Radiation sensitive mixture and production of relief patterns
    131.
    发明授权
    Radiation sensitive mixture and production of relief patterns 失效
    辐射敏感性混合物和放射性物质的生产

    公开(公告)号:US5075199A

    公开(公告)日:1991-12-24

    申请号:US352383

    申请日:1989-05-16

    CPC classification number: G03F7/0045

    Abstract: A radiation sensitive mixture useful for producing relief patterns contains(a) a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions and(b) an organic compound whose solubility in an aqueous alkaline developer is increased by the action of acid and which contains at least one acid cleavable group and also a group which on irradiation forms a strong acid,wherein the polymeric binder (a) contains from 5 to 40 mol % of monomer units having ##STR1## in copolymerized or cocondensed form or the ##STR2## introduced by polymer analogous reaction with the proviso that the radical R contains from 5 to 9 carbon atoms.

    Abstract translation: 用于产生浮雕图案的辐射敏感混合物包含(a)不溶于水但可溶于碱性水溶液的聚合物粘合剂,和(b)其在碱性显影液中的溶解度通过酸的作用而增加的有机化合物, 含有至少一个酸可裂解基团以及在照射时形成强酸的基团,其中聚合物粘合剂(a)含有5至40摩尔%的具有共聚或缩聚形式的单体单元或“IMAGE” 通过聚合物类似反应引入,条件是基团R含有5至9个碳原子。

    Radiation-sensitive mixture for photosensitive coating materials and the
production of relief patterns and relief images
    132.
    发明授权
    Radiation-sensitive mixture for photosensitive coating materials and the production of relief patterns and relief images 失效
    用于感光涂料的辐射敏感性混合物以及放射图案和放射图像的生产

    公开(公告)号:US5064746A

    公开(公告)日:1991-11-12

    申请号:US337923

    申请日:1989-04-14

    Inventor: Reinhold Schwalm

    Abstract: The radiation-sensitive mixture contains(a) a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions and(b) an organic compound whose solubility in an aqueous alkaline developer is increased by the action of an acid and which contains one or more acid-cleavable groups,the polymeric binder (a) being a copolymer which contains o-nitrobenzyl groups.The novel radiation-sensitive mixture is particularly suitable for the production of photoresists.

    Abstract translation: 辐射敏感性混合物包含(a)不溶于水但可溶于碱性水溶液的聚合物粘合剂,和(b)其在碱性显影液中的溶解度通过酸的作用而增加的有机化合物,其含有一个或多个 更多的酸可分解基团,聚合物粘合剂(a)是含有邻硝基苄基的共聚物。 新型辐射敏感混合物特别适用于制备光致抗蚀剂。

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