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公开(公告)号：US20190243254A1
公开(公告)日：2019-08-08
申请号：US16389208
申请日：2019-04-19
Applicant: ASML Holding N.V.
Inventor： Krishanu Shome , Justin Lloyd Kreuzer
Abstract: A metrology system includes a radiation source that generates light, an optical modulation unit, a reflector, an interferometer, and a detector. The optical modulating unit temporally separates a first polarization mode of the light from a second polarization mode of the light. The reflector directs the light towards a substrate. The interferometer interferes the diffracted light from a pattern on the substrate, or reflected light from the substrate, and produces output light from the interference. The detector receives the output light from the interferometer. The first and second polarization modes of the output light are temporally separated at the detector. Additionally, an optical rotator can be configured to receive the first polarized light and rotate the polarization of the first polarized light.
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公开(公告)号：US10338481B2
公开(公告)日：2019-07-02
申请号：US15766427
申请日：2016-10-06
Applicant: ASML Holding N.V.
Inventor： Krishanu Shome , Justin Lloyd Kreuzer
Abstract: A metrology system includes a radiation source that generates light, an optical modulation unit, a reflector, an interferometer, and a detector. The optical modulating unit temporally separates a first polarization mode of the light from a second polarization mode of the light. The reflector directs the light towards a substrate. The interferometer interferes the diffracted light from a pattern on the substrate, or reflected light from the substrate, and produces output light from the interference. The detector receives the output light from the interferometer. The first and second polarization modes of the output light are temporally separated at the detector.
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13.发明授权Mark position measuring apparatus and method, lithographic apparatus and device manufacturing method 有权标记位置测量装置和方法，光刻设备和装置制造方法公开(公告)号：US09551939B2
公开(公告)日：2017-01-24
申请号：US14428565
申请日：2013-09-23
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor： Simon Gijsbert Josephus Mathijssen , Arie Jeffrey Den Boef , Stanley Drazkiewicz , Justin Lloyd Kreuzer , Gerrit Johannes Nijmeijer
CPC classification number: G03F7/70141 , G01B11/14 , G03F9/7069 , G03F9/7088
Abstract: An apparatus to measure the position of a mark, the apparatus including an illumination arrangement to direct radiation across a pupil of the apparatus, the illumination arrangement including an illumination source to provide multiple-wavelength radiation of substantially equal polarization and a wave plate to alter the polarization of the radiation in dependency of the wavelength, such that radiation of different polarization is supplied; an objective to direct radiation on the mark using the radiation supplied by the illumination arrangement while scanning the radiation across the mark in a scanning direction; a radiation processing element to process radiation that is diffracted by the mark and received by the objective; and a detection arrangement to detect variation in an intensity of radiation output by the radiation processing element during the scanning and to calculate from the detected variation a position of the mark in at least a first direction of measurement.
Abstract translation: 一种用于测量标记位置的装置，该装置包括用于将辐射引导到装置的光瞳上的照明装置，所述照明装置包括照明源，以提供基本上相等偏振的多波长辐射和波片，以改变 依赖于波长的辐射的极化，使得提供不同极化的辐射; 使用由照射装置提供的辐射在扫描方向上扫描横过标记的辐射来将辐射引导到标记上的目的; 辐射处理元件，用于处理由所述标记衍射并由所述物镜接收的辐射; 以及检测装置，用于检测在扫描期间由辐射处理元件输出的辐射强度的变化，并且根据检测到的变化来计算至少第一测量方向上的标记的位置。
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14.发明授权公开(公告)号：US11994808B2
公开(公告)日：2024-05-28
申请号：US17029845
申请日：2020-09-23
Applicant: ASML Holding N.V.
Inventor： Mohamed Swillam , Tamer Mohamed Tawfik Ahmed Elazhary , Stephen Roux , Yuxiang Lin , Justin Lloyd Kreuzer
CPC classification number: G03F7/70633 , G01B11/14 , G01B11/272 , G02B6/12007 , G03F7/70575 , G03F7/70616 , G03F7/7085 , G01B2210/56 , G02B6/29301 , G02B6/29395 , G03F7/70608 , H01L21/67259
Abstract: A system includes a radiation source, first and second phased arrays, and a detector. The first and second phased arrays include optical elements, a plurality of ports, waveguides, and phase modulators. The optical elements radiate radiation waves. The waveguides guide radiation from a port of the plurality of ports to the optical elements. Phase modulators adjust phases of the radiation waves. One or both of the first and second phased arrays form a first beam and/or a second beam of radiation directed toward a target structure based on the port coupled to the radiation source. The detector receives radiation scattered by the target structure and generates a measurement signal based on the received radiation.
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公开(公告)号：US11526091B2
公开(公告)日：2022-12-13
申请号：US17600174
申请日：2020-03-25
Applicant: ASML HOLDING N.V.
Inventor： Tamer Mohamed Tawfik Ahmed Mohamed Elazhary , Justin Lloyd Kreuzer , Yuxiang Lin , Kirill Urievich Sobolev
IPC: G03F9/00
Abstract: Apparatus for, and method of, measuring a parameter of an alignment mark on a substrate in which an optical system is arranged to receive at least one diffraction order from the alignment mark and the diffraction order is modulated at a pupil or a wafer conjugate plane of the optical system, a solid state optical device is arranged to receive the modulated diffraction order, and a spectrometer is arranged to receive the modulated diffraction order from the solid state optical device and to determine an intensity of one or more spectral components in the modulated diffraction order.
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Patent Agency Ranking
16.发明申请公开(公告)号：US20210095957A1
公开(公告)日：2021-04-01
申请号：US17029845
申请日：2020-09-23
Applicant: ASML Holding N.V.
Inventor： Mohamed SWILLAM , Tamer Mohamed Tawfik Ahmed Mohamed Elazhary , Stephen Roux , Yuxiang Lin , Justin Lloyd Kreuzer
Abstract: A system includes a radiation source, first and second phased arrays, and a detector. The first and second phased arrays include optical elements, a plurality of ports, waveguides, and phase modulators. The optical elements radiate radiation waves. The waveguides guide radiation from a port of the plurality of ports to the optical elements. Phase modulators adjust phases of the radiation waves. One or both of the first and second phased arrays form a first beam and/or a second beam of radiation directed toward a target structure based on the port coupled to the radiation source. The detector receives radiation scattered by the target structure and generates a measurement signal based on the received radiation.
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公开(公告)号：US10558131B2
公开(公告)日：2020-02-11
申请号：US16389208
申请日：2019-04-19
Applicant: ASML Holding N.V.
Inventor： Krishanu Shome , Justin Lloyd Kreuzer
Abstract: A metrology system includes a radiation source that generates light, an optical modulation unit, a reflector, an interferometer, and a detector. The optical modulating unit temporally separates a first polarization mode of the light from a second polarization mode of the light. The reflector directs the light towards a substrate. The interferometer interferes the diffracted light from a pattern on the substrate, or reflected light from the substrate, and produces output light from the interference. The detector receives the output light from the interferometer. The first and second polarization modes of the output light are temporally separated at the detector. Additionally, an optical rotator can be configured to receive the first polarized light and rotate the polarization of the first polarized light.
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18.发明授权公开(公告)号：US09970747B2
公开(公告)日：2018-05-15
申请号：US15439833
申请日：2017-02-22
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
CPC classification number: G01B11/14 , F25D3/06 , F25D11/003 , F25D23/006 , G01B9/0207 , G03F7/70108 , G03F9/7069 , G03F9/7084 , G03F9/7088
Abstract: An apparatus (AS) measures positions of marks (202) on a lithographic substrate (W). An illumination arrangement (940, 962, 964) provides off-axis radiation from at least first and second regions. The first and second source regions are diametrically opposite one another with respect to an optical axis (O) and are limited in angular extent. The regions may be small spots selected according to a direction of periodicity of a mark being measured, or larger segments. Radiation at a selected pair of source regions can be generated by supplying radiation at a single source feed position to a self-referencing interferometer. A modified half wave plate is positioned downstream of the interferometer, which can be used in the position measuring apparatus. The modified half wave plate has its fast axis in one part arranged at 45° to the fast axis in another part diametrically opposite.
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19.发明申请MARK POSITION MEASURING APPARATUS AND METHOD, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权标记位置测量装置和方法，光刻装置和装置制造方法公开(公告)号：US20150234290A1
公开(公告)日：2015-08-20
申请号：US14428565
申请日：2013-09-23
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor： Simon Gijsbert Josephus Mathijssen , Arie Jeffrey Den Boef , Stanley Drazkiewicz , Justin Lloyd Kreuzer , Gerrit Johannes Nijmeijer
CPC classification number: G03F7/70141 , G01B11/14 , G03F9/7069 , G03F9/7088
Abstract: An apparatus to measure the position of a mark, the apparatus including an illumination arrangement to direct radiation across a pupil of the apparatus, the illumination arrangement including an illumination source to provide multiple-wavelength radiation of substantially equal polarization and a wave plate to alter the polarization of the radiation in dependency of the wavelength, such that radiation of different polarization is supplied; an objective to direct radiation on the mark using the radiation supplied by the illumination arrangement while scanning the radiation across the mark in a scanning direction; a radiation processing element to process radiation that is diffracted by the mark and received by the objective; and a detection arrangement to detect variation in an intensity of radiation output by the radiation processing element during the scanning and to calculate from the detected variation a position of the mark in at least a first direction of measurement.
Abstract translation: 一种用于测量标记位置的装置，该装置包括用于将辐射引导到装置的光瞳上的照明装置，所述照明装置包括照明源，以提供基本上相等偏振的多波长辐射和波片，以改变 依赖于波长的辐射的极化，使得提供不同极化的辐射; 使用由照射装置提供的辐射在扫描方向上扫描横过标记的辐射来将辐射引导到标记上的目的; 辐射处理元件，用于处理由所述标记衍射并由所述物镜接收的辐射; 以及检测装置，用于检测在扫描期间由辐射处理元件输出的辐射强度的变化，并且根据检测到的变化来计算至少第一测量方向上的标记的位置。
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公开(公告)号：US12124177B2
公开(公告)日：2024-10-22
申请号：US17782622
申请日：2020-11-18
Applicant: ASML Holding N.V. , ASML Netherlands B.V.
Inventor： Mohamed Swillam , Simon Reinald Huisman , Justin Lloyd Kreuzer
CPC classification number: G03F7/706851 , G03F7/70633 , G03F7/7085 , G03F9/7046 , G03F9/7088
Abstract: A detection system (200) includes an illumination system (210), a first optical system (232), a phase modulator (220), a lock-in detector (255), and a function generator (230). The illumination system is configured to transmit an illumination beam (218) along an illumination path. The first optical system is configured to transmit the illumination beam toward a diffraction target (204) on a substrate (202). The first optical system is further configured to transmit a signal beam including diffraction order sub-beams (222, 224, 226) that are diffracted by the diffraction target. The phase modulator is configured to modulate the illumination beam or the signal beam based on a reference signal. The lock-in detector is configured to collect the signal beam and to measure a characteristic of the diffraction target based on the signal beam and the reference signal. The function generator is configured to generate the reference signal for the phase modulator and the lock-in detector.
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