Method of treating depression with certain triazine derivatives
    122.
    发明授权
    Method of treating depression with certain triazine derivatives 失效
    用某些三嗪衍生物治疗抑郁症的方法

    公开(公告)号:US5789407A

    公开(公告)日:1998-08-04

    申请号:US424397

    申请日:1995-04-25

    CPC分类号: C07D487/04 A61K31/53

    摘要: The present invention relates to an antidepressant containing as an active ingredient a triazine derivative or a pharmaceutically acceptable salt thereof, the derivative being represented by the following Formula (I): ##STR1## in which, R.sup.1 represents hydrogen, substituted or unsubstituted lower alkyl, or substituted or unsubstituted lower alkanoyl; R.sup.2 represents hydrogen, substituted or unsubstituted lower alkyl, substituted or unsubstituted lower alkenyl, substituted or unsubstituted cycloalkyl, substituted or unsubstituted aryl, substituted or unsubstituted aralkyl, or a substituted or unsubstituted heterocyclic group; R.sup.3 represents a substituted or unsubstituted heterocyclic group; X represents a single bond, O, S, S(O), S(O).sub.2, or NR.sup.4 (in which R.sup.4 represents hydrogen, or substituted or unsubstituted lower alkyl; or R.sup.2 and NR.sup.4 are combined to form a substituted or unsubstituted 4 to 6-membered saturated heterocyclic group); and A represents N or CR.sup.5 (in which R.sup.5 represents hydrogen, or substituted or unsubstituted lower alkyl).

    摘要翻译: PCT No.PCT / JP94 / 01455 Sec。 371日期1995年04月25日 102(e)日期1995年4月25日PCT 1994年9月2日PCT公布。 公开号WO95 / 07282 日期:1995年3月16日本发明涉及含有作为活性成分的三嗪衍生物或其药学上可接受的盐的抗抑郁药,该衍生物由下式(I)表示:其中,R 1表示 氢,取代或未取代的低级烷基或取代或未取代的低级烷酰基; R 2表示氢,取代或未取代的低级烷基,取代或未取代的低级烯基,取代或未取代的环烷基,取代或未取代的芳基,取代或未取代的芳烷基或取代或未取代的杂环基; R3表示取代或未取代的杂环基; X表示单键,O,S,S(O),S(O)2或NR4(其中R4表示氢或取代或未取代的低级烷基;或R2和NR4组合形成取代或未取代的4 至6元饱和杂环基); A表示N或CR5(其中R5表示氢或取代或未取代的低级烷基)。

    Therapeutic agent for Parkinson's disease
    123.
    发明授权
    Therapeutic agent for Parkinson's disease 失效
    帕金森病治疗剂

    公开(公告)号:US5587378A

    公开(公告)日:1996-12-24

    申请号:US447885

    申请日:1995-05-23

    摘要: Methods for the treatment of Parkinson's disease comprising administering to a patient an agent which contains, as an active ingredient, a xanthine derivative or a pharmaceutically acceptable salt thereof. The xanthine derivative is represented by the formula: ##STR1## wherein R.sup.1, R.sup.2 and R.sup.3 are independently hydrogen, lower alkyl, lower alkenyl, or lower alkynyl; and R.sup.4 is cycloalkyl, --(CH.sub.2).sub.n --R.sup.5, wherein R.sup.5 represents substituted or unsubstituted aryl or a substituted or unsubstituted heterocyclic group; and n is an integer of 0 to 4, or ##STR2## wherein Y.sup.1 and Y.sup.2 represent independently hydrogen, halogen, or lower alkyl; and Z is substituted or unsubstituted aryl, ##STR3## wherein R.sup.6 is hydrogen, hydroxy, lower alkyl, lower alkoxy, halogen, nitro, or amino; and m is an integer of 1 to 4, or a substituted or unsubstituted heterocyclic group; and X.sup.1 and X.sup.2 are independently O or S.

    摘要翻译: 用于治疗帕金森病的方法包括向患者施用含有作为活性成分的黄嘌呤衍生物或其药学上可接受的盐的试剂。 黄嘌呤衍生物由下式表示:其中R 1,R 2和R 3独立地是氢,低级烷基,低级链烯基或低级炔基; 并且R 4是环烷基, - (CH 2)n -R 5,其中R 5表示取代或未取代的芳基或取代或未取代的杂环基; n为0〜4的整数,或者,其中Y1和Y2独立地表示氢,卤素或低级烷基; Z是取代或未取代的芳基,其中R6是氢,羟基,低级烷基,低级烷氧基,卤素,硝基或氨基; m为1〜4的整数,或取代或未取代的杂环基; X1和X2独立地为O或S.

    Method of polishing semiconductor wafers and apparatus therefor
    124.
    发明授权
    Method of polishing semiconductor wafers and apparatus therefor 失效
    研磨半导体晶片的方法及其设备

    公开(公告)号:US5584746A

    公开(公告)日:1996-12-17

    申请号:US283152

    申请日:1994-08-03

    IPC分类号: B24B37/30 B24B1/00 B24B29/00

    CPC分类号: B24B37/30

    摘要: A method of polishing semiconductor wafers and apparatus therefore are described. According to the present invention, a semiconductor wafer mounted on the lower side of a wafer mounting plate may be polished on a polishing pad by the front referenced polishing technique due to a flexibility of the wafer mounting plate to make the same to conform in detail with the backside contour of the wafer under polishing pressure and a selected flexibility differential between a wafer holding region and the outer moving region of the wafer mounting plate. An apparatus includes the wafer mounting plate that also works as a vacuum chuck plate is constructed out of a flexible thin disc of hard plastics, a central round region is used for a wafer holding region facing the backside of the wafer and the outside annular region is more flexible to work as a moving region, a pan-shaped rubber sheet is secured to a ring projection, the wafer mounting disc is adhered to the inner periphery of the rubber sheet at and along the periphery thereof to generate a sealed space, passes for vacuum communication and for a compressed air supply are formed through a rotary shaft, and vacuum chuck holes are communicated with the vacuum pass and the compressed air pass is in communication with a sealed space in the wafer holder.

    摘要翻译: 因此,对半导体晶片及其装置进行研磨的方法进行了说明。 根据本发明,安装在晶片安装板的下侧的半导体晶片可以通过前置抛光技术在抛光垫上抛光,这是由于晶片安装板的灵活性使其与 抛光压力下的晶片的背面轮廓和晶片保持区域与晶片安装板的外部移动区域之间的选定的柔性差异。 一种装置,包括晶片安装板,其作为真空吸盘板,由硬塑料的柔性薄盘构成,中心圆形区域用于面向晶片背面的晶片保持区域,外部环形区域为 更灵活地作为移动区域工作,将盘形橡胶片固定到环形突起,晶片安装盘在其周围并沿其周边粘附到橡胶片的内周,以产生密封空间,通过 通过旋转轴形成真空连通和压缩空气供给,并且真空吸盘孔与真空通道连通,压缩空气通道与晶片保持器中的密封空间连通。

    Polishing member and wafer polishing apparatus
    125.
    发明授权
    Polishing member and wafer polishing apparatus 失效
    抛光件和晶圆抛光装置

    公开(公告)号:US5564965A

    公开(公告)日:1996-10-15

    申请号:US355212

    申请日:1994-12-09

    IPC分类号: B24B37/22 B24D13/14 B24B5/00

    CPC分类号: B24B37/22

    摘要: A polishing apparatus is provided which can effect surface-based polishing of a wafer without causing the wafer to produce an undulation or peripheral protrusion. A sheetlike polishing member 5 constructed by superposing a foam sheet 2 containing minute closed cells in a web of chloroprene rubber and a velour type non-woven fabric (polishing cloth 3) is attached fast to the surface of a polishing table 1. The polishing member is capable of polishing a given wafer while maintaining the uniformity of thickness of the wafer or an oxide film formed on the surface of the wafer because, during the application of pressure by a pressing member 14, the polishing pressure is uniformly distributed throughout the entire rear surface of the wafer and the polishing member is bent in conformity with the global rises and falls in the wafer surface.

    摘要翻译: 提供一种抛光装置,其可以实现晶片的基于表面的抛光,而不会导致晶片产生起伏或周边突起。 通过将包含微小闭孔的发泡片2叠加在氯丁橡胶和丝绒型无纺布(抛光布3)的网中而构成的片状抛光构件5快速地附着在抛光台1的表面上。抛光构件 能够在保持晶片的厚度均匀性或形成在晶片表面上的氧化物膜的同时抛光给定晶片,因为在通过按压部件14施加压力期间,抛光压力均匀地分布在整个后部 晶片的表面和抛光构件与晶片表面的全局上升和下降一致地弯曲。

    Signal processing method and signal processing device
    126.
    发明授权
    Signal processing method and signal processing device 失效
    信号处理方法及信号处理装置

    公开(公告)号:US5550597A

    公开(公告)日:1996-08-27

    申请号:US494731

    申请日:1995-06-26

    IPC分类号: H04N9/64 H04N11/04

    CPC分类号: H04N9/646 H04N11/04

    摘要: When an input component image signal is inputted in a signal processing step, a high-frequency signal emphasis processing like HPF is performed with respect to a luminance signal and a processing like LPF with replenishment of the low-midrange frequency signal is performed in an LPF step and a color signal step with respect to color difference signals. Then, the luminance signal and color difference signals are outputted by prescribed clock pulses. The clock pulse of the color difference signals may be set lower than the clock pulse of the luminance signal according to the condition of the image. Processed as above, a new component image signal (a luminance signal Y and any combination of color difference signals U and V, V and W, W and U) is generated from a conventional component image signal (Y and U, V, W) without loss in image information or image quality. Furthermore, the amount of data of the signal to be generated per unit of time is reduced as compared with the conventional component coding system of 4:1:1 or 4:2:0 (MPEG). Thus, a signal processing method and device which enables signal transmission with lower transmission rate can be achieved.

    摘要翻译: 当在信号处理步骤中输入输入分量图像信号时,相对于亮度信号执行像HPF这样的高频信号强调处理,并且在LPF中进行处理,在LPF中执行补充低中频信号 步进和色差信号步进。 然后,通过规定的时钟脉冲输出亮度信号和色差信号。 可以根据图像的条件将色差信号的时钟脉冲设置为低于亮度信号的时钟脉冲。 如上所述,从传统的分量图像信号(Y和U,V,W)产生新的分量图像信号(亮度信号Y和色差信号U和V,V和W,W和U的任何组合) 不损失图像信息或图像质量。 此外,与传统的4:1:1或4:2:0(MPEG)组件编码系统相比,每单位时间产生的信号的数据量会减少。 因此,可以实现能够实现具有较低传输速率的信号传输的信号处理方法和装置。

    Camera with device for detecting line of sight
    127.
    发明授权
    Camera with device for detecting line of sight 失效
    相机用于检测视线的设备

    公开(公告)号:US5491532A

    公开(公告)日:1996-02-13

    申请号:US305981

    申请日:1994-09-19

    IPC分类号: G02B7/28 G03B13/02 G03B13/36

    CPC分类号: G03B13/02 G03B2213/025

    摘要: A camera with a device for detecting the line of sight is provided with a first light source for detecting the corneal reflected image of the eye and a second light source for detecting the boundary between the pupil and the iris or between the iris and the white of the eye, thereby effecting illuminations for these purposes with optimum illumination intensities. Thus the position of the Purkinje's first image and the central position of the pupil can be detected efficiently, and the direction of the line of sight can be accurately calculated.

    摘要翻译: 具有用于检测视线的装置的相机设置有用于检测眼睛的角膜反射图像的第一光源和用于检测瞳孔和虹膜之间或虹膜与白the之间的边界的第二光源 眼睛,从而以最佳照明强度实现这些目的的照明。 因此,可以有效地检测浦肯野第一图像的位置和瞳孔的中心位置,并且可以精确地计算视线的方向。

    High-aperture-ratio inner-focus telephoto lens
    128.
    发明授权
    High-aperture-ratio inner-focus telephoto lens 失效
    高孔径比内置长焦镜头

    公开(公告)号:US5490014A

    公开(公告)日:1996-02-06

    申请号:US167210

    申请日:1993-12-16

    申请人: Fumio Suzuki

    发明人: Fumio Suzuki

    IPC分类号: G02B13/02 G02B15/173

    CPC分类号: G02B15/173

    摘要: A high-aperture-ratio inner-focus telephoto lens comprises a first lens group of positive refracting power, a second lens group of negative refracting power and a third lens group of positive refracting power arranged in the named order from the object side, in which the first lens group and the second lens group form a substantially afocal system, focusing is effected by moving the second lens group along the optical axis, and the first lens group has a front group of positive refracting power and a rear group of weak positive refracting power arranged in the named order from the object side.

    摘要翻译: 高开口率内焦距长焦透镜包括正折射率的第一透镜组,负折射率的第二透镜组和从物体侧按顺序排列的正折射率的第三透镜组,其中 第一透镜组和第二透镜组形成基本上无焦点的系统,通过沿着光轴移动第二透镜组来实现聚焦,并且第一透镜组具有正折射率的正面组和弱正折射的后组 功率以物体方式按命名顺序排列。

    Xanthine derivatives
    129.
    发明授权
    Xanthine derivatives 失效
    黄嘌呤衍生物

    公开(公告)号:US5447933A

    公开(公告)日:1995-09-05

    申请号:US973959

    申请日:1992-11-09

    IPC分类号: C07D473/06 A61K31/52

    CPC分类号: C07D473/06

    摘要: A novel xanthine derivative of the formula (I): ##STR1## wherein one of R.sup.1 and R.sup.2 represents substituted or unsubstituted lower alkyl, lower alkenyl, lower alkynyl, substituted or unsubstituted alicyclic alkyl, substituted or unsubstituted phenyl, or substituted or unsubstituted benzyl; and the other represents--(CH.sub.2).sub.m --Xwherein m is 2 or 3, and X is amino substituted phenyl.Q represents ##STR2## (wherein R.sup.3 and R.sup.4 are the same or different and are substituted or unsubstituted alicyclic alkyl), ##STR3## or a pharmacologically accetable salt thereof is disclosed. This derivative has anti-dementia activity.

    摘要翻译: 式(I)的新颖的黄嘌呤衍生物:取代或未取代的低级烷基,低级烯基,低级炔基,取代或未取代的脂环族烷基,取代或未取代的苯基或取代或未取代的苄基; 另一个表示 - (CH 2)m -X,其中m为2或3,X为氨基取代的苯基。 Q代表不同的并且是取代或未取代的脂环族烷基),IMA或其药理学上可接受的盐。 该衍生物具有抗痴呆活性。

    Polishing machine and method of dissipating heat therefrom
    130.
    发明授权
    Polishing machine and method of dissipating heat therefrom 失效
    抛光机及其散热方法

    公开(公告)号:US5400547A

    公开(公告)日:1995-03-28

    申请号:US22478

    申请日:1993-02-25

    摘要: A polishing machine for polishing a flat workpiece such as a semiconductor wafer has a rotatable reference table supporting an abrasive cloth disposed on a surface thereof, and a rotatable workpiece holder for holding a flat workpiece against the abrasive cloth. While the flat workpiece is being polished by the abrasive cloth, an abrasive compound is supplied between the abrasive cloth and the flat workpiece. The reference table has grooves defined therein for dissipating heat from the reference table and the abrasive cloth while the flat workpiece is being polished by the abrasive cloth. The grooves may be supplied with either the abrasive compound or a coolant.

    摘要翻译: 用于抛光诸如半导体晶片的平坦工件的抛光机具有支撑布置在其表面上的研磨布的可旋转参考台和用于将平坦工件保持在研磨布上的可旋转工件保持器。 当平面工件被研磨布抛光时,研磨剂在磨料与平面工件之间供应。 参考台具有限定在其中的凹槽,用于在通过研磨布抛光平坦工件时从参考台和研磨布散发热量。 凹槽可以被供给研磨剂或冷却剂。