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    OPTICAL IMAGING DEVICE WITH THERMAL ATTENUATION
    6.
    发明申请
    OPTICAL IMAGING DEVICE WITH THERMAL ATTENUATION 有权
    具有热衰减的光学成像装置

    公开(公告)号：US20090135385A1

    公开(公告)日：2009-05-28

    申请号：US12267074

    申请日：2008-11-07

    申请人： Bernhard Gellrich ,  Jens Kugler ,  Thomas Ittner ,  Stefan Hembacher ,  Karl-Heinz Schimitzek ,  Payam Tayebati ,  Hubert Holderer

    发明人： Bernhard Gellrich ,  Jens Kugler ,  Thomas Ittner ,  Stefan Hembacher ,  Karl-Heinz Schimitzek ,  Payam Tayebati ,  Hubert Holderer

    IPC分类号： G03B27/52

    CPC分类号： G03F7/70341 ,  G03F7/70891

    摘要： An optical imaging device, in particular for use in microlithography, includes a mask device for receiving a mask having a projection pattern, a projection device with an optical element group, a substrate device for receiving a substrate and an immersion zone. The optical element group is adapted to project the projection pattern onto the substrate and includes a plurality of optical elements with an immersion element to which the substrate is at least temporarily located adjacent to during operation. During operation, the immersion zone is located between the immersion element and the substrate and is at least temporarily filled with an immersion medium. A thermal attenuation device is provided, the thermal attenuation device being adapted to reduce fluctuations within the temperature distribution of the immersion element induced by the immersion medium.

    摘要翻译： 特别是用于微光刻的光学成像装置包括用于接收具有投影图案的掩模的掩模装置，具有光学元件组的投影装置，用于接收基板的基板装置和浸没区。 光学元件组适于将投影图案投影到基板上并且包括具有浸没元件的多个光学元件，基板在工作期间至少临时定位到该浸没元件。 在操作期间，浸没区域位于浸没元件和基底之间，并且至少暂时填充浸渍介质。 提供一种热衰减装置，该热衰减装置适于减少浸入式介质引起的浸没元件的温度分布内的波动。

    Optical imaging device with thermal attenuation
    7.
    发明授权
    Optical imaging device with thermal attenuation 有权
    具有热衰减的光学成像装置

    公开(公告)号：US08363206B2

    公开(公告)日：2013-01-29

    申请号：US12267074

    申请日：2008-11-07

    申请人： Bernhard Gellrich ,  Jens Kugler ,  Thomas Ittner ,  Stefan Hembacher ,  Karl-Heinz Schimitzek ,  Payam Tayebati ,  Hubert Holderer

    发明人： Bernhard Gellrich ,  Jens Kugler ,  Thomas Ittner ,  Stefan Hembacher ,  Karl-Heinz Schimitzek ,  Payam Tayebati ,  Hubert Holderer

    IPC分类号： G03B27/52 ,  G03B27/42

    CPC分类号： G03F7/70341 ,  G03F7/70891

    摘要： An optical imaging device, in particular for use in microlithography, includes a mask device for receiving a mask having a projection pattern, a projection device with an optical element group, a substrate device for receiving a substrate and an immersion zone. The optical element group is adapted to project the projection pattern onto the substrate and includes a plurality of optical elements with an immersion element to which the substrate is at least temporarily located adjacent to during operation. During operation, the immersion zone is located between the immersion element and the substrate and is at least temporarily filled with an immersion medium. A thermal attenuation device is provided, the thermal attenuation device being adapted to reduce fluctuations within the temperature distribution of the immersion element induced by the immersion medium.

    摘要翻译： 特别是用于微光刻的光学成像装置包括用于接收具有投影图案的掩模的掩模装置，具有光学元件组的投影装置，用于接收基板的基板装置和浸没区。 光学元件组适于将投影图案投影到基板上并且包括具有浸没元件的多个光学元件，基板在工作期间至少临时定位到该浸没元件。 在操作期间，浸没区域位于浸没元件和基底之间，并且至少暂时填充浸渍介质。 提供一种热衰减装置，该热衰减装置适于减少浸入式介质引起的浸没元件的温度分布内的波动。

    Optical element unit for exposure processes having sealing element
    8.
    发明授权
    Optical element unit for exposure processes having sealing element 有权
    用于具有密封元件的曝光工艺的光学元件单元

    公开(公告)号：US09046795B2

    公开(公告)日：2015-06-02

    申请号：US12046186

    申请日：2008-03-11

    申请人： Tilman Schwertner ,  Ulrich Bingel ,  Guido Limbach ,  Julian Kaller ,  Hans-Juergen Scherle ,  Jens Kugler ,  Dirk Schaffer ,  Bernhard Gellrich

    发明人： Tilman Schwertner ,  Ulrich Bingel ,  Guido Limbach ,  Julian Kaller ,  Hans-Juergen Scherle ,  Jens Kugler ,  Dirk Schaffer ,  Bernhard Gellrich

    IPC分类号： G03F7/20

    CPC分类号： G03F7/7015 ,  G02B27/0006 ,  G03F7/70808 ,  G03F7/70825 ,  G03F7/70883 ,  G03F7/70908 ,  G03F7/70916 ,  G03F7/70933 ,  Y10T29/49

    摘要： An optical element unit includes a first optical element module and a sealing arrangement. The first optical element module occupies a first module space and includes a first module component of a first component type and an associated second module component of a second component type. The first component type is optical elements and the second component type being different from the first component type. The sealing arrangement separates the first module space into a first space and a second space and substantially pre-vents, at least in a first direction, the intrusion of substances from one of the first space and the second space into the other one of the first space and the second space. The first module component at least partially contacts the first space and, at least in its area optically used, not contacting the second space. The second module component at least partially contacts the second space.

    摘要翻译： 光学元件单元包括第一光学元件模块和密封装置。 第一光学元件模块占据第一模块空间并且包括第一组件类型的第一模块组件和第二组件类型的相关联的第二模块组件。 第一部件类型是光学元件，第二部件类型与第一部件类型不同。 密封装置将第一模块空间分隔成第一空间和第二空间，并且至少在第一方向上基本上预先将物质从第一空间和第二空间中的一个进入另一个第一空间 空间和第二空间。 第一模块部件至少部分地接触第一空间，并且至少在其光学使用的区域中不接触第二空间。 第二模块组件至少部分地接触第二空间。

    Optical element module with minimized parasitic loads
    9.
    发明授权
    Optical element module with minimized parasitic loads 有权
    具有最小化寄生负载的光学元件模块

    公开(公告)号：US08351139B2

    公开(公告)日：2013-01-08

    申请号：US12708034

    申请日：2010-02-18

    申请人： Jens Kugler ,  Ulrich Weber ,  Dirk Schaffer

    发明人： Jens Kugler ,  Ulrich Weber ,  Dirk Schaffer

    IPC分类号： G02B7/02

    CPC分类号： G02B7/02 ,  G02B7/021 ,  G03F7/70825

    摘要： An optical element module is provided. The optical module includes an optical element unit that includes an optical element and a support structure that supports the optical element unit. The support structure includes a support device and a contact device mounted to the support device. The contact device exerts a force on the optical element unit in a first direction via a first contact surface of the contact device. The first contact surface contacts a second contact surface of the optical element unit. The contact device includes a first linking section and a second linking section extending along a second direction running transverse to the first direction and arranged kinematically in series between the first contact surface and the support device. The first linking section and the second linking section are elastically deformed in response to a bending moment resulting from the force. The first linking section and the second linking section are arranged on opposite sides of a reference plane. The reference plane includes the force and runs transverse to the second direction.

    摘要翻译： 提供了一种光学元件模块。 光学模块包括光学元件单元，其包括光学元件和支撑光学元件单元的支撑结构。 支撑结构包括支撑装置和安装到支撑装置的接触装置。 接触装置经由接触装置的第一接触面沿第一方向在光学元件单元上施加力。 第一接触表面接触光学元件单元的第二接触表面。 接触装置包括第一连接部分和第二连接部分，该第二连接部分沿着横向于第一方向的第二方向延伸并且在运动学上串联布置在第一接触表面和支撑装置之间。 第一连接部分和第二连接部分响应于由力产生的弯矩而弹性变形。 第一连接部分和第二连接部分布置在参考平面的相对侧上。 参考平面包括力并横向于第二方向延伸。

    Optical projection system
    10.
    发明授权
    Optical projection system 有权
    光学投影系统

    公开(公告)号：US08300210B2

    公开(公告)日：2012-10-30

    申请号：US11664896

    申请日：2005-10-01

    申请人： Johannes Rau ,  Armin Schoeppach ,  Bernhard Gellrich ,  Jens Kugler ,  Martin Mahlmann ,  Bernhard Geuppert ,  Thomas Petasch ,  Gerhard Fuerter

    发明人： Johannes Rau ,  Armin Schoeppach ,  Bernhard Gellrich ,  Jens Kugler ,  Martin Mahlmann ,  Bernhard Geuppert ,  Thomas Petasch ,  Gerhard Fuerter

    IPC分类号： G03B27/54 ,  G03B27/42 ,  G02B7/02

    CPC分类号： G03F7/7015 ,  G02B7/00 ,  G02B7/008 ,  G02B7/021 ,  G02B7/028 ,  G02B7/22 ,  G02B17/08 ,  G02B17/0804 ,  G02B17/0812 ,  G02B17/0892 ,  G03F7/70808 ,  G03F7/70825 ,  G03F7/70833 ,  G03F7/70883

    摘要： An optical projection unit comprising a first optical element module and at least one second optical element module is provided. The first optical element module comprises a first housing unit and at least a first optical element, the first optical element being received within the first housing unit and having an optically used first region defining a first optical axis. The at least one second optical element module is located adjacent to the first optical element module and comprises at least one second optical element, the second optical element defining a second optical axis of the optical projection unit. The first housing unit has a central first housing axis and an outer wall extending in a circumferential direction about the first housing axis. The first optical axis is at least one of laterally offset and inclined with respect to the first housing axis. Furthermore, the first housing axis is substantially collinear with the second optical axis.

    摘要翻译： 提供了包括第一光学元件模块和至少一个第二光学元件模块的光学投影单元。 第一光学元件模块包括第一壳体单元和至少第一光学元件，第一光学元件被接收在第一壳体单元内并且具有限定第一光轴的光学使用的第一区域。 所述至少一个第二光学元件模块位于与所述第一光学元件模块相邻并且包括至少一个第二光学元件，所述第二光学元件限定所述光学投影单元的第二光轴。 第一壳体单元具有中心的第一壳体轴线和围绕第一壳体轴线在圆周方向上延伸的外壁。 第一光轴是相对于第一壳体轴线的横向偏移和倾斜中的至少一个。 此外，第一壳体轴线与第二光轴基本共线。