公开(公告)号：US08757197B2

公开(公告)日：2014-06-24

申请号：US12996370

申请日：2009-04-06

申请人： Kaoru Hirata ,  Katsuyuki Sugita ,  Kouji Nishino ,  Ryousuke Dohi ,  Nobukazu Ikeda

发明人： Kaoru Hirata ,  Katsuyuki Sugita ,  Kouji Nishino ,  Ryousuke Dohi ,  Nobukazu Ikeda

IPC分类号： F16K31/02

CPC分类号： G05D7/0635 ,  Y10T137/7761

摘要： The invention prevents overshoot from occurring in flow rate on the output side of a flow rate regulator when output flow rate is changed or the gas type distributed is changed. Thus, an automatic pressure regulator is provided to supply gas pressure to a flow rate regulator that includes a piezoelectric element driving type pressure regulating valve, a control pressure detector provided on the output side of the pressure regulating valve, and a controller to which a detected value P2 of the control pressure detector and a set value Pst for control pressure are input, wherein the controller supplies a control signal to a piezoelectric element driving unit of the pressure regulating valve using a proportional control system to perform valve opening regulation in which the proportional control system of the controller is set to control to bring about a residual deviation in control pressure by disabling an integral action.

摘要翻译： 本发明防止了当流量改变或气体分布改变时流量调节器的输出侧的流量发生过冲。 因此，提供了一种自动压力调节器，用于向包括压电元件驱动型压力调节阀的流量调节器，设置在压力调节阀的输出侧的控制压力检测器和控制器提供气体压力， 输入控制压力检测器的值P2和用于控制压力的设定值Pst，其中控制器使用比例控制系统向压力调节阀的压电元件驱动单元提供控制信号，以执行阀开度调节，其中比例 控制器的控制系统设置为通过禁用积分作用来控制控制压力的残留偏差。

公开(公告)号：US08606412B2

公开(公告)日：2013-12-10

申请号：US12307554

申请日：2007-06-13

申请人： Masaaki Nagase ,  Ryousuke Dohi ,  Nobukazu Ikeda ,  Kouji Nishino ,  Kaoru Hirata ,  Katsuyuki Sugita ,  Atsushi Matsumoto

发明人： Masaaki Nagase ,  Ryousuke Dohi ,  Nobukazu Ikeda ,  Kouji Nishino ,  Kaoru Hirata ,  Katsuyuki Sugita ,  Atsushi Matsumoto

IPC分类号： G05D7/00

CPC分类号： G05D7/0635 ,  G01F1/36 ,  G01F15/005 ,  G01F15/022

摘要： With a pressure type flow control apparatus, a valve on the downstream side of a throttle mechanism is released and a flow rate setting value Qe inputted to the pressure type flow control apparatus is changed to detect the magnitude ΔV of change of a flow rate output signal Qo from the pressure type flow control apparatus while the flow rate setting value Qe is changed, so that normal functioning of the releasing operations of the valve on the downstream side of the throttle mechanism is confirmed when the magnitude ΔV of change of the flow rate output signal Qo is above the predetermined value. If the releasing operations are malfunctioning, the magnitude ΔV of changes is found to be below the predetermined value.

摘要翻译： 利用压力式流量控制装置，释放节气门机构下游侧的阀，改变输入到压力式流量控制装置的流量设定值Qe，以检测流量输出信号的变化幅度DeltaV 当流量设定值Qe变化时，来自压力式流量控制装置的Qo，使得当流量输出的变化幅度DeltaV被确定时，在节气门机构的下游侧的阀的释放操作的正常功能被确认 信号Qo高于预定值。 如果释放操作发生故障，则发现变化幅度DeltaV低于预定值。

公开(公告)号：US08561966B2

公开(公告)日：2013-10-22

申请号：US12439572

申请日：2007-08-21

申请人： Ryousuke Dohi ,  Kouji Nishino ,  Nobukazu Ikeda ,  Yohei Sawada

发明人： Ryousuke Dohi ,  Kouji Nishino ,  Nobukazu Ikeda ,  Yohei Sawada

IPC分类号： F16K31/44 ,  F16K31/02

CPC分类号： F16K31/04 ,  F16K7/16 ,  F16K31/52491

摘要： In a step motor driven cam valve a stem freely ascends and descends within a body having an in-flow passage, an out-flow passage, a valve chamber, and a valve seat. The stem is descended by an actuator, composed of a step motor and a cam mechanism located at a position above the stem, that changes a rotational motion of the step motor to a linear motion and transmits the linear motion to the stem. A diaphragm within a valve chamber or a valve body at a lower end part of the stem rests on the valve seat. A lift support mechanism that supports the actuator to freely ascend and descend is arranged at a bonnet that covers the valve chamber. A height fine-adjustment mechanism, arranged at the lift supporting mechanism, finely adjusts the height of the actuator relative to the stem so as to perform zero-point adjustment of the valve.

摘要翻译： 在步进马达驱动的凸轮阀中，杆在具有流入通道，​​流出通道，阀室和阀座的主体内自由上升和下降。 杆由致动器下降，该致动器由位于杆上方的位置的步进电动机和凸轮机构组成，其将步进电动机的旋转运动改变为线性运动，并将线性运动传递到杆。 阀室内的隔膜或阀杆的下端部的阀体位于阀座上。 支撑致动器自由上升和下降的提升支撑机构布置在覆盖阀室的发动机罩上。 布置在升降支撑机构处的高度精细调节机构，精细地调节致动器相对于杆的高度，以便执行阀的零点调节。

公开(公告)号：US08555920B2

公开(公告)日：2013-10-15

申请号：US12303841

申请日：2007-06-13

申请人： Kaoru Hirata ,  Yohei Sawada ,  Ryousuke Dohi ,  Kouji Nishino ,  Nobukazu Ikeda

发明人： Kaoru Hirata ,  Yohei Sawada ,  Ryousuke Dohi ,  Kouji Nishino ,  Nobukazu Ikeda

IPC分类号： F17D1/04

CPC分类号： G05D7/0664 ,  Y10T137/85938 ,  Y10T137/87314 ,  Y10T137/87539

摘要： A flow rate ratio variable type fluid supply apparatus includes a flow rate control system supplying gas of flow rate Q that is diverted to first flow diverting pipe passage and second flow diverting pipe passage with prescribed flow rates Q1/Q0 so gas is supplied to a chamber, and a first orifice having opening area S1 is installed on the first flow diverting passage, and the second flow diverting passage is connected to a plurality of branch pipe passages connected in parallel, orifices having opening area installed on the branch passages, and open/close valves installed on all, or some of, the branch passages so gas is diverted to flow diverting passages with flow rate ratio Q1/Q0 equivalent to the ratio of the first orifice and the total opening area S2o of flow passable orifices of the second flow diverting passage by regulating total opening area of the flow passable orifices.

摘要翻译： 流量比可变型流体供给装置包括：流量控制系统，其将具有规定流量Q1 / Q0的第一分流管路和第二分流管路的流量Q的气体供给到气室， 并且具有开口面积S1的第一孔口安装在第一分流通道上，第二分流通道连接到并联连接的多个支管通道，开口区域安装在分支通道上的开口/ 安装在所有或一些分支通道上的关闭阀，使得气体转向流动转向通道，流量比Q1 / Q0等于第一孔口与第二流量的可流通孔口的总开口面积S2o的比值 通过调节流通孔的总开口面积来分流通道。

公开(公告)号：US20130186471A1

公开(公告)日：2013-07-25

申请号：US13813219

申请日：2011-06-28

申请人： Masaaki Nagase ,  Nobukazu Ikeda ,  Yohei Sawada ,  Tooru Hirai ,  Kazuyuki Morisaki ,  Kouji Nishino ,  Ryousuke Dohi

发明人： Masaaki Nagase ,  Nobukazu Ikeda ,  Yohei Sawada ,  Tooru Hirai ,  Kazuyuki Morisaki ,  Kouji Nishino ,  Ryousuke Dohi

IPC分类号： G01F7/00

CPC分类号： G01F7/005 ,  G01F1/34 ,  G01F15/002 ,  G01F15/005 ,  G01F25/0053 ,  G05D7/0652 ,  Y10T137/0324

摘要： In a gas supply device supplying many different gases to a gas use portion through many flow rate controllers, a flow rate controller calibration unit includes a build-up tank with inner volume, an inlet side on-off valve and an outlet side on-off valve V2 of the tank, and a gas pressure detector and a gas temperature detector for gas inside the tank, joined in a branched form to a gas supply line, with the valve V2 connected to vacuum. The calibration unit is used to calibrate a flow rate controller based on performing a first measurement of gas temperature and pressure inside the tank, and then building-up gas into the tank, and then performing a second measurement of gas temperature and pressure, and from respective measured values, calculating gas flow rate Q and by comparing a set gas flow rate and calculated gas flow rate Q, performing flow rate calibration.

摘要翻译： 在通过许多流量控制器向气体使用部分供应许多不同气体的气体供应装置中，流量控制器校准单元包括具有内部容积的积聚罐，入口侧开关阀和出口侧开关 阀的阀V2，以及气罐内的气体的气体压力检测器和气体温度检测器，以分支形式连接到气体供给管线，阀V2连接到真空。 校准单元用于基于对罐内的气体温度和压力进行第一次测量，然后将气体积聚到罐中，然后对气体温度和压力进行第二次测量，并从 各个测量值，计算气体流量Q，并通过比较设定的气体流量和计算出的气体流量Q进行流量校准。

公开(公告)号：US20120298220A1

公开(公告)日：2012-11-29

申请号：US13483328

申请日：2012-05-30

申请人： Atsushi HIDAKA ,  Masaaki NAGASE ,  Ryousuke DOHI ,  Nobukazu IKEDA ,  Kouji NISHINO

发明人： Atsushi HIDAKA ,  Masaaki NAGASE ,  Ryousuke DOHI ,  Nobukazu IKEDA ,  Kouji NISHINO

IPC分类号： F16K17/00

CPC分类号： G01F1/363 ,  G01F15/024 ,  G05D7/0635 ,  Y10T137/7737 ,  Y10T137/776 ,  Y10T137/7761

摘要： A pressure type flow rate control device provides flow rate control for gas at 100-500° C. with an error not more than 1.0% F.S. The pressure type flow rate control device includes a valve body with a fluid passage, a valve portion interposed in the passage, a valve drive unit driving the valve portion to open/close the passage, a restriction mechanism on the downstream side of the valve portion in the passage, a temperature detector detecting gas temperature between the valve portion and restriction mechanism, a pressure detector detecting gas pressure between the valve portion and restriction mechanism, and an arithmetic control device controlling flow rate of gas in the restriction mechanism based on values detected by the temperature detector and the pressure detector, wherein the temperature detector is inserted in an attachment hole of the valve body at a position just above an outlet side fluid passage.

摘要翻译： 压力式流量控制装置为100-500℃的气体提供流量控制，误差不超过1.0％F.S. 压力式流量控制装置包括具有流体通道的阀体，插入通道中的阀部分，驱动阀部分以打开/关闭通道的阀驱动单元，在阀部分的下游侧的限制机构 在通道中，检测器检测阀部分和限制机构之间的气体温度，检测阀部分和限制机构之间的气体压力的压力检测器以及根据检测到的值控制限制机构中的气体流量的算术控制装置 通过温度检测器和压力检测器，其中温度检测器被插入在阀体的安装孔中，恰好在出口侧流体通道的正上方。

公开(公告)号：US08191856B2

公开(公告)日：2012-06-05

申请号：US12852220

申请日：2010-08-06

申请人： Atsushi Matsumoto ,  Kaoru Hirata ,  Ryousuke Dohi ,  Nobukazu Ikeda ,  Kouji Nishino

发明人： Atsushi Matsumoto ,  Kaoru Hirata ,  Ryousuke Dohi ,  Nobukazu Ikeda ,  Kouji Nishino

IPC分类号： F16K31/02

CPC分类号： F16K24/04 ,  F16K7/14 ,  F16K31/004 ,  F16K31/007 ,  F16K51/02

摘要： A control valve has a body that forms a valve chamber and a valve seat, a metal diaphragm installed inside the valve chamber and making contact with and departing from the valve seat, an actuator box fixed to the side of the body, a piezoelectric element installed inside the actuator box to thrust the metal diaphragm through mediation of a metal diaphragm presser by elongating downward when voltage is applied, a conical spring mechanism that absorbs elongation of the piezoelectric element at the time when the metal diaphragm makes contact with the valve seat and a prescribed thrust is applied to the valve seat and the like, and a preload mechanism that applies upward compressive force to the piezoelectric element all the time wherein the compressive force applied to the piezoelectric element is externally adjustable.

摘要翻译： 控制阀具有形成阀室和阀座的主体，安装在阀室内部并与阀座接触和离开的金属隔膜，固定在主体侧的致动器盒，安装在压缩元件侧的压电元件 在致动器箱内部，通过金属隔膜压板的调节，通过在施加电压时向下延伸来推动金属隔膜;锥形弹簧机构，其在金属隔膜与阀座接触时吸收压电元件的伸长， 规定的推力被施加到阀座等，以及预压机构，其向压电元件施加向上的压缩力，其中施加到压电元件的压缩力是外部可调节的。

公开(公告)号：US08181932B2

公开(公告)日：2012-05-22

申请号：US12161549

申请日：2006-11-13

申请人： Atsushi Matsumoto ,  Kaoru Hirata ,  Ryousuke Dohi ,  Nobukazu Ikeda ,  Kouji Nishino

发明人： Atsushi Matsumoto ,  Kaoru Hirata ,  Ryousuke Dohi ,  Nobukazu Ikeda ,  Kouji Nishino

IPC分类号： F16K31/02

CPC分类号： F16K24/04 ,  F16K7/14 ,  F16K31/004 ,  F16K31/007 ,  F16K51/02

摘要： A control valve has a body that forms a valve chamber and a valve seat, a metal diaphragm installed inside the valve chamber and making contact with and departing from the valve seat, an actuator box fixed to the side of the body, a piezoelectric element installed inside the actuator box to thrust the metal diaphragm through mediation of a metal diaphragm presser by elongating downward when voltage is applied, a conical spring mechanism that absorbs elongation of the piezoelectric element at the time when the metal diaphragm makes contact with the valve seat and a prescribed thrust is applied to the valve seat and the like, and a preload mechanism that applies upward compressive force to the piezoelectric element all the time wherein the compressive force applied to the piezoelectric element is externally adjustable.

摘要翻译： 控制阀具有形成阀室和阀座的主体，安装在阀室内部并与阀座接触和离开的金属隔膜，固定在主体侧的致动器盒，安装在压缩元件侧的压电元件 在致动器箱内部，通过金属隔膜压板的调节，通过在施加电压时向下延伸来推动金属隔膜;锥形弹簧机构，其在金属隔膜与阀座接触时吸收压电元件的伸长， 规定的推力被施加到阀座等，以及预压机构，其向压电元件施加向上的压缩力，其中施加到压电元件的压缩力是外部可调节的。

公开(公告)号：US20120031500A1

公开(公告)日：2012-02-09

申请号：US13203866

申请日：2009-11-06

申请人： Jun Hirose ,  Kazuyuki Tezuka ,  Yohei Uchida ,  Mutsunori Koyonogi ,  Takahiro Matsuda ,  Ryousuke Dohi ,  Kouji Nishino ,  Nobukazu Ikeda

发明人： Jun Hirose ,  Kazuyuki Tezuka ,  Yohei Uchida ,  Mutsunori Koyonogi ,  Takahiro Matsuda ,  Ryousuke Dohi ,  Kouji Nishino ,  Nobukazu Ikeda

IPC分类号： F17D1/16

CPC分类号： C23C16/45561 ,  H01L21/67017 ,  Y10T137/0396

摘要： To provide a fluid control apparatus capable of reducing the space, while reducing the cost.A fluid control apparatus 1 has a fluid controlling unit 2 and a fluid introducing unit 3. The fluid introducing unit 3 is divided into three parts: a first and a second inlet-side shutoff/open parts 5, 6 disposed on the inlet side, each made up of 2×N/2 on-off valves 23, and a fluid controlling unit-side shutoff/open part 7 made up of 4×M on-off valves 23, disposed between the first and second inlet-side shutoff/open parts 5, 6 and the fluid controlling unit 2.

摘要翻译： 提供能够减少空间的流体控制装置，同时降低成本。 流体控制装置1具有流体控制单元2和流体引入单元3.流体引入单元3被分成三部分：设置在入口侧的第一和第二入口侧截止/打开部分5,6， 每个都由2×N / 2开关阀23和由4×M开关阀23构成的​​流体控制单元侧关闭/打开部分7，其设置在第一和第二入口侧截止阀/ 打开部分5,6和流体控制单元2。

公开(公告)号：US08047510B2

公开(公告)日：2011-11-01

申请号：US12306904

申请日：2007-06-13

申请人： Kaoru Hirata ,  Masaaki Nagase ,  Atsushi Hidaka ,  Atsushi Matsumoto ,  Ryousuke Dohi ,  Kouji Nishino ,  Nobukazu Ikeda

发明人： Kaoru Hirata ,  Masaaki Nagase ,  Atsushi Hidaka ,  Atsushi Matsumoto ,  Ryousuke Dohi ,  Kouji Nishino ,  Nobukazu Ikeda

IPC分类号： B01F3/04

CPC分类号： C23C16/4481 ,  C23C16/52 ,  G05D16/2013 ,  Y10T137/7737

摘要： An evaporation supply apparatus for raw material used in semiconductor manufacturing includes a source tank in which a raw material is pooled; a flow rate control device that supplies carrier gas at a regulated flow rate into the source tank; a primary piping path for feeding mixed gas G0, made up of raw material vapor G4 and carrier gas G1, an automatic pressure regulating device that regulates a control valve based on the detected values of the pressure and temperature of mixed gas G0 to regulate the cross-sectional area of the passage through which the mixed gas G0 is distributed so as to hold the pressure of the mixed gas G0 inside the source tank constant; and a constant-temperature heating unit for heating the source tank to a set temperature, in which mixed gas G0 is supplied to a process chamber while controlling the pressure inside the source tank.

摘要翻译： 用于半导体制造的原料的蒸发供给装置包括：原料汇集在其中的源罐; 流量控制装置，其以规定的流量将载气供给到所述源罐; 用于供给由原料蒸气G4和载气G1组成的混合气体G0的主要管路，基于混合气体G0的压力和温度的检测值来调节控制阀的自动调压装置，以调节十字 混合气体G0通过其分配的通道的截面积，以将混合气体G0的压力保持在源箱内部恒定; 以及用于将源罐加热到设定温度的恒温加热单元，其中将混合气体G0供给到处理室，同时控制源罐内的压力。