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27 条记录 (耗时 0.019 秒)

    Photoresist resin composition
    11.
    发明授权
    Photoresist resin composition 失效
    光致抗蚀剂树脂组合物

    公开(公告)号：US07378223B2

    公开(公告)日：2008-05-27

    申请号：US11124224

    申请日：2005-05-06

    申请人： Bong-gi Kim ,  Sung-mun Ryu ,  Seong-mo Park ,  Chan-seok Park

    发明人： Bong-gi Kim ,  Sung-mun Ryu ,  Seong-mo Park ,  Chan-seok Park

    IPC分类号： G03C1/73 ,  G03C1/76 ,  G03F7/028 ,  G03F7/09

    CPC分类号： G03F7/027 ,  Y10S430/117 ,  Y10S430/121 ,  Y10S430/123 ,  Y10S430/124 ,  Y10S430/125

    摘要： The invention provides photoresist resin compositions and in particular, a photoresist resin compositions comprising a) an acrylate monomer having two urethane bonds, b) a crosslinkable urethane monomer having at least two ethylene double bonds, c) an alkali-soluble compound, d) a photopolymerization initiator and e) a solvent, and a photoresist dry film resists using the photoresist resins. The photoresist resin compositions and the photoresist dry film resists using the same in accordance with the invention have excellent adhesion to a substrate and sandblast resistance and at the same time, they have high sensitivity as well as high resolution, thereby enabling fine pattern formation on substrates.

    摘要翻译： 本发明提供了光致抗蚀剂树脂组合物，特别是光致抗蚀剂树脂组合物，其包含a）具有两个氨基甲酸酯键的丙烯酸酯单体，b）具有至少两个乙烯双键的交联性氨基甲酸酯单体，c）碱溶性化合物，d） 光聚合引发剂和e）溶剂，并且光致抗蚀剂干膜抗蚀使用光致抗蚀剂树脂。 根据本发明的光致抗蚀剂树脂组合物和使用其的光致抗蚀剂干膜具有优异的对基材的粘合性和耐喷砂性，同时它们具有高灵敏度和高分辨率，从而能够在基板上形成精细图案 。

    Pb free Ag paste composition for PDP address electrode
    14.
    发明申请
    Pb free Ag paste composition for PDP address electrode 失效
    用于PDP寻址电极的无铅Ag糊组合物

    公开(公告)号：US20060011895A1

    公开(公告)日：2006-01-19

    申请号：US11142012

    申请日：2005-06-01

    申请人： Byung-joo Chung ,  Chan-seok Park ,  Seong-mo Park ,  Sin-hye Paek

    发明人： Byung-joo Chung ,  Chan-seok Park ,  Seong-mo Park ,  Sin-hye Paek

    IPC分类号： H01B1/12

    CPC分类号： H01J9/02 ,  H01B1/16 ,  H01B1/22 ,  H01J2211/225

    摘要： The present invention provides a Pb free Ag paste composition for a PDP address electrode comprising a) 60 to 90% by weight of an Ag powder; b) 1 to 10% by weight of a Pb free inorganic binder; c) 0.001 to 1% by weight of an inorganic thickener; and d) 5 to 38% by weight of an alkali-soluble, negative photoresist composition for fine conductive powder dispersion. The Pb free Ag paste composition according to the invention i) is environment-friendly by using a Pb free inorganic binder, ii) is suitable for the fabrication of fine electrodes by using the prior electrode formation processes, iii) can apply the formed pattern to low temperature sintering processes of not higher than 600° C., iv) does not use a surfactant and stabilizer and has excellent printing, leveling and sintering performances by using an inorganic thickener and conductive Ag powder, and v) enables sintering to be carried out at a sintering target temperature without binder burning off zone.

    摘要翻译： 本发明提供一种用于PDP寻址电极的无铅Ag膏组合物，其包含a）60至90重量％的Ag粉末; b）1〜10重量％的无铅无机粘合剂; c）0.001至1重量％的无机增稠剂; 和d）5〜38重量％的用于导电粉末分散体的碱溶性负性光致抗蚀剂组合物。 根据本发明的无铅Ag糊组合物i）通过使用无铅无机粘合剂是环境友好的，ii）适用于通过使用现有电极形成工艺制造细电极，iii）可以将形成的图案应用于 低温烧结工艺不高于600℃，iv）不使用表面活性剂和稳定剂，并且通过使用无机增稠剂和导电性Ag粉末具有优异的印刷，流平和烧结性能，以及v）能够进行烧结 在烧结目标温度下没有粘合剂燃烧掉区域。

    Operation controller for a semiconductor memory device
    15.
    发明授权
    Operation controller for a semiconductor memory device 失效
    一种用于半导体存储器件的操作控制器

    公开(公告)号：US6060916A

    公开(公告)日：2000-05-09

    申请号：US64687

    申请日：1998-04-22

    申请人： Chan-seok Park

    发明人： Chan-seok Park

    IPC分类号： G11C11/407 ,  G11C7/10 ,  G11C7/22 ,  G11C11/34 ,  G11C11/413 ,  G11C19/00 ,  H03K17/00

    CPC分类号： G11C7/1066 ,  G11C19/00 ,  G11C7/1045 ,  G11C7/22

    摘要： A semiconductor memory device including an operation control circuit for selecting between a single data rate (SDR) mode and a double data rate (DDR) mode. The operation control circuit includes a mode selector for generating a master signal which selects between the SDR and the DDR mode. The operation control circuit also includes a shift register, a repeater, and a pulse generator. When the SDR mode is selected, the shift register generates an output clock signal which changes states every period of the input clock signal. When the DDR mode is selected, the repeater generates an output clock signal which changes states with every state change of the input clock signal. Productivity efficiency is enhanced and production costs are reduced by providing both the SDR and the DDR mode circuitry and the operation control circuit on a single chip.

    摘要翻译： 一种半导体存储器件，包括用于在单个数据速率（SDR）模式和双倍数据速率（DDR）模式之间进行选择的操作控制电路。 操作控制电路包括用于产生在SDR和DDR模式之间进行选择的主信号的模式选择器。 操作控制电路还包括移位寄存器，中继器和脉冲发生器。 当选择SDR模式时，移位寄存器产生输出时钟信号，该输出时钟信号在输入时钟信号的每个周期改变状态。 当选择DDR模式时，中继器产生输出时钟信号，该输出时钟信号随着输入时钟信号的每个状态改变而改变状态。 通过在单个芯片上同时提供SDR和DDR模式电路和操作控制电路，提高了生产效率并降低了生产成本。

    Noble ruthenium-type sensitizer and method of preparing the same
    16.
    发明授权
    Noble ruthenium-type sensitizer and method of preparing the same 有权
    贵金属钌型敏化剂及其制备方法

    公开(公告)号：US08288542B2

    公开(公告)日：2012-10-16

    申请号：US12527767

    申请日：2008-02-15

    申请人： Chan-seok Park

    发明人： Chan-seok Park

    IPC分类号： C07F15/00 ,  H01L51/00

    CPC分类号： C09B57/10 ,  C07F15/0053 ,  H01G9/2031 ,  H01G9/2059 ,  H01L51/0086 ,  Y02E10/542 ,  Y02E10/549 ,  Y02P70/521

    摘要： The present invention relates to a ruthenium-type dye and a making method thereof, and more particularly, to a ruthenium-type dye which is used to manufacture a dye-sensitized solar cell, drastically improves a molar extinction coefficient to enhance efficiency of a solar cell with only a small amount of a dye and oxide semiconductor particles, allows a thin film solar cell element to be manufactured without difficulty and sharply reduces manufacturing costs of a solar cell, and a making method thereof.

    摘要翻译： 本发明涉及钌型染料及其制造方法，更具体地说，涉及一种用于制造染料敏化太阳能电池的钌型染料，显着提高了摩尔消光系数以提高太阳能的效率 仅使用少量的染料和氧化物半导体颗粒的电池，可以毫无困难地制造薄膜太阳能电池元件，并且显着降低太阳能电池的制造成本及其制造方法。

    PHOTOSENSITIVE RESIN COMPOSITION CONTROLLING SOLUBILITY AND PATTERN FORMATION METHOD OF DOUBLE-LAYER STRUCTURE USING THE SAME
    20.
    发明申请
    PHOTOSENSITIVE RESIN COMPOSITION CONTROLLING SOLUBILITY AND PATTERN FORMATION METHOD OF DOUBLE-LAYER STRUCTURE USING THE SAME 有权
    使用它的双层结构的可溶性树脂组合物控制溶解性和图案形成方法

    公开(公告)号：US20090191484A1

    公开(公告)日：2009-07-30

    申请号：US12351398

    申请日：2009-01-09

    申请人： Seok-Yoon YANG ,  Gil-Lae KIM ,  Chan-Seok PARK ,  Choon-Ho PARK ,  Soo-Guy RHO

    发明人： Seok-Yoon YANG ,  Gil-Lae KIM ,  Chan-Seok PARK ,  Choon-Ho PARK ,  Soo-Guy RHO

    IPC分类号： G03F7/20

    CPC分类号： G03F7/032 ,  G03F7/0007 ,  G03F7/0751 ,  Y10S430/106

    摘要： The present invention relates to a new photosensitive resin composition capable of solubility control and a pattern formation method of a double-layer structure using the same, and more particularly to a photosensitive resin composition that can control the -value using a new photopolymerization initiator and lower layer hardener and that can control a film thickness according to the exposure energy without pattern breakup, even with low exposure energy. This photosensitive resin composition is useful for color filters and overcoating materials of LCD (liquid crystal display) manufacturing processes.

    摘要翻译： 本发明涉及一种能够进行溶解度控制的新的感光性树脂组合物和使用该感光性树脂组合物的双层结构的图案形成方法，更具体地说，涉及可以控制 - 使用新的光聚合引发剂和较低 层状硬化剂，并且即使在低曝光能量下也可以根据曝光能量控制膜厚度而不发生图案破裂。 该感光性树脂组合物可用于LCD（液晶显示）制造工艺的滤色器和外涂层材料。