公开(公告)号：US11379970B2

公开(公告)日：2022-07-05

申请号：US16968966

申请日：2019-02-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Adrianus Cornelis Matheus Koopman ,  Scott Anderson Middlebrooks ,  Antoine Gaston Marie Kiers ,  Mark John Maslow

IPC: G06T7/00 ,  G06T7/11 ,  G03F7/20 ,  G06K9/62 ,  G06N3/08

Abstract: A method for training a deep learning model of a patterning process. The method includes obtaining (i) training data including an input image of at least a part of a substrate having a plurality of features and including a truth image, (ii) a set of classes, each class corresponding to a feature of the plurality of features of the substrate within the input image, and (iii) a deep learning model configured to receive the training data and the set of classes, generating a predicted image, by modeling and/or simulation with the deep learning model using the input image, assigning a class of the set of classes to a feature within the predicted image based on matching of the feature with a corresponding feature within the truth image, and generating, by modeling and/or simulation, a trained deep learning model by iteratively assigning weights using a loss function.

公开(公告)号：US09360770B2

公开(公告)日：2016-06-07

申请号：US14562133

申请日：2014-12-05

Applicant: ASML Netherlands B.V.

Inventor： Arend Johannes Kisteman ,  Wim Tjibbo Tel ,  Thomas Theeuwes ,  Antoine Gaston Marie Kiers

IPC: G03B27/32 ,  G03B27/52 ,  G03C5/00 ,  G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70641 ,  G03F7/70616 ,  G03F7/70625 ,  G03F9/7026

Abstract: A method of, and associated apparatus for, determining focus corrections for a lithographic projection apparatus. The method comprises exposing a plurality of global correction fields on a test substrate, each comprising a plurality of global correction marks, and each being exposed with a tilted focus offset across it; measuring a focus dependent characteristic for each of the plurality of global correction marks to determine interfield focus variation information; and calculating interfield focus corrections from the interfield focus variation information.

公开(公告)号：US09128065B2

公开(公告)日：2015-09-08

申请号：US14242225

申请日：2014-04-01

Applicant: ASML Netherlands B.V.

Inventor： Hugo Augustinus Joseph Cramer ,  Antoine Gaston Marie Kiers ,  Henricus Petrus Maria Pellemans

IPC: G01B11/00 ,  G01N21/86 ,  G03B27/32 ,  G03B27/42 ,  G03B27/54 ,  G03B27/74 ,  G01N21/956 ,  G03F9/00 ,  G01J3/18 ,  G01J3/28 ,  G01J3/44 ,  G01N21/47 ,  G01N21/95 ,  G03F7/20

CPC classification number: G01N21/956 ,  G01J3/18 ,  G01J3/2803 ,  G01J3/4412 ,  G01N21/4788 ,  G01N21/9501 ,  G03F7/70191 ,  G03F7/70633 ,  G03F9/7049 ,  G03F9/7065 ,  G03F9/7088 ,  G03F9/7092

Abstract: For angular resolved spectrometry a radiation beam is used having an illumination profile having four quadrants is used. The first and third quadrants are illuminated whereas the second and fourth quadrants aren't illuminated. The resulting pupil plane is thus also divided into four quadrants with only the zeroth order diffraction pattern appearing in the first and third quadrants and only the first order diffraction pattern appearing in the second and third quadrants.

Abstract translation: 对于角度分辨光谱法，使用具有具有四个象限的照明轮廓的辐射束。 第一和第三象限被照亮，而第二和第四象限不被照亮。 因此，所得到的光瞳面也被分成四个象限，仅在第一和第三象限中出现零级衍射图案，并且仅在第二和第三象限中出现一级衍射图案。

公开(公告)号：US20140211185A1

公开(公告)日：2014-07-31

申请号：US14242225

申请日：2014-04-01

Applicant: ASML Netherlands B.V.

Inventor： Hugo Augustinus Joseph Cramer ,  Antoine Gaston Marie Kiers ,  Henricus Petrus Maria Pellemans

IPC: G01N21/956 ,  G03F7/20

CPC classification number: G01N21/956 ,  G01J3/18 ,  G01J3/2803 ,  G01J3/4412 ,  G01N21/4788 ,  G01N21/9501 ,  G03F7/70191 ,  G03F7/70633 ,  G03F9/7049 ,  G03F9/7065 ,  G03F9/7088 ,  G03F9/7092

Abstract: For angular resolved spectrometry a radiation beam is used having an illumination profile having four quadrants is used. The first and third quadrants are illuminated whereas the second and fourth quadrants aren't illuminated. The resulting pupil plane is thus also divided into four quadrants with only the zeroth order diffraction pattern appearing in the first and third quadrants and only the first order diffraction pattern appearing in the second and third quadrants.

Abstract translation: 对于角度分辨光谱法，使用具有具有四个象限的照明轮廓的辐射束。 第一和第三象限被照亮，而第二和第四象限不被照亮。 因此，所得到的光瞳面也被分成四个象限，仅在第一和第三象限中出现零级衍射图案，并且仅在第二和第三象限中出现一级衍射图案。

公开(公告)号：US20140055788A1

公开(公告)日：2014-02-27

申请号：US14011663

申请日：2013-08-27

Applicant: ASML Netherlands B.V.

Inventor： Arie Jeffrey Maria DEN BOEF ,  Arno Jan Bleeker ,  Youri Johannes Laurentius Maria Van Dommelen ,  Mircea Dusa ,  Antoine Gaston Marie Kiers ,  Paul Frank Luehrmann ,  Henricus Petrus Maria Pellemans ,  Maurits Van Der Schaar ,  Cedric Desire Grouwstra ,  Markus Gerardus Martinus Van Kraaij

IPC: G03F7/20

CPC classification number: G01N21/8806 ,  G03F7/70341 ,  G03F7/70633 ,  G03F7/7065 ,  G03F9/7034

Abstract: An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.