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公开(公告)号：US11977330B2
公开(公告)日：2024-05-07
申请号：US17109697
申请日：2020-12-02
发明人： Takaaki Kaiho , Yasuo Someya , Minoru Adegawa
CPC分类号： G03F7/0382 , C08L33/14 , G03F7/2041
摘要： A resist composition which generates an acid by exposure and whose solubility in a developing solution changes by the action of an acid. The resist composition contains a high-molecular-weight compound having a constitutional unit represented by General Formula (a0-1), and a high-molecular-weight compound having a constitutional unit represented by General Formula (f01-1) and a constitutional unit including an acid-dissociable group represented by General Formula (f02-r-1). In the formulas, R represents a hydrogen atom or the like; Va01 represents a divalent linking group; na01 represents an integer of 0 to 2; Ra01 is a lactone-containing cyclic group having a cyano group or the like; Vf01 represents a divalent linking group; Rf011 and Rf012 each represents a trifluoromethyl group or the like; Rf021 and Rf022 each represents an alkyl group having 1 to 3 carbon atoms; and Rf023 represents a polycyclic aliphatic hydrocarbon group
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公开(公告)号：US11965111B2
公开(公告)日：2024-04-23
申请号：US16552345
申请日：2019-08-27
发明人： Takumi Namiki , Emi Uchida , Mai Sugawara
摘要： A surface treatment agent containing a silylating agent (A) and a compound (C) having an amide skeleton in a molecule, and a surface treatment method for subjecting an object to be treated to surface treatment using the surface treatment agent.
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公开(公告)号：US20240124823A1
公开(公告)日：2024-04-18
申请号：US18547088
申请日：2022-01-14
摘要： This fluid circuit device includes a block that has a guide portion in which a pipe allowing a fluid sent from a pump to circulate therein is attachable and detachable. The guide portion includes at least one of a recessed portion that guides the pipe along a surface of the block, and a hole portion that guides the pipe through the inside of the block.
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公开(公告)号：US20240118619A1
公开(公告)日：2024-04-11
申请号：US18460104
申请日：2023-09-01
发明人： Keiichi Ibata , Tomotaka Yamada
CPC分类号： G03F7/0757 , G03F7/0045 , G03F7/2004
摘要： A resist composition including a silicon-containing resin and an acid generator component that generates acid upon exposure. The acid generator component includes an onium salt containing an anion moiety having an iodine atom and a cation moiety.
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公开(公告)号：US20240103368A1
公开(公告)日：2024-03-28
申请号：US18262451
申请日：2022-01-31
CPC分类号： G03F7/032 , G03F7/0043 , G03F7/0295
摘要： A negative photosensitive composition for forming a top plate portion of a hollow structure which contains an epoxy group-containing compound, a cationic polymerization initiator, a polyfunctional (meth)acrylate compound, and a photoradical polymerization initiator.
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公开(公告)号：US20240084091A1
公开(公告)日：2024-03-14
申请号：US18451957
申请日：2023-08-18
发明人： Takaaki MORITA
CPC分类号： C08J9/26 , A61L9/014 , B01D46/543 , B01D61/147 , B01D69/02 , B01D71/64 , C02F1/444 , A61L2209/14 , A61L2209/22 , B01D67/003 , C08J2201/044 , C08J2205/042 , C08J2205/044 , C08J2379/08 , C08J2381/06
摘要： An object is to provide a porous film which has excellent removal performance of viruses and the like and a long lifetime, a virus removal method which uses the porous film as a filter, a method for producing a virus-free product which uses the porous film as a filter and a device which includes the porous film as a filter. In a porous film including a structure of spherical pores communicating with each other, an interconnected pore is an opening of the spherical pores communicating with each other, and the pore diameter of the interconnected pore is set to 10 nm or more and 35 nm or less, and the number of spherical pores which are present between one surface of the porous film and the other surface thereof and are 50 nm or more and 200 nm or less is set to 200 or more and 1000 or less.
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公开(公告)号：US11912889B2
公开(公告)日：2024-02-27
申请号：US17607182
申请日：2020-05-13
发明人： Kunihiro Noda , Takehiro Seshimo , Dai Shiota
IPC分类号： C08G77/60 , B05D3/02 , C09D183/16 , C09D183/08
CPC分类号： C09D183/16 , C08G77/60 , C09D183/08
摘要： The present invention aims to provide: a novel silicon-containing polymer that is alkali soluble or is soluble in an alkaline aqueous solution by using heat, etc.; a film-forming composition including the silicon-containing polymer; a method for forming a silicon-containing polymer coating using the film-forming composition; a method for forming a silica coating using the film-forming composition; and a production method for the silicon-containing polymer. The silicon-containing polymer including at least either a polysiloxane chain or oligosiloxane chain or a polysilane chain or oligosilane chain in the molecular chain thereof has a group that has e.g., a carboxy or carboxylic acid ester group and a sulfide group, introduced to the molecular chain as a result of an ene-thiol reaction.
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18.发明公开公开(公告)号：US20240053680A1
公开(公告)日：2024-02-15
申请号：US18258533
申请日：2021-11-30
发明人： Aya MOMOZAWA , Yuta YAMAMOTO
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/0048
摘要： A photosensitive dry film including a chemically amplified positive type photosensitive composition, in which the photosensitive dry film can suppress white turbidity and separation caused by resin contained therein and can prevent bubbles generated while solvent is removed by heating from remaining. The photosensitive dry film including a chemically amplified positive type photosensitive composition includes an acid generating agent, resin having alkali solubility that increases under action of an acid, and organic solvent, the resin including an acrylic resin, the acrylic resin including a constituent unit derived from (meth)acrylate including an acid-non-dissociable alicyclic hydrocarbon group-comprising group, the organic solvent (S) including a high boiling point organic solvent that has a boiling point at atmospheric pressure of 150° C. or more, and a value of δh, a term of energy by hydrogen bonding relating to a Hansen solubility parameter, of 11 (MPa)0.5 or less.
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公开(公告)号：US11898081B2
公开(公告)日：2024-02-13
申请号：US17095159
申请日：2020-11-11
发明人： Takuya Ohhashi , Yukihisa Wada
IPC分类号： C09K13/04 , H01L21/48 , C09K13/00 , H01L21/3213 , C23F1/14 , C23F1/40 , C23F1/00 , H01L21/306
CPC分类号： C09K13/04 , C09K13/00 , C23F1/00 , C23F1/14 , C23F1/40 , H01L21/30604 , H01L21/32134 , H01L21/4892
摘要： A ruthenium-etching solution for carrying out an etching process on ruthenium. The etching solution includes orthoperiodic acid and ammonia, in which a pH is 8 or higher and 10 or lower. A method for manufacturing the ruthenium-etching solution, a method for processing an object to be processed including carrying out an etching process on an object to be processed including ruthenium using the ruthenium-etching solution, and a method for manufacturing a ruthenium-containing wiring.
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公开(公告)号：US20230357635A1
公开(公告)日：2023-11-09
申请号：US18191652
申请日：2023-03-28
发明人： YaChien Chuang
IPC分类号： C09K13/00
CPC分类号： C09K13/00
摘要： A silicon etchant, containing a quaternary ammonium hydroxide, an amine, and a solvent, in which the amine is a polyamine and/or an alkanolamine.
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