Nano pattern formation
    144.
    发明授权
    Nano pattern formation 有权
    纳米图案形成

    公开(公告)号:US09102515B2

    公开(公告)日:2015-08-11

    申请号:US14054679

    申请日:2013-10-15

    Inventor: Kwangyeol Lee

    Abstract: Nano structure patterning formation includes coating a part of a structural guide with a hydrophobic polymer, positioning the structural guide on a substrate, coating at least a part of the substrate with a film made of a block copolymer, and annealing the film made of the block copolymer to align the block copolymer.

    Abstract translation: 纳米结构图案形成包括用疏水聚合物涂覆结构导向器的一部分,将结构引导件定位在基底上,用由嵌段共聚物制成的膜涂覆至少一部分基底,并且将由该块制成的膜退火 共聚物以对齐嵌段共聚物。

    MEMS microphone
    145.
    发明授权
    MEMS microphone 有权
    MEMS麦克风

    公开(公告)号:US09029963B2

    公开(公告)日:2015-05-12

    申请号:US14034986

    申请日:2013-09-24

    Abstract: Mechanical resonating structures, as well as related devices and methods of manufacture. The mechanical resonating structures can be microphones, each including a diaphragm and a piezoelectric stack. The diaphragm can have one or more openings formed therethrough to enable the determination of an acoustic pressure being applied to the diaphragm through signals emitted by the piezoelectric stack.

    Abstract translation: 机械共振结构,以及相关设备和制造方法。 机械谐振结构可以是麦克风,每个麦克风包括隔膜和压电叠层。 隔膜可以具有穿过其中形成的一个或多个开口,以使得能够通过由压电叠层发射的信号来确定施加到隔膜的声压。

    MEMS MICROPHONE
    146.
    发明申请
    MEMS MICROPHONE 有权
    MEMS麦克风

    公开(公告)号:US20140084395A1

    公开(公告)日:2014-03-27

    申请号:US14034986

    申请日:2013-09-24

    Abstract: Mechanical resonating structures, as well as related devices and methods of manufacture. The mechanical resonating structures can be microphones, each including a diaphragm and a piezoelectric stack. The diaphragm can have one or more openings formed therethrough to enable the determination of an acoustic pressure being applied to the diaphragm through signals emitted by the piezoelectric stack.

    Abstract translation: 机械共振结构,以及相关设备和制造方法。 机械谐振结构可以是麦克风,每个麦克风包括隔膜和压电叠层。 隔膜可以具有穿过其中形成的一个或多个开口,以使得能够通过由压电叠层发射的信号来确定施加到隔膜的声压。

    NANO PATTERN FORMATION
    147.
    发明申请
    NANO PATTERN FORMATION 有权
    纳米图案形成

    公开(公告)号:US20140044933A1

    公开(公告)日:2014-02-13

    申请号:US14054679

    申请日:2013-10-15

    Inventor: Kwangyeol LEE

    Abstract: Nano structure patterning formation includes coating a part of a structural guide with a hydrophobic polymer, positioning the structural guide on a substrate, coating at least a part of the substrate with a film made of a block copolymer, and annealing the film made of the block copolymer to align the block copolymer.

    Abstract translation: 纳米结构图案形成包括用疏水聚合物涂覆结构导向器的一部分,将结构引导件定位在基底上,用由嵌段共聚物制成的膜涂覆至少一部分基底,并且将由该块制成的膜退火 共聚物以对齐嵌段共聚物。

    METHOD OF MANUFACTURING CAPACITIVE ELECTROMECHANICAL TRANSDUCER
    148.
    发明申请
    METHOD OF MANUFACTURING CAPACITIVE ELECTROMECHANICAL TRANSDUCER 审中-公开
    制造电容式电磁传感器的方法

    公开(公告)号:US20130302934A1

    公开(公告)日:2013-11-14

    申请号:US13981504

    申请日:2012-01-24

    Abstract: Provided is a method of manufacturing a capacitive electromechanical transducer using fusion bonding, which is capable of reducing fluctuations in initial deformation among diaphragms caused at positions having different boundary conditions such as the bonding area, thereby enhancing the uniformity of the transducer and stabilizing the sensitivity and the like. The method of manufacturing a capacitive electromechanical transducer includes: forming an insulating layer on a first silicon substrate and forming at least one recess; fusion bonding a second silicon substrate onto the insulating layer; and thinning the second silicon substrate and forming a silicon film. The method further includes, before the bonding of the second silicon substrate onto the insulating layer, forming a groove in the insulating layer at the periphery of the at least one recess.

    Abstract translation: 提供一种使用熔接的制造电容式机电换能器的方法,其能够减少在具有不同边界条件(例如接合面积)的位置处引起的膜片之间的初始变形的波动,从而增强换能器的均匀性并稳定灵敏度, 类似。 制造电容式机电换能器的方法包括:在第一硅衬底上形成绝缘层并形成至少一个凹槽; 将第二硅衬底熔合到所述绝缘层上; 并使第二硅衬底变薄并形成硅膜。 该方法还包括在将第二硅衬底接合到绝缘层之前,在至少一个凹部的周边处在绝缘层中形成凹槽。

    Systems and methods for fabricating an out-of-plane MEMS structure
    150.
    发明授权
    Systems and methods for fabricating an out-of-plane MEMS structure 有权
    用于制造平面外MEMS结构的系统和方法

    公开(公告)号:US08404568B2

    公开(公告)日:2013-03-26

    申请号:US12163277

    申请日:2008-06-27

    Abstract: System and methods offset mechanism elements during fabrication of Micro-Electro-Mechanical Systems (MEMS) devices. An exemplary embodiment applies a voltage across an offset mechanism element and a bonding layer of a MEMS device to generate an electrostatic charge between the offset mechanism element and the bonding layer, wherein the electrostatic charge draws the offset mechanism element to the bonding layer. The offset mechanism element and the bonding layer are then bonded.

    Abstract translation: 微机电系统(MEMS)器件制造过程中的系统和方法偏移机制元件。 示例性实施例施加电压跨越MEMS装置的偏移机构元件和结合层,以在偏置机构元件和结合层之间产生静电荷,其中静电电荷将偏移机构元件拉到粘合层。 然后粘合偏移机构元件和粘合层。

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