公开(公告)号：US07079331B2

公开(公告)日：2006-07-18

申请号：US11109316

申请日：2005-04-19

申请人： Ulrich Weber ,  Alexander Kohl ,  Hubert Holderer ,  Armin Schoeppach ,  Erwin Gaber ,  Winfried Kaiser ,  Reiner Garreis ,  Toralf Gruner ,  Chris Reed ,  Dragos Pariza ,  Mike Meehan

发明人： Ulrich Weber ,  Alexander Kohl ,  Hubert Holderer ,  Armin Schoeppach ,  Erwin Gaber ,  Winfried Kaiser ,  Reiner Garreis ,  Toralf Gruner ,  Chris Reed ,  Dragos Pariza ,  Mike Meehan

IPC分类号： G02B7/02 ,  G02B27/10 ,  G02B27/14 ,  G02B7/18 ,  G02F1/01

CPC分类号： G03F7/70825 ,  G02B7/008 ,  G02B7/1805 ,  G03F7/70891

摘要： The invention relates to a device for holding a beam splitter element having an optically active beam splitter layer in an optical imaging device, the beam splitter element being connected to at least one support element that is fastened in the housing of the imaging device. The connection between the beam splitter element and said at least one support element is designed in such a way that the position of the beam splitter layer of the beam splitter element remains nearly constant relative to the housing independently of temperatures and of thermal stresses acting upon the beam splitter element.

摘要翻译： 本发明涉及一种用于在光学成像装置中保持具有光学有源分束器层的分束器元件的装置，所述分束器元件连接到紧固在成像装置的外壳中的至少一个支撑元件。 分束器元件和所述至少一个支撑元件之间的连接被设计成使得分束器元件的分束器层的位置相对于壳体保持几乎恒定，而与温度和作用在 分束器元件

公开(公告)号：US20060012893A1

公开(公告)日：2006-01-19

申请号：US10530689

申请日：2003-08-13

申请人： Ulrich Weber ,  Alexander Kohl ,  Hubert Holderer

发明人： Ulrich Weber ,  Alexander Kohl ,  Hubert Holderer

IPC分类号： G02B7/02

CPC分类号： G03F9/7096 ,  G02B7/004 ,  G02B7/023 ,  G03F7/70833

摘要： An objective, in particular a projection objective in microlithography for producing semiconductor components, is assembled from a number of individual housing structures (4, 5), optical elements being arranged in each housing structure (4, 5), and a number of optical axes (15, 16, 18, 35) being formed by the housing structures (4, 5). At least one first housing structure (4) is provided with seats (22, 23, 24, 25) on which one or more further housing structures (5) and/or optical subassemblies (6, 8, 11, 14) are adjusted and are connected to the first housing structure (4).

摘要翻译： 特别是用于制造半导体部件的微光刻中的投影物镜的目的是从多个单独的外壳结构（4,5）组装，设置在每个外壳结构（4,5）中的光学元件，以及多个光轴 （15,16,18，35）由所述壳体结构（4,5）形成。 至少一个第一壳体结构（4）设置有座（22,23,24,25），其上调整了一个或多个另外的壳体结构（5）和/或光学子组件（6,8,11,14），并且 连接到第一壳体结构（4）。

公开(公告)号：US20050264786A1

公开(公告)日：2005-12-01

申请号：US11101235

申请日：2005-04-07

申请人： Martin Brunotte ,  Jurgen Hartmaier ,  Hubert Holderer ,  Winfried Kaiser ,  Alexander Kohl ,  Jens Kugler ,  Manfred Maul ,  Christian Wagner

发明人： Martin Brunotte ,  Jurgen Hartmaier ,  Hubert Holderer ,  Winfried Kaiser ,  Alexander Kohl ,  Jens Kugler ,  Manfred Maul ,  Christian Wagner

IPC分类号： G02B7/02 ,  G02B1/02 ,  G02B5/30 ,  G03F7/20 ,  H01L21/027 ,  G03B27/54

CPC分类号： G02B1/08 ,  G02B1/02 ,  G02B5/3083 ,  G03F7/70241 ,  G03F7/70825 ,  G03F7/70966

摘要： A projection exposure apparatus for microlithography has a light source, an illumination system, a mask-positioning system and a projection lens. The latter has a system aperture plane and an image plane and contains at least one lens that is made of a material which has a birefringence dependent on the transmission angle. The exposure apparatus further has an optical element, which has a position-dependent polarization-rotating effect or a position-dependent birefringence. This element, which is provided close to a pupil plane of the projection exposure apparatus, compensates at least partially for the birefringent effects produced in the image plane by the at least one lens.

公开(公告)号：US06728021B1

公开(公告)日：2004-04-27

申请号：US10299032

申请日：2002-11-18

申请人： Alexander Kohl ,  Hubert Holderer

发明人： Alexander Kohl ,  Hubert Holderer

IPC分类号： G02F103

CPC分类号： G03F7/70966

摘要： High precision optical components, for example CaF2 lenses in lithographic systems for the production of integrated circuits, often suffer from stress induced birefringence and other imperfections. For altering the optical properties in a confined region of the optical component, the latter is exposed to a beam of ions having an energy preferably in the order 100 MeV/u. This results in a modification of the optical properties due to an interaction of the ions with the surrounding medium the optical component consists of. By carefully choosing the parameters of the process, it is possible to alter the refractive index or the mechanical stress distribution or other optical properties within a confined region of this medium.

摘要翻译： 高精度光学元件，例如用于生产集成电路的光刻系统中的CaF 2透镜，经常遭受应力引起的双折射和其它缺陷。 为了改变光学部件的限制区域中的光学性质，后者被暴露于具有优选为100MeV / u的量级的能量的离子束。 这导致由于离子与光学部件组成的周围介质的相互作用而导致的光学性质的改变。 通过仔细选择该过程的参数，可以改变该介质的限制区域内的折射率或机械应力分布或其他光学性质。

公开(公告)号：US07656595B2

公开(公告)日：2010-02-02

申请号：US12211978

申请日：2008-09-17

申请人： Klaus Beck ,  Bernhard Gellrich ,  Hubert Holderer ,  Thomas Petasch ,  Cornelia Roesch ,  Alexander Kohl

发明人： Klaus Beck ,  Bernhard Gellrich ,  Hubert Holderer ,  Thomas Petasch ,  Cornelia Roesch ,  Alexander Kohl

IPC分类号： G02B7/02

CPC分类号： G03F7/70258 ,  G02B7/023 ,  G03F7/70825

摘要： A arrangement serves for the adjustment of an optical element (1), in particular of a lens in an optical system, in particular in a projection lens system for semiconductor lithography. The optical element (1) is mounted in a mount (3) by means of a number of bearing feet (2) distributed over the circumference of the optical element (1) and is selectively deformable by actuators (5). At least some of the bearing feet (2) are engaged by the actuators (5) in a region of the respective bearing foot (2) in such a way that the respective bearing foot (2) can be displaced in the direction of the optical axis (7).

摘要翻译： 一种布置用于调整光学元件（1），特别是调整光学系统中的透镜，特别是在用于半导体光刻的投影透镜系统中。 光学元件（1）通过分布在光学元件（1）的圆周上的多个轴承脚（2）安装在安装件（3）中，并且可由致动器（5）选择性地变形。 至少一些轴承脚（2）在相应的轴承座（2）的区域中被致动器（5）接合，使得相应的轴承座（2）可以沿着光学方向 轴（7）。

公开(公告)号：US20090040487A1

公开(公告)日：2009-02-12

申请号：US12247597

申请日：2008-10-08

申请人： Wolfgang Hummel ,  Juergen Fischer ,  Karl-Eugen Aubele ,  Erich Merz ,  Raoul Reiner ,  Klaus Rief ,  Stefan Schongart ,  Markus Neumaier ,  Barbel Trossbach ,  Ulrich Weber ,  Michael Muehlbeyer ,  Hubert Holderer ,  Alexander Kohl ,  Jochen Weber ,  Johannes Lippert ,  Thorsten Rassel

发明人： Wolfgang Hummel ,  Juergen Fischer ,  Karl-Eugen Aubele ,  Erich Merz ,  Raoul Reiner ,  Klaus Rief ,  Stefan Schongart ,  Markus Neumaier ,  Barbel Trossbach ,  Ulrich Weber ,  Michael Muehlbeyer ,  Hubert Holderer ,  Alexander Kohl ,  Jochen Weber ,  Johannes Lippert ,  Thorsten Rassel

IPC分类号： G03B27/42

CPC分类号： G03F7/70258 ,  G03F7/70825

摘要： An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.

摘要翻译： 用于微光刻的投影曝光机中的成像装置具有至少一个光学元件和至少一个具有线性驱动的操纵器，用于操纵光学元件的位置。 线性驱动器具有驱动区域和非驱动子区域，它们可以在运动轴线的方向上相对于彼此移动。 至少临时地通过具有主动轴的功能元件和通过至少大致平行于运动轴的有源方向的功能元件临时地互相连接。

公开(公告)号：US20080174757A1

公开(公告)日：2008-07-24

申请号：US11936768

申请日：2007-11-07

申请人： Wolfgang Hummel ,  Jurgen Fischer ,  Karl-Eugen Aubele ,  Erich Merz ,  Raoul Reiner ,  Klaus Rief ,  Stefan Schongart ,  Markus Neumaier ,  Barbel Trossbach ,  Ulrich Weber ,  Michael Muhlbeyer ,  Hubert Holderer ,  Alexander Kohl ,  Jochen Weber ,  Johannes Lippert ,  Thorsten Rassel

发明人： Wolfgang Hummel ,  Jurgen Fischer ,  Karl-Eugen Aubele ,  Erich Merz ,  Raoul Reiner ,  Klaus Rief ,  Stefan Schongart ,  Markus Neumaier ,  Barbel Trossbach ,  Ulrich Weber ,  Michael Muhlbeyer ,  Hubert Holderer ,  Alexander Kohl ,  Jochen Weber ,  Johannes Lippert ,  Thorsten Rassel

IPC分类号： G03B27/54

CPC分类号： G03F7/70258 ,  G03F7/70825

摘要： An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.

摘要翻译： 用于微光刻的投影曝光机中的成像装置具有至少一个光学元件和至少一个具有线性驱动的操纵器，用于操纵光学元件的位置。 线性驱动器具有驱动区域和非驱动子区域，它们可以在运动轴线的方向上相对于彼此移动。 至少临时地通过具有主动轴的功能元件和通过至少大致平行于运动轴的有源方向的功能元件临时地互相连接。

公开(公告)号：US07193794B2

公开(公告)日：2007-03-20

申请号：US10779392

申请日：2004-02-13

申请人： Klaus Beck ,  Bernhard Gellrich ,  Hubert Holderer ,  Thomas Petasch ,  Cornelia Roesch ,  Alexander Kohl

发明人： Klaus Beck ,  Bernhard Gellrich ,  Hubert Holderer ,  Thomas Petasch ,  Cornelia Roesch ,  Alexander Kohl

IPC分类号： G02B7/02

CPC分类号： G03F7/70258 ,  G02B7/023 ,  G03F7/70825

摘要： An arrangement serves for the adjustment of an optical element (1), in particular of a lens in an optical system, in particular in a projection lens system for semiconductor lithography. The optical element (1) is mounted in a mount (3) by means of a number of bearing feet (2) distributed over the circumference of the optical element (1) and is selectively deformable by actuators (5). At least some of the bearing feet (2) are engaged by the actuators (5) in a region of the respective bearing foot (2) in such a way that the respective bearing foot (2) can be displaced in the direction of the optical axis (7).

摘要翻译： 一种布置用于调整光学元件（1），特别是调整光学系统中的透镜，特别是在用于半导体光刻的投影透镜系统中。 光学元件（1）通过分布在光学元件（1）的圆周上的多个轴承脚（2）安装在安装件（3）中，并且可由致动器（5）选择性地变形。 至少一些轴承脚（2）在相应的轴承座（2）的区域中被致动器（5）接合，使得相应的轴承座（2）可以沿着光学方向 轴（7）。

公开(公告)号：US07170585B2

公开(公告)日：2007-01-30

申请号：US11101235

申请日：2005-04-07

申请人： Martin Brunotte ,  Jürgen Hartmaier ,  Hubert Holderer ,  Winfried Kaiser ,  Alexander Kohl ,  Jens Kugler ,  Manfred Maul ,  Christian Wagner

发明人： Martin Brunotte ,  Jürgen Hartmaier ,  Hubert Holderer ,  Winfried Kaiser ,  Alexander Kohl ,  Jens Kugler ,  Manfred Maul ,  Christian Wagner

IPC分类号： G03B27/54 ,  G03B27/72

CPC分类号： G02B1/08 ,  G02B1/02 ,  G02B5/3083 ,  G03F7/70241 ,  G03F7/70825 ,  G03F7/70966

摘要： A projection exposure apparatus for microlithography has a light source, an illumination system, a mask-positioning system and a projection lens. The latter has a system aperture plane and an image plane and contains at least one lens that is made of a material which has a birefringence dependent on the transmission angle. The exposure apparatus further has an optical element, which has a position-dependent polarization-rotating effect or a position-dependent birefringence. This element, which is provided close to a pupil plane of the projection exposure apparatus, compensates at least partially for the birefringent effects produced in the image plane by the at least one lens.

摘要翻译： 用于微光刻的投影曝光装置具有光源，照明系统，掩模定位系统和投影透镜。 后者具有系统孔径平面和图像平面，并且包含由具有取决于透射角的双折射材料制成的至少一个透镜。 曝光装置还具有光学元件，其具有位置相关的偏振旋转效果或位置相关的双折射。 靠近投影曝光装置的光瞳平面设置的该元件至少部分补偿由至少一个透镜在图像平面中产生的双折射效应。

公开(公告)号：US20070014038A1

公开(公告)日：2007-01-18

申请号：US11533660

申请日：2006-09-20

申请人： Klaus Beck ,  Bernhard Gellrich ,  Hubert Holderer ,  Thomas Petasch ,  Cornelia Roesch ,  Alexander Kohl

发明人： Klaus Beck ,  Bernhard Gellrich ,  Hubert Holderer ,  Thomas Petasch ,  Cornelia Roesch ,  Alexander Kohl

IPC分类号： G02B7/02

CPC分类号： G03F7/70258 ,  G02B7/023 ,  G03F7/70825

摘要： A arrangement serves for the adjustment of an optical element (1), in particular of a lens in an optical system, in particular in a projection lens system for semiconductor lithography. The optical element (1) is mounted in a mount (3) by means of a number of bearing feet (2) distributed over the circumference of the optical element (1) and is selectively deformable by actuators (5). At least some of the bearing feet (2) are engaged by the actuators (5) in a region of the respective bearing foot (2) in such a way that the respective bearing foot (2) can be displaced in the direction of the optical axis (7).

摘要翻译： 一种布置用于调整光学元件（1），特别是光学系统中的透镜的调整，特别是用于半导体光刻的投影透镜系统中。 光学元件（1）通过分布在光学元件（1）的圆周上的多个轴承脚（2）安装在安装件（3）中，并且可由致动器（5）选择性地变形。 至少一些轴承脚（2）在相应的轴承座（2）的区域中被致动器（5）接合，使得相应的轴承座（2）可以沿着光学方向 轴（7）。