公开(公告)号：US20200338517A1

公开(公告)日：2020-10-29

申请号：US16855860

申请日：2020-04-22

Applicant: Applied Materials, Inc.

Inventor： Jonathan Frankel ,  Colin C. Neikirk ,  Pravin K. Narwankar ,  Quoc Truong ,  Govindraj Desai ,  Sekar Krishnasamy

IPC: B01J8/10 ,  B01F7/04 ,  B01F7/00 ,  B05D1/00 ,  C23C16/44

Abstract: A reactor for coating particles includes a stationary vacuum chamber to hold a bed of particles to be coated, a vacuum port in an upper portion of the chamber, a chemical delivery system configured to inject a reactant or precursor gas into a lower portion of the chamber, a paddle assembly, and a motor to rotate a drive shaft of the paddle assembly. The lower portion of the chamber forms a half-cylinder. The paddle assembly includes a rotatable drive shaft extending through the chamber along the axial axis of the half cylinder, and a plurality of paddles extending radially from the drive shaft such that rotation of the drive shaft by the motor orbits the plurality of paddles about the drive shaft.

公开(公告)号：US10794853B2

公开(公告)日：2020-10-06

申请号：US15833552

申请日：2017-12-06

Applicant: APPLIED MATERIALS, INC.

Inventor： Colin Neikirk ,  Yuriy Melnik ,  Pravin K. Narwankar

IPC: G01N27/414 ,  C23C16/46 ,  C23C16/52 ,  H01L23/29 ,  H01L21/56 ,  H01L21/285 ,  H01L21/312 ,  H01L21/47 ,  H01L21/02 ,  C23C16/448

Abstract: The present disclosure relates to a method of depositing a polymer layer, including: providing a substrate, having a sensor structure disposed on the substrate, to a substrate support within a hot wire chemical vapor deposition (HWCVD) chamber; providing a process gas comprising an initiator gas and a monomer gas and a carrier gas to the HWCVD chamber; heating a plurality of filaments disposed in the HWCVD chamber to a first temperature sufficient to activate the initiator gas without decomposing the monomer gas; and exposing the substrate to initiator radicals from the activated initiator gas and to the monomer gas to deposit a polymer layer atop the sensor structure.

公开(公告)号：US12146217B2

公开(公告)日：2024-11-19

申请号：US17590614

申请日：2022-02-01

Applicant: Applied Materials, Inc.

Inventor： Kaushal Gangakhedkar ,  Jonathan Frankel ,  Colin C. Neikirk ,  Pravin K. Narwankar

IPC: C23C16/44 ,  A61K9/16 ,  C23C16/455

Abstract: A reactor for coating particles includes a vacuum chamber configured to hold particles to be coated, a vacuum port to exhaust gas from the vacuum chamber via the outlet of the vacuum chamber, a chemical delivery system configured to flow a process gas into the particles via a gas inlet on the vacuum chamber, one or more vibrational actuators located on a first mounting surface of the vacuum chamber, and a controller configured to cause the one or more vibrational actuators to generate a vibrational motion in the vacuum chamber sufficient to induce a vibrational motion in the particles held within the vacuum chamber.

公开(公告)号：US20240376596A1

公开(公告)日：2024-11-14

申请号：US18781825

申请日：2024-07-23

Applicant: Applied Materials, Inc.

Inventor： Jonathan Frankel ,  Colin C. Neikirk ,  Pravin K. Narwankar ,  Quoc Truong ,  Govindraj Desai ,  Sekar Krishnasamy ,  Shrikant Swaminathan

IPC: C23C16/44 ,  B01F27/051 ,  B01F27/07 ,  B01F27/072 ,  B01F27/112 ,  B01F27/70 ,  B01J19/00 ,  B01J19/18 ,  C23C16/455

Abstract: A reactor for coating particles includes a stationary vacuum chamber that has a lower portion that forms a half-cylinder and an upper portion and that holds a bed of particles to be coated, a vacuum port in the upper portion of the chamber, a paddle assembly, and a gas injection assembly that includes a vaporizer to convert a first liquid to a first reactant or precursor gas, a manifold to receive the first reactant or precursor gas from the vaporizer, and a plurality of channels leading from the manifold to a plurality of apertures located in the lower portion of the chamber.

公开(公告)号：US12077856B2

公开(公告)日：2024-09-03

申请号：US18314707

申请日：2023-05-09

Applicant: Applied Materials, Inc.

Inventor： Jonathan Frankel ,  Colin C. Neikirk ,  Pravin K. Narwankar ,  Quoc Truong ,  Govindraj Desai ,  Sekar Krishnasamy ,  Shrikant Swaminathan

IPC: C23C16/44 ,  B01F27/051 ,  B01F27/07 ,  B01F27/072 ,  B01F27/112 ,  B01F27/70 ,  B01J19/00 ,  B01J19/18 ,  C23C16/455

CPC classification number: C23C16/4417 ,  B01F27/051 ,  B01F27/0726 ,  B01F27/074 ,  B01F27/112 ,  B01F27/70 ,  B01J19/0066 ,  B01J19/18 ,  C23C16/45555

Abstract: A reactor for coating particles includes a stationary vacuum chamber that has a lower portion that forms a half-cylinder and an upper portion and that holds a bed of particles to be coated, a vacuum port in the upper portion of the chamber, a paddle assembly, and a gas injection assembly that includes a vaporizer to convert a first liquid to a first reactant or precursor gas, a manifold to receive the first reactant or precursor gas from the vaporizer, and a plurality of channels leading from the manifold to a plurality of apertures located in the lower portion of the chamber.

公开(公告)号：US12064522B2

公开(公告)日：2024-08-20

申请号：US17492363

申请日：2021-10-01

Applicant: Applied Materials, Inc.

Inventor： Fei Wang ,  Miaojun Wang ,  Colin C. Neikirk ,  Jonathan Frankel ,  Pravin K. Narwankar

IPC: A61K9/50

CPC classification number: A61K9/5089 ,  A61K9/501

Abstract: A method of preparing a pharmaceutical composition having a drug-containing core enclosed by one or more silicon oxide materials is provided. The method entails alternating exposing the particles to gaseous or vaporous SiCl4 and gaseous or vaporous H2O at a reduced temperature and in the absence of a catalyst.

公开(公告)号：US20230355536A1

公开(公告)日：2023-11-09

申请号：US18199625

申请日：2023-05-19

Applicant: Applied Materials, Inc.

Inventor： Fei Wang ,  Geetika Bajaj ,  Pravin K. Narwankar

IPC: A61K9/50

CPC classification number: A61K9/5089 ,  A61K9/501

Abstract: This disclosure pertains to coated drug compositions and methods of preparing coated drug compositions with a low temperature o-zone based silicon oxide coating. Specifically, the instant application discloses a method to coat active pharmaceutical ingredient particles using a silicon precursor and ozone at a low temperature.

公开(公告)号：US20230279543A1

公开(公告)日：2023-09-07

申请号：US18314707

申请日：2023-05-09

Applicant: Applied Materials, Inc.

Inventor： Jonathan Frankel ,  Colin C. Neikirk ,  Pravin K. Narwankar ,  Quoc Truong ,  Govindraj Desai ,  Sekar Krishnasamy ,  Shrikant Swaminathan

IPC: C23C16/44 ,  C23C16/455 ,  B01J19/00 ,  B01J19/18 ,  B01F27/051 ,  B01F27/70 ,  B01F27/07 ,  B01F27/112 ,  B01F27/072

CPC classification number: C23C16/4417 ,  B01F27/051 ,  B01F27/0726 ,  B01F27/074 ,  B01F27/112 ,  B01F27/70 ,  B01J19/0066 ,  B01J19/18 ,  C23C16/45555

Abstract: A reactor for coating particles includes a stationary vacuum chamber that has a lower portion that forms a half-cylinder and an upper portion and that holds a bed of particles to be coated, a vacuum port in the upper portion of the chamber, a paddle assembly, and a gas injection assembly that includes a vaporizer to convert a first liquid to a first reactant or precursor gas, a manifold to receive the first reactant or precursor gas from the vaporizer, and a plurality of channels leading from the manifold to a plurality of apertures located in the lower portion of the chamber.

公开(公告)号：US11674223B2

公开(公告)日：2023-06-13

申请号：US16855871

申请日：2020-04-22

Applicant: Applied Materials, Inc.

Inventor： Jonathan Frankel ,  Colin C. Neikirk ,  Pravin K. Narwankar ,  Quoc Truong ,  Govindraj Desai ,  Sekar Krishnasamy ,  Shrikant Swaminathan

IPC: C23C16/44 ,  C23C16/455 ,  B01J19/00 ,  B01J19/18 ,  B01F27/051 ,  B01F27/70 ,  B01F27/07 ,  B01F27/112 ,  B01F27/072

CPC classification number: C23C16/4417 ,  B01F27/051 ,  B01F27/074 ,  B01F27/0726 ,  B01F27/112 ,  B01F27/70 ,  B01J19/0066 ,  B01J19/18 ,  C23C16/45555

Abstract: A reactor for coating particles includes a stationary vacuum chamber having a lower portion that forms a half-cylinder and an upper portion to hold a bed of particles to be coated, a vacuum port in the upper portion of the chamber, a paddle assembly, a motor to rotate a drive shaft of the paddle assembly, a chemical delivery system to deliver a first fluid, and a first gas injection assembly to receive the first fluid from the chemical delivery system and having apertures configured to inject a first reactant or precursor gas into the lower portion of the chamber and such that the first reactant or precursor gas flows substantially tangent to a curved inner surface of the half-cylinder.

公开(公告)号：US11598000B2

公开(公告)日：2023-03-07

申请号：US16137797

申请日：2018-09-21

Applicant: Applied Materials, Inc.

Inventor： Ranga Rao Arnepalli ,  Colin Costano Neikirk ,  Yuriy Melnik ,  Suresh Chand Seth ,  Pravin K. Narwankar ,  Sukti Chatterjee ,  Lance A. Scudder

IPC: C23C14/02 ,  C23C16/02 ,  C23C16/50 ,  C23C16/455 ,  C23C16/56 ,  C23C16/40

Abstract: Methods of removing native oxide layers and depositing dielectric layers having a controlled number of active sites on MEMS devices for biological applications are disclosed. In one aspect, a method includes removing a native oxide layer from a surface of the substrate by exposing the substrate to one or more ligands in vapor phase to volatize the native oxide layer and then thermally desorbing or otherwise etching the volatized native oxide layer. In another aspect, a method includes depositing a dielectric layer selected to provide a controlled number of active sites on the surface of the substrate. In yet another aspect, a method includes both removing a native oxide layer from a surface of the substrate by exposing the substrate to one or more ligands and depositing a dielectric layer selected to provide a controlled number of active sites on the surface of the substrate.