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830 条记录 (耗时 0.033 秒)

    COMPOSITIONS AND METHODS FOR SELECTIVELY ETCHING SILICON NITRIDE FILMS
    11.
    发明申请
    COMPOSITIONS AND METHODS FOR SELECTIVELY ETCHING SILICON NITRIDE FILMS 有权

    公开(公告)号：US20220389314A1

    公开(公告)日：2022-12-08

    申请号：US17749868

    申请日：2022-05-20

    申请人： ENTEGRIS, INC.

    发明人： Steven M. Bilodeau ,  Claudia Yevenes ,  Juhee Yeo

    IPC分类号： C09K13/06 ,  H01L21/306

    摘要： The invention relates to compositions and methods for the selective wet etching of a surface of a microelectronic device that contains both silicon nitride (SiN) and polysilicon. An etching composition as described comprises phosphoric acid, certain polysilicon corrosion inhibitors, along with certain silanes. The combination of the two components was found to greatly improve the selectivity of the silicon nitride etching composition in the presence of polysilicon.

    Manifold with movable connectology
    13.
    发明授权
    Manifold with movable connectology 有权

    公开(公告)号：US11511219B2

    公开(公告)日：2022-11-29

    申请号：US16886231

    申请日：2020-05-28

    申请人： ENTEGRIS, INC.

    发明人： Satoshi Kamimoto

    IPC分类号： B01D35/30 ,  B01D27/00

    摘要： Filter cartridges and manifold blocks for filter manifold systems are described. The filter cartridges include flanges surrounding openings at first and second ends of the filter cartridge, with face seals in the flanges. Manifold blocks include end blocks, at least one of which is movable so that the distance between the end blocks can be changed. When a filter cartridge is installed into the manifold by engagement of the flanges with slots in the manifold end blocks, a fluid pathway is formed through a first manifold end block, into the filter cartridge, through the filter cartridge, out of the filter cartridge and into a second manifold end block. The fluid pathway is sealed by the face seals where the flow is from a manifold end block into or out of the filter cartridge.

    ELECTROSTATIC DISCHARGE MITIGATION VALVE
    16.
    发明申请
    ELECTROSTATIC DISCHARGE MITIGATION VALVE 有权

    公开(公告)号：US20220349488A1

    公开(公告)日：2022-11-03

    申请号：US17732136

    申请日：2022-04-28

    申请人： ENTEGRIS, INC.

    发明人： John A. Leys ,  JaeHan Shim

    IPC分类号： F16K25/00 ,  F16K7/16

    摘要： This disclosure provides operative components that mitigate electrostatic charge in fluid circuits. Illustrative embodiments include diaphragm valves that provide fluid control and allow static charge to dissipate when these diaphragm valves are grounded.

    CLEANING COMPOSITION
    18.
    发明申请
    CLEANING COMPOSITION 有权

    公开(公告)号：US20220336210A1

    公开(公告)日：2022-10-20

    申请号：US17720580

    申请日：2022-04-14

    申请人： ENTEGRIS, INC.

    发明人： Jun Liu ,  Michael L. White ,  Daniela White ,  Emanuel I. Cooper

    IPC分类号： H01L21/02

    摘要： Provided are compositions useful for the cleaning of microelectronic device structures. The residues may include post-CMP, post-etch, post-ash residues, pad and brush debris, metal and metal oxide particles and precipitated metal organic complexes such as copper-benzotriazole complexes. Advantageously, the compositions as described herein show improved aluminum, cobalt, and copper compatibility.