公开(公告)号：US20140060434A1

公开(公告)日：2014-03-06

申请号：US13721323

申请日：2012-12-20

Applicant: APPLIED MATERIALS, INC.

Inventor： DAVID K. CARLSON ,  MICHAEL R. RICE ,  KARTIK B. SHAH ,  KASHIF MAQSOOD ,  PRAVIN K. NARWANKAR

IPC: C30B25/14 ,  B05B1/00

CPC classification number: H01L21/683 ,  B05B1/005 ,  C30B25/08 ,  C30B25/14 ,  C30B29/06 ,  E05F1/00 ,  H01L21/67017 ,  H01L21/67028 ,  H01L21/67115 ,  H01L21/67173 ,  H01L21/67712 ,  H01L21/6776

Abstract: Apparatus for use in a substrate processing chamber are provided herein. In some embodiments, a gas injector for use in a process chamber may include first set of gas orifices configured to provide a jet flow of a first process gas into the process chamber, and a second set of gas orifices configured to provide a laminar flow of a second process gas into the process chamber, wherein the first set of gas orifices are disposed between at least two gas orifices of the second set of gas orifices.

Abstract translation: 本文提供了用于基板处理室的装置。 在一些实施例中，用于处理室的气体注入器可以包括构造成提供第一工艺气体到处理室中的喷射流的第一组气体孔，以及第二组气体孔，其被配置成提供 第二工艺气体进入处理室，其中第一组气体孔设置在第二组气体孔的至少两个气体孔之间。

公开(公告)号：US20140060433A1

公开(公告)日：2014-03-06

申请号：US13721311

申请日：2012-12-20

Applicant: APPLIED MATERIALS, INC.

Inventor： DAVID K. CARLSON ,  MICHAEL R. RICE ,  KARTIK B. SHAH ,  KASHIF MAQSOOD ,  PRAVIN K. NARWANKAR

IPC: H01L21/683

CPC classification number: H01L21/683 ,  B05B1/005 ,  C30B25/08 ,  C30B25/14 ,  C30B29/06 ,  E05F1/00 ,  H01L21/67017 ,  H01L21/67028 ,  H01L21/67115 ,  H01L21/67173 ,  H01L21/67712 ,  H01L21/6776

Abstract: Apparatus for the removal of exhaust gases are provided herein. In some embodiments, an apparatus may include a carrier for supporting one or more substrates in a substrate processing tool, the carrier having a first exhaust outlet, and an exhaust assembly including a first inlet disposed proximate the carrier to receive process exhaust from the first exhaust outlet of the carrier, a second inlet to receive a cleaning gas, and an outlet to remove the process exhaust and the cleaning gas.

Abstract translation: 本文提供了用于排出废气的设备。 在一些实施例中，设备可以包括用于在衬底处理工具中支撑一个或多个衬底的载体，所述载体具有第一排气出口和排气组件，所述排气组件包括靠近所述载体设置的第一入口，以接收来自所述第一排气 载体的出口，用于接收清洁气体的第二入口和用于去除工艺废气和清洁气体的出口。

公开(公告)号：US20130269613A1

公开(公告)日：2013-10-17

申请号：US13803181

申请日：2013-03-14

Applicant: APPLIED MATERIALS, INC.

Inventor： ERROL ANTONIO C. SANCHEZ ,  DAVID K. CARLSON

IPC: H01L21/02

CPC classification number: C23C14/246 ,  C23C16/4488 ,  C30B25/08 ,  C30B29/40 ,  H01L21/02104 ,  H01L21/67017

Abstract: Methods and apparatus for generating and delivering process gases for processing substrates are provided herein. In some embodiments, an apparatus for processing a substrate may include a container comprising a lid, a bottom, and a sidewall, wherein the lid, the bottom, and the sidewall define an open area; a solid precursor collection tray disposed within the open area; a gas delivery tube disposed within the open area and extending toward the solid precursor collection tray to provide a gas proximate the solid precursor collection tray; and a purge flow conduit coupled to the open area.

Abstract translation: 本文提供了用于生产和输送处理基板的工艺气体的方法和装置。 在一些实施例中，用于处理衬底的装置可以包括容器，其包括盖子，底部和侧壁，其中盖子，底部和侧壁限定开放区域; 设置在所述开放区域内的固体前体收集盘; 气体输送管，其设置在所述开放区域内并且朝向所述固体前体收集盘延伸以提供靠近所述固体前体收集盘的气体; 以及联接到所述开放区域的吹扫流动导管。

公开(公告)号：US20130220221A1

公开(公告)日：2013-08-29

申请号：US13769912

申请日：2013-02-19

Applicant: Applied Materials, Inc.

Inventor： ERROL ANTONIO C. SANCHEZ ,  MARCEL E. JOSEPHSON ,  JAIDEV RAJARAM ,  RICHARD O. COLLINS ,  DAVID K. CARLSON

IPC: C23C16/455

CPC classification number: C23C16/455 ,  C23C16/4482 ,  C23C16/4483 ,  Y10T137/0318 ,  Y10T137/6416

Abstract: Methods and apparatus for delivering a gas mixture to a process chamber are provided herein. In some embodiments, a precursor delivery apparatus may include an ampoule having a body with a first volume to hold a liquid precursor, an inlet to receive the liquid precursor and a carrier gas, and an outlet to flow a gas mixture of the liquid precursor and the carrier gas from the ampoule; a first heater disposed proximate to or in the first volume to heat the liquid precursor disposed in the first volume proximate to or at a first location within the first volume where the liquid precursor contacts the carrier gas; and a heat transfer apparatus disposed about the body to at least one of provide heat to or remove heat from the ampoule.

Abstract translation: 本文提供了将气体混合物输送到处理室的方法和装置。 在一些实施方案中，前体输送装置可以包括具有第一体积以容纳液体前体的本体的安瓿，用于接收液体前体和载气的入口，以及使液体前体和 来自安瓿的载气; 设置在第一体积附近或第一体积中的第一加热器，用于加热设置在第一体积中的液体前体，该液体前体靠近第一容积或液体前体接触载气的第一容积内的第一位置; 以及传热装置，其围绕所述主体设置为向所述安瓿提供热量或从所述安瓿去除热量中的至少一个。