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公开(公告)号：US10126664B2
公开(公告)日：2018-11-13
申请号：US15483410
申请日：2017-04-10
Applicant: ASML NETHERLANDS B.V.
IPC: G03F7/20
Abstract: An immersion lithographic apparatus is disclosed in which at least a part of the liquid supply system (which provides liquid between the projection system and the substrate) is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce the relative velocity between that part and the substrate so that the speed at which the substrate may be moved relative to the projection system may be increased.
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12.发明授权公开(公告)号：US10018925B2
公开(公告)日：2018-07-10
申请号：US15452445
申请日：2017-03-07
Applicant: ASML NETHERLANDS B.V.
Inventor： Nicolaas Rudolf Kemper , Nicolaas Ten Kate , Joost Jeroen Ottens , Marcel Beckers , Marco Polizzi , Michel Riepen , Anthonie Kuijper , Koen Steffens , Adrianes Johannes Baeten , Anca Mihaela Antonevici
CPC classification number: G03F7/70866 , B01D19/0021 , G03B27/52 , G03F7/70341
Abstract: An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.
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公开(公告)号：US20180188661A1
公开(公告)日：2018-07-05
申请号：US15904946
申请日：2018-02-26
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： Nicolaas Rudolf KEMPER , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Joost Jeroen Ottens , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Marco Polizzi , Edwin Augustinus Matheus Van Gompel , Johannes Petrus Maria Smeulers , Stefan Philip Christiaan Belfroid , Herman Vogel
IPC: G03F7/20
Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
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公开(公告)号：US09618853B2
公开(公告)日：2017-04-11
申请号：US14831663
申请日：2015-08-20
Applicant: ASML NETHERLANDS B.V.
IPC: G03F7/20
CPC classification number: G03F7/70866 , G03F7/70341
Abstract: An immersion lithographic apparatus is disclosed in which at least a part of the liquid supply system (which provides liquid between the projection system and the substrate) is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce the relative velocity between that part and the substrate so that the speed at which the substrate may be moved relative to the projection system may be increased.
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公开(公告)号：US09436096B2
公开(公告)日：2016-09-06
申请号：US14586333
申请日：2014-12-30
Applicant: ASML NETHERLANDS B.V.
Inventor： Koen Jacobus Johannes Maria Zaal , Joost Jeroen Ottens
CPC classification number: G03F7/70716 , G03F7/70341 , G03F7/70725 , G03F7/70775 , G03F7/70783 , G03F7/7085 , G03F7/70858 , G03F7/70875
Abstract: A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.
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Patent Agency Ranking
公开(公告)号：US12204255B2
公开(公告)日：2025-01-21
申请号：US18300094
申请日：2023-04-13
Applicant: ASML NETHERLANDS B.V.
Inventor： Nicolaas Ten Kate , Joost Jeroen Ottens , Bastiaan Andreas Wilhelmus Hubertus Knarren , Robbert Jan Voogd , Giovanni Francisco Nino , Marinus Jan Remie , Johannes Henricus Wilhelmus Jacobs , Thibault Simon Mathieu Laurent , Johan Gertrudis Cornelis Kunnen
IPC: G03F7/00
Abstract: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.
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公开(公告)号：US10678139B2
公开(公告)日：2020-06-09
申请号：US16245400
申请日：2019-01-11
Applicant: ASML NETHERLANDS B.V.
Inventor： Joeri Lof , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Johannes Catherinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Erik Theodorus Maria Bijlaart , Christiaan Alexander Hoogendam , Helmar Van Santen , Marcus Adrianus Van De Kerkhof , Mark Kroon , Arie Jeffrey Den Boef , Joost Jeroen Ottens , Jeroen Johannes Sophia Maria Mertens
IPC: G03F7/20
Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
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公开(公告)号：US10649346B2
公开(公告)日：2020-05-12
申请号：US16271303
申请日：2019-02-08
Applicant: ASML NETHERLANDS B.V.
Inventor： Takeshi Kaneko , Joost Jeroen Ottens , Raymond Wilhelmus Louis Lafarre
Abstract: A table for a lithographic apparatus, the table having an encoder plate located on the table, a gap between the encoder plate and a top surface of the table, the gap located radially inward of the encoder plate relative to the periphery of the table, and a fluid extraction system with an opening in the surface of the gap to extract liquid from the gap.
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公开(公告)号：US09904185B2
公开(公告)日：2018-02-27
申请号：US15333044
申请日：2016-10-24
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Joost Jeroen Ottens , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Marco Polizzi , Edwin Augustinus Matheus Van Gompel , Johannes Petrus Maria Smeulers , Stefan Philip Christiaan Belfroid , Herman Vogel
CPC classification number: G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095
Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
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公开(公告)号：US09851644B2
公开(公告)日：2017-12-26
申请号：US15237394
申请日：2016-08-15
Applicant: ASML NETHERLANDS B.V.
Inventor： Koen Jacobus Johannes Maria Zaal , Joost Jeroen Ottens
CPC classification number: G03F7/70716 , G03F7/70341 , G03F7/70725 , G03F7/70775 , G03F7/70783 , G03F7/7085 , G03F7/70858 , G03F7/70875
Abstract: A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.
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