公开(公告)号：US20210132509A1

公开(公告)日：2021-05-06

申请号：US17049707

申请日：2019-04-03

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Simon Reinald HUISMAN ,  Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY ,  Yuxiang LIN ,  Vu Quang TRAN ,  Sebastianus Adrianus GOORDEN ,  Justin Lloyd KREUZER ,  Christopher John MASON ,  Igor Matheus Petronella AARTS ,  Krishanu SHOME ,  Irit TZEMAH

IPC: G03F7/20 ,  G03F9/00

Abstract: An alignment sensor apparatus includes an illumination system, a first optical system, a second optical system, a detector system, and a processor. The illumination system is configured to transmit an illumination beam along an illumination path. The first optical system is configured to transmit the illumination beam toward a diffraction target on a substrate. The second optical system includes a first polarizing optic configured to separate and transmit an irradiance distribution. The detector system is configured to measure a center of gravity of the diffraction target based on the irradiance distribution outputted from a first polarization branch and a second polarization branch. The processor is configured to measure a shift in the center of gravity of the diffraction target caused by an asymmetry variation in the diffraction target and determine a sensor response function of the alignment sensor apparatus based on the center of gravity shift.

公开(公告)号：US20200064746A1

公开(公告)日：2020-02-27

申请号：US16466315

申请日：2017-12-13

Applicant: ASML HOLDING N.V.

Inventor： Justin Lloyd KREUZER

IPC: G03F7/20

Abstract: A method including: subsequent to a first device lithographic step of a device patterning process, measuring a degraded metrology mark on an object and/or a device pattern feature associated with the degraded metrology mark, the degraded metrology mark arising at least in part from the first device lithographic step on the object; and prior to a second device lithographic step of the device patterning process on the object, creating a replacement metrology mark, for use in the patterning process in place of the degraded metrology mark, on the object.

公开(公告)号：US20240027913A1

公开(公告)日：2024-01-25

申请号：US18255261

申请日：2021-12-02

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Sergei SOKOLOV ,  Simon Reinald HUISMAN ,  Jin LIAN ,  Sebastianus Adrianus GOORDEN ,  Muhsin ERALP ,  Henricus Petrus Maria PELLEMANS ,  Justin Lloyd KREUZER

IPC: G03F7/00

CPC classification number: G03F7/70091 ,  G03F7/70625 ,  G03F7/70633

Abstract: A metrology system (400) includes a multi-source radiation system. The multi-source radiation system includes a waveguide device (502) and the multi-source radiation system is configured to generate one or more beams of radiation. The metrology system (400) further includes a coherence adjuster (500) including a multimode waveguide device (504). The multimode waveguide device (504) includes an input configured to receive the one or more beams of radiation from the multi-source radiation system (514) and an output (518) configured to output a coherence adjusted beam of radiation for irradiating a target (418). The metrology system (400) further includes an actuator (506) coupled to the waveguide device (502) and configured to actuate the waveguide device (502) so as to change an impingement characteristic of the one or more beams of radiation at the input of the multimode waveguide device (504).

公开(公告)号：US20230273531A1

公开(公告)日：2023-08-31

申请号：US18016225

申请日：2021-06-29

Applicant: ASML Holding N.V.

Inventor： Mohamed SWILLAM ,  Justin Lloyd KREUZER ,  Stephen ROUX

IPC: G03F7/00 ,  G03F7/20

CPC classification number: G03F7/706845 ,  G03F7/706849 ,  G03F7/706851 ,  G03F7/70233

Abstract: A metrology system comprises a radiation source, an optical element, first and second detectors, an integrated optical device comprising a multimode waveguide, and a processor. The radiation source generates radiation. The optical element directs radiation toward a target to generate scattered radiation from the target. The first detector receives a first portion of the scattered radiation and generates a first detection signal based on the received first portion. The multimode waveguide interferes a second portion of the scattered radiation using modes of the multimode waveguide. The second detector receives the interfered second portion and generates a second detection signal based on the received interfered second portion. The processor receives the first and second detection signals. The processor analyzes the received first portion, the received interfered second portion, and a propagation property of the multimode waveguide. The processor determines the property of the target based on the analysis.

公开(公告)号：US20220283515A1

公开(公告)日：2022-09-08

申请号：US17637156

申请日：2020-08-25

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY ,  Simon Reinald HUISMAN ,  Justin Lloyd KREUZER ,  Sebastianus Adrianus GOORDEN

IPC: G03F7/20

Abstract: A method of determining an overlay measurement associated with a substrate and a system to obtain an overlay measurement associated with a patterning process. A method for determining an overlay measurement may be used in a lithography patterning process. The method includes generating a diffraction signal by illuminating a first overlay pattern and a second overlay pattern using a coherent beam. The method also includes obtaining an interference pattern based on the diffraction signal. The method further includes determining an overlay measurement between the first overlay pattern and the second overlay pattern based on the interference pattern.

公开(公告)号：US20200271438A1

公开(公告)日：2020-08-27

申请号：US16650962

申请日：2018-09-14

Applicant: ASML Holding N.V.

Inventor： Parag Vinayak KELKAR ,  Justin Lloyd KREUZER

IPC: G01B11/06 ,  G02B27/28 ,  G02B5/30

Abstract: An inspection apparatus, including: an optical system configured to provide a beam of radiation to a surface to be measured and to receive redirected radiation from the surface; and a detection system configured to measure the redirected radiation, wherein the optical system includes an optical element to process the radiation, the optical element including a Mac Neille-type multilayer polarizing coating configured to produce a reduced chromatic offset of the radiation.

公开(公告)号：US20190204759A1

公开(公告)日：2019-07-04

申请号：US16301521

申请日：2017-05-17

Applicant: ASML Holding N.V.

Inventor： Krishanu SHOME ,  Igor Matheus Petronella AARTS ,  Justin Lloyd KREUZER ,  Irit TZEMAH

IPC: G03F9/00

CPC classification number: G03F9/7049 ,  G03F9/7073 ,  G03F9/7088

Abstract: An alignment system obtains the characteristics of the light coming back from a wafer stack. A beam analyzer measures changes in wavelength, polarization, and beam profile. This measured information allows for in-line process variation corrections. The correction provides optical monitoring of individual mark stack variations, and in turn provides information to reduce individual mark process variation-induced accuracy error.

公开(公告)号：US20170160075A1

公开(公告)日：2017-06-08

申请号：US15439833

申请日：2017-02-22

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Justin Lloyd KREUZER ,  Arie Jeffrey DEN BOEF ,  Simon Gijsbert Josephus MATHIJSSEN

IPC: G01B11/14 ,  G03F7/20 ,  G03F9/00 ,  G01B9/02

CPC classification number: G01B11/14 ,  F25D3/06 ,  F25D11/003 ,  F25D23/006 ,  G01B9/0207 ,  G03F7/70108 ,  G03F9/7069 ,  G03F9/7084 ,  G03F9/7088

Abstract: An apparatus (AS) measures positions of marks (202) on a lithographic substrate (W). An illumination arrangement (940, 962, 964) provides off-axis radiation from at least first and second regions. The first and second source regions are diametrically opposite one another with respect to an optical axis (O) and are limited in angular extent. The regions may be small spots selected according to a direction of periodicity of a mark being measured, or larger segments. Radiation at a selected pair of source regions can be generated by supplying radiation at a single source feed position to a self-referencing interferometer. A modified half wave plate is positioned downstream of the interferometer, which can be used in the position measuring apparatus. The modified half wave plate has its fast axis in one part arranged at 45° to the fast axis in another part diametrically opposite.

公开(公告)号：US20230266681A1

公开(公告)日：2023-08-24

申请号：US18012799

申请日：2021-06-09

Applicant: ASML Holding N.V.

Inventor： Mohamed SWILLAM ,  Justin Lloyd KREUZER ,  Stephen ROUX

IPC: G03F9/00

CPC classification number: G03F9/7019 ,  G03F9/7065

Abstract: Systems, apparatuses, and methods are provided for determining the alignment of a substrate. An example method can include emitting a multi-wavelength radiation beam including a first wavelength and a second wavelength toward a region of a surface of a substrate. The example method can further include measuring a first diffracted radiation beam indicative of first order diffraction at the first wavelength in response to an irradiation of the region by the multi-wavelength radiation beam. The example method can further include measuring a second diffracted radiation beam indicative of first order diffraction at the second wavelength in response to the irradiation of the region by the multi-wavelength radiation beam. Subsequently, the example method can include generating, based on the measured first set of photons and the measured second set of photons, an electronic signal for use in determining an alignment position of the substrate.

公开(公告)号：US20230116318A1

公开(公告)日：2023-04-13

申请号：US17798040

申请日：2021-01-21

Applicant: ASML Holding N.V.

Inventor： Krishanu SHOME ,  Justin Lloyd KREUZER

IPC: G03F9/00 ,  G03F7/20

Abstract: An apparatus for and method of sensing multiple alignment marks in which the optical axis of a detector is divided into multiple axes each of which can essentially simultaneously detect a separate alignment mark to generate a signal which can then be multiplexed and presented to a single detector or multiple detectors thus permitting more rapid detection of multiple marks.