公开(公告)号：US09811001B2

公开(公告)日：2017-11-07

申请号：US15065674

申请日：2016-03-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Peter Danny Van Voorst ,  Duygu Akbulut ,  Koos Van Berkel ,  Jeroen Johan Maarten Van De Wijdeven ,  Ferry Zijp

IPC: G01B11/04 ,  G02B7/02 ,  G03B27/32 ,  G03B27/74 ,  G03F7/20 ,  G02B21/00 ,  G01N21/956 ,  G01B11/00 ,  G02B27/09

CPC classification number: G03F7/70483 ,  G01B11/00 ,  G01N21/956 ,  G02B21/0016 ,  G02B21/33 ,  G02B27/0988 ,  G03F7/70625 ,  G03F7/70633

Abstract: A method of position control of an optical component relative to a surface is disclosed. The method may include: obtaining a first signal by a first position measurement process; controlling relative movement between the optical component and the surface for a first range of motion using the first signal; obtaining a second signal by a second position measurement process different than the first position measurement process; and controlling relative movement between the optical component and the surface for a second range of motion using the second signal, the second range of motion being nearer the surface than the first range of motion.

公开(公告)号：US20240241452A1

公开(公告)日：2024-07-18

申请号：US18558910

申请日：2022-04-05

Applicant: ASML Netherlands B.V.

Inventor： Arjan Johannes Anton Beukman ,  Duygu Akbulut

IPC: G03F7/00 ,  G03F9/00

CPC classification number: G03F7/70633 ,  G03F7/70775 ,  G03F7/7085 ,  G03F9/7088

Abstract: Disclosed is a parallel metrology sensor system comprising a reference frame and a plurality of integrated optics sensor heads, each integrated optics sensor head configured to perform an independent measurement. Each of the integrated optics sensor heads is operable to measure its position with respect to the reference frame.

公开(公告)号：US11262661B2

公开(公告)日：2022-03-01

申请号：US16431833

申请日：2019-06-05

Applicant: ASML Netherlands B.V.

Inventor： Nitesh Pandey ,  Arie Jeffrey Den Boef ,  Duygu Akbulut ,  Marinus Johannes Maria Van Dam ,  Hans Butler ,  Hugo Augustinus Joseph Cramer ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Ferry Zijp ,  Jeroen Arnoldus Leonardus Johannes Raaymakers ,  Marinus Petrus Reijnders

IPC: G01N21/956 ,  G03F7/20

Abstract: A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.

公开(公告)号：US10444640B2

公开(公告)日：2019-10-15

申请号：US16159080

申请日：2018-10-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Janneke Ravensbergen ,  Duygu Akbulut ,  Nitesh Pandey ,  Jin Lian

IPC: G01B11/00 ,  G03F7/20 ,  G01B9/02

Abstract: A metrology apparatus is disclosed that has an optical system to focus radiation onto a structure and directs redirected radiation from the structure to a detection system. The optical system applies a plurality of different offsets of an optical characteristic to radiation before and/or after redirected by the structure, such that a corresponding plurality of different offsets are provided to redirected radiation derived from a first point of a pupil plane field distribution relative to redirected radiation derived from a second point of the pupil plane field distribution. The detection system detects a corresponding plurality of radiation intensities resulting from interference between the redirected radiation derived from the first point of the pupil plane field distribution and the redirected radiation derived from the second point of the pupil plane field distribution. Each radiation intensity corresponds to a different one of the plurality of different offsets.

公开(公告)号：US10317808B2

公开(公告)日：2019-06-11

申请号：US16069678

申请日：2017-01-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Simon Reinald Huisman ,  Alessandro Polo ,  Duygu Akbulut ,  Sebastianus Adrianus Goorden ,  Arie Jeffrey Den Boef

IPC: G01B11/00 ,  G03F9/00 ,  G01B9/02 ,  G01D5/26

Abstract: In an alignment sensor of a lithographic apparatus, position sensing radiation is delivered to a target (P1). After reflection or diffraction from the target, position sensing radiation is processed to determine a position of the target. Reference radiation interferes with the position sensing radiation) while a relative phase modulation is applied between the reference radiation and the position sensing radiation. The interfering radiation includes a time-varying component defined by the applied phase modulation. The interfering radiation is delivered to two photodetectors in such a way that each photodetector receives said time-varying component in anti-phase to that received at the other photodetector. A difference signal (i(t)) from said photodetectors contains an amplified, low noise version of said time-varying component. This is used in determining the position of the target. Mode matching enhances interference. Surface scattered radiation is rejected.

公开(公告)号：US10185224B2

公开(公告)日：2019-01-22

申请号：US15569086

申请日：2016-04-19

Applicant: ASML Netherlands B.V.

Inventor： Ferry Zijp ,  Duygu Akbulut ,  Peter Danny Van Voorst ,  Jeroen Johan Maarten Van De Wijdeven ,  Koos Van Berkel

IPC: G03B27/52 ,  G03B27/72 ,  G03F7/20 ,  G02B21/00 ,  G01N21/956 ,  G01B11/14 ,  G02B5/30

Abstract: A method involving providing incident radiation of a first polarization state by an optical component into an interface of an object with an external environment, wherein a surface is provided adjacent the interface and separated by a gap from the interface, detecting, from incident radiation reflected from the interface and from the surface, radiation of a second different polarization state arising from the reflection of incident radiation of the first polarization at the interface as distinct from the radiation of the first polarization state in the reflected radiation, and producing a position signal representative of a relative position between the focus of the optical component and the object.

公开(公告)号：US11086240B2

公开(公告)日：2021-08-10

申请号：US16470905

申请日：2017-11-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Sebastianus Adrianus Goorden ,  Nitesh Pandey ,  Duygu Akbulut ,  Alessandro Polo ,  Simon Reinaid Huisman

IPC: G01B11/02 ,  G03F9/00 ,  G03F7/20

Abstract: Disclosed is a metrology sensor system, such as a position sensor. The system comprises an optical collection system configured to collect diffracted or scattered radiation from a metrology mark on a substrate, said collected radiation comprising at least one parameter-sensitive signal and noise signal which is not parameter-sensitive, a processing system operable to process the collected radiation; and a module housing. An optical guide is provided for guiding the at least one parameter-sensitive signal, separated from the noise signal, from the processing system to a detection system outside of the housing. A detector detects the separated at least one parameter-sensitive signal. An obscuration for blocking zeroth order radiation and/or a demagnifying optical system may be provided between the optical guide and the detector.

公开(公告)号：US11042100B2

公开(公告)日：2021-06-22

申请号：US16410250

申请日：2019-05-13

Applicant: ASML Netherlands B.V.

Inventor： Jin Lian ,  Zili Zhou ,  Duygu Akbulut ,  Sergey Tarabrin

IPC: G03F7/20

Abstract: The disclosure relates to measuring a target. In one arrangement, a measurement apparatus is provided that has an optical system configured to illuminate a target with radiation and direct reflected radiation from the target to a sensor. A programmable spatial light modulator in a pupil plane of the optical system is programmed to redirect light in each of a plurality of pupil plane zones in such a way as to form a corresponding plurality of images at different locations on the sensor. Each image is formed by radiation passing through a different respective one of the pupil plane zones.

公开(公告)号：US10234767B2

公开(公告)日：2019-03-19

申请号：US15660498

申请日：2017-07-26

Applicant: ASML Netherlands B.V.

Inventor： Sebastianus Adrianus Goorden ,  Nitesh Pandey ,  Duygu Akbulut ,  Teunis Willem Tukker ,  Johannes Matheus Marie De Wit

IPC: G03F7/20 ,  G01N21/88 ,  G01N21/95 ,  G02B6/26 ,  G02B6/42

Abstract: Devices and methods for processing a radiation beam with coherence are disclosed. In one arrangement, an optical system receives a radiation beam with coherence. The radiation beam comprises components distributed over one or more radiation beam spatial modes. A waveguide supports a plurality of waveguide spatial modes. The optical system directs a plurality of the components of the radiation beam belonging to a common radiation beam spatial mode and having different frequencies onto the waveguide in such a way that each of the plurality of components couples to a different set of the waveguide spatial modes, each set comprising one or more of the waveguide spatial modes.

公开(公告)号：US10126659B2

公开(公告)日：2018-11-13

申请号：US15286319

申请日：2016-10-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Ferry Zijp ,  Sietse Thijmen Van Der Post ,  Fanhe Kong ,  Duygu Akbulut

IPC: G03B27/68 ,  G03F7/20 ,  G02B21/24 ,  G01N21/956

Abstract: A method including obtaining a plurality of radiation distributions of measurement radiation redirected by the target, each of the plurality of radiation distributions obtained at a different gap distance between the target and an optical element of a measurement apparatus, the optical element being the nearest optical element to the target used to provide the measurement radiation to the target, and determining a parameter related to the target using data of the plurality of radiation distributions in conjunction with a mathematical model describing the measurement target.