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公开(公告)号：US20220350260A1
公开(公告)日：2022-11-03
申请号：US17761475
申请日：2020-09-03
发明人： Armand Eugene Albert , Justin Lloyd KREUZER , Nikhil MEHTA , Patrick WARNAAR , Vasco Tomas TENNER , Patricius Aloysius Jacobus TINNEMANS , Hugo Augustinus Joseph CRAMER
IPC分类号： G03F7/20 , G01N21/956 , G01N21/95
摘要： Disclosed is a method for a metrology measurement on an area of a substrate comprising at least a portion of a target structure. The method comprises receiving a radiation information representing a portion of radiation scattered by the are, and using a filter in a Fourier domain for removing or suppressing at least a portion of the received radiation information that does not relate to radiation that has been scattered by the target structure for obtaining a filtered radiation information for the metrology measurement, wherein characteristics of the filter are based on target information about the target structure.
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公开(公告)号：US20220100109A1
公开(公告)日：2022-03-31
申请号：US17415682
申请日：2019-12-12
发明人： Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY , Franciscus BIJNEN , Alessandro POLO , Kirill Urievich SOBOLEV , Simon Reinald HUISMAN , Justin Lloyd KREUZER
摘要： An apparatus for and method of determining the alignment of a substrate in which a multiple alignment marks are simultaneously illuminated with spatially coherent radiation and the light from the illuminated marks is collected in parallel to obtain information on the positions of the marks and distortions within the marks.
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公开(公告)号：US20170212434A1
公开(公告)日：2017-07-27
申请号：US15328194
申请日：2015-07-07
发明人： Simon Gijsbert Josephus MATHIJSSEN , Arie Jeffrey DEN BOEF , Justin Lloyd KREUZER , Patricius Aloysius Jacobus TINNEMANS
IPC分类号： G03F9/00
CPC分类号： G03F9/7088 , G03F9/7065 , G03F9/7069
摘要： An alignment sensor for a lithographic apparatus is arranged and constructed to measure an alignment of a movable part of the lithographic apparatus in respect of a stationary part of the lithographic apparatus. The alignment sensor comprises a light source configured to generate a pulse train at a optical wavelength and a pulse repetition frequency, a non-linear optical element, arranged in an optical propagation path of the pulse train, the non-linear optical element configured to transform the pulse train at the optical wavelength into a transformed pulse train in an optical wavelength range, an optical imaging system configured to project the transformed pulse train onto an alignment mark comprising a diffraction grating; a detector to detect a diffraction pattern as diffracted by the diffraction grating, and a data processing device configured to derive alignment data from the detected diffraction pattern as detected by the detector.
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公开(公告)号：US20230055116A1
公开(公告)日：2023-02-23
申请号：US17794905
申请日：2021-01-21
申请人： ASML Holding N.V.
发明人： Peter Conrad KOCHERSPERGER , Christopher Michael DOHAN , Justin Lloyd KREUZER , Michal Emanuel PAWLOWSKI , Aage BENDIKSEN , Kirill Urievich SOBOLEV , James Hamilton WALSH , Roberto B. WIENER , Arun Mahadevan VENKATARAMAN
IPC分类号： G03F1/84
摘要： An inspection system includes a radiation source that generates a beam of radiation and irradiates a first surface of an object, defining a region of the first surface of the object. The radiation source also irradiates a second surface of the object, defining a region of the second surface, wherein the second surface is at a different depth level within the object than the first surface. The inspection system may also include a detector that defines a field of view (FOV) of the first surface including the region of the first surface, and receives radiation scattered from the region of the first surface and the region of the second surface. The inspection system may also include a processor that discards image data not received from the region of the first surface, and constructs a composite image comprising the image data from across the region of the first surface.
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公开(公告)号：US20210318627A1
公开(公告)日：2021-10-14
申请号：US17271684
申请日：2019-08-22
发明人： Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY , Justin Lloyd KREUZER , Franciscus Godefridus Casper BIJNEN , Krishanu SHOME
摘要： An apparatus and system for determining alignment of a substrate in which a periodic alignment mark is illuminated with spatially coherent radiation which is then provided to a compact integrated optical device to create self images of the alignment mark which may be manipulated (e.g., mirrored, polarized) and combined to obtain information on the position of the mark and distortions within the mark. Also disclosed is a system for determining alignment of a substrate in which a periodic alignment mark is illuminated with spatially coherent radiation which is then provided to an optical fiber arrangement to obtain information such as the position of the mark and distortions within the mark.
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公开(公告)号：US20210132509A1
公开(公告)日：2021-05-06
申请号：US17049707
申请日：2019-04-03
发明人： Simon Reinald HUISMAN , Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY , Yuxiang LIN , Vu Quang TRAN , Sebastianus Adrianus GOORDEN , Justin Lloyd KREUZER , Christopher John MASON , Igor Matheus Petronella AARTS , Krishanu SHOME , Irit TZEMAH
摘要： An alignment sensor apparatus includes an illumination system, a first optical system, a second optical system, a detector system, and a processor. The illumination system is configured to transmit an illumination beam along an illumination path. The first optical system is configured to transmit the illumination beam toward a diffraction target on a substrate. The second optical system includes a first polarizing optic configured to separate and transmit an irradiance distribution. The detector system is configured to measure a center of gravity of the diffraction target based on the irradiance distribution outputted from a first polarization branch and a second polarization branch. The processor is configured to measure a shift in the center of gravity of the diffraction target caused by an asymmetry variation in the diffraction target and determine a sensor response function of the alignment sensor apparatus based on the center of gravity shift.
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公开(公告)号：US20200064746A1
公开(公告)日：2020-02-27
申请号：US16466315
申请日：2017-12-13
申请人： ASML HOLDING N.V.
发明人： Justin Lloyd KREUZER
IPC分类号： G03F7/20
摘要： A method including: subsequent to a first device lithographic step of a device patterning process, measuring a degraded metrology mark on an object and/or a device pattern feature associated with the degraded metrology mark, the degraded metrology mark arising at least in part from the first device lithographic step on the object; and prior to a second device lithographic step of the device patterning process on the object, creating a replacement metrology mark, for use in the patterning process in place of the degraded metrology mark, on the object.
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公开(公告)号：US20240027913A1
公开(公告)日：2024-01-25
申请号：US18255261
申请日：2021-12-02
发明人： Sergei SOKOLOV , Simon Reinald HUISMAN , Jin LIAN , Sebastianus Adrianus GOORDEN , Muhsin ERALP , Henricus Petrus Maria PELLEMANS , Justin Lloyd KREUZER
IPC分类号： G03F7/00
CPC分类号： G03F7/70091 , G03F7/70625 , G03F7/70633
摘要： A metrology system (400) includes a multi-source radiation system. The multi-source radiation system includes a waveguide device (502) and the multi-source radiation system is configured to generate one or more beams of radiation. The metrology system (400) further includes a coherence adjuster (500) including a multimode waveguide device (504). The multimode waveguide device (504) includes an input configured to receive the one or more beams of radiation from the multi-source radiation system (514) and an output (518) configured to output a coherence adjusted beam of radiation for irradiating a target (418). The metrology system (400) further includes an actuator (506) coupled to the waveguide device (502) and configured to actuate the waveguide device (502) so as to change an impingement characteristic of the one or more beams of radiation at the input of the multimode waveguide device (504).
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19.发明公开公开(公告)号：US20230273531A1
公开(公告)日：2023-08-31
申请号：US18016225
申请日：2021-06-29
申请人： ASML Holding N.V.
CPC分类号： G03F7/706845 , G03F7/706849 , G03F7/706851 , G03F7/70233
摘要： A metrology system comprises a radiation source, an optical element, first and second detectors, an integrated optical device comprising a multimode waveguide, and a processor. The radiation source generates radiation. The optical element directs radiation toward a target to generate scattered radiation from the target. The first detector receives a first portion of the scattered radiation and generates a first detection signal based on the received first portion. The multimode waveguide interferes a second portion of the scattered radiation using modes of the multimode waveguide. The second detector receives the interfered second portion and generates a second detection signal based on the received interfered second portion. The processor receives the first and second detection signals. The processor analyzes the received first portion, the received interfered second portion, and a propagation property of the multimode waveguide. The processor determines the property of the target based on the analysis.
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公开(公告)号：US20220283515A1
公开(公告)日：2022-09-08
申请号：US17637156
申请日：2020-08-25
发明人： Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY , Simon Reinald HUISMAN , Justin Lloyd KREUZER , Sebastianus Adrianus GOORDEN
IPC分类号： G03F7/20
摘要： A method of determining an overlay measurement associated with a substrate and a system to obtain an overlay measurement associated with a patterning process. A method for determining an overlay measurement may be used in a lithography patterning process. The method includes generating a diffraction signal by illuminating a first overlay pattern and a second overlay pattern using a coherent beam. The method also includes obtaining an interference pattern based on the diffraction signal. The method further includes determining an overlay measurement between the first overlay pattern and the second overlay pattern based on the interference pattern.
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