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27 条记录 (耗时 0.015 秒)

    Computer readable mask shrink control processor
    11.
    发明申请
    Computer readable mask shrink control processor 有权

    公开(公告)号：US20060259886A1

    公开(公告)日：2006-11-16

    申请号：US11126708

    申请日：2005-05-10

    申请人： S.M. Sadjadi ,  Nicolas Bright

    发明人： S.M. Sadjadi ,  Nicolas Bright

    IPC分类号： G06F17/50 ,  G06F19/00 ,  G03F1/00

    CPC分类号： G03F1/36

    摘要： An apparatus comprising computer readable media is provided. The computer readable media comprises computer readable code for receiving a feature layout and computer readable code for applying shrink correction on the feature layout. The computer readable code for applying the shrink correction comprises providing corner cutouts, adjusting line width and length, shape modifications, etc. for forming features in a patterned layer.

    Smart component-based management techniques in a substrate processing system
    13.
    发明授权
    Smart component-based management techniques in a substrate processing system 有权
    基于基于组件的管理技术在基板处理系统中的应用

    公开(公告)号：US07254510B2

    公开(公告)日：2007-08-07

    申请号：US11498544

    申请日：2006-08-02

    申请人： Neil Benjamin ,  Richard Alan Gottscho ,  Nicolas Bright ,  Robert Steger

    发明人： Neil Benjamin ,  Richard Alan Gottscho ,  Nicolas Bright ,  Robert Steger

    IPC分类号： G06F19/00

    CPC分类号： G01R31/3187 ,  G05B19/4184 ,  G05B2219/31362 ,  G05B2219/31463 ,  Y02P90/14 ,  Y02P90/86

    摘要： A method of component management in a substrate processing system is disclosed. The substrate processing system has a set of components, at least a plurality of components of the set of components being designated to be smart components, each component of the plurality of components having an intelligent component enhancement (ICE). The method includes querying the plurality of components to request their respective unique identification data from their respective ICEs. The method further includes receiving unique identification data from the plurality of components if any of the plurality of components responds to the querying. The method additionally includes flagging the first component for corrective action if a first component of the plurality of components fails to provide first component unique identification data when the first component identification data is expected.

    摘要翻译： 公开了一种基板处理系统中的部件管理方法。 衬底处理系统具有一组组件，该组组件中的至少多个组件被指定为智能组件，多个组件的每个组件具有智能组件增强（ICE）。 该方法包括查询多个组件以从它们各自的ICE请求它们各自的唯一标识数据。 该方法还包括如果多个组件中的任何组件响应于查询，则从多个组件接收唯一的标识数据。 该方法另外包括：如果在预期第一组件识别数据时多个组件的第一组件不能提供第一组件唯一标识数据，则标记第一组件以用于校正动作。

    Method and apparatus for wafer mechanical stress monitoring and wafer thermal stress monitoring
    15.
    发明申请
    Method and apparatus for wafer mechanical stress monitoring and wafer thermal stress monitoring 审中-公开
    用于晶片机械应力监测和晶片热应力监测的方法和装置

    公开(公告)号：US20050066739A1

    公开(公告)日：2005-03-31

    申请号：US10671978

    申请日：2003-09-26

    申请人： Yehiel Gotkis ,  Rodney Kistler ,  Aleksander Owczarz ,  David Hemker ,  Nicolas Bright

    发明人： Yehiel Gotkis ,  Rodney Kistler ,  Aleksander Owczarz ,  David Hemker ,  Nicolas Bright

    IPC分类号： B24B37/04 ,  B24B49/14 ,  B24B49/16 ,  G01L1/00

    CPC分类号： B24B37/015 ,  B24B49/16

    摘要： A chemical mechanical planarization (CMP) system is provided. The CMP system includes a wafer carrier configured to support a wafer during a planarization process, the wafer carrier including a sensor configured to detect a signal indicating a stress being experienced by the wafer during planarization. A computing device in communication with the sensor is included. The computing device is configured to translate the signal to generate a stress map for analysis. A stress relief device responsive to a signal received from the computing device is included. The stress relief device is configured to relieve the stress being experienced by the wafer.

    摘要翻译： 提供化学机械平面化（CMP）系统。 CMP系统包括被配置为在平坦化处理期间支撑晶片的晶片载体，晶片载体包括被配置成在平坦化期间检测指示由晶片经历的应力的信号的传感器。 包括与传感器通信的计算设备。 计算设备被配置为平移信号以产生用于分析的应力图。 包括响应于从计算设备接收的信号的应力消除装置。 应力释放装置被构造成减轻晶片经历的应力。

    Complementary sensors metrological process and method and apparatus for implementing the same
    16.
    发明申请
    Complementary sensors metrological process and method and apparatus for implementing the same 失效
    互补传感器计量过程及其实现方法和装置

    公开(公告)号：US20050007107A1

    公开(公告)日：2005-01-13

    申请号：US10914017

    申请日：2004-08-05

    申请人： Yehiel Gotkis ,  Rodney Kistler ,  Aleksander Owczarz ,  David Hemker ,  Nicolas Bright

    发明人： Yehiel Gotkis ,  Rodney Kistler ,  Aleksander Owczarz ,  David Hemker ,  Nicolas Bright

    IPC分类号： H01L21/66 ,  G01B7/06

    CPC分类号： H01L22/26

    摘要： A method for detecting a thickness of a layer of a wafer to be processed is provided. The method includes defining a plurality of sensors configured to create a set of complementary sensors proximate the wafer. Further included in the method is distributing the plurality of sensors along a particular radius of the wafer such that each sensor of the plurality of sensors is out of phase with an adjacent sensor by a same angle. The method also includes measuring signals generated by the plurality of sensors. Further included is averaging the signals generated by the plurality of sensors so as to generate a combination signal. The averaging is configured to remove noise from the combination signal such that the combination signal is capable of being correlated to identify the thickness of the layer.

    摘要翻译： 提供了一种用于检测待处理晶片层的厚度的方法。 该方法包括限定配置成在晶片附近产生一组互补传感器的多个传感器。 该方法中还包括沿着晶片的特定半径分布多个传感器，使得多个传感器中的每个传感器与相邻的传感器相异相同角度。 该方法还包括测量由多个传感器产生的信号。 还包括对由多个传感器产生的信号进行平均以产生组合信号。 平均化被配置为从组合信号去除噪声，使得组合信号能够被相关联以识别层的厚度。

    Method and apparatus for controlling the volume of a plasma
    17.
    发明授权
    Method and apparatus for controlling the volume of a plasma 有权
    用于控制等离子体体积的方法和装置

    公开(公告)号：US06322661B1

    公开(公告)日：2001-11-27

    申请号：US09439759

    申请日：1999-11-15

    申请人： Andrew D. Bailey, III ,  Alan M. Schoepp ,  Nicolas Bright

    发明人： Andrew D. Bailey, III ,  Alan M. Schoepp ,  Nicolas Bright

    IPC分类号： H05H100

    CPC分类号： H01J37/32623 ,  H01J37/32688

    摘要： A plasma confinement arrangement for controlling the volume of a plasma while processing a substrate inside a process chamber using a plasma enhanced process is disclosed. The arrangement includes a first magnetic bucket having a plurality of first magnetic elements. The first magnetic elements being configured for producing a first magnetic field inside the process chamber. The arrangement further includes a second magnetic bucket having a plurality of second magnetic elements. The second magnetic elements being configured for producing a second magnetic field inside the process chamber. The second magnetic field being configured to combine with the first magnetic field to produce a resultant magnetic field between the first magnetic bucket and the second magnetic bucket. The resultant magnetic field being configured to permit by-product gas from the processing to pass through while substantially confining the plasma within a volume defined at least by the process chamber and the resultant magnetic field.

    摘要翻译： 公开了一种等离子体限制装置，用于在使用等离子体增强过程处理处理室内的衬底的同时控制等离子体的体积。 该装置包括具有多个第一磁性元件的第一磁性桶。 第一磁性元件被配置用于在处理室内产生第一磁场。 该装置还包括具有多个第二磁性元件的第二磁性桶。 第二磁性元件构造成用于在处理室内产生第二磁场。 第二磁场被配置为与第一磁场组合以在第一磁性铲斗和第二磁性铲斗之间产生合成的磁场。 所得到的磁场被配置为允许来自处理的副产物气体通过，同时基本上将等离子体限制在至少由处理室限定的体积和所得的磁场中。

    Methods and arrangement for creating recipes using best-known methods
    18.
    发明授权
    Methods and arrangement for creating recipes using best-known methods 有权
    使用最着名的方法创建配方的方法和安排

    公开(公告)号：US07542820B2

    公开(公告)日：2009-06-02

    申请号：US11536582

    申请日：2006-09-28

    申请人： Chung-Ho Huang ,  Shih-Jeun Fan ,  Chin Chuan Chang ,  Nicolas Bright

    发明人： Chung-Ho Huang ,  Shih-Jeun Fan ,  Chin Chuan Chang ,  Nicolas Bright

    IPC分类号： G06F19/00

    CPC分类号： G06N5/022 ,  G05B2219/32097 ,  G05B2219/45031

    摘要： A method for affecting a creation of a recipe for processing a substrate in a processing system. The method includes providing a best-known method driven recipe editor. The best-known method driven recipe editor incorporates best-known methods (BKMs), which are best practice specifications for the recipe. The method also includes creating a plurality of BKM modules based on the BKMs for the recipe. The method further includes defining rules for parameters in the plurality of BKM modules. The rules are propagated by the BKMs. The methods moreover includes creating a BKM driven recipe by employing the best-known method driven recipe editor to enter values for the parameters within the guidelines of BKM rules.

    摘要翻译： 一种用于影响在处理系统中处理衬底的配方的创建的方法。 该方法包括提供最着名的方法驱动的食谱编辑器。 最着名的方法驱动的食谱编辑器包含最着名的方法（BKM），这是方法的最佳实践规范。 该方法还包括基于用于配方的BKM创建多个BKM模块。 该方法还包括为多个BKM模块中的参数定义规则。 规则由BKM传播。 方法还包括通过采用最着名的方法驱动的配方编辑器来创建BKM驱动的配方，以便在BKM规则的指导下输入参数的值。

    Computer readable mask shrink control processor
    19.
    发明授权
    Computer readable mask shrink control processor 有权
    计算机可读面膜收缩控制处理器

    公开(公告)号：US07539969B2

    公开(公告)日：2009-05-26

    申请号：US11126708

    申请日：2005-05-10

    申请人： S. M. Reza Sadjadi ,  Nicolas Bright

    发明人： S. M. Reza Sadjadi ,  Nicolas Bright

    IPC分类号： G06F17/50

    CPC分类号： G03F1/36

    摘要： An apparatus comprising computer readable media is provided. The computer readable media comprises computer readable code for receiving a feature layout and computer readable code for applying shrink correction on the feature layout. The computer readable code for applying the shrink correction comprises providing corner cutouts, adjusting line width and length, shape modifications, etc. for forming features in a patterned layer.

    摘要翻译： 提供了一种包括计算机可读介质的装置。 计算机可读介质包括用于接收特征布局的计算机可读代码和用于在特征布局上应用收缩校正的计算机可读代码。 用于施加收缩校正的计算机可读代码包括提供拐角切口，调整线宽和长度，形状修改等，以形成图案化层中的特征。