Reflector and reflector element for antennas for use in outer space and a method for deploying the reflectors
    122.
    发明授权
    Reflector and reflector element for antennas for use in outer space and a method for deploying the reflectors 失效
    用于外层空间的天线的反射器和反射器元件以及用于部署反射器的方法

    公开(公告)号:US06229501B1

    公开(公告)日:2001-05-08

    申请号:US09298661

    申请日:1999-04-23

    IPC分类号: H01Q1520

    CPC分类号: H01Q1/288 B64G1/66 H01Q15/161

    摘要: An antenna reflector for satellites or space vehicles having a number of hexagonal individual reflectors (1) which can be arranged around a rigid central element (2). The reflectors (1) are connected to the central element (2) by a support structure (3) that can collapse to hold the reflectors in a compact storage state or be extended to deploy the reflectors. The reflectors (1) are folded like an umbrella in a transport state when the reflectors are collapsed and at the place of use, they are brought into their operating positions and spread out, so that they collectively form a reflector surface. Each reflector (1) has a foldable surface structure connected by a multiple number of ribs (11) to a rigid, central structure (12).

    摘要翻译: 一种用于卫星或航天器的天线反射器,其具有多个可以布置在刚性中心元件(2)周围的六边形单个反射器(1)。 反射器(1)通过支撑结构(3)连接到中心元件(2),支撑结构(3)可以折叠以将反射器保持在紧凑的存储状态,或者延伸以部署反射器。 反射器(1)在反射器被折叠时在运输状态下像伞一样折叠,并且在使用的地方,它们进入其操作位置并展开,从而它们共同形成反射器表面。 每个反射器(1)具有通过多个肋(11)连接到刚性中心结构(12)的可折叠表面结构。

    Method and apparatus for producing an antenna reflector, and a structure for such a reflector
    123.
    发明授权
    Method and apparatus for producing an antenna reflector, and a structure for such a reflector 失效
    用于制造天线反射器的方法和装置以及这种反射器的结构

    公开(公告)号:US06201515B1

    公开(公告)日:2001-03-13

    申请号:US09298660

    申请日:1999-04-23

    IPC分类号: H01Q2112

    摘要: A method for the production of a reflector for antennas to be used in outer space in which a thread (7) is wound on a winding spindle (1), to obtain a netting or network structure. The winding spindle (1) has contour segments (2) on its surface, whose contour corresponds to the contour of a sector of the reflector surface being produced. After winding, the resulting thread network structure is hardened on the winding spindle (1) and the thread network structure is divided into individual sections. The contour segments (2) are separated from the winding spindle (1) and together with the sections of the hardened network structure thereon are fitted together on an assembly rig so that the individual sections collectively form a reflector. The winding of the thread of the network structure on the spindle can vary in at least one direction or in its angle of placement a, so that the network structure has a different, selectable rigidity in individual areas.

    摘要翻译: 一种用于生产用于外圈的天线的反射器的方法,其中线(7)缠绕在卷绕轴(1)上,以获得网状或网状结构。 卷绕轴(1)在其表面上具有轮廓段(2),其轮廓对应于正在产生的反射器表面的扇形轮廓。 绕组后,所得螺纹网络结构在卷绕轴(1)上硬化,螺纹网状结构分为单独部分。 轮廓段(2)与卷绕轴(1)分离,并且与其上的硬化网络结构的部分一起装配在组装钻机上,使得各个部分共同形成反射器。 网络结构在主轴上的线圈的缠绕可以在至少一个方向或其放置角度α上变化,使得网络结构在各个区域中具有不同的可选刚性。

    Coating method using aqueous photopolymerizable compositions
    124.
    发明授权
    Coating method using aqueous photopolymerizable compositions 有权
    使用水性光聚合组合物的涂布方法

    公开(公告)号:US6045972A

    公开(公告)日:2000-04-04

    申请号:US320919

    申请日:1999-05-27

    摘要: The claimed invention relates to a method for coating a substrate, preferably a printed circuit board, comprising the step of applying to said substrate surface a photopolymerizable water-borne aqueous-alkaline developable coating composition. The novel composition comprises a certain film-forming, acid group-containing acrylated derivative of an epoxy resin which is sufficiently neutralized with ammonia or an amine or an inorganic base to promote the formation of the corresponding ammonium or amine or inorganic base carboxylates by a neutralization reaction; a photoinitiator; water; and, optional components; as well as one or more additional optional (meth)acrylate monomer or (meth)acrylate oligomer or a vinyl compound that can be crosslinked with light. The method produces coated substrates that are non-tacky after drying and that have good edge coverage.

    摘要翻译: 要求保护的发明涉及一种用于涂覆基底,优选印刷电路板的方法,其包括向所述基底表面施加可光聚合的水性水性 - 碱性可显影涂料组合物的步骤。 该新型组合物包含一定量的形成环氧树脂的含酸基的丙烯酸酯化的衍生物,其与氨或胺或无机碱充分中和,以促进通过中和形成相应的铵或胺或无机碱羧酸盐 反应; 光引发剂; 水; 和可选组件; 以及一种或多种可以与光交联的任选的(甲基)丙烯酸酯单体或(甲基)丙烯酸酯低聚物或乙烯基化合物。 该方法产生在干燥后不发粘并且具有良好的边缘覆盖的涂覆的基底。

    Aqueous acrylic photopolymerisable compositions
    125.
    发明授权
    Aqueous acrylic photopolymerisable compositions 失效
    水性丙烯酸类可光聚合组合物

    公开(公告)号:US5942371A

    公开(公告)日:1999-08-24

    申请号:US714633

    申请日:1996-09-13

    摘要: Photopolymerisable compositions are described which comprisea) 20 to 80% by weight of a specific film-forming, acid group-containing acrylate of higher molecular weight which is neutralised with ammonia or an amine or an inorganic base, at least 10% by weight of component a) consisting of a acrylate of higher molecular weight which is derived from a reaction product of a polymolecular epoxy resin that is advanced with a bisphenol and an ethylenically unsaturated monocarboxylic acid and after subsequent reaction with a cyclic anhydride of an organic polycarboxylic acid,b) 0.1 to 15% by weight of a photoinitiator,c) 1 to 25% by weight of optional components, andd) water, as well ase) at least one additional optional (meth)acrylate monomer or (meth)acrylate oligomer or a vinyl compound that can be crosslinked with light.The compositions contain no additional polymolecular polymer binders and which can be used as aqueous applicable photoresist compositions, preferably for coating printed circuit boards. The coatings obtained therefrom are non-tacky after drying and have good edge coverage.

    摘要翻译: 描述了可光聚合组合物,其包含a)20至80重量%的具有成膜性,较高分子量的含酸基团的丙烯酸酯,其被氨或胺或无机碱中和,至少10重量% 组分a)由较高分子量的丙烯酸酯组成,该丙烯酸酯衍生自与双酚和烯键式不饱和一元羧酸一起进行的多分子环氧树脂的反应产物,随后与有机多元羧酸的环状酸反应,b )0.1至15重量%的光引发剂,c)1至25重量%的任选组分,和d)水,以及e)至少一种另外的任选的(甲基)丙烯酸酯单体或(甲基)丙烯酸酯低聚物或 可与光交联的乙烯基化合物。 所述组合物不含另外的多分子聚合物粘合剂,并且其可用作水溶性光致抗蚀剂组合物,优选用于涂布印刷电路板。 由此获得的涂层在干燥后是非粘性的并且具有良好的边缘覆盖。

    Positive photoresist with an alkoxyalkyl ester group-containing
(co)polymer and carboxyl-group containing (co)polymer
    126.
    发明授权
    Positive photoresist with an alkoxyalkyl ester group-containing (co)polymer and carboxyl-group containing (co)polymer 失效
    具有含烷氧基烷基酯基(共)聚合物和含羧基(共))聚合物的正性光致抗蚀剂

    公开(公告)号:US5939242A

    公开(公告)日:1999-08-17

    申请号:US757391

    申请日:1996-11-27

    申请人: Qian Tang Martin Roth

    发明人: Qian Tang Martin Roth

    摘要: Positive photoresist compositions which can be developed in aqueous-alkaline media, comprising(a) at least one homopolymer or copolymer containing acid-labile .alpha.-alkoxyalkyl ester groups,(b) at least one carboxyl-containing copolymer in which the content of carboxyl groups is from 0.40 to 5.50 mol/kg,(c) at least one compound which forms an acid on exposure to actinic radiation, and(d) an organic solvent,have high photosensitivity, a long shelf life of the components and of coatings produced therefrom and are particularly suitable as etch resists for the production of printed circuits.

    摘要翻译: 可以在水性 - 碱性介质中显影的正性光致抗蚀剂组合物包含(a)至少一种含酸不稳定的α-烷氧基烷基酯基团的均聚物或共聚物,(b)至少一种含羧基的共聚物,其中羧基含量 (c)至少一种在光化辐射下形成酸的化合物和(d)有机溶剂,具有高的光敏性,组分和由其制备的涂层的保质期长 并且特别适合作为生产印刷电路的抗蚀剂。

    Araliphatic sulfonium salts and their use
    127.
    发明授权
    Araliphatic sulfonium salts and their use 失效
    脂环族锍盐及其用途

    公开(公告)号:US5013814A

    公开(公告)日:1991-05-07

    申请号:US462252

    申请日:1990-01-09

    CPC分类号: C08G59/687 C07C381/12

    摘要: Sulfonium salts of the formulae I to IV ##STR1## in which A is C.sub.1 -C.sub.12 alkyl, C.sub.3 -C.sub.8 cycloalkyl, C.sub.4 -C.sub.10 cycloalkylalkyl, phenyl which is unsubstituted or mono- or polysubstituted by C.sub.1 -C.sub.8 alkyl, C.sub.1 -C.sub.4 alkoxy, halogen, nitro, phenyl, phenoxy, alkoxycarbonyl having 1-4 C atoms in the alkoxy radical or acyl having 1-12 C atoms, Ar, Ar.sup.1 and Ar.sup.2, independently of one another, are each unsubstituted or mono- or polysubstituted phenyl, or naphthyl which is unsubstituted or mono- or polysubstituted each arylene is an unsubstituted or mono- or polysubstituted phenylene or unsubstituted or mono- or polysubstituted naphthylene and Q.sup..crclbar. is SbF.sub.6 --, AsF.sub.6 -- or SbF.sub.5 OH-- are valuable curing agents and curing accelerators in the heat-curing of cationically polymerizable compounds, preferably epoxy resins.

    摘要翻译: (I)其中A是C 1 -C 12烷基,C 3 -C 8环烷基,C 4 -C 10环烷基烷基,苯基(Ⅳ)的化合物(Ⅳ) 其中C 1 -C 8烷基,C 1 -C 4烷氧基,卤素,硝基,苯基,苯氧基,烷氧基中具有1-4个C原子的烷氧基羰基或具有1-12个C原子的酰基单取代或多取代,Ar,Ar1和Ar2 每个亚芳基是未取代的或单或多取代的苯基或萘基,每个亚芳基是未取代的或单取代或多取代的亚苯基或未取代的或单取代或多取代的亚萘基和Q( - ) 是SbF 6 - ,AsF 6 - 或SbF 5 OH-是阳离子聚合化合物,优选环氧树脂的热固化中的有价值的固化剂和固化促进剂。

    Advanced epoxide resins based on cyclohex-1-ylmethylenediphenol
derivatives or bicyclo[2.2.1]hept-1-ylmethylenediphenol derivatives
    128.
    发明授权
    Advanced epoxide resins based on cyclohex-1-ylmethylenediphenol derivatives or bicyclo[2.2.1]hept-1-ylmethylenediphenol derivatives 失效
    基于环己-1-基亚甲基二酚衍生物或双环[2.2.1]庚-1-基亚甲基二苯酚衍生物的高级环氧树脂

    公开(公告)号:US4908423A

    公开(公告)日:1990-03-13

    申请号:US270995

    申请日:1988-11-14

    摘要: The invention relates to compounds of the formula I or II ##STR1## in which A is a radical ##STR2## R.sup.1 is hydrogen or methyl, R.sup.2 is the radical of an aliphatic, cycloaliphatic, aromatic or araliphatic diol after both of the hydroxyl groups have been removed, R.sup.3, R.sup.4, R.sup.5 and R.sup.6 independently of one another are hydrogen, C.sub.1 -C.sub.6 alkyl, chlorine or bromine, R.sup.7 is a radical of the formula III, IV, V or VI ##STR3## R.sup.8, R.sup.10, R.sup.12 and R.sup.14 are hydrogen, C.sub.1 -C.sub.6 alkyl or phenyl, R.sup.9, R.sup.11, R.sup.13 and R.sup.15 are hydrogen or C.sub.1 -C.sub.6 alkyl and the average value of n (number average) is a number from 1 to 20, it being possible for the radicals R.sup.1 to R.sup.15, within a given molecule, to assume different meanings within the scope of the definitions given.These compounds or also the epoxidized intermediates of the formula X ##STR4## in which R.sup.1 to R.sup.3 are as defined above and R.sup.7 is a radical of the formula IV or VI can be processed to give cured products having a high glass transition temperature and a low tendency to discoloration.

    So-called advanced epoxide resins based on
cyclohex-1-ylmethylenediphenol derivatives or
bicyclo(2.2.1)hept-1-ylmethylenediphenol derivatives
    129.
    发明授权
    So-called advanced epoxide resins based on cyclohex-1-ylmethylenediphenol derivatives or bicyclo(2.2.1)hept-1-ylmethylenediphenol derivatives 失效
    基于环己-1-基亚甲基二酚衍生物或双环(2.2.1)庚-1-基亚甲基二苯酚衍生物的所谓先进环氧树脂

    公开(公告)号:US4808740A

    公开(公告)日:1989-02-28

    申请号:US147389

    申请日:1988-01-25

    摘要: The invention relates to compounds of the formula I or II ##STR1## in which A is a radical ##STR2## R.sup.1 is hydrogen or methyl, R.sup.2 is the radical of an aliphatic, cycloaliphatic, aromatic or araliphatic diol after both of the hydroxyl groups have been removed, R.sup.3, R.sup.4, R.sup.5 and R.sup.6 independently of one another are hydrogen, C.sub.1 -C.sub.6 alkyl, chlorine or bromine, R.sup.7 is a radical of the formula III, IV, V or VI ##STR3## R.sup.8, R.sup.10, R.sup.12 and R.sup.14 are hydrogen, C.sub.1 -C.sub.6 alkyl or phenyl, R.sup.9, R.sup.11, R.sup.13 and R.sup.15 are hydrogen or C.sub.1 -C.sub.6 alkyl and the average value of n (number average) is a number from 1 to 20, it being possible for the radicals R.sup.1 to R.sup.15, within a given molecule, to assume different meanings within the scope of the definitions given.These compounds or also the epoxidized intermediates of the formula X ##STR4## in which R.sup.1 to R.sup.3 are defined above and R.sup.7 is a radical of the formula IV or VI can be processed to give cured products having a high glass transition temperature and a low tendency to discoloration.

    摘要翻译: 本发明涉及式Ⅰ或Ⅱ的化合物,其中A是一个基团,其中R 1是(R 1,R 2,R 3, 氢或甲基,R2是除去羟基之后脂族,脂环族,芳族或芳脂族二醇的基团,R3,R4,R5和R6彼此独立地是氢,C1-C6烷基,氯或溴, (VI)R8是R 1,R 2,R 2和R 14是氢,C 1 -C 6烷基, C 6烷基或苯基,R 9,R 11,R 13和R 15是氢或C 1 -C 6烷基,n(数均)的平均值为1至20的数,在给定的分子内可以为基团R 1至R 15, 在给定的定义范围内承担不同的含义。 这些化合物或者其中R 1至R 3如上所定义并且R 7为式Ⅳ或Ⅵ基团的式ⅩⅩⅩⅥ的环氧化中间体可加工得到具有高玻璃化度的固化产物 转变温度和变色偏低。

    2,3-dimethylmaleimido-alkyl haloacetates
    130.
    发明授权
    2,3-dimethylmaleimido-alkyl haloacetates 失效
    2,3-二甲基马来酰亚氨基 - 烷基卤代乙酸酯

    公开(公告)号:US4656292A

    公开(公告)日:1987-04-07

    申请号:US745748

    申请日:1985-06-17

    申请人: Martin Roth

    发明人: Martin Roth

    摘要: 2,3-Dimethylmaleimido-alkyl or oxaalkyl haloacetates are useful in the preparation of polymers containing maleimide groups and quaternary ammonium groups which polymers are soluble in water. The polymers can be used as light-sensitive photographic recording materials which can be developed with water.

    摘要翻译: 2,3-二甲基马来酰亚氨基 - 烷基或氧杂烷基卤代乙酸酯可用于制备聚合物可溶于水的含马来酰亚胺基团和季铵基团的聚合物。 聚合物可以用作可用水显影的感光照相记录材料。