公开(公告)号：US11384648B2

公开(公告)日：2022-07-12

申请号：US16843358

申请日：2020-04-08

Applicant: Applied Materials, Inc.

Inventor： Yuriy Melnik ,  Sukti Chatterjee ,  Kaushal Gangakhedkar ,  Jonathan Frankel ,  Lance A. Scudder ,  Pravin K. Narwankar ,  David Alexander Britz ,  Thomas Knisley ,  Mark Saly ,  David Thompson

IPC: F01D5/28 ,  F01D9/02 ,  C23C16/455 ,  C23C16/34 ,  C23C16/40 ,  C23C16/30 ,  C23C16/56 ,  F01D25/12 ,  F01D25/28 ,  F23R3/28 ,  C07F11/00 ,  F01D25/14

Abstract: Protective coatings on an aerospace component are provided. An aerospace component includes a surface containing nickel, nickel superalloy, aluminum, chromium, iron, titanium, hafnium, alloys thereof, or any combination thereof, and a coating disposed on the surface, where the coating contains a nanolaminate film stack having two or more pairs of a first deposited layer and a second deposited layer. The first deposited layer contains chromium oxide, chromium nitride, aluminum oxide, aluminum nitride, or any combination thereof, the second deposited layer contains aluminum oxide, aluminum nitride, silicon oxide, silicon nitride, silicon carbide, yttrium oxide, yttrium nitride, yttrium silicon nitride, hafnium oxide, hafnium nitride, hafnium silicide, hafnium silicate, titanium oxide, titanium nitride, titanium silicide, titanium silicate, or any combination thereof, and the first deposited layer and the second deposited layer have different compositions from each other.

公开(公告)号：US09303318B2

公开(公告)日：2016-04-05

申请号：US13649488

申请日：2012-10-11

Applicant: Applied Materials, Inc.

Inventor： Tuoh-Bin Ng ,  Yuriy Melnik ,  Lily L Pang ,  Eda Tuncel ,  Lu Chen ,  Son T Nguyen

IPC: C23C16/455 ,  C23C16/30 ,  C23C16/448

CPC classification number: C23C16/303 ,  C23C16/4488 ,  C23C16/45574 ,  C23C16/4558 ,  Y10T137/0318 ,  Y10T137/8593

Abstract: In one embodiment, an apparatus includes a first gas distribution assembly that includes a first gas passage for introducing a first process gas into a second gas passage that introduces the first process gas into a processing chamber and a second gas distribution assembly that includes a third gas passage for introducing a second process gas into a fourth gas passage that introduces the second process gas into the processing chamber. The first and second gas distribution assemblies are each adapted to be coupled to at least one chamber wall of the processing chamber. The first gas passage is shaped as a first ring positioned within the processing chamber above the second gas passage that is shaped as a second ring positioned within the processing chamber. The gas distribution assemblies may be designed to have complementary characteristic radial film growth rate profiles.

Abstract translation: 在一个实施例中，一种装置包括第一气体分配组件，该第一气体分配组件包括用于将第一工艺气体引入第二气体通道的第一气体通道，该第二气体通道将第一工艺气体引入处理室，以及包括第三气体的第二气体分配组件 用于将第二工艺气体引入到将第二工艺气体引入处理室的第四气体通道中。 第一和第二气体分配组件各自适于联接到处理室的至少一个室壁。 第一气体通道被成形为位于第二气体通道上方的处理室内的第一环，该第一环形成为位于处理室内的第二环。 气体分配组件可以被设计成具有互补的特征径向膜生长速率曲线。

公开(公告)号：US11598000B2

公开(公告)日：2023-03-07

申请号：US16137797

申请日：2018-09-21

Applicant: Applied Materials, Inc.

Inventor： Ranga Rao Arnepalli ,  Colin Costano Neikirk ,  Yuriy Melnik ,  Suresh Chand Seth ,  Pravin K. Narwankar ,  Sukti Chatterjee ,  Lance A. Scudder

IPC: C23C14/02 ,  C23C16/02 ,  C23C16/50 ,  C23C16/455 ,  C23C16/56 ,  C23C16/40

Abstract: Methods of removing native oxide layers and depositing dielectric layers having a controlled number of active sites on MEMS devices for biological applications are disclosed. In one aspect, a method includes removing a native oxide layer from a surface of the substrate by exposing the substrate to one or more ligands in vapor phase to volatize the native oxide layer and then thermally desorbing or otherwise etching the volatized native oxide layer. In another aspect, a method includes depositing a dielectric layer selected to provide a controlled number of active sites on the surface of the substrate. In yet another aspect, a method includes both removing a native oxide layer from a surface of the substrate by exposing the substrate to one or more ligands and depositing a dielectric layer selected to provide a controlled number of active sites on the surface of the substrate.

公开(公告)号：US11519066B2

公开(公告)日：2022-12-06

申请号：US16921577

申请日：2020-07-06

Applicant: Applied Materials, Inc.

Inventor： David Alexander Britz ,  Lance A. Scudder ,  Yuriy Melnik ,  Sukti Chatterjee

IPC: C23C16/34 ,  C23C16/455 ,  C23C28/04 ,  C23C16/40 ,  C23C16/50

Abstract: Embodiments of the present disclosure generally relate to protective coatings on various substrates including aerospace components and methods for depositing the protective coatings. In one or more embodiments, a method of forming a protective coating on an aerospace component includes forming an aluminum oxide layer on a surface of the aerospace component and depositing a boron nitride layer on or over the aluminum oxide layer during a vapor deposition process. In some examples, the method includes depositing a metal-containing catalytic layer on the aluminum oxide layer before depositing the boron nitride layer. The boron nitride layer can include hexagonal boron nitride (hBN).

公开(公告)号：US11015252B2

公开(公告)日：2021-05-25

申请号：US16283567

申请日：2019-02-22

Applicant: Applied Materials, Inc.

Inventor： David Britz ,  Pravin K. Narwankar ,  David Thompson ,  Yuriy Melnik ,  Sukti Chatterjee

IPC: F01D5/28 ,  F01D5/18 ,  C23C28/00 ,  C23C16/455 ,  C23C28/04 ,  C23C16/40 ,  C23C14/08

Abstract: Using the systems and methods discussed herein, CMAS corrosion is inhibited via CMAS interception in an engine environment and/or is prevented or reduced by the formation of a metal oxide protective coating on a hot engine section component. The CMAS interception can occur while the engine is in operation in flight or in a testing or quality control environment. The metal oxide protective coating can be applied over other coatings, including Gd-zirconates (GZO) or yttria-stabilized zirconia (YSZ). The metal oxide protective coating is applied at original equipment manufacturers (OEM) and can also be applied in-situ using a gas injection system during engine use in-flight or during maintenance or quality testing. The metal oxide protective coating contains a rare earth element, aluminum, zirconium, chromium, or combinations thereof, and is from 1 nm to 3 microns in thickness.

公开(公告)号：US11761094B2

公开(公告)日：2023-09-19

申请号：US17313847

申请日：2021-05-06

Applicant: Applied Materials, Inc.

Inventor： David Britz ,  Pravin K. Narwankar ,  David Thompson ,  Yuriy Melnik ,  Sukti Chatterjee

IPC: F01D5/28 ,  C23C28/00 ,  F01D5/18 ,  C23C16/455 ,  C23C16/52 ,  C23C28/04 ,  C23C16/40 ,  C23C14/08

CPC classification number: C23C28/3455 ,  C23C16/45525 ,  C23C16/52 ,  C23C28/3215 ,  C23C28/345 ,  F01D5/186 ,  F01D5/288 ,  C23C14/083 ,  C23C16/40 ,  C23C28/042 ,  F05D2230/31 ,  F05D2240/24 ,  F05D2260/95 ,  F05D2300/121 ,  F05D2300/132 ,  F05D2300/134 ,  Y10T428/2462

Abstract: Using the systems and methods discussed herein, CMAS corrosion is inhibited via CMAS interception in an engine environment and/or is prevented or reduced by the formation of a metal oxide protective coating on a hot engine section component. The CMAS interception can occur while the engine is in operation in flight or in a testing or quality control environment. The metal oxide protective coating can be applied over other coatings, including Gd-zirconates (GZO) or yttria-stabilized zirconia (YSZ). The metal oxide protective coating is applied at original equipment manufacturers (OEM) and can also be applied in-situ using a gas injection system during engine use in-flight or during maintenance or quality testing. The metal oxide protective coating contains a rare earth element, aluminum, zirconium, chromium, or combinations thereof and can have a thickness from 1 nm to 3,000 nm.

公开(公告)号：US10794853B2

公开(公告)日：2020-10-06

申请号：US15833552

申请日：2017-12-06

Applicant: APPLIED MATERIALS, INC.

Inventor： Colin Neikirk ,  Yuriy Melnik ,  Pravin K. Narwankar

IPC: G01N27/414 ,  C23C16/46 ,  C23C16/52 ,  H01L23/29 ,  H01L21/56 ,  H01L21/285 ,  H01L21/312 ,  H01L21/47 ,  H01L21/02 ,  C23C16/448

Abstract: The present disclosure relates to a method of depositing a polymer layer, including: providing a substrate, having a sensor structure disposed on the substrate, to a substrate support within a hot wire chemical vapor deposition (HWCVD) chamber; providing a process gas comprising an initiator gas and a monomer gas and a carrier gas to the HWCVD chamber; heating a plurality of filaments disposed in the HWCVD chamber to a first temperature sufficient to activate the initiator gas without decomposing the monomer gas; and exposing the substrate to initiator radicals from the activated initiator gas and to the monomer gas to deposit a polymer layer atop the sensor structure.

公开(公告)号：US12242186B2

公开(公告)日：2025-03-04

申请号：US18394133

申请日：2023-12-22

Applicant: Applied Materials, Inc.

Inventor： Andrew Ceballos ,  Rami Hourani ,  Kenichi Ohno ,  Yuriy Melnik ,  Amita Joshi

IPC: G03F7/00 ,  B82Y10/00 ,  C23C16/04 ,  C23C16/455 ,  G03F7/20 ,  H01L21/28

Abstract: Embodiments of the present disclosure generally relate to densified nanoimprint films and processes for making these densified nanoimprint films, as well as optical devices containing the densified nanoimprint films. In one or more embodiments, a densified nanoimprint film contains a base nanoimprint film and a metal oxide disposed on the base nanoimprint film and in between the nanoparticles. The base nanoimprint film contains nanoparticles, where the nanoparticles contain titanium oxide, zirconium oxide, niobium oxide, tantalum oxide, hafnium oxide, chromium oxide, indium tin oxide, silicon nitride, or any combination thereof. The metal oxide contains aluminum oxide, titanium oxide, zirconium oxide, niobium oxide, tantalum oxide, indium oxide, indium tin oxide, hafnium oxide, chromium oxide, scandium oxide, tin oxide, zinc oxide, yttrium oxide, praseodymium oxide, magnesium oxide, silicon oxide, silicon nitride, silicon oxynitride, or any combination thereof.

公开(公告)号：US11892771B2

公开(公告)日：2024-02-06

申请号：US17136959

申请日：2020-12-29

Applicant: Applied Materials, Inc.

Inventor： Andrew Ceballos ,  Rami Hourani ,  Kenichi Ohno ,  Yuriy Melnik ,  Amita Joshi

IPC: G03F7/00 ,  H01L21/28 ,  C23C16/04 ,  C23C16/455 ,  G03F7/20 ,  B82Y10/00

CPC classification number: G03F7/0002 ,  C23C16/045 ,  C23C16/45527 ,  C23C16/45553 ,  G03F7/0005 ,  G03F7/2004 ,  H01L21/28123 ,  B82Y10/00

Abstract: Embodiments of the present disclosure generally relate to densified nanoimprint films and processes for making these densified nanoimprint films, as well as optical devices containing the densified nanoimprint films. In one or more embodiments, a densified nanoimprint film contains a base nanoimprint film and a metal oxide disposed on the base nanoimprint film and in between the nanoparticles. The base nanoimprint film contains nanoparticles, where the nanoparticles contain titanium oxide, zirconium oxide, niobium oxide, tantalum oxide, hafnium oxide, chromium oxide, indium tin oxide, silicon nitride, or any combination thereof. The metal oxide contains aluminum oxide, titanium oxide, zirconium oxide, niobium oxide, tantalum oxide, indium oxide, indium tin oxide, hafnium oxide, chromium oxide, scandium oxide, tin oxide, zinc oxide, yttrium oxide, praseodymium oxide, magnesium oxide, silicon oxide, silicon nitride, silicon oxynitride, or any combination thereof.

公开(公告)号：US11753727B2

公开(公告)日：2023-09-12

申请号：US17313863

申请日：2021-05-06

Applicant: Applied Materials, Inc.

Inventor： David Britz ,  Pravin K. Narwankar ,  David Thompson ,  Yuriy Melnik ,  Sukti Chatterjee

IPC: C23C16/40 ,  C23C28/00 ,  F01D5/28 ,  F01D5/18 ,  C23C16/455 ,  C23C16/52 ,  C23C28/04 ,  C23C14/08

CPC classification number: C23C28/3455 ,  C23C16/45525 ,  C23C16/52 ,  C23C28/3215 ,  C23C28/345 ,  F01D5/186 ,  F01D5/288 ,  C23C14/083 ,  C23C16/40 ,  C23C28/042 ,  F05D2230/31 ,  F05D2240/24 ,  F05D2260/95 ,  F05D2300/121 ,  F05D2300/132 ,  F05D2300/134 ,  Y10T428/2462

Abstract: Using the systems and methods discussed herein, CMAS corrosion is inhibited via CMAS interception in an engine environment and/or is prevented or reduced by the formation of a metal oxide protective coating on a hot engine section component. The CMAS interception can occur while the engine is in operation in flight or in a testing or quality control environment. The metal oxide protective coating can be applied over other coatings, including Gd-zirconates (GZO) or yttria-stabilized zirconia (YSZ). The metal oxide protective coating is applied at original equipment manufacturers (OEM) and can also be applied in-situ using a gas injection system during engine use in-flight or during maintenance or quality testing. The metal oxide protective coating contains a rare earth element, aluminum, zirconium, chromium, or combinations thereof.