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11.发明申请Method for recording information in luminescent compositions and uses thereof in articles of manufacture 失效在发光组合物中记录信息的方法及其在制品中的用途公开(公告)号：US20050103424A1
公开(公告)日：2005-05-19
申请号：US10937347
申请日：2004-09-10
Applicant: My Nguyen , Marc-Andre Locas , Pierre Brunner , Jean-Francois Fortin , Chuanyong Ji
Inventor： My Nguyen , Marc-Andre Locas , Pierre Brunner , Jean-Francois Fortin , Chuanyong Ji
CPC classification number: G11B7/245 , B41M3/144 , C09K11/06 , C09K2211/1029 , C09K2211/1466 , C09K2211/182 , C09K2211/188 , G11B7/244 , G11B7/2492 , G11B7/2531 , G11B7/2532 , G11B7/2533 , G11B7/2539 , H05B33/14
Abstract: Described herein are a method for recording luminescent compositions, comprising a) providing a luminescent composition which comprises at least a first and second luminescent compound, wherein the first luminescent compound is a donor compound having a peak luminescent emission spectrum at a given wavelength, wherein the second luminescent compound is an acceptor compound having a peak absorption spectrum at a longer wavelength than the given wavelength, and wherein the emission spectrum of the donor compound at least partially overlaps the absorption spectrum of the acceptor compound; b) combining the composition with a substrate, so that at least a portion of the composition is available for exposure to a photon source; and c) embedding information at predetermined sites in the combined composition by localized exposure to a photon source, the embedding resulting in an information pattern when exposed to a luminescence deciphering device, and uses of said information pattern.
Abstract translation: 本文描述了一种记录发光组合物的方法，包括：a）提供包含至少第一和第二发光化合物的发光组合物，其中第一发光化合物是在给定波长下具有峰值发光光谱的供体化合物，其中 第二发光化合物是在比给定波长更长的波长处具有峰值吸收光谱的受主化合物，并且其中供体化合物的发射光谱至少部分地与受体化合物的吸收光谱重叠; b）将组合物与基底组合，使得组合物的至少一部分可用于暴露于光子源; 以及c）通过局部暴露于光子源将组合成分中的预定位置嵌入信息，当暴露于发光解密装置时产生信息图案的嵌入和所述信息图案的使用。
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12.发明授权Copolymers, polymeric particles comprising said copolymers and copolymeric binders for radiation-sensitive coating compositions for negative-working radiation-sensitive lithographic printing plates 有权共聚物，包含所述共聚物的聚合物颗粒和用于负性辐射敏感平版印刷版的辐射敏感性涂料组合物的共聚物粘合剂公开(公告)号：US09482944B2
公开(公告)日：2016-11-01
申请号：US13391363
申请日：2010-09-14
Applicant: My T. Nguyen , Marc-Andre Locas
Inventor： My T. Nguyen , Marc-Andre Locas
IPC: C08F220/50 , G03F7/029 , C08F220/70 , C08F220/60 , B41C1/10 , C07C233/18 , C07C255/19 , C07C255/33 , C07C271/16 , C07C271/28 , C07C275/10 , C07D207/40 , C07D295/215 , C07F9/09 , C08F220/42 , G03F7/027 , G03F7/033 , C08F212/08 , C08F220/06 , C08F230/02
CPC classification number: G03F7/029 , B41C1/1008 , B41C2210/04 , B41C2210/08 , B41C2210/22 , B41C2210/24 , C07C233/18 , C07C255/19 , C07C255/33 , C07C271/16 , C07C271/28 , C07C275/10 , C07D207/40 , C07D295/215 , C07F9/091 , C08F212/08 , C08F220/06 , C08F220/42 , C08F220/50 , C08F220/60 , C08F220/70 , C08F230/02 , G03F7/027 , G03F7/033 , C08F220/14 , C08F220/26
Abstract: There is provided a copolymer and polymeric particle comprising the copolymer, a method of producing a polymeric particle, a copolymeric binder, a method of producing a copolymeric binder, a near infrared radiation-sensitive coating composition, a negative working lithographic offset printing plate, a method of producing a negative working lithographic offset printing plate and methods of imaging the plate and printing with the imaged plate.
Abstract translation: 提供了包含共聚物的共聚物和聚合物颗粒，聚合物颗粒的制造方法，共聚物粘合剂，共聚合粘合剂的制造方法，近红外线辐射敏感性涂料组合物，负型平版印刷版印刷版， 制造负性平版印刷胶版印刷版的方法以及成像印版的成像方法和印版。
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Patent Agency Ranking
13.发明授权Materials for lithographic plates coatings, lithographic plates and coatings containing same, methods of preparation and use 有权用于平版印刷版涂料，平版印刷版和含有其的涂料，制备和使用方法公开(公告)号：US08323867B2
公开(公告)日：2012-12-04
申请号：US12579881
申请日：2009-10-15
Applicant: My T. Nguyen , Marc-Andre Locas
Inventor： My T. Nguyen , Marc-Andre Locas
CPC classification number: C09D159/00 , B41C1/1008 , B41C1/1016 , B41C2210/04 , B41C2210/22 , B41C2210/24 , C07C271/16 , C07C275/62 , C07C2603/18 , C07F5/027 , C08B11/193 , C08F220/22 , C08G18/622 , C08G18/785 , C09D101/26 , C09D175/16 , G03F7/027 , G03F7/029 , G03F7/032 , G03F7/0325 , G03F7/033
Abstract: This invention relates to iodonium salts, acetal copolymers and polymer binders comprising functional groups capable of undergoing cationic or radical polymerization, their method of preparation and their use in the preparation of coating solutions and coatings. This invention also relates to coatings containing the iodonium salts, acetal copolymers and/or polymer binders and to negative working lithographic printing plates comprising these coatings.
Abstract translation: 本发明涉及含有可进行阳离子或自由基聚合的官能团的碘鎓盐，缩醛共聚物和聚合物粘合剂，其制备方法及其在制备涂料溶液和涂料中的用途。 本发明还涉及含有碘鎓盐，缩醛共聚物和/或聚合物粘合剂的涂层以及包含这些涂层的负性平版印刷版。
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14.发明申请公开(公告)号：US20120190810A1
公开(公告)日：2012-07-26
申请号：US13391363
申请日：2010-09-14
Applicant: My T. Nguyen , Marc-Andre Locas
Inventor： My T. Nguyen , Marc-Andre Locas
IPC: C08F30/02 , C07C255/30 , C07C255/60 , C07C69/54 , C07C271/20 , C07F9/09 , C08F22/30 , C07C275/16
CPC classification number: G03F7/029 , B41C1/1008 , B41C2210/04 , B41C2210/08 , B41C2210/22 , B41C2210/24 , C07C233/18 , C07C255/19 , C07C255/33 , C07C271/16 , C07C271/28 , C07C275/10 , C07D207/40 , C07D295/215 , C07F9/091 , C08F212/08 , C08F220/06 , C08F220/42 , C08F220/50 , C08F220/60 , C08F220/70 , C08F230/02 , G03F7/027 , G03F7/033 , C08F220/14 , C08F220/26
Abstract: There is provided a copolymer and polymeric particle comprising the copolymer, a method of producing a polymeric particle, a copolymeric binder, a method of producing a copolymeric binder, a near infrared radiation-sensitive coating composition, a negative working lithographic offset printing plate, a method of producing a negative working lithographic offset printing plate and methods of imaging the plate and printing with the imaged plate.
Abstract translation: 提供了包含共聚物的共聚物和聚合物颗粒，聚合物颗粒的制造方法，共聚物粘合剂，共聚合粘合剂的制造方法，近红外线辐射敏感性涂料组合物，负型平版印刷版印刷版， 制造负性平版印刷胶版印刷版的方法以及成像印版的成像方法和印版。
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15.发明申请MATERIALS FOR LITHOGRAPHIC PLATES COATINGS, LITHOGRAPHIC PLATES AND COATINGS CONTAINING SAME, METHODS OF PREPARATION AND USE 审中-公开用于平版印刷涂料的材料，含有它们的石墨板和涂料，制备和使用方法公开(公告)号：US20120003584A1
公开(公告)日：2012-01-05
申请号：US13189908
申请日：2011-07-25
Applicant: My T. NGUYEN , Marc-Andre LOCAS
Inventor： My T. NGUYEN , Marc-Andre LOCAS
IPC: G03F7/004 , C08F293/00
CPC classification number: C09D159/00 , B41C1/1008 , B41C1/1016 , B41C2210/04 , B41C2210/22 , B41C2210/24 , C07C271/16 , C07C275/62 , C07C2603/18 , C07F5/027 , C08B11/193 , C08F220/22 , C08G18/622 , C08G18/785 , C09D101/26 , C09D175/16 , G03F7/027 , G03F7/029 , G03F7/032 , G03F7/0325 , G03F7/033
Abstract: This invention relates to iodonium salts, acetal copolymers and polymer binders comprising functional groups capable of undergoing cationic or radical polymerization, their method of preparation and their use in the preparation of coating solutions and coatings. This invention also relates to coatings containing the iodonium salts, acetal copolymers and/or polymer binders and to negative working lithographic printing plates comprising these coatings.
Abstract translation: 本发明涉及含有可进行阳离子或自由基聚合的官能团的碘鎓盐，缩醛共聚物和聚合物粘合剂，其制备方法及其在制备涂料溶液和涂料中的用途。 本发明还涉及含有碘鎓盐，缩醛共聚物和/或聚合物粘合剂的涂层以及包含这些涂层的负性平版印刷版。
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公开(公告)号：US07910768B2
公开(公告)日：2011-03-22
申请号：US11746252
申请日：2007-05-09
Applicant: My T. Nguyen , Marc-Andre Locas
Inventor： My T. Nguyen , Marc-Andre Locas
CPC classification number: C09D159/00 , B41C1/1008 , B41C1/1016 , B41C2210/04 , B41C2210/22 , B41C2210/24 , C07C271/16 , C07C275/62 , C07C2603/18 , C07F5/027 , C08B11/193 , C08F220/22 , C08G18/622 , C08G18/785 , C09D101/26 , C09D175/16 , G03F7/027 , G03F7/029 , G03F7/032 , G03F7/0325 , G03F7/033
Abstract: This invention relates to iodonium salts, acetal copolymers and polymer binders comprising functional groups capable of undergoing cationic or radical polymerization, their method of preparation and their use in the preparation of coating solutions and coatings. This invention also relates to coatings containing the iodonium salts, acetal copolymers and/or polymer binders and to negative working lithographic printing plates comprising these coatings.
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公开(公告)号：US20100062370A1
公开(公告)日：2010-03-11
申请号：US12579844
申请日：2009-10-15
Applicant: My T. NGUYEN , Marc-Andre Locas
Inventor： My T. NGUYEN , Marc-Andre Locas
CPC classification number: C09D159/00 , B41C1/1008 , B41C1/1016 , B41C2210/04 , B41C2210/22 , B41C2210/24 , C07C271/16 , C07C275/62 , C07C2603/18 , C07F5/027 , C08B11/193 , C08F220/22 , C08G18/622 , C08G18/785 , C09D101/26 , C09D175/16 , G03F7/027 , G03F7/029 , G03F7/032 , G03F7/0325 , G03F7/033
Abstract: This invention relates to iodonium salts, acetal copolymers and polymer binders comprising functional groups capable of undergoing cationic or radical polymerization, their method of preparation and their use in the preparation of coating solutions and coatings. This invention also relates to coatings containing the iodonium salts, acetal copolymers and/or polymer binders and to negative working lithographic printing plates comprising these coatings.
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