Mask pattern inspection method, exposure condition verification method, and manufacturing method of semiconductor device
    11.
    发明申请
    Mask pattern inspection method, exposure condition verification method, and manufacturing method of semiconductor device 有权
    掩模图案检查方法,曝光条件验证方法和半导体器件的制造方法

    公开(公告)号:US20070009811A1

    公开(公告)日:2007-01-11

    申请号:US11480382

    申请日:2006-07-05

    IPC分类号: G03C5/00 G06K9/00 G03F1/00

    CPC分类号: G03F1/84

    摘要: A mask pattern inspection method includes: transferring a mask pattern onto a conductor substrate or a semiconductor substrate; preparing a sample including a substrate surface pattern in an electrically conductive state to the substrate, the substrate surface pattern being constituted of a convex pattern or a concave pattern each having a shape in accordance with the transferred mask pattern, or a surface layer obtained by filling the concave pattern with a material; irradiating the sample with an electron beam to detect at least one of a secondary electron, a reflected electron and a backscattered electron generated from the surface of the sample, thereby acquiring an image of the sample surface; and inspecting the mask pattern on the basis of the image.

    摘要翻译: 掩模图案检查方法包括:将掩模图案转印到导体基板或半导体基板上; 将具有导电状态的基板表面图案的样品制备到基板,所述基板表面图案由根据所转印的掩模图案的形状的凸形图案或凹形图案构成,或者通过填充获得的表面层 具有材料的凹形图案; 用电子束照射样品以检测从样品表面产生的二次电子,反射电子和背散射电子中的至少一个,从而获取样品表面的图像; 并基于图像检查掩模图案。

    Method of producing Ethyl (3R, 5S, 6E)-7-[2 cyclopropyl-4-(fluorophenyl) quinoline-3-yl]-3, 5-dihydroxy-6-heptenoate
    12.
    发明申请
    Method of producing Ethyl (3R, 5S, 6E)-7-[2 cyclopropyl-4-(fluorophenyl) quinoline-3-yl]-3, 5-dihydroxy-6-heptenoate 失效
    制备(3R,5S,6E)-7- [2-环丙基-4-(氟苯基)喹啉-3-基] -3,5-二羟基-6-庚烯酸乙酯的方法

    公开(公告)号:US20060089381A1

    公开(公告)日:2006-04-27

    申请号:US11254864

    申请日:2005-10-21

    CPC分类号: C07D215/14 C07B2200/07

    摘要: A method of producing Ethyl (3R,5S,6E)-7-[2-cyclopropyl-4-(4-fluorophenyl)quinoline-3-yl]-3,5-dihydroxy-6-heptenoate by means of liquid chromatography using a packing material comprising a carrier and, carried thereon, a polysaccharide derivative, wherein a part or all of the hydrogen atoms of hydroxyl and amino groups of the polysaccharide derivative are substituted with one or more substituents, such as a carbamoyl group wherein one hydrogen atom is substituted with an aromatic group having a specific alkyl group. The method allows the production of the above (3R,5S,6E) isomer with enhanced productivity to a conventional method.

    摘要翻译: 通过液相色谱法使用(3R,5S,6E)-7- [2-环丙基-4-(4-氟苯基)喹啉-3-基] -3,5-二羟基-6-庚烯酸乙酯 包含载体的载体和载体上的多糖衍生物,其中多糖衍生物的羟基和氨基的一部分或全部氢原子被一个或多个取代基取代,例如氨基甲酰基,其中一个氢原子是 被具有特定烷基的芳基取代。 该方法允许以常规方法以高生产率生产上述(3R,5S,6E)异构体。

    Defect inspection apparatus, program, and manufacturing method of semiconductor device
    14.
    发明申请
    Defect inspection apparatus, program, and manufacturing method of semiconductor device 有权
    半导体器件的缺陷检查装置,程序和制造方法

    公开(公告)号:US20050230618A1

    公开(公告)日:2005-10-20

    申请号:US11086212

    申请日:2005-03-23

    摘要: A defect inspection apparatus includes a charged particle beam source which emits a charged particle beam to illuminate the charged particle beam onto a sample as a primary beam; an image pickup which includes an imaging element having a light receiving face receiving at least one of a secondary charged particle, a reflective charged particle, and a back-scattered charged particle generated from the sample by the illumination of the primary beam and which outputs a signal indicating a state of the surface of the sample; a mapping projection system which maps/projects at least one of the secondary charged particle, the reflective charged particle, and the back-scattered charged particle as a secondary beam and which makes the beam to form an image on the light receiving face of the imaging element; a controller which adjusts a beam diameter of the primary beam in such a manner as to apply the beam to the sample with a size smaller than that of an imaging region as a target of review to scan the imaging region and which allows the image pickup to pick up a plurality of frame images; an image processor which processes the plurality of obtained frame images to prepare a review image; and a defect judgment unit which judges a defect of the sample based on the review image.

    摘要翻译: 缺陷检查装置包括:带电粒子束源,其发射带电粒子束,以将带电粒子束照射到样品上作为主光束; 一种图像拾取器,其包括具有光接收面的成像元件,所述光接收面接收通过所述一次光束的照射从所述样品产生的二次带电粒子,反射带电粒子和反向散射带电粒子中的至少一个,并且输出 指示样品表面状态的信号; 映射投影系统,其将二次带电粒子,反射带电粒子和反向散射带电粒子中的至少一个作为次级光束进行映射/投影,并且使得该光束在成像的光接收面上形成图像 元件; 控制器,其以这样的方式调节主光束的光束直径,使得将光束以比成像区域的尺寸小的像素的尺寸施加到作为检查对象的扫描成像区域,并且允许图像拾取 拾取多个帧图像; 处理所述多个获得的帧图像以准备检查图像的图像处理器; 以及缺陷判定单元,其基于检查图像判断样本的缺陷。

    Control apparatus for hydraulic excavator
    16.
    发明授权
    Control apparatus for hydraulic excavator 失效
    液压挖掘机控制装置

    公开(公告)号:US5999872A

    公开(公告)日:1999-12-07

    申请号:US794903

    申请日:1997-02-04

    IPC分类号: E02F9/20 E02F3/00 G60F15/00

    CPC分类号: E02F9/2025

    摘要: A control apparatus for a hydraulic excavator is capable of carrying out precise operations according to various kinds of classifications of works without requiring switching operations by an operator and management according to work records. The apparatus includes a classification of work discriminating section for recognizing a classification of work being carried out by the hydraulic excavator on the basis of data detected by sensors for detecting an operating amount of a lever for a boom and the like; sections for setting an operating mode of hydraulic pumps absorbing horse power and the like, according to the classification of work recognized; a hydraulic pump control section for controlling the hydraulic pumps according to the set operating mode; and an auto acceleration control section for making effective or invalid the auto acceleration control for controlling speed of an engine to a low speed when work stops. The apparatus further includes a device for readably storing the recognized classification of work in terms of a time series.

    摘要翻译: 一种用于液压挖掘机的控制装置能够根据各种工作分类进行精确的操作,而不需要操作者的切换操作和根据工作记录的管理。 该装置包括:工作识别部分,用于根据用于检测用于吊杆等的杠杆的操作量的传感器检测到的数据,识别由液压挖掘机进行的工作分类; 根据所认定的工作分类,设置吸收马力的液压泵的操作模式等; 液压泵控制部分,用于根据设定的操作模式控制液压泵; 以及自动加速控制部,用于当工件停止时使发动机的速度控制为低速的自动加速控制有效或无效。 该装置还包括一种用于按照时间序列可读地存储所识别的工作分类的装置。

    Filler used for separating optical isomers and process for separating optical isomers with the filler
    18.
    发明授权
    Filler used for separating optical isomers and process for separating optical isomers with the filler 有权
    用于分离光学异构体的填料和用填料分离光学异构体的方法

    公开(公告)号:US07749389B2

    公开(公告)日:2010-07-06

    申请号:US11637157

    申请日:2006-12-12

    IPC分类号: B01D15/08

    摘要: The objectives of this invention are to provide a filler for separating optical isomers, capable of efficiently carrying out optical resolution of optical isomer mixtures, and to provide a process for separating optical isomers by a simulated moving bed chromatography utilizing the filler. This invention provides a filler made of a carrier supporting a specific amount of an optically active high molecular weight compound. Separation by the simulated moving bed chromatography using the filler is carried out under the condition that the capacity factors have specific values.

    摘要翻译: 本发明的目的是提供一种用于分离光学异构体的填料,其能够有效地进行光学异构体混合物的光学拆分,并提供通过使用填料的模拟移动床色谱分离光学异构体的方法。 本发明提供了由支持特定量的光学活性高分子量化合物的载体制成的填料。 在容量因子具有特定值的条件下,通过使用填料的模拟移动床层析法进行分离。

    Electron beam apparatus with detailed observation function and sample inspecting and observing method using electron beam apparatus
    19.
    发明授权
    Electron beam apparatus with detailed observation function and sample inspecting and observing method using electron beam apparatus 有权
    具有详细观察功能的电子束装置和使用电子束装置的样品检查和观察方法

    公开(公告)号:US07352195B2

    公开(公告)日:2008-04-01

    申请号:US11723591

    申请日:2007-03-21

    IPC分类号: G01N23/00

    CPC分类号: G01R31/305

    摘要: Provided is a sample observing method allowing for a detailed observation of a sample by using one and the same electron beam apparatus. The method uses an electron beam apparatus 1 comprising a primary optical system 10 serving for irradiating the electron beam onto the sample surface and a secondary optical system 30 serving for detecting secondary electrons emanating from said sample surface to form an image of the sample surface. The inspection is carried out on the sample surface, S, by irradiating the electron beam to the sample surface, and after the extraction of a defective region in the sample based on the inspection, the extracted defective region is once again applied with the irradiation of the electron beam so as to provide a magnification or a detailed observation of the defective region.

    摘要翻译: 提供了通过使用同一电子束装置对样品进行详细观察的样本观察方法。 该方法使用电子束装置1,其包括用于将电子束照射到样品表面上的主要光学系统10和用于检测从所述样品表面发出的二次电子以形成样品表面的图像的二次光学系统30。 通过向样品表面照射电子束,在样品表面S上进行检查,并且在基于检查提取样品中的缺陷区域之后,再次施加提取的缺陷区域 电子束,以便提供缺陷区域的放大或详细观察。

    Electron beam apparatus with detailed observation function and sample inspecting and observing method using electron beam apparatus
    20.
    发明授权
    Electron beam apparatus with detailed observation function and sample inspecting and observing method using electron beam apparatus 有权
    具有详细观察功能的电子束装置和使用电子束装置的样品检查和观察方法

    公开(公告)号:US07212017B2

    公开(公告)日:2007-05-01

    申请号:US11019111

    申请日:2004-12-22

    IPC分类号: G01N23/00

    CPC分类号: G01R31/305

    摘要: Provided is a sample observing method allowing for a detailed observation of a sample by using one and the same electron beam apparatus. The method uses an electron beam apparatus 1 comprising a primary optical system 10 serving for irradiating the electron beam onto the sample surface and a secondary optical system 30 serving for detecting secondary electrons emanating from said sample surface to form an image of the sample surface. The inspection is carried out on the sample surface, S, by irradiating the electron beam to the sample surface, and after the extraction of a defective region in the sample based on the inspection, the extracted defective region is once again applied with the irradiation of the electron beam so as to provide a magnification or a detailed observation of the defective region.

    摘要翻译: 提供了通过使用同一电子束装置对样品进行详细观察的样本观察方法。 该方法使用电子束装置1,其包括用于将电子束照射到样品表面上的主要光学系统10和用于检测从所述样品表面发出的二次电子以形成样品表面的图像的二次光学系统30。 通过向样品表面照射电子束,在样品表面S上进行检查,并且在基于检查提取样品中的缺陷区域之后,再次施加提取的缺陷区域 电子束,以便提供缺陷区域的放大或详细观察。