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公开(公告)号：US09753382B2
公开(公告)日：2017-09-05
申请号：US14397126
申请日：2013-03-19
Applicant: ASML Netherlands B.V.
Inventor： Thibault Simon Mathieu Laurent , Johannes Henricus Wilhelmus Jacobs , Haico Victor Kok , Yuri Johannes Gabriël Van De Vijver , Johannes Antonius Maria Van De Wal , Bastiaan Andreas Wilhelmus Hubertus Knarren , Robbert Jan Voogd , Jan Steven Christiaan Westerlaken , Johannes Hubertus Antonius Van De Rijdt , Allard Eelco Kooiker , Wilhelmina Margareta Jozef Hurkens-Mertens , Yohann Bruno Yvon Teillet
CPC classification number: G03F7/7085 , G03F7/70341 , G03F7/70666 , G03F7/70858 , G03F7/70891
Abstract: A sensor for use in lithographic apparatus of an immersion type and which, in use, comes into contact with the immersion liquid is arranged so that the thermal resistance of a first heat path from a transducer of the sensor to a temperature conditioning device is less than the thermal resistance of a second heat flow path from the transducer to the immersion liquid. Thus, heat flow is preferentially towards the temperature conditioning device and not the immersion liquid so that temperature-induced disturbance in the immersion liquid is reduced or minimized.
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Patent Agency Ranking
公开(公告)号：US20150077728A1
公开(公告)日：2015-03-19
申请号：US14397126
申请日：2013-03-19
Applicant: ASML NETHERLANDS B.V.
Inventor： Thibault Simon Mathieu Laurent , Johannes Henricus Wilhelmus Jacobs , Haico Victor Kok , Yuri Johannes Gabriël Van De Vijver , Johannes Antonius Maria Van De Wal , Bastiaan Andreas Wilhelmus Hubertus Knarren , Robbert Jan Voogd , Jan Steven Christiaan Westerlaken , Johannes Hubertus Antonius Van De Rijdt , Allard Eelco Kooiker , Wilhelmina Margareta Jozef Hurkens-Mertens , Yohann Bruno Yvon Teillet
IPC: G03F7/20
CPC classification number: G03F7/7085 , G03F7/70341 , G03F7/70666 , G03F7/70858 , G03F7/70891
Abstract: A sensor for use in lithographic apparatus of an immersion type and which, in use, comes into contact with the immersion liquid is arranged so that the thermal resistance of a first heat path from a transducer of the sensor to a temperature conditioning device is less than the thermal resistance of a second heat flow path from the transducer to the immersion liquid. Thus, heat flow is preferentially towards the temperature conditioning device and not the immersion liquid so that temperature-induced disturbance in the immersion liquid is reduced or minimized.
Abstract translation: 用于浸没式光刻设备的传感器，并且在使用中与浸入液体接触的布置使得从传感器的换能器到温度调节装置的第一热路的热阻小于 从换能器到浸液的第二热流路的热阻。 因此，热流优先朝向温度调节装置，而不是浸没液体，使得浸没液体中的温度引起的干扰减小或最小化。
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公开(公告)号：US11630399B2
公开(公告)日：2023-04-18
申请号：US17698100
申请日：2022-03-18
Applicant: ASML NETHERLANDS B.V.
Inventor： Nicolaas Ten Kate , Joost Jeroen Ottens , Bastiaan Andreas Wilhelmus Hubertus Knarren , Robbert Jan Voogd , Giovanni Francisco Nino , Marinus Jan Remie , Johannes Henricus Wilhelmus Jacobs , Thibault Simon Mathieu Laurent , Johan Gertrudis Cornelis Kunnen
IPC: G03F7/20
Abstract: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.
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公开(公告)号：US10732498B2
公开(公告)日：2020-08-04
申请号：US16502674
申请日：2019-07-03
Applicant: ASML Netherlands B.V.
Inventor： Pieter Cristiaan De Groot , Gerard Frans Jozef Schasfoort , Maksym Yuriiovych Sladkov , Manfred Petrus Johannes Maria Dikkers , Jozef Maria Finders , Pieter-Jan Van Zwol , Johannes Jacobus Matheus Baselmans , Stefan Michael Bruno Baumer , Laurentius Cornelius De Winter , Wouter Joep Engelen , Marcus Adrianus Van De Kerkhof , Robbert Jan Voogd
Abstract: A patterning device comprising a reflective marker, wherein the marker comprises: a plurality of reflective regions configured to preferentially reflect radiation having a given wavelength; and a plurality of absorbing regions configured to preferentially absorb radiation having the given wavelength; wherein the absorbing and reflective regions are arranged to form a patterned radiation beam reflected from the marker when illuminated with radiation, and wherein the reflective regions comprise a roughened reflective surface, the roughened reflective surface being configured to diffuse radiation reflected from the reflective regions, and wherein the roughened reflective surface has a root mean squared roughness of about an eighth of the given wavelength or more.
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公开(公告)号：US10203611B2
公开(公告)日：2019-02-12
申请号：US15818232
申请日：2017-11-20
Applicant: ASML NETHERLANDS B.V.
Inventor： Thibault Simon Mathieu Laurent , Gerardus Adrianus Antonius Maria Kusters , Bastiaan Andreas Wilhelmus Hubertus Knarren , Raymond Wilhelmus Louis Lafarre , Koen Steffens , Takeshi Kaneko , Robbert Jan Voogd , Gregory Martin Mason Corcoran , Ruud Hendrikus Martinus Johannes Bloks , Johan Gertrudis Cornelis Kunnen , Ramin Badie
IPC: G03F7/20
Abstract: A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.
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公开(公告)号：US09690207B2
公开(公告)日：2017-06-27
申请号：US14436046
申请日：2013-09-10
Applicant: ASML Netherlands B.V.
Inventor： Haico Victor Kok , Robbert Jan Voogd
CPC classification number: G03F7/70775 , G01B11/0675 , G01B11/14 , G03F7/70483 , G03F7/70525 , G03F9/7046 , G03F9/7049 , G03F9/7092
Abstract: A sensor system to measure a physical quantity, the system including a parallel detection arrangement with multiple detectors to allow measurements in parallel at different spatial locations, wherein the multiple detectors share a noise source, wherein the sensor system is configured such that the multiple detectors each output a signal as a function of the physical quantity, and wherein the sensor system is configured such that at least one detector responds differently to noise originating from the shared noise source than the one or more other detectors.
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