公开(公告)号：US20240264533A1

公开(公告)日：2024-08-08

申请号：US18635589

申请日：2024-04-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis LAFARRE ,  Sjoerd Nicolaas Lambertus DONDERS ,  Nicolaas TEN KATE ,  Nina Vladimirovna DZIOMKINA ,  Yogesh Pramod KARADE ,  Elisabeth Corinne RODENBURG

IPC: G03F7/00 ,  B05D3/06 ,  B05D5/00 ,  B22F7/06 ,  B22F10/00 ,  B22F10/20 ,  B22F10/25 ,  B22F10/28 ,  B22F10/66 ,  B23K26/342 ,  B23K26/354 ,  B23Q3/18 ,  B33Y10/00 ,  B33Y80/00 ,  G03F7/20

CPC classification number: G03F7/70341 ,  B05D3/06 ,  B05D5/00 ,  B22F7/062 ,  B22F10/00 ,  B22F10/20 ,  B23K26/342 ,  B23K26/354 ,  B23Q3/18 ,  B33Y10/00 ,  B33Y80/00 ,  G03F7/20 ,  G03F7/70416 ,  G03F7/707 ,  G03F7/70708 ,  G03F7/70716 ,  G03F7/70733 ,  G03F7/708 ,  B22F10/25 ,  B22F10/28 ,  B22F10/66

Abstract: A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burls to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.

公开(公告)号：US20240168394A1

公开(公告)日：2024-05-23

申请号：US18398860

申请日：2023-12-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Stef Marten Johan JANSSENS ,  Bert Dirk SCHOLTEN ,  Sjoerd Nicolaas Lambertus DONDERS ,  Teunis VAN DAM ,  Peter Mark OVERSCHIE ,  Theresa Mary SPAAN-BURKE ,  Siegfried Alexander TROMP

IPC: G03F7/00 ,  H01L21/683

CPC classification number: G03F7/70725 ,  G03F7/707 ,  G03F7/70783 ,  G03F7/70816 ,  H01L21/6838 ,  H01L21/67288

Abstract: A system for positioning, a stage system, a lithographic apparatus, a method for positioning and a method for manufacturing a device in which use is made of a stage system that includes a plurality of gas bearing devices. Each gas bearing device includes: a gas bearing body, which has a free surface, a primary channel which extends through the gas bearing body and has an inlet opening in the free surface, a secondary channel system which extends through the gas bearing body and which has a plurality of discharge openings in the free surface. The flow resistance in the secondary channel system is higher than the flow resistance in the primary channel.

公开(公告)号：US20190339623A1

公开(公告)日：2019-11-07

申请号：US16511809

申请日：2019-07-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Bob STREEFKERK ,  Sjoerd Nicolaas Lambertus DONDERS ,  Roelof Frederik DE GRAAF ,  Christiaan Alexander HOOGENDAM ,  Martinus Hendrikus Antonius LEENDERS ,  Jeroen Johannes Sophia Maria MERTENS ,  Michel RIEPEN

IPC: G03F7/20

Abstract: An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.

公开(公告)号：US20190224755A1

公开(公告)日：2019-07-25

申请号：US16369368

申请日：2019-03-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis LAFARRE ,  Sjoerd Nicolaas Lambertus DONDERS ,  Nicolaas TEN KATE ,  Nina Vladimirovna DZIOMKINA ,  Yogesh Pramod KARADE ,  Elisabeth Corinne RODENBURG

IPC: B22F7/06 ,  B23K26/354 ,  G03F7/20 ,  B22F3/105 ,  B33Y80/00 ,  B33Y10/00 ,  B23K26/342 ,  B05D5/00 ,  B05D3/06 ,  B23Q3/18

Abstract: A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burs to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.

公开(公告)号：US20190187571A1

公开(公告)日：2019-06-20

申请号：US16309501

申请日：2017-06-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Stef Marten Johan JANSSENS ,  Bert Dirk SCHOLTEN ,  Sjoerd Nicolaas Lambertus DONDERS ,  Teunis VAN DAM ,  Peter Mark OVERSCHIE ,  Theresa Mary SPAAN-BURKE ,  Siegfried Alexander TROMP

IPC: G03F7/20

CPC classification number: G03F7/70725 ,  G03F7/70625 ,  G03F7/707 ,  H01L21/67288 ,  H01L21/6838

Abstract: A system for positioning, a stage system, a lithographic apparatus, a method for positioning and a method for manufacturing a device in which use is made of a stage system. The stage system has a plurality of air bearing devices. Each air bearing device has: a gas bearing body which has a free surface, a primary channel which extends through the bearing body and has an inlet opening in the free surface, and a secondary channel system which extends through the bearing body and which has a plurality of discharge openings in the free surface. The flow resistance in the secondary channel system can be higher than the flow resistance in the primary channel.

公开(公告)号：US20180046089A1

公开(公告)日：2018-02-15

申请号：US15790287

申请日：2017-10-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Bob STREEFKERK ,  Johannes Jacobus Matheus BASELMANS ,  Henrikus Herman Marie COX ,  Antonius Theodorus Anna Maria DERKSEN ,  Sjoerd Nicolaas Lambertus DONDERS ,  Christiaan Alexander HOOGENDAM ,  Joeri LOF ,  Erik Roelof LOOPSTRA ,  Jeroen Johannes Sophia Maria MERTENS ,  Frits VAN DER MEDLEN ,  Johannes Catharinus Hubertus MULKENS ,  Gerardus Petrus Matthijs VAN NUNEN ,  Klaus SIMON ,  Bernardus Antonius SLAGHEKKE ,  Alexander STRAAIJER ,  Jan-Gerard Cornelis VAN DER TOORN ,  Martijn HOUKES

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70425 ,  G03F7/70525 ,  G03F7/709

Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.

公开(公告)号：US20170242347A1

公开(公告)日：2017-08-24

申请号：US15448438

申请日：2017-03-02

Applicant: ASML NETHERLANDS B.V.

Inventor： Christiaan Alexander HOOGENDAM ,  Antonius Theodorus Anna Maria DERKSEN ,  Sjoerd Nicolaas Lambertus DONDERS ,  Joeri LOF ,  Erik Roelof LOOPSTRA ,  Johannes Catharinus Hubertus MULKENS ,  Hans JANSEN ,  Jacobus Johannus Leonardus Hendricus VERSPAY ,  Alexander STRAAIJER ,  Bob STREEFKERK

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70833 ,  G03F7/7085 ,  G03F7/70916 ,  G03F9/7088

Abstract: A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.

公开(公告)号：US20170031250A1

公开(公告)日：2017-02-02

申请号：US15293009

申请日：2016-10-13

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Nicolaas Rudolf KEMPER ,  Henrikus Herman Marie COX ,  Sjoerd Nicolaas Lambertus DONDERS ,  Roelof Frederik DE GRAAF ,  Christiaan Alexander HOOGENDAM ,  Nicolaas TEN KATE ,  Jeroen Johannes Sophia Maria MERTENS ,  Frits VAN DER MEULEN ,  Franciscus Johannes Herman Maria TEUNISSEN ,  Jan-Gerard Cornelis VAN DER TOORN ,  Martinus Cornelis Maria VERHAGEN ,  Stefan Philip Christiaan BELFROID ,  Johannes Petrus Maria SMEULERS ,  Herman VOGEL

IPC: G03F7/20

CPC classification number: G03F7/70883 ,  G03F7/70341 ,  G03F7/70858 ,  G03F7/70866 ,  G03F7/7095

Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.

Abstract translation: 在浸没式光刻投影装置的液体去除系统中使用多孔构件来平滑不均匀的流动。 多孔构件上的压差可以保持在多孔构件的起泡点以下，从而获得单相液体流。 或者，多孔构件可以用于减少两相流中的不均匀性。

公开(公告)号：US20160306283A1

公开(公告)日：2016-10-20

申请号：US15196120

申请日：2016-06-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Daniel Jozef Maria DIRECKS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Nicolaas Rudolf KEMPER ,  Danny Maria Hubertus PHILIPS ,  Michel RIEPEN ,  Clemens Johannes Gerardus VAN DEN DUNGEN ,  Adrianes Johannes BAETEN ,  Fabrizio EVANGELISTA

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70991

Abstract: A fluid handling structure for a lithographic apparatus is disclosed. The fluid handling structure has a plurality of openings arranged in plan, in a line. The fluid handling structure is configured such that the openings are directed, in use, towards a facing surface, the facing surface being a substrate and/or a substrate table. The substrate table is configured to support the substrate. Outward of the line of openings is a damper. The damper may have a width that varies along the line of openings. The damper width is defined between the line of openings and an opposing damper edge.

Abstract translation: 公开了一种用于光刻设备的流体处理结构。 流体处理结构具有以平面方式排成一行的多个开口。 流体处理结构被配置为使得开口在使用中朝向相对表面定向，面对表面是基底和/或基底台。 衬底台被配置为支撑衬底。 开口线的外侧是阻尼器。 阻尼器可以具有沿着开口线变化的宽度。 阻尼器宽度限定在开口线和相对的阻尼器边缘之间。

公开(公告)号：US20150338748A1

公开(公告)日：2015-11-26

申请号：US14816997

申请日：2015-08-03

Applicant: ASML NETHERLANDS B.V.

Inventor： Christiaan Alexander HOOGENDAM ,  Antonius Theodorus Anna Maria DERKSEN ,  Sjoerd Nicolaas Lambertus DONDERS ,  Joeri LOF ,  Erik Roelof LOOPSTRA ,  Johannes Catharinus Hubertus MULKENS ,  Hans JANSEN ,  Jacobus Johannus Leonardus Hendricus VERSPAY ,  Alexander STRAAIJER ,  Bob STREEFKERK

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70833 ,  G03F7/7085 ,  G03F7/70916 ,  G03F9/7088

Abstract: A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.

Abstract translation: 光刻投影装置包括被配置为保持图案形成装置的支撑结构，所述图案形成装置被配置为根据期望的图案对辐射束进行图案化; 被配置为保持基板的基板台; 投影系统，被配置为将所述图案化的光束投影到所述基板的目标部分上; 液体供应系统，被配置为向所述投影系统和所述基板之间的空间提供液体; 以及快门，被配置为隔离所述基板的空间或被基板占据的空间。