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    Method of optimizing light output during light replication
    15.
    发明授权
    Method of optimizing light output during light replication 有权
    光复制时优化光输出的方法

    公开(公告)号：US08952631B2

    公开(公告)日：2015-02-10

    申请号：US13048427

    申请日：2011-03-15

    Applicant: Dmitri Simonian ,  Steven Paolini ,  Richard Jui-chi Koo

    Inventor： Dmitri Simonian ,  Steven Paolini ,  Richard Jui-chi Koo

    IPC: H05B37/02 ,  H05B33/08

    CPC classification number: H05B33/086 ,  H05B37/0209

    Abstract: A method of utilizing a light replication luminaire to match the spectral characteristics of light that is output from the luminaire to the spectral characteristics of a target light spectrum is provided. In one example, the method permits the user to assign a weight to one or more characteristics of the target light spectrum to be replicated. A best approximation of the target light spectrum is then determined, taking into account the weight assigned to each characteristic. In another example, the target light spectrum is provided to the luminaire by the user through the specification of various characteristics of the target light spectrum.

    Abstract translation: 提供了利用光复制照明器将从照明器输出的光的光谱特性与目标光谱的光谱特性相匹配的方法。 在一个示例中，该方法允许用户为要复制的目标光谱的一个或多个特征分配权重。 然后确定目标光谱的最佳近似值，同时考虑分配给每个特征的权重。 在另一示例中，目标光谱由用户通过对目标光谱的各种特性的规范提供给照明设备。

    LIGHTING SYSTEM WITH SENSOR FEEDBACK
    16.
    发明申请
    LIGHTING SYSTEM WITH SENSOR FEEDBACK 审中-公开
    带传感器反馈的照明系统

    公开(公告)号：US20130307419A1

    公开(公告)日：2013-11-21

    申请号：US13475851

    申请日：2012-05-18

    Applicant: Dmitri Simonian ,  Steven Paolini

    Inventor： Dmitri Simonian ,  Steven Paolini

    IPC: H05B37/02

    CPC classification number: H05B33/0869 ,  H05B33/0872

    Abstract: A lighting system includes multiple light sources, a sensing unit, and a control system. The light sources have different emission spectra, and the sensing unit is configured to measure a spectral content of light. The control system may be configured to use measurements from the sensing unit to select respective intensities for emissions from the light sources and then independently control the light sources to emit the respective intensities. In particular, the control system can select and render a spectral distribution selected based on the light reflected from objects that are being illuminated or render a spectral distribution to supplement light from other light sources and achieve a lighting objective.

    Abstract translation: 照明系统包括多个光源，感测单元和控制系统。 光源具有不同的发射光谱，并且感测单元被配置为测量光的光谱含量。 控制系统可以被配置为使用来自感测单元的测量来选择用于来自光源的发射的相应强度，然后独立地控制光源以发射相应的强度。 特别地，控制系统可以选择和渲染基于从被照射的物体反射的光或者进行光谱分布选择的光谱分布，以补充来自其他光源的光并实现照明目标。

    Removal of sacrificial materials in MEMS fabrications
    19.
    发明申请
    Removal of sacrificial materials in MEMS fabrications 审中-公开
    去除MEMS制造中的牺牲材料

    公开(公告)号：US20060096705A1

    公开(公告)日：2006-05-11

    申请号：US11303063

    申请日：2005-12-14

    Applicant: Hongqin Shi ,  Dmitri Simonian

    Inventor： Hongqin Shi ,  Dmitri Simonian

    IPC: C03C25/68 ,  H01L21/306

    CPC classification number: H01L21/31116 ,  B81C1/00476 ,  B81C2201/0132 ,  B82Y30/00

    Abstract: A method and apparatus for removing the sacrificial layers of microstructures in fabrications have been disclosed. The method comprises a plasma etching process followed by a non-energized spontaneous vapor phase etching process. The plasma and spontaneous etching processes utilize the same etchant that is capable of chemically reacting with the sacrificial material, wherein t chemical reaction is spontaneous.

    Abstract translation: 已经公开了用于去除制造中的微结构的牺牲层的方法和装置。 该方法包括等离子体蚀刻工艺，随后是非电自动气相蚀刻工艺。 等离子体和自发蚀刻工艺利用能够与牺牲材料化学反应的相同的蚀刻剂，其中t化学反应是自发的。

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