors are collapsed and at the place of use, they are brought into their operating positions and spread out, so that they collectively form a reflector surface. Each reflector (1) has a foldable surface structure connected by a multiple number of ribs (11) to a rigid, central structure (12).
摘要:
A method for the production of a reflector for antennas to be used in outer space in which a thread (7) is wound on a winding spindle (1), to obtain a netting or network structure. The winding spindle (1) has contour segments (2) on its surface, whose contour corresponds to the contour of a sector of the reflector surface being produced. After winding, the resulting thread network structure is hardened on the winding spindle (1) and the thread network structure is divided into individual sections. The contour segments (2) are separated from the winding spindle (1) and together with the sections of the hardened network structure thereon are fitted together on an assembly rig so that the individual sections collectively form a reflector. The winding of the thread of the network structure on the spindle can vary in at least one direction or in its angle of placement a, so that the network structure has a different, selectable rigidity in individual areas.
摘要:
The claimed invention relates to a method for coating a substrate, preferably a printed circuit board, comprising the step of applying to said substrate surface a photopolymerizable water-borne aqueous-alkaline developable coating composition. The novel composition comprises a certain film-forming, acid group-containing acrylated derivative of an epoxy resin which is sufficiently neutralized with ammonia or an amine or an inorganic base to promote the formation of the corresponding ammonium or amine or inorganic base carboxylates by a neutralization reaction; a photoinitiator; water; and, optional components; as well as one or more additional optional (meth)acrylate monomer or (meth)acrylate oligomer or a vinyl compound that can be crosslinked with light. The method produces coated substrates that are non-tacky after drying and that have good edge coverage.
摘要:
Photopolymerisable compositions are described which comprisea) 20 to 80% by weight of a specific film-forming, acid group-containing acrylate of higher molecular weight which is neutralised with ammonia or an amine or an inorganic base, at least 10% by weight of component a) consisting of a acrylate of higher molecular weight which is derived from a reaction product of a polymolecular epoxy resin that is advanced with a bisphenol and an ethylenically unsaturated monocarboxylic acid and after subsequent reaction with a cyclic anhydride of an organic polycarboxylic acid,b) 0.1 to 15% by weight of a photoinitiator,c) 1 to 25% by weight of optional components, andd) water, as well ase) at least one additional optional (meth)acrylate monomer or (meth)acrylate oligomer or a vinyl compound that can be crosslinked with light.The compositions contain no additional polymolecular polymer binders and which can be used as aqueous applicable photoresist compositions, preferably for coating printed circuit boards. The coatings obtained therefrom are non-tacky after drying and have good edge coverage.
摘要:
Positive photoresist compositions which can be developed in aqueous-alkaline media, comprising(a) at least one homopolymer or copolymer containing acid-labile .alpha.-alkoxyalkyl ester groups,(b) at least one carboxyl-containing copolymer in which the content of carboxyl groups is from 0.40 to 5.50 mol/kg,(c) at least one compound which forms an acid on exposure to actinic radiation, and(d) an organic solvent,have high photosensitivity, a long shelf life of the components and of coatings produced therefrom and are particularly suitable as etch resists for the production of printed circuits.
摘要:
Sulfonium salts of the formulae I to IV ##STR1## in which A is C.sub.1 -C.sub.12 alkyl, C.sub.3 -C.sub.8 cycloalkyl, C.sub.4 -C.sub.10 cycloalkylalkyl, phenyl which is unsubstituted or mono- or polysubstituted by C.sub.1 -C.sub.8 alkyl, C.sub.1 -C.sub.4 alkoxy, halogen, nitro, phenyl, phenoxy, alkoxycarbonyl having 1-4 C atoms in the alkoxy radical or acyl having 1-12 C atoms, Ar, Ar.sup.1 and Ar.sup.2, independently of one another, are each unsubstituted or mono- or polysubstituted phenyl, or naphthyl which is unsubstituted or mono- or polysubstituted each arylene is an unsubstituted or mono- or polysubstituted phenylene or unsubstituted or mono- or polysubstituted naphthylene and Q.sup..crclbar. is SbF.sub.6 --, AsF.sub.6 -- or SbF.sub.5 OH-- are valuable curing agents and curing accelerators in the heat-curing of cationically polymerizable compounds, preferably epoxy resins.
摘要:
The invention relates to compounds of the formula I or II ##STR1## in which A is a radical ##STR2## R.sup.1 is hydrogen or methyl, R.sup.2 is the radical of an aliphatic, cycloaliphatic, aromatic or araliphatic diol after both of the hydroxyl groups have been removed, R.sup.3, R.sup.4, R.sup.5 and R.sup.6 independently of one another are hydrogen, C.sub.1 -C.sub.6 alkyl, chlorine or bromine, R.sup.7 is a radical of the formula III, IV, V or VI ##STR3## R.sup.8, R.sup.10, R.sup.12 and R.sup.14 are hydrogen, C.sub.1 -C.sub.6 alkyl or phenyl, R.sup.9, R.sup.11, R.sup.13 and R.sup.15 are hydrogen or C.sub.1 -C.sub.6 alkyl and the average value of n (number average) is a number from 1 to 20, it being possible for the radicals R.sup.1 to R.sup.15, within a given molecule, to assume different meanings within the scope of the definitions given.These compounds or also the epoxidized intermediates of the formula X ##STR4## in which R.sup.1 to R.sup.3 are as defined above and R.sup.7 is a radical of the formula IV or VI can be processed to give cured products having a high glass transition temperature and a low tendency to discoloration.
摘要:
The invention relates to compounds of the formula I or II ##STR1## in which A is a radical ##STR2## R.sup.1 is hydrogen or methyl, R.sup.2 is the radical of an aliphatic, cycloaliphatic, aromatic or araliphatic diol after both of the hydroxyl groups have been removed, R.sup.3, R.sup.4, R.sup.5 and R.sup.6 independently of one another are hydrogen, C.sub.1 -C.sub.6 alkyl, chlorine or bromine, R.sup.7 is a radical of the formula III, IV, V or VI ##STR3## R.sup.8, R.sup.10, R.sup.12 and R.sup.14 are hydrogen, C.sub.1 -C.sub.6 alkyl or phenyl, R.sup.9, R.sup.11, R.sup.13 and R.sup.15 are hydrogen or C.sub.1 -C.sub.6 alkyl and the average value of n (number average) is a number from 1 to 20, it being possible for the radicals R.sup.1 to R.sup.15, within a given molecule, to assume different meanings within the scope of the definitions given.These compounds or also the epoxidized intermediates of the formula X ##STR4## in which R.sup.1 to R.sup.3 are defined above and R.sup.7 is a radical of the formula IV or VI can be processed to give cured products having a high glass transition temperature and a low tendency to discoloration.
摘要:
2,3-Dimethylmaleimido-alkyl or oxaalkyl haloacetates are useful in the preparation of polymers containing maleimide groups and quaternary ammonium groups which polymers are soluble in water. The polymers can be used as light-sensitive photographic recording materials which can be developed with water.